公开(公告)号：JP2013087232A

公开(公告)日：2013-05-13

申请号：JP2011230390

申请日：2011-10-20

Applicant: Nippon Soda Co Ltd ,  日本曹達株式会社 ,  Jsr Corp ,  Jsr株式会社

Inventor： SHINTANI TAKESHI ,  OKADO TOSHIAKI ,  TANDO IZUMI ,  NARUSE HIDENORI ,  KAJITA TORU

IPC: C08F297/02 ,  C09B67/20 ,  G02B5/20

CPC classification number: C08F299/04 ,  C08F290/062 ,  C08F297/026 ,  C09B67/0002 ,  C09B67/009 ,  G02B5/223 ,  C08F220/18 ,  C08F2220/285 ,  C08F2220/281

Abstract: PROBLEM TO BE SOLVED: To provide a novel copolymer having excellent pigment dispersion performance, particularly, a novel copolymer which can be used as a pigment dispersant capable of attaining higher brightness and higher contrast of green pigment particularly in a color filter.SOLUTION: The novel copolymer contains: a block chain (A) including a repeating unit having tertiary amino group; and a block chain (B) including a repeating unit represented by formula (I) (wherein Rrepresents hydrogen atom or 1-3C alkyl, Rand Reach independently represent hydrogen atom or 1-6C alkyl, Q represents oxygen-containing heterocyclic group which may have alkyl as a substituent or 2-20C alkenyl, and n represents an integer of 0-6), and has an amine value of 80 mgKOH/g or more and 250 mgKOH/g or less.

Abstract translation: 要解决的问题：为了提供具有优异的颜料分散性能的新型共聚物，特别是可以用作颜料分散剂的新型共聚物，其可以获得更高的亮度和更高的绿色颜料的对比度，特别是在滤色器中。 解决方案：新型共聚物含有：包含具有叔氨基的重复单元的嵌段链（A）; 和包含由式（I）表示的重复单元的嵌段链（B）（其中R 1 表示氢原子或1-3C烷基，R 2 和R 3 各自独立地表示氢原子或1-6C烷基，Q表示可具有烷基作为取代基的含氧杂环基或2-20C 烯基，n表示0-6的整数），胺值为80mgKOH / g以上至250mgKOH / g以下。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011197142A

公开(公告)日：2011-10-06

申请号：JP2010061575

申请日：2010-03-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  KAJITA TORU

IPC: G03F7/038 ,  C08F20/06 ,  C08F20/28 ,  C08F20/32 ,  G03F7/004 ,  G03F7/028 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which can be cured by low-temperature heating, has good alkali developability and high radiation sensitivity, and capable of forming a cured film with excellent hardness and solvent resistance.SOLUTION: The radiation-sensitive composition contains[A] an alkali-soluble resin, [B] at least one compound selected from the group consisting of vinyloxyalkyloxetane and vinyloxyaryloxetane compounds, and [C] a compound which generates an acid when energy is imparted thereto.

Abstract translation: 要解决的问题：提供可通过低温加热固化的辐射敏感性组合物，具有良好的碱显影性和高的辐射敏感性，并且能够形成具有优异的硬度和耐溶剂性的固化膜。解决方案： 敏感性组合物含有[A]碱溶性树脂，[B]至少一种选自乙烯氧基烷氧基乙烯和乙烯氧基异丙烷化合物的化合物，[C]当赋予能量时产生酸的化合物。

公开(公告)号：JP2011191344A

公开(公告)日：2011-09-29

申请号：JP2010055156

申请日：2010-03-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  KAJITA TORU

IPC: G03F7/039 ,  C08F216/12 ,  C08F220/06 ,  C08F220/28 ,  C08F222/06 ,  C08F222/40 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition which has good alkali developability, can be cured by low-temperature heating, and also has high radiation sensitivity. SOLUTION: The positive radiation-sensitive resin composition includes a polymer having at least one structural unit selected from polyvinyl ethers in which tertiary carbon has an oxetanyl structure and an acid generator. It is preferable that the polymer further includes a maleic anhydride or maleimide structural unit as a monomer unit. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有良好的碱显影性的正性辐射敏感性树脂组合物，可以通过低温加热固化，并且还具有高的辐射敏感性。 正型辐射敏感性树脂组合物包括具有至少一个选自叔碳具有氧杂环丁烷基结构的聚乙烯醚和酸发生剂的结构单元的聚合物。 优选聚合物还包含作为单体单元的马来酸酐或马来酰亚胺结构单元。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010085929A

公开(公告)日：2010-04-15

申请号：JP2008257801

申请日：2008-10-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/031 ,  C07C323/40 ,  C08F220/04 ,  G02F1/1339 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity even when a light source eliminating a short wavelength range is used, giving a sufficient spacer shape even with the amount of exposure of not more than 1,000 J/m 2 for example, and allowing formation of a spacer for a liquid crystal display element excellent in elastic recovery property, rubbing durability, adhesiveness to a transparent substrate, resolution or the like. SOLUTION: The radiation-sensitive resin composition includes: [A] a copolymer of (a1) at least one kind selected from a group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound except for the above compounds (a1); [B] a polymerizable unsaturated compound; and [C] a specified oxime ester represented by a compound No.1. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决问题：为了提供即使在消除短波长范围的光源时也具有高灵敏度的辐射敏感性树脂组合物，即使曝光量不大于1,000J / cm 2，也能提供足够的间隔物形状， 例如，可以形成弹性恢复性，摩擦耐久性，对透明基材的粘合性，分辨率等优异的液晶显示元件的间隔物。 解决方案：辐射敏感性树脂组合物包括：[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）除 以上化合物（a1）; [B]可聚合不饱和化合物; 和[C]由化合物No.1表示的规定的肟酯。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009222822A

公开(公告)日：2009-10-01

申请号：JP2008065057

申请日：2008-03-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/033 ,  C08F2/44 ,  C08F265/04 ,  G02F1/1339 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition from which a spacer for a liquid crystal display element having flexibility and a high elastic recovery rate is formed even at a post-bake temperature of ≤200°C, and a radiation-sensitive resin composition excellent in storage stability. SOLUTION: The radiation-sensitive resin composition contains [A] an alkali-soluble polymer having a bicyclo ortho ester structure, [B] a polymerizable unsaturated compound, and [C] a radiation-sensitive polymerization initiator. The radiation-sensitive resin composition may further contain [D] an acid generator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种辐射敏感性树脂组合物，即使在后烘烤温度≤200℃下也形成了具有柔软性和高弹性回复率的液晶显示元件用间隔物，以及 具有优异的储存稳定性的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物含有[A]具有双环原酸酯结构的碱溶性聚合物，[B]可聚合不饱和化合物和[C]辐射敏感聚合引发剂。 辐射敏感性树脂组合物还可以含有[D]酸产生剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009222816A

公开(公告)日：2009-10-01

申请号：JP2008064989

申请日：2008-03-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/075 ,  C08F8/30 ,  C08F290/12 ,  G02F1/1335 ,  G02F1/1339 ,  G03F7/033 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition from which a protective film excellent in heat resistance and adhesion on a color filter is formed, and a radiation-sensitive resin composition from which a spacer excellent in adhesion and excellent also in various performances such as elastic recovery property is formed. SOLUTION: The radiation-sensitive resin composition contains [A] a polymer of an unsaturated compound containing (a1) at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides, [B] a calix arene compound having a specific structure, and [C] a radiation-sensitive polymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，其中形成了耐滤性和滤色片上的粘附性优异的保护膜，以及粘合性优异的间隔物优异的辐射敏感性树脂组合物 也在各种表现如弹性恢复性能的形成。 解决方案：辐射敏感性树脂组合物含有[A]含有（a1）至少一种选自不饱和羧酸和不饱和羧酸酐的化合物的不饱和化合物的聚合物，[B]杯状芳烃 具有特定结构的化合物，[C]辐射敏感性聚合引发剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009204865A

公开(公告)日：2009-09-10

申请号：JP2008046792

申请日：2008-02-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/023 ,  G02B1/04 ,  G02B3/00 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high radiation sensitivity, having a developing margin of forming a satisfactory pattern shape even when exceeding the optimum developing time in a developing process, and can form easily a pattern-like thin film excellent in tightness. SOLUTION: The radiation sensitive resin composition contains (A) a copolymer of (a1) at least one selected from the group comprising an unsaturated carboxylic acid and an unsaturated carboxylic anhydride, and (a2) at least kind selected from the group comprising an unsaturated compound having an oxiranyl group, and an unsaturated compound having an oxetanyl group, (B) a 1,2-quinone diazide compound, and (C) a calixarene compound of specific structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，即使在显影过程中超过最佳显影时间时也具有形成令人满意的图案形状的显影余量，并且可以容易地形成图案样 薄膜性能优良。 解决方案：辐射敏感性树脂组合物含有（A）（a1）选自不饱和羧酸和不饱和羧酸酐的至少一种的共聚物，和（a2）选自包含 具有环氧乙烷基的不饱和化合物和具有氧杂环丁烷基的不饱和化合物，（B）1,2-醌二叠氮化合物和（C）特定结构的杯芳烃化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009203344A

公开(公告)日：2009-09-10

申请号：JP2008046787

申请日：2008-02-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: C08G59/40 ,  C08F290/14 ,  C08G8/22 ,  C08G59/08 ,  C08L33/14 ,  G02B5/20 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting composition, which is suitably used to produce a color filter protective film high in surface hardness and excellent in various resistances such as transparency, heat resistance, and adhesiveness. SOLUTION: The thermosetting resin composition comprises: [A] a polymer having a repeating unit derived from a polymerizable unsaturated compound having an oxiranyl group or oxetanyl group; and [B] a calyx compound having a specific structure. The thermosetting resin composition can be suitably used to produce the color filter protective film. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种热固性组合物，其适合用于制备表面硬度高，透明性，耐热性和粘合性等各种电阻优异的滤色器保护膜。 解决方案：热固性树脂组合物包含：[A]具有衍生自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的重复单元的聚合物; 和[B]具有特定结构的花萼化合物。 热固性树脂组合物可以适用于制造滤色器保护膜。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009179648A

公开(公告)日：2009-08-13

申请号：JP2008017317

申请日：2008-01-29

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO ,  SOGA TETSUNORI ,  ISHIKAWA MASAYOSHI ,  KAJITA TORU

IPC: C08F24/00 ,  C08F8/00 ,  C08F20/28 ,  C08J7/00

Abstract: PROBLEM TO BE SOLVED: To provide a refractive index variable composition in which the refractive index of the material is varied by an easy method and a refractive index difference can be varied in a desired positive or negative direction, and to provide a method for forming a refractive index pattern from the composition. SOLUTION: The refractive index variable composition contains (A) a polymer having a bicyclo ortho-ester structure. The method for forming a refractive index pattern comprises irradiating a part of a molded product of the refractive index variable composition with radiation, or irradiating a part of a molded product of the refractive index variable composition with radiation and then heating the product. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供折射率可变组合物，其中材料的折射率通过简单的方法改变，并且折射率差可以在期望的正或负方向上变化，并且提供一种方法 用于从组合物形成折射率图案。 折射率可变组合物含有（A）具有双环原位酯结构的聚合物。 形成折射率图案的方法包括用辐射照射折射率可变组合物的成型产品的一部分，或者用辐射照射折射率可变组合物的模制产品的一部分，然后加热产品。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009075284A

公开(公告)日：2009-04-09

申请号：JP2007243287

申请日：2007-09-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/029 ,  G02F1/1339 ,  G03F7/032 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition obtaining an adequate residual film ratio even under ≤1,000 J/m 2 of exposure energy, and capable of forming a spacer or a protective film for a display device excellent in adhesion and rubbing resistance and further having a high elastic recovery rate even at a post-bake temperature of SOLUTION: The radiation-sensitive resin composition comprises [A] a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound other than the component (a1), [B] a polymerizable compound having an ethylenically unsaturated bond, [C] a radiation-sensitive radical generator, and [D] a specific onium-fluorinated alkylfluorophosphate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供即使在≤1,000J/ m 2的曝光能量下获得足够的残余膜比，并且能够形成间隔物或保护性的辐射敏感性树脂组合物 用于具有优异的粘合性和耐摩擦性的显示装置的膜，并且即使在后烘烤温度<200℃下也具有高的弹性回复率。 解决方案：辐射敏感性树脂组合物包含[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）不同于组分（ a1），[B]具有烯键式不饱和键的可聚合化合物，[C]辐射敏感性自由基发生剂和[D]特定的氟化氟化烷基氟磷酸酯。 版权所有（C）2009，JPO＆INPIT