Abstract:
PURPOSE:To suppress the temperature dependency of damping characteristics, by supporting an optical system with leaf springs between which a polymer compound having the damping characteristics is sandwiched. CONSTITUTION:The plate members 14 and 15 are made of, for example, 20mum stainless steel and 10mum beryllium copper, and the polymer compound layer 16 uses, for example, acrylic alkyl ester flexible resin and is, for example, 50mum thick. The polymer compound layer 16 is stuck not over the entire areas of the plate members 14 and 15, but partly. Thus, the temperature dependency of the damping characteristics is reduced.
Abstract:
PURPOSE:To obtain a titled pickup which generates no resonance, has widened a servo-band, and generates no vibrating sound, by forming a bobbin which is provided with an objective lens and is driven electromagnetically, by ceramics. CONSTITUTION:Light of a laser light beam, etc. is irradiated to a disk by an objective lens 2 through a photoconductive hole (b), and its reflected ray is photodetected by a photoelectric converting element through the objective lens. A bobbin 1 is formed by ceramics, and focus adjustment and tracking adjustment can be executed by driving said bobbin in the axial core direction and the right- angle direction to both plate springs 9. Since ceramics have large strength, the thickness of a side wall part of the bobbin 1 can be thinned, and the magnetic permeability in an air-gap part of a magnetic circuit can be raised. Accordingly, it is possible to raise following-up properties of the objective lens at the time of focus adjustment and at the time of tracking adjustment.
Abstract:
PROBLEM TO BE SOLVED: To provide an image processing apparatus and image processing method which can adaptively perform contour correction for an arbitrary luminance and can perform sufficient contour enhancement for a desired portion of image data, and also to provide a camera system. SOLUTION: The image processing apparatus 200 includes: a contour correcting portion 210 for correcting a contour signal of an input digital image signal; a non-linear luminance generating portion 220 for performing gamma correction on a digital image signal to generate a luminance signal; and a contour correction adding portion 230 for adding a final contour image signal S210 output from the contour correcting portion 210 to the non-linear luminance signal S220 generated by the non-linear luminance generating portion 220. The contour correcting portion 210 includes a gain generating portion 213 which is inputted with the luminance signal of digital image and generates a contour correction gain according to the luminance, and has a function to perform luminance modulation correction on the contour signal using the generated gain. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a storage device which can hold written data stably and can carry out writing of data or the like by a small current. SOLUTION: An electrode-to-electrode substance layer 13 is held between an electrode 11 and an electrode 12. A transfer barrier layer 14 of electron or the like having a pin hole 14A is formed in an interface between the electrode and the substance layer 13. When a writing voltage is applied, an active species is ionized and eluted from the electrode 11 side containing redox active species and moves to the electrode 12 direction. Thereafter, it receives electron from the electrode 12 side and is deposited on receiving electron from the electrode 12 side, and a conduction path 16 is formed between the electrode 11 and the electrode 12. The conduction path 16 is formed in a narrow region corresponding to the pin hole 14A, and the density of the redox active species deposited in an inside becomes higher when compared to a conventional structure wherein the transfer barrier layer 14 of electron or the like does not exist, thus keeping almost a fixed resistance value regardless of the passage of time after writing. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor memory element and a semiconductor memory device using the same, which record and read information easily, and are manufactured easily by a relatively simple manufacturing method. SOLUTION: The semiconductor memory element 10 comprises a first electrode 2, a second electrode 5, and an amorphous thin film 4 sandwiched between both electrodes. At least either of the electrodes 2, 5 contains Ag or Cu, and the amorphous thin film 4 is composed of Ge and one or more elements selected from S, Se, Te, and Sb. The semiconductor memory element 10 is provided with wires connected to the first/second electrodes 2, 5, and a plurality of wired semiconductor memory elements 10 are arranged to form the magnetic memory device. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To achieve high integration so that the size of a memory cell can be reduced. SOLUTION: Each memory cell 10 has a p-type active region 13 and an n-type active region 14, two pieces of word lines 21a and 21b (WL1 and WL2), and a common gate line (GL1) and a common gate line 22b (GL2). The two memory cells 10 and 10' are arranged so that the cells are deviated by e.g. 1/2 to each other in the direction perpendicular to the direction of the word line from the perfectly opposing positions. Furthermore, these memory cells 10 and 10' are arranged so that the parts of the cells are overlapped in the direction of the word line. Thus, the size of the memory cell can be made small in the direction of the word line.
Abstract:
PROBLEM TO BE SOLVED: To enable effective prevention of deterioration of charge holding characteristics caused by a pattern shift at the time of forming a gate, and also enable reduction of a source voltage due to a wiring resistance and reduction of a cell area. SOLUTION: A first active region in which first transistors (drive transistor and word transistor) are to be formed and a second active region in which a second transistor (load transistor) is to be formed are arranged so channel current directions of the transistors are parallel to each other in the respective memory cells, and are also separated between adjacent cells in a direction perpendicular thereto. A power voltage supply line VCC is a groove wiring line of a 2-layer contact structure in which the power voltage is supplied to an impurity region. Further a bit-line connection wiring line 182 is also of a groove wiring type. One of the power voltage supply lines may be used commonly between the adjacent cells in a direction perpendicular to the wiring line direction, and memory node wiring layers 50a and 50b may be formed with different etching masks.
Abstract:
PURPOSE: To unnecessitate the guide shaft of a movable part which is provided in a conventional feeding mechanism, to reduce the number of components and also to make a whole device small in size and light in weight by using a yoke also for the guide shaft of movable part. CONSTITUTION: The feeding mechanism is provided with the fixedly arranged yoke 11, permanent magnet 12 mounted on this yoke, movable part supported so as capable of sliding in one direction of the yoke, and coil bobbin 13 mounted on this movable part and wound with the coil so as to surround the yokes 11a, 11b. In this case, the magnetic path constituted of the permanent magnet 12 and yokes 11a, 11b is passed through the area between the permanent magnet 12 and the yokes 11a, 11b. Consequently, the force facing toward one direction of the yoke is generated in the area of the coil 13b, then the movable part is moved in one direction of the yoke and guided along the yoke.
Abstract:
PURPOSE:To provide a minute semiconductor device having the high reliability by reducing the diffusion of impurities, and enhancing the dielectric strength of a sidewall with respect to a conductor film. CONSTITUTION:The first sidewall comprising an SiO2 film 22 formed by high- temperature CVD is formed on the side surfaces of a polycide film 16 and an SiO2 film 17. The second sidewall comprising an SiO2 film 24 formed by low-temperature CVD is formed on the outer surface of the SiO2 film 22. Therefore, heat treatment to be applied is less and the diffusion of impurities 21 and 23, which are already introduced, is less in comparison with the case, wherein the entire sidewall is formed of the SiO2 film 22. The etching of the SiO2 film 22 having the excellent film quantity can be prevented with the SiO2 film 24.