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公开(公告)号：JPH08197854A
公开(公告)日：1996-08-06
申请号：JP2631895
申请日：1995-01-21
Applicant: SONY CORP
Inventor： TOMITA HIDEMI , SAMU FUI , KUROMIYA YOSHIYUKI
Abstract: PURPOSE: To obtain a photographic paper capable of forming an image with excellent preservation properties such as a lightfastness, anti-darkness and discoloration property, skin fat resistance, and plasticizer prooflng property, In a photographic paper to be used in a sublimation type thermal transfer recording method. CONSTITUTION: A photographic paper 1 consists of a sheet base material 2 and dyes reservoir layer 3 wherein it is allowed to contain a polymer having a phenoxyethylate unit as a main component in the dyes reservoir 3.
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公开(公告)号：JPH08118820A
公开(公告)日：1996-05-14
申请号：JP26162294
申请日：1994-09-30
Applicant: SONY CORP
Inventor： SAMU FUI , NAKAMURA YOSHINORI , ITO ATSUSHI , TOMITA HIDEMI , KUROMIYA YOSHIYUKI
Abstract: PURPOSE: To obtain photographic printing paper capable of forming an image superior in shelf stability, such as a light resistance, properties of resisting fading in darkness, a resistance to sebum, and a resistance to plasticizer, with respect to photographic printing paper used for a sublimable thermal transfer recording method. CONSTITUTION: In photographic printing paper composed of a sheet substrate and a dye-accepting layer, a vinyl phenol resin and a dyeable resin are incorporated in the dye-accepting layer, or the dye-accepting layer is made of a vinyl phenol resin and a polymer of a butyral resin and a multifunctional isocyanate compound.
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Patent Agency Ranking
公开(公告)号：JPH0768805A
公开(公告)日：1995-03-14
申请号：JP16869993
申请日：1993-06-14
Applicant: SONY CORP
Inventor： HIRANO EIKI , TOMITA HIDEMI , SHINOZAKI KENJI
Abstract: PURPOSE:To improve transfer sensitivity by facilitating volatilization of a recording material, by a method wherein at least two kinds of recording materials (transfer dyes) are allowed to mixe up with each other at a fixed mole fraction and when steam pressure is specific at a fixed temperature, a specific formula is satisfied in a specific temperature sphere. CONSTITUTION:In a head part (recording part) 10, solid sublimating dyes 12 within a holding tank 11 is melted by a heater 16, the liquid sublimating dyes 12' are supplied to glass beads 22 of an evaporation part 17 by making use of a capillarity of a liquid dye holding tank 15. Laser beams L generated by semiconductor laser chip 18 is converted into heat by a beam and heat converting body 21, the liquid sublimating dyes 12' are evaporated and transferred to an image receiving layer 50a of the recorded paper 50. On this occasion, at least two kinds of recording material (transfer dyes) are allowed to mix up with each other at a fixed mole fraction and when steam pressure is Pmix at a temperature T, the following formula is satisfied within a temperature sphere of 25-500 deg.C. Namely, the formula is: Pmix>SIGMAPK.xK. Wherein PK, xK are respectively the steam pressure and mole fraction of the Kth recording material at the temperature T.
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公开(公告)号：JPH0768804A
公开(公告)日：1995-03-14
申请号：JP16869893
申请日：1993-06-14
Applicant: SONY CORP
Inventor： TOMITA HIDEMI , HIRANO HIDEKI , SHINOZAKI KENJI , OGATA MASANORI
Abstract: PURPOSE:To contrive to make a recording high-quality or an improvement in durability of a recording device by preventing a principal part of the device from being deteriorated by heating by high-temperature at the time of recording, by a method wherein a heating medium which is heated by imparting heat to a recording material is formed of a high molecular material whose weight reduction at a specific temperature does not exceed a specific value. CONSTITUTION:Recorded paper 50 is supplied to a space between a plane base 4 and head part (recording part) 10. Then in the head part 10, after solid and powdery sublimating dyes 12 within a solid dye holding tank 11 are melted (liquefaction) by a heater 16, the liquid sublimating dyes 12' are supplied to glass beads 22 within an evaporation hole 17a in evaporation part 17 by a fixed quantity by making use of a capillarity of liquid dye holding tank 15. On the one hand, laser beams L generated by semiconductor laser chip 18 is converted into heat by a beam and heat converting body 21. Hereby, the liquid sublimating dyes 12' are evaporated and transferred to an image receiving layer 50a of the recorded paper 50. On this occasion, the beam and heat converting body 21 is formed of a high molecular material whose weight reduction at 350 deg.C is not exceeding 1% per hour.
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45.发明专利
公开(公告)号：JPH0768802A
公开(公告)日：1995-03-14
申请号：JP16869693
申请日：1993-06-14
Applicant: SONY CORP
Inventor： HIRANO EIKI , TOMITA HIDEMI , SHINOZAKI KENJI , SHIODA HIROYUKI , OGATA MASANORI
Abstract: PURPOSE:To contrive an improvement in thermal efficiency, miniaturization and a reduction in weight, by a method wherein a layer of a hot-melt recording material facing on a recorded body through a gap is evaporated and sublimated by heating the layer selectively and a circumferential space is kept vacuous by filling the circumferential space with a substance having a lower thermal conductivity than that of air. CONSTITUTION:Pieces of recorded paper 50 are separated piece by piece and supplied to a space between a plane base 4 and head part (recording part) 10. Then in the head part 10, semiconductor laser chips 18 for three colors (Y, M, C) are juxtaposed in numbers of pieces by amount of pixels in three rows. Then after solid and powdery sublimating dyes 12 within solid dye holding tanks 11 each are melted (liquefaction) by a heater 16, those liquid sublimating dyes 12' are supplied to glass beads 22 within an evaporation hole 17a in evaporation parts 17 each by a fixed quantity by making use of a capillarity of liquid dye holding tanks 15 each. On the one hand, laser beams L generated by semiconductor laser chips 18 each are coverted into heat by beam and heat converting layers 21 each. Hereby, the liquid sublimating dyes 12' are evaporated and transferred to an image receiving layer 50a of the recorded layer 50.
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公开(公告)号：JPH03282548A
公开(公告)日：1991-12-12
申请号：JP8379690
申请日：1990-03-30
Applicant: SONY CORP
Inventor： NOGUCHI TSUTOMU , TOMITA HIDEMI
IPC: G03F7/021 , H01L21/027
Abstract: PURPOSE:To provide the resist material which has a high sensitivity to far UV light and to enhance the resolution thereof by introducing a dihydroxybenzene deriv. into a novolak resin synthesized from cresol and formalin at 1:1 to 1:4 and chemically bonding a diazo compd. directly to the novolak resin. CONSTITUTION:This resist material is mainly composed of the novolak resin which has 1:1 to 1:4 molar ratio of the cresol and the formation and contains the dihydroxybenzene deriv. The diazo compd. is chemically bonded to the phenolic hydroxyl group of the novolak resin. Branched structures are introduced into the resin by forming the resin contg. the excessive formalin. The cresol of the branched parts is liable to react with an alkali and the resin is liable to be developed. The deterioration in the resist shape is obviated when the resin and the cyan compd. are chemically bonded. Further, the transmissivity and the dissolution rate in a developer are increased and the resist sensitivity is improved by introducing the dihydroxybenzene deriv. into the resin.
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公开(公告)号：JPH02118663A
公开(公告)日：1990-05-02
申请号：JP27241088
申请日：1988-10-28
Applicant: SONY CORP
Inventor： TOMITA HIDEMI , NOGUCHI TSUTOMU
Abstract: PURPOSE:To obtain a pattern having high precision by forming a hardly soluble layer in an exposed part of a photoresist layer prior to whole surface exposure of the photoresist layer by subjecting the photoresist layer to previous exposure and alkali treatment. CONSTITUTION:A resist layer 12 on an Si substrate 11 is exposed to far ultraviolet rays so as to form a predetermined line/space, then developed with an aq. soln. of tetramethyl ammonium hydroxide(TMAH). The development is interrupted by washing with water, then a hardly soluble layer 13 is formed by drying the developed resist layer 12. The resist layer 12 contg. the formed hardly soluble layer 13 is exposed wholly to ultraviolet rays, then developed with an aq. soln. of TMAH. Thus, a fine resist pattern having sufficiently good shape is formed with high precision.
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