Liquid crystal display device
    42.
    发明授权

    公开(公告)号:US10761380B2

    公开(公告)日:2020-09-01

    申请号:US16373832

    申请日:2019-04-03

    Abstract: A reliability of seal portion of a liquid crystal display device can be improved by the following structure. A liquid crystal display device includes: a TFT substrate which includes a display region and a terminal part, and has an inorganic insulating film formed on an organic passivation film and an alignment film formed over the inorganic insulating film; a counter substrate, the TFT substrate and the counter substrate bonded together by a sealing material formed at a seal part surrounding the display region; and a liquid crystal sealed inside. At the seal part, a transparent conductive oxide film is formed between the inorganic insulating film and the alignment film. The transparent conductive oxide film exists inside an edge of the TFT substrate and hence, the edge of the TFT substrate is free of the transparent conductive oxide film.

    Liquid crystal display device and manufacturing method thereof

    公开(公告)号:US10197857B2

    公开(公告)日:2019-02-05

    申请号:US15826366

    申请日:2017-11-29

    Abstract: The present invention prevents the shaving of an alignment film caused by a columnar spacer in a liquid crystal display device of an IPS method using photo-alignment. A plinth higher than a pixel electrode is formed at a part where a columnar spacer formed over a counter substrate touches a TFT substrate. When an alignment film of a double-layered structure is applied over the pixel electrode and the plinth, the thickness of the alignment film over the plinth reduces by a leveling effect. When photo-alignment is applied in the state, a photodegraded upper alignment film over the plinth disappears and a lower alignment film having a high mechanical strength remains. As a result, it is possible to prevent the shaving of the alignment film.

    Display device and manufacturing method for same
    47.
    发明授权
    Display device and manufacturing method for same 有权
    显示装置及其制造方法相同

    公开(公告)号:US09496292B2

    公开(公告)日:2016-11-15

    申请号:US13915671

    申请日:2013-06-12

    CPC classification number: H01L27/1244 H01L27/1225 H01L27/1288 H01L27/3244

    Abstract: The present invention provides a display device having: gate electrodes formed on a transparent substrate; a gate insulating film for covering the gate electrodes; an oxide semiconductor formed on the gate insulating film; drain electrodes and source electrodes formed at a distance from each other with channel regions of the oxide semiconductor in between; an interlayer capacitor film for covering the drain electrodes and source electrodes; common electrodes formed on top of the interlayer capacitor film; and pixel electrodes formed so as to face the common electrodes, and wherein an etching stopper layer for covering the channel regions is formed between the oxide semiconductor and the drain electrodes and source electrodes, the drain electrodes are a multilayer film where a transparent conductive film and a metal film are layered on top of each other, and the drain electrodes and source electrodes make direct contact with the oxide semiconductor.

    Abstract translation: 本发明提供一种显示装置,具有:形成在透明基板上的栅电极; 用于覆盖栅电极的栅极绝缘膜; 形成在栅极绝缘膜上的氧化物半导体; 漏电极和源极之间形成有一定距离的氧化物半导体的沟道区; 用于覆盖漏电极和源电极的层间电容膜; 公共电极形成在层间电容器膜的顶部; 以及形成为与公共电极相对的像素电极,并且其中在氧化物半导体与漏电极和源电极之间形成用于覆盖沟道区的蚀刻停止层,漏电极是多层膜,其中透明导电膜和 金属膜层叠在一起,漏电极和源电极与氧化物半导体直接接触。

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