公开(公告)号：JP2012181289A

公开(公告)日：2012-09-20

申请号：JP2011043398

申请日：2011-02-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  TAKAHASHI HIDETOMO ,  YAMAGUCHI SHUHEI ,  SAITO SHOICHI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO

IPC: G03F7/039 ,  C08F220/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  G03F7/32 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a negative pattern formation method that allows excellent roughness performance such as line width roughness, exposure latitude, and dry etching resistance, and an actinic ray-sensitive or radiation-sensitive resin composition and a resist film used for the same.SOLUTION: A negative pattern formation method comprises: (A) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin containing repeating units consisting of 65 mol% or more repeating units including a group that is decomposed by the action of acid to generate a polar group, with respect to the repeating units in the resin as a whole, and expressed by a following general formula (I); (B) a step of exposing the film; and (C) a step of developing an image using a developing solution including an organic solvent to form a negative pattern.

Abstract translation: 要解决的问题：为了提供允许优异的粗糙度性能如线宽粗糙度，曝光宽容度和耐干蚀刻性的负型图案形成方法，以及光化射线敏感或辐射敏感性树脂组合物和抗蚀剂膜 用于相同。 解决方案：负图案形成方法包括：（A）使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物包含含有由65重量％以上的重复单元构成的重复单元的树脂，所述重复单元包括 相对于树脂中的重复单元整体由酸的作用分解以产生极性基团的基团，并由下列通式（I）表示; （B）曝光胶片的步骤; 和（C）使用包含有机溶剂的显影溶液显影图像以形成负图案的步骤。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012181287A

公开(公告)日：2012-09-20

申请号：JP2011043393

申请日：2011-02-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  TAKAHASHI HIDETOMO ,  YAMAGUCHI SHUHEI ,  SAITO SHOICHI ,  SHIRAKAWA MICHIHIRO ,  YOSHINO FUMIHIRO

IPC: G03F7/32 ,  C08F20/28 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0397

Abstract: PROBLEM TO BE SOLVED: To provide a pattern formation method that allows excellent roughness performance such as line width roughness and exposure latitude, and an actinic ray-sensitive or radiation-sensitive resin composition and a resist film used for the same.SOLUTION: A pattern formation method comprises: (A) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin containing repeating units consisting of 65 mol% or more repeating units including a group that is decomposed by the action of acid to generate a polar group, with respect to the repeating units in the resin as a whole, and expressed by a following general formula (I) or (II); (B) a step of exposing the film; and (C) a step of developing an image using a developing solution including an organic solvent.

Abstract translation: 要解决的问题：提供允许优异的粗糙度性能如线宽粗糙度和曝光宽容度的图案形成方法以及用于其的光化学敏感或辐射敏感性树脂组合物和抗蚀剂膜。 解决方案：图案形成方法包括：（A）使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物包含含有由65重量％以上的重复单元构成的树脂，所述重复单元包括基团 相对于树脂中的重复单元，通过酸的作用分解产生极性基团，并由以下通式（I）或（II）表示： （B）曝光胶片的步骤; 和（C）使用包含有机溶剂的显影溶液显影图像的步骤。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012113003A

公开(公告)日：2012-06-14

申请号：JP2010259577

申请日：2010-11-19

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KATAOKA SHOHEI

IPC: G03F7/32 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in both of line width uniformity of a pattern and developing time-dependency of sensitivity, a chemically amplified resist composition and a resist film, for negative pattern formation with a developer containing an organic solvent.SOLUTION: A pattern forming method, in which a negative pattern is formed, comprises steps of: (1) forming a film with a chemically amplified resist composition containing (A) a resin that has 35 mol% or more of a repeating unit having an alcoholic hydroxyl group based on all repeating units in the resin, and is increased in its polarity and reduced in its solubility in a developer containing an organic solvent by an action of an acid, and (B) a compound that generates an acid by irradiation with an actinic ray or radiation; (2) exposing the film; and (3) developing a pattern with the developer containing the organic solvent.

Abstract translation: 要解决的问题：为了提供一种图案的线宽均匀性和显影时间依赖性都优异的图案形成方法，化学放大型抗蚀剂组合物和抗蚀剂膜，用于通过含有 有机溶剂。 解决方案：形成负型图案的图案形成方法包括以下步骤：（1）用化学放大型抗蚀剂组合物形成膜，该组合物含有（A）具有35摩尔％以上的重复的树脂 具有基于树脂中所有重复单元的醇羟基的单元，并且其极性增加并且通过酸的作用降低其在含有机溶剂的显影剂中的溶解度，和（B）产生酸的化合物 通过用光化射线或辐射照射; （2）曝光胶片; 和（3）用含有有机溶剂的显影剂显影图案。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012068543A

公开(公告)日：2012-04-05

申请号：JP2010214563

申请日：2010-09-24

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SAITO SHOICHI ,  KATAOKA SHOHEI ,  IWATO KAORU ,  FUJII KANA

IPC: G03F7/038 ,  C08F8/00 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that is excellent in resolution such as a critical dimension with no bridge defects, and DOF, as well as a resist film and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin that is decomposed by an action of an acid to produce an amide group or a thioamide group.

Abstract translation: 要解决的问题：提供分辨率优异的光电敏感性或辐射敏感性树脂组合物，例如没有桥接缺陷的临界尺寸，以及DOF，以及抗蚀剂膜和图案形成方法 使用组合。 光敏射线敏感或辐射敏感性树脂组合物含有通过酸的作用而分解以产生酰胺基或硫代酰胺基的树脂。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012047896A

公开(公告)日：2012-03-08

申请号：JP2010188639

申请日：2010-08-25

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO KEITA ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  IWATO KAORU ,  KATAOKA SHOHEI ,  SAITO SHOICHI

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a pattern with a small defect density.SOLUTION: The pattern forming method includes: (a) forming a film using a chemical amplification type resist composition; (b) exposing the film; and (c) developing the exposed film using a developer containing a first organic solvent. The developer has a density of particles having a particle diameter of 0.3 μm or more of 30 pieces/mL.

Abstract translation: 要解决的问题：提供能够形成具有小缺陷密度的图案的图案形成方法。 解决方案：图案形成方法包括：（a）使用化学放大型抗蚀剂组合物形成膜; （b）曝光胶片; 和（c）使用含有第一有机溶剂的显影剂显影曝光的膜。 显影剂的粒径为0.3μm以上的粒子的密度为30个/ mL。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012027436A

公开(公告)日：2012-02-09

申请号：JP2010286766

申请日：2010-12-22

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  IWATO KAORU ,  FUJII KANA ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  KATO KEITA ,  YAMAGUCHI SHUHEI

IPC: G03F7/32 ,  C08F20/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/10 ,  C07C309/12 ,  C07C309/13 ,  C07C309/14 ,  C07D211/96 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0755 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in resolution such as a minimum dimension that does not allow a bridge defect to generate, roughness performance such as line edge roughness and dependence on developing time, to provide an actinic ray sensitive or radiation sensitive resin composition used for the method, and to provide a resist film.SOLUTION: A pattern forming method comprises the steps of: (a) forming a film from an actinic ray sensitive or radiation sensitive resin composition containing a compound(A) that generates an acid upon irradiation with an actinic ray or radiation and is decomposed by an action of an acid to reduce solubility in an organic solvent; (b) exposing the film; and (c) developing using a developer containing an organic solvent.

Abstract translation: 要解决的问题：为了提供优异的分辨率的图案形成方法，例如不允许桥接缺陷产生的最小尺寸，粗糙度性能如线边缘粗糙度和对显影时间的依赖性，以提供光化射线 敏感或辐射敏感的树脂组合物，并提供抗蚀剂膜。 解决方案：图案形成方法包括以下步骤：（a）由光化射线敏感或辐射敏感性树脂组合物形成膜，所述组合物含有在用光化射线或辐射照射时产生酸的化合物（A），并且是 通过酸的作用分解以降低在有机溶剂中的溶解度; （b）曝光胶片; 和（c）使用含有有机溶剂的显影剂显影。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011209520A

公开(公告)日：2011-10-20

申请号：JP2010077432

申请日：2010-03-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUYA SHINJI ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  KATO KEITA ,  DOBASHI TORU ,  MIZUTANI KAZUYOSHI

IPC: G03F7/038 ,  C08F20/36 ,  C08F32/04 ,  G03F7/32 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in development defect performance, liquid immersion defect performance and limit resolution and enables to form a pattern having a good shape, and a pattern forming method using the same.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin which contains a first repeating unit having a group that is decomposed by the action of an acid to thereby generate an alcoholic hydroxyl group, and which exhibits decreased solubility in a developer containing an organic solvent under the action of an acid, a compound which generates an acid upon irradiation with actinic rays or radiation, and a hydrophobic resin.

Abstract translation: 要解决的问题：提供显影缺陷性能，液浸缺陷性能和极限分辨率优异的能光泽或光敏树脂组合物，并且能够形成具有良好形状的图案，以及使用 光敏性或辐射敏感性树脂组合物包含含有具有通过酸作用分解的基团的第一重复单元从而产生醇羟基并且表现出降低的溶解度的树脂 在酸的作用下在含有有机溶剂的显影剂中，在用光化射线或辐射照射时产生酸的化合物和疏水性树脂。

公开(公告)号：JP2011053430A

公开(公告)日：2011-03-17

申请号：JP2009202129

申请日：2009-09-01

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIRAKAWA MICHIHIRO ,  TANGO NAOHIRO ,  YAMAGUCHI SHUHEI ,  SHIBUYA AKINORI ,  KATAOKA SHOHEI

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an effect of improving the circularity of a pattern and allowing formation of a pattern with a good focus latitude, and to provide a pattern forming method using the composition.
SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, and (B) a compound expressed by general formula (1-1) or (1-2), which generates an acid by irradiation with actinic rays or radiation. The composition is characterized in that: the resin (A) contains a repeating unit having an acid decomposable group, and the content rate of the repeating unit is from 45 to 75 mol% with respect to the whole repeating units in the resin (A); and the content rate of the compound (B) is from 10 to 30 mass% on a basis of the whole solid content of the composition. In general formula (1-1), R
13 represents a hydrogen atom, fluorine atom, or the like; R
14 each independently represents, when plural R
14 are present, an alkyl group, a cycloalkyl group, or the like; R
15 each independently represents an alkyl group, a cycloalkyl group, or the like; l represents an integer of 0 to 2; r represents an integer of 0 to 8; and X
- represents a non-nucleophilic anion. In general formula (1-2), M represents an alkyl group, a cycloalkyl group, or the like; R
1c and R
2c each independently represent a hydrogen atom, an alkyl group, or the like; R
x and R
y each independently represent an alkyl group, a cycloalkyl group, or the like; and X
- represents a non-nucleophilic anion.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改善图案的圆形度并且允许形成具有良好的焦点纬度的图案的效果的光化射线敏感或辐射敏感性树脂组合物，并且提供图案形成方法 使用组合。 光解射线敏感性或辐射敏感性树脂组合物包含（A）通过酸的作用使其与碱性显影液的溶解度增加的树脂，（B）由通式 （1-1）或（1-2），其通过用光化射线或辐射照射产生酸。 该组合物的特征在于：树脂（A）含有具有酸分解性基团的重复单元，重复单元的含有率相对于树脂（A）中的全部重复单元为45〜75摩尔％ ; 并且化合物（B）的含有率基于组合物的全部固体成分为10〜30质量％。 在通式（1-1）中，R 13是氢原子，氟原子等; 当存在多个R SB 14时，R SB 14各自独立地表示烷基，环烷基等; R SB 15各自独立地表示烷基，环烷基等; l表示0〜2的整数， r表示0〜8的整数， 而X - 表示非亲核阴离子。 在通式（1-2）中，M表示烷基，环烷基等; R SB 1和R SB 2各自独立地表示氢原子，烷基等; R SB和R SB各自独立地表示烷基，环烷基等; 而X - 表示非亲核阴离子。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010256856A

公开(公告)日：2010-11-11

申请号：JP2010013681

申请日：2010-01-25

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： ITO TAKAYUKI ,  TAKAHASHI HIDETOMO ,  TSUCHIMURA TOMOTAKA ,  KATAOKA SHOHEI ,  INAZAKI TAKESHI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/0397

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition satisfying high sensitivity, high resolution, good pattern form, good line edge roughness and reduction of outgassing at the same time in a superfine region, in particular, in electron beam, X-ray or EUV ray lithography, and to provide a resist film and a pattern forming method using the resist film. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having the following repeating units (A)-(C) and a solvent having a boiling temperature of 150°C or lower. A resist film of the composition and a pattern-forming method using the composition are provided. The repeating units are: (A) a repeating unit containing a group for decomposing and forming an acid upon irradiation with ah actinic ray or radiation; (B) a repeating unit containing a group for decomposing and forming a carboxylic acid by the action of an acid; and (C) a repeating unit containing a carbon-carbon unsaturated bond. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供在超细区域中同时满足高灵敏度，高分辨率，良好图案形式，良好的线边缘粗糙度和减少除气的光化射线敏感或辐射敏感性树脂组合物， 特别地，在电子束，X射线或EUV射线光刻中，并提供使用该抗蚀剂膜的抗蚀剂膜和图案形成方法。 光敏性或辐射敏感性树脂组合物含有具有以下重复单元（A） - （C）的树脂（P）和沸点为150℃以下的溶剂。 提供了组合物的抗蚀剂膜和使用该组合物的图案形成方法。 重复单元是：（A）包含用于在用光化学射线或辐射照射时分解和形成酸的基团的重复单元; （B）含有通过酸的分解和形成羧酸的基团的重复单元; 和（C）含有碳 - 碳不饱和键的重复单元。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2014098921A

公开(公告)日：2014-05-29

申请号：JP2014000666

申请日：2014-01-06

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIRAKAWA MICHIHIRO ,  TANGO NAOHIRO ,  YAMAGUCHI SHUHEI ,  SHIBUYA AKINORI ,  KATAOKA SHOHEI

IPC: G03F7/004 ,  C08F220/12 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an effect of improving the circularity of a pattern and allowing formation of a pattern with a good focus latitude, and to provide a pattern forming method using the composition.SOLUTION: An actinic ray sensitive or radiation sensitive resin composition contains (A) a resin solubility of which to an alkali developer is increased by the action of acids, and (B) a compound represented by the general formula (1-1) or (1-2) generating acids by irradiation of an actinic ray or radiation, the resin (A) contains a repeating unit having an acid decomposable group, the percentage content of the repeating unit is 45 to 75 mol% based on all repeating units in the resin (A), and the content of the compound (B) is 10 to 30 mass% based on all solid contents of the composition.

Abstract translation: 要解决的问题：提供具有改善图案的圆形度并且允许形成具有良好的对焦纬度的图案的效果的光化射线敏感或辐射敏感性树脂组合物，并且提供使用该组合物的图案形成方法 解决方案：光化射线敏感或辐射敏感性树脂组合物含有（A）通过酸的作用使其对碱显影剂的树脂溶解度增加，（B）由通式（1-1）表示的化合物或 （1-2）通过光化射线或辐射的照射产生酸，树脂（A）含有具有酸分解基团的重复单元，重复单元的百分含量基于所有重复单元的45至75摩尔％ 树脂（A）和化合物（B）的含量相对于组合物的全部固体成分为10〜30质量％。