Abstract:
A method includes compiling, by a compiler (305) of a Smart Secure Platform (SSP) supporting a Primary Platform (105) and a Secondary Platform, source code comprising an implementation of an operating system of the Secondary Platform and applications of the Secondary Platform, to produce compiled source code compatible by an operating system of the Primary Platform (105); linking, by the compiler (305), personalization data to the compiled source code to produce a native Secondary Platform Bundle (SPB) compatible with the Primary Platform (105), the personalization data being associated with a subscription of a user of the SSP; and delivering, by the compiler, the native SPB.
Abstract:
An integrated electronic device, delimited by a first surface (S 1 ) and by a second surface (S 2 ) and including: a body (2) made of semiconductor material, formed inside which is at least one optoelectronic component chosen between a detector (30) and an emitter (130); and an optical path (OP), which is at least in part of a guided type and extends between the first surface and the second surface, the optical path traversing the body. The optoelectronic component is optically coupled, through the optical path, to a first portion of free space and a second portion of free space, which are arranged, respectively, above and underneath the first and second surfaces.
Abstract:
A vertical-conduction electronic device (100; 150), comprising: a semiconductor wafer (1) including a semiconductor layer (2, 3) having a first side (3a), a first type of conductivity (N), and a first doping level; a first body region (32) and a second body region (34), which have a second type of conductivity (P) and extend in the semiconductor layer (2, 3); an enriched region (12), having the first type of conductivity and a second doping " level higher than the first doping level, which extends in the semiconductor layer facing the first side (3a), between the first and second body regions (32, 34); a dielectric filling region (20), which extends in the semiconductor layer, facing the first side (3a), and completely surrounded by the enriched region (12); and a gate structure (29), which extends on the first side (3a) on the enriched region (12), on the dielectric filling region (20), on part of the first body region (32), and on part of the second body region (34).
Abstract:
A vertical-conduction electronic device (100; 150), comprising: a semiconductor wafer (1) including a semiconductor layer (2, 3) having a first side (3a), a first type of conductivity (N), and a first doping level; a first body region (32) and a second body region (34), which have a second type of conductivity (P) and extend in the semiconductor layer (2, 3); an enriched region (12), having the first type of conductivity and a second doping " level higher than the first doping level, which extends in the semiconductor layer facing the first side (3a), between the first and second body regions (32, 34); a dielectric filling region (20), which extends in the semiconductor layer, facing the first side (3a), and completely surrounded by the enriched region (12); and a gate structure (29), which extends on the first side (3a) on the enriched region (12), on the dielectric filling region (20), on part of the first body region (32), and on part of the second body region (34).
Abstract:
A base (2) carries a first chip (3) and a second chip (4) oriented differently with respect to the base and packaged in a package (6). Each chip integrates an antenna and a magnetic via (13). A magnetic coupling path connects the chips, forming a magnetic circuit that enables transfer of signals and power between the chips (3, 4) even if the magnetic path is interrupted, and is formed by a first stretch (5c) coupled between the first magnetic-coupling element (13) of the first chip and the first magnetic-coupling element (12) of the second chip, and a second stretch (5f) coupled between the second magnetic-coupling element (12) of the first chip and the second magnetic-coupling element (13) of the second chip. The first stretch has a parallel portion (5c1, 5c3) extending parallel to the faces (2a, 2b) of the base. The first and second stretches have respective transverse portions (5i1, 5i2) extending on the main surfaces of the second chip, transverse to the parallel portion.
Abstract:
The invention concerns a method for etching a PVD deposited barium strontium titanate (BST) layer, wherein a non-ionic surfactant at a concentration between 0.1 and 1 percent is added to an acid etching solution.
Abstract:
A coupling interface couples a transceiver to one or more capacitive voltage dividers of a power transmission system. The coupling interface includes a first signal path including an adjustable inductance configured to form a resonance circuit with a capacitance associated with the one or more capacitive voltage dividers. The coupling interface may include a second signal path including an adjustable inductance configured to form a resonance circuit with the capacitance associated with the one or more capacitive voltage dividers.
Abstract:
A switching circuit (10) for an ultrasound transmission channel (1) is inserted between a connection terminal (Xdcr) and a low voltage output terminal (LVout) and comprising a receiving switch (30) a high voltage clamp circuit (HV1) inserted between the connection terminal (Xdcr) and a central node (Vc), a low voltage clamping switch (25) inserted between said central node (Vc) and a reference voltage (GND), the receiving switch (30) being low voltage and being inserted between the central node (Vc) and the low voltage output terminal (LVout), the clamping switch (25) and the receiving switch (30) being controlled in a complementary way with respect to each other. A transmission channel ( 1) for ultrasound applications is also described comprising at least such a switching circuit (10) and a process for driving said switching circuit (10).
Abstract:
A microelectromechanical detection structure (1; 1') for a MEMS resonant biaxial accelerometer (16) is provided with: an inertial mass (2; 2'), anchored to a substrate (30) by means of elastic elements (8) in such a way as to be suspended above the substrate (30), the elastic elements (8) enabling inertial movements of detection of the inertial mass (2; 2') along a first axis of detection (x) and a second axis of detection (y) that belong to a plane (xy) of main extension of said inertial mass (2; 2'), in response to respective linear external accelerations (a x , a y ); and at least one first resonant element (10a) and one second resonant element (10b), which have a respective longitudinal extension, respectively along the first axis of detection (x) and the second axis of detection (y), and are mechanically coupled to the inertial mass (2; 2') through a respective one of the elastic elements (8) in such a way as to undergo a respective axial stress (N 1 , N 2 ) when the inertial mass moves respectively along the first axis of detection (x) and the second axis of detection (y).
Abstract:
A process for manufacturing a semiconductor device (10; 10') envisages the steps of: providing a semiconductor material body (2) having at least one deep trench (4) that extends through said body of semiconductor material starting from a top surface (2a) thereof; and filling the deep trench (4) via an epitaxial growth of semiconductor material, thereby forming a columnar structure (8) within the body of semiconductor material (2). The manufacturing process further envisages the step of modulating the epitaxial growth by means of a concurrent chemical etching of the semiconductor material that is undergoing epitaxial growth so as to obtain a compact filling free from voids of the deep trench (4); in particular, a flow of etching gas is introduced into the same reaction environment as that of the epitaxial growth, wherein a flow of source gas is supplied for the same epitaxial growth.