Abstract:
A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.
Abstract:
A process cartridge is detachably mountable to a main assembly of an electrophotographic image forming apparatus that includes a cam movable between first and second positions. The cartridge includes an electrophotographic photosensitive drum, a developing roller developing an electrostatic latent image formed on the drum, a first frame for supporting the drum, a second frame for supporting the roller and connected with the first frame for relative rotation about a shaft disposed downstream of the roller with respect to a cartridge mounting direction, an entering portion at one end of the second frame with respect to a drum longitudinal direction and downstream of the shaft with respect to the mounting direction, permitting at least a part of the cam to enter when the process cartridge is mounted to the apparatus, and a cam engaging portion engaging the cam to receive a force for spacing the drum and the roller from each other.
Abstract:
The present invention provides a method of preparing a detection target structure useful for detecting a target nucleotide sequence. For example, provided is a method of preparing a detection target structure from a target nucleic acid (1). The target nucleic acid includes a target nucleotide sequence 2 in a part. According to the method of the present invention, a nucleic acid is elongated by using a primer so as to permit the target nucleic acid to have a double strand structure in the portion other than the target nucleotide sequence 2, thereby affording a detection target structure 4. The present invention also provides the detection target structure thus prepared a detection method of the target nucleotide sequence by using the detection target structure, a kit for preparing the detection target structure, and an assay kit for detecting the target nucleotide sequence.
Abstract:
A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.
Abstract:
A substrate is supported on a plurality of substrate supporting pins mounted to a second movable member. Next, so as to bring the plurality of substrate supporting pins close to a plurality of substrate supporting pins mounted to a first movable member, the first movable member and second movable member are moved, respectively. After this, with the substrate being supported between the substrate supporting pins, the first movable member and the second movable member are reversed. Then, the first movable member and the second movable member are moved relative to each other such that the respective plurality of substrate supporting pins are spaced apart from one another.
Abstract:
There is provided a surface protective member for a transmission screen that has excellent antireflective effect while maintaining a surface protective effect. The surface protective member for a transmission screen comprises a fine particle-containing hard coat layer provided on a transparent substrate, wherein the average particle diameter of the fine particles is 5 to 15 μm, the hard coat layer has a thickness satisfying a requirement represented by formula (d-2)≦t≦d wherein t represents the thickness of the hard coat layer, μm; and d represents the average particle diameter of the fine particles, μm, and a part of the fine particles is projected on the surface of the hard coat layer to constitute concaves and convexes.
Abstract translation:在保持表面保护效果的同时,提供了具有优异的抗反射效果的用于透射屏的表面保护构件。 用于透射屏的表面保护构件包括设置在透明基板上的含微粒的硬涂层,其中微粒的平均粒径为5〜15μm,硬涂层的厚度满足下述要求: 式(d-2)<= t <= d其中t表示硬涂层的厚度,mum; d表示微粒,母体的平均粒径,一部分微粒投射在硬涂层的表面上,构成凹凸。
Abstract:
A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.
Abstract:
Disclosed is a method of driving a plasma display panel. In this method, one field corresponding to one image is divided into a plurality of sub-fields, and at least one second sub-field is arranged after a first sub-field. In the first sub-field, the method comprises a first step of forming wall charges with negative polarity near the scanning electrode and forming wall charges with positive polarity near the common electrode and the data electrode; a second step of adjusting an amount of the wall charges with negative polarity near the scanning electrode and an amount of the wall charges with positive polarity near the common electrode and the data electrode; a third step of generating a writing discharge in a selected display cell of the display cells; a fourth step of generating light emission for display; and a fifth step of erasing a part of the wall charges in the display cell which emits light in the fourth step. In the second sub-field, the method comprises the same steps as the third, fourth and fifth steps. A potential difference between a scanning electrode and a common electrode in each of the fifth steps in the first and second sub-fields is set to be smaller than a potential difference between a scanning electrode and a common electrode in each of the third steps in the first and second sub-fields.
Abstract:
A pattern correcting method for correcting a design pattern to form a desired pattern on a wafer is disclosed, which comprises defining an allowable dimensional change quantity of each of design patterns, defining a pattern correction condition for the each design pattern based on the allowable dimensional change quantity defined for the each design pattern, and correcting the each design pattern based on the pattern correction condition defined for the each design pattern.
Abstract:
When a discharge start voltage takes a normal value under the normal temperature, priming discharge starts at a time t1. In this case, at a time t3 that is later than the time t1 by a predetermined time t, a sustain driver control signal Ssud2 is raised to put a sustain electrode into the floating state to stop the priming discharge. When the discharge start voltage takes a higher value than usual under the high temperature, the priming discharge starts at a time t2. In this case, at a time t4 that is later than the time t2 by the predetermined time t, the sustain driver control signal Ssud2 is lowered to put the sustain electrode into the floating state to stop the priming discharge. With such a configuration, provided is a plasma display device capable of implementing excellent and stable display quality while maintaining constant, even if a discharge start voltage varies, the charge state in display cells after a priming period, and a drive method for such a plasma display device.