公开(公告)号：JP2008104412A

公开(公告)日：2008-05-08

申请号：JP2006290646

申请日：2006-10-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： OZEKI KATSUHISA ,  NEMORI RIYOUICHI ,  KOBAYASHI TAKAYUKI ,  KAWAMURA KOICHI

IPC: C12M3/00

CPC classification number: C12M23/20 ,  C12M25/00

Abstract: PROBLEM TO BE SOLVED: To provide a substrate enabling cell culture, and further enabling separation and recovery, and to provide a method for producing the substrate.
SOLUTION: The substrate comprising a supporter having a covering layer, comprising a thermoresponsive polymer on the surface is regulated, such that the covering area of the covering layer comprising the thermoresponsive polymer is 50 cm
2 or higher and the in-plane variation coefficient of the covering amount with the thermoresponsive polymer is 30% or lower.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够进行细胞培养的基板，进一步实现分离和回收，并提供一种基板的制造方法。 解决方案：包含具有覆盖层的支撑体的基底在表面上包括热敏聚合物被调节，使得包含热敏聚合物的覆盖层的覆盖面积为50cm 2 / 高温聚合物的覆盖量的面内变化系数为30％以下。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008083519A

公开(公告)日：2008-04-10

申请号：JP2006264705

申请日：2006-09-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： AOSHIMA TOSHIE ,  KAWAMURA KOICHI

IPC: G02B5/22 ,  B32B27/18 ,  C09K3/00

CPC classification number: B32B27/20 ,  G02B5/223

Abstract: PROBLEM TO BE SOLVED: To provide an optical cut filter having high shielding property against light and excellent heat resistance, light resistance and moisture heat resistance and a simple structure and applicable to a large area.
SOLUTION: The optical cut filter has a light absorbing layer on at least one surface of a base material, the absorbing layer containing a grafted polymer directly bonded to the base material and an anionic dye, characterized in that the grafted polymer has an ionic group and that the anionic dye forms an association state.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高光屏蔽性和优异的耐热性，耐光性和耐湿热性的光学切割滤光片，并且结构简单，适用于大面积。 解决方案：光学切割过滤器在基材的至少一个表面上具有光吸收层，吸收层含有直接结合到基材的接枝聚合物和阴离子染料，其特征在于接枝聚合物具有 并且阴离子染料形成缔合状态。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008007729A

公开(公告)日：2008-01-17

申请号：JP2006182291

申请日：2006-06-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： AOSHIMA TOSHIE ,  KAWAMURA KOICHI

IPC: C08J7/04 ,  B32B9/00 ,  C08F291/00

CPC classification number: C09D5/1675 ,  C08F291/00 ,  C08L51/003

Abstract: PROBLEM TO BE SOLVED: To obtain an stain-resistant film that is provided with a water-repellent and oil-repellent treatment surface having excellent adhesivity to a substrate and has high stain resistance and its durability and to provide a method for producing the same.
SOLUTION: The stain-resistant film comprises a substrate and an organic-inorganic composite layer having a crosslinking structure formed by hydrolysis and condensation polymerization of an alkoxide of an element selected from Si, Ti, Zr and Al in a graft polymer layer composed of a graft polymer chain directly bonded to the surface of the substrate and is obtained by subjecting the surface of the organic-inorganic composite layer to water-repellent and oil-repellent treatment.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了获得具有对基材具有优异粘合性并具有高耐污性和耐久性的拒水拒油处理表面的耐污染膜，并提供一种生产方法 一样。 防污膜包括基材和具有通过在接枝聚合物层中选自Si，Ti，Zr和Al的元素的醇盐的醇盐的水解和缩聚而形成的交联结构的有机 - 无机复合层 由直接接合到基材表面的接枝聚合物链构成，通过使有机 - 无机复合层的表面进行防水拒油处理而得到。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008007727A

公开(公告)日：2008-01-17

申请号：JP2006182287

申请日：2006-06-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： AOSHIMA TOSHIE ,  KAWAMURA KOICHI

IPC: C08J7/04 ,  B32B7/02 ,  B32B27/16 ,  C08F291/00

Abstract: PROBLEM TO BE SOLVED: To obtain an antistatic film having high transparency, high adhesivity between an antistatic layer and an organic substrate, excellent antistatic property (surface stain resistance) and its durability and to provide a method for producing the same. SOLUTION: The antistatic film comprises an antistatic layer composed of an organic-inorganic composite material comprising an inorganic component having a crosslinking structure formed by hydrolysis and condensation polymerization of an alkoxide of an element selected from Si, Ti, Zr and Al and a conductive colloid in a graft polymer layer containing a graft polymer chain directly bonded to a substrate surface and is obtained by subjecting the surface of the antistatic layer to water-repellent and oil-repellent treatment. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题为了获得具有高透明度，抗静电层和有机基材之间的高粘合性的抗静电膜，具有优异的抗静电性（耐表面污渍性）及其耐久性，并提供其制备方法。 抗静电膜包括由有机 - 无机复合材料组成的抗静电层，该有机 - 无机复合材料包含具有通过选自Si，Ti，Zr和Al的元素的醇盐的水解和缩聚而形成的交联结构的无机组分，和 接枝聚合物层中的导电胶体，其含有直接接合到基材表面的接枝聚合物链，并且通过使抗静电层的表面进行防水和拒油处理而获得。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008003160A

公开(公告)日：2008-01-10

申请号：JP2006170491

申请日：2006-06-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI

IPC: G03F7/004 ,  C08F291/00 ,  C08F292/00 ,  G03F7/26 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method which can easily form a super fine graft polymer pattern on the surface of a solid object. SOLUTION: This method has a step of connecting a photopolymerization position for starting optical polymerization and a compound having a junction with the substrate, a step of exposing the pattern to deactivate the optical polymerization start position in the exposed area, and a step of generating a graft polymer, after bringing an unsaturated compound capable of radical polymerization in contact on the substrate, exposing all over using only the light of a wavelength which this unsaturated compound does not absorb to start radical polymerization from the photopolymerization start position remaining on the non-exposed area when exposing the pattern. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在固体物体的表面上容易形成超细微接枝聚合物图案的图案形成方法。 解决方案：该方法具有连接用于起始光聚合的光聚合位置和具有与基板接合的化合物的步骤，暴露图案以使曝光区域中的光学聚合开始位置失活的步骤，以及步骤 产生接枝聚合物后，使能够自由基聚合的不饱和化合物在基材上接触后，仅使用该不饱和化合物不吸收的波长的光全部曝光，从剩余的光聚合开始位置开始自由基聚合 未曝光区域曝光图案。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2012001694A

公开(公告)日：2012-01-05

申请号：JP2010140784

申请日：2010-06-21

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KANEHARA HIDEYUKI ,  KAWAMURA KOICHI

IPC: C08F16/12 ,  C12M1/00 ,  C12M1/40

CPC classification number: C12M39/00 ,  C12M23/20

Abstract: PROBLEM TO BE SOLVED: To provide: a microorganism adhesion-preventing material that is excellent in microorganism adhesion preventability, has less effect on environment, and can be produced at low cost; a microorganism adhesion-preventing base material using the microorganism adhesion-preventing material; a bioreactor; and a coating material for agriculture.SOLUTION: This invention relates to: the microorganism adhesion-preventing material containing a polymer; the microorganism adhesion-preventing base material; the bioreactor; and the coating material for agriculture, wherein the polymer has a pendant group on a side chain. The pendant group comprises at least a carbon atom, a hydrogen atom and an oxygen atom, and has the total atomic weight of 100 or larger.

Abstract translation: 待解决的问题：提供：微生物粘附防止性优异的微生物粘附防止材料，对环境的影响较小，可以低成本地制造; 使用微生物粘附防止材料的微生物粘附防止基材; 生物反应器 和农业用涂料。 解决方案：本发明涉及：含有聚合物的微生物粘附防止材料; 微生物粘附防止基材; 生物反应器 和农业用涂料，其中聚合物在侧链具有侧基。 该侧基包含至少一个碳原子，氢原子和氧原子，总原子量为100以上。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009270060A

公开(公告)日：2009-11-19

申请号：JP2008123687

申请日：2008-05-09

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI ,  FUJITA MITSUHIRO

IPC: C08F4/02 ,  C08F292/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a material for fixing a polymerization initiator on a surface, which can easily produce a domain structure of a nanosize order by a self assembled monolayer of the polymerization initiator without using means such as lithography; and to provide a method for producing a grafted polymer pattern which can easily produce a grafted polymer pattern having a domain structure of a nanosize order.
SOLUTION: The method for producing a material for fixing a polymerization initiator on a surface comprises: contacting the polymerization initiator, having a site which can be bonded to a support, with the surface of the support, using a dipping or evaporation method; and then forming the nanodomain structure by the self assembled monolayer of the polymerization initiator bonded to the support on the support by self-assembly of the polymerization initiator bonded to the support. The method for producing the grafted polymer pattern comprises a step of producing the grafted polymer on the nanodomain structure of the material for fixing the polymerization initiator on the surface provided by the method for producing the material for fixing the polymerization initiator on the surface.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在表面上固定聚合引发剂的材料的方法，其可以通过聚合引发剂的自组装单层容易地产生纳米级的畴结构，而不使用诸如 平版印刷 并提供一种接枝聚合物图案的制造方法，其可以容易地制备具有纳米级序列结构的接枝聚合物图案。 解决方案：用于在表面上固定聚合引发剂的材料的制备方法包括：使用浸渍或蒸发法将具有可与载体结合的位点的聚合引发剂与载体的表面接触 ; 然后通过聚合引发剂的自组装单层通过结合到载体上的聚合引发剂的自组装，将与结合到载体上的载体的自组装单层形成纳米结构域结构。 接枝聚合物图案的制造方法包括在将聚合引发剂固定在表面上的材料的制造方法所提供的表面上，在聚合引发剂固定用材料的纳米域结构上制造接枝聚合物的工序。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009047898A

公开(公告)日：2009-03-05

申请号：JP2007213593

申请日：2007-08-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI

IPC: G03F1/50 ,  G03F1/68 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide photomask blanks having high flatness and excellent close adhesiveness of a chrome membrane, and to provide a method of manufacturing the photomask blanks simply. SOLUTION: The method of manufacturing the photomask blanks includes a step of forming a polymer layer formed by the polymer having a functional group forming the interaction with chrome or chromium oxide and having at least one terminal bonded chemically and directly on a glass substrate on the glass substrate and a step of forming the chrome membrane on the polymer layer by a vapor phase method. These photomask blanks are manufactured by the manufacturing method. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高平坦度和优异的铬膜密合性的光掩模坯料，并且简单地提供制造光掩模坯料的方法。 解决方案：制造光掩模坯料的方法包括形成聚合物层的步骤，所述聚合物层由具有与铬或氧化铬形成相互作用的官能团形成的聚合物层，并且具有化学和直接键合在玻璃基板上的至少一个末端 并且通过气相法在聚合物层上形成铬膜的步骤。 这些光掩模坯料通过制造方法制造。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009003998A

公开(公告)日：2009-01-08

申请号：JP2007161796

申请日：2007-06-19

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： HATTORI KOJI ,  KAWAMURA KOICHI

IPC: G11B5/842 ,  C08F2/00 ,  C08F292/00 ,  G11B5/706 ,  G11B5/73

CPC classification number: G11B5/855

Abstract: PROBLEM TO BE SOLVED: To provide a magnetic recording medium having high productivity while reducing transition noise and to provide its manufacturing method. SOLUTION: The manufacturing method of the magnetic recording medium has a polymerization initiator fixing step for fixing a polymerization initiator to a substrate by a micro contact printing, a pattern forming step for forming a pattern of a graft polymer by bringing a compound having a polymerizable unsaturated bond into contact with the polymerization initiator fixed to the substrate to perform graft polymerization and a magnetic region forming step for forming a plurality of physically independent magnetic regions by applying an alloy particle containing liquid containing alloy particles capable of forming a CuAu type or Cu 3 Au type ferromagnetic regular alloy to the pattern and further performing annealing treatment. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高生产率的磁记录介质，同时降低过渡噪声并提供其制造方法。 解决方案：磁记录介质的制造方法具有聚合引发剂固定步骤，用于通过微接触印刷将聚合引发剂固定到基材上;图案形成步骤，用于通过使具有 与聚合引发剂接触的可聚合不饱和键与基材进行接枝聚合，以及磁区形成步骤，用于通过涂覆含有能够形成CuAu型合金颗粒的含有液体的合金颗粒，形成多个物理上独立的磁区，或 Cu 3 Au型铁磁规则合金，并进一步进行退火处理。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008207401A

公开(公告)日：2008-09-11

申请号：JP2007044692

申请日：2007-02-23

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI ,  SATO KOJI ,  MATSUSHITA YASUAKI

IPC: B32B9/00 ,  H01L51/50 ,  H05B33/04 ,  H05K3/38

CPC classification number: H05K3/387

Abstract: PROBLEM TO BE SOLVED: To provide a laminate with a graft polymer layer which features excellent adhesion with an inorganic compound film on the surface of a substrate and enables easy forming of a conducting layer with a favorable electroconductivity, and a laminate with a conducting layer and its manufacturing method, a wiring substrate and a display device using the laminate. SOLUTION: This laminate keeps an intermediate layer with an inorganic compound film formed on its top surface and a graft polymer layer directly connected with the inorganic compound film overlying the substrate. Alternatively, it is possible to form a laminate by applying a conducting material to the surface of the graft polymer layer as the conducting layer. The conducting layer is useful for various kinds of wirings. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有与基材表面上的无机化合物膜具有优异粘附性的接枝聚合物层的层压体，并且能够容易地形成具有良好的导电性的导电层，以及具有 导电层及其制造方法，布线基板和使用该层叠体的显示装置。 解决方案：该层压体保持在其顶表面上形成无机化合物膜的中间层和与覆盖在基材上的无机化合物膜直接连接的接枝聚合物层。 或者，可以通过将导电材料施加到作为导电层的接枝聚合物层的表面来形成层压体。 导电层可用于各种布线。 版权所有（C）2008，JPO＆INPIT