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    Silicate bodies containing coprecipitated oxides
    41.
    发明授权
    Silicate bodies containing coprecipitated oxides 失效
    含有共沉淀氧化物的硅酸盐体

    公开(公告)号：US3678144A

    公开(公告)日：1972-07-18

    申请号：US3678144D

    申请日：1970-06-12

    Applicant: CORNING GLASS WORKS

    Inventor： SHOUP ROBERT D

    IPC: C03B19/12 ,  C03C1/00 ,  C03C3/06 ,  B29H7/20

    CPC classification number: C03C1/006 ,  C03B19/12 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/10 ,  C03C2201/28 ,  C03C2201/30 ,  C03C2201/31 ,  C03C2201/32 ,  C03C2201/80 ,  C03C2203/22 ,  C03C2203/24 ,  C03C2203/30 ,  Y10S65/901

    Abstract: This invention relates to the discovery of a method for incorporating various oxides into silica-containing porous and nonporous glass materials by dissolving soluble compounds of the additive oxides, characterized as MxOy, into solutions, colloidal solutions, or suspensions of soluble silicates, reacting the mixture with an organic compound, and then firing the thus-formed body at temperatures below the softening point of the particular glass composition for a sufficient length of time to produce the porous body or non-porous glass body containing the added oxides intimately bonded to the silica network.

    Abstract translation: 本发明涉及将各种氧化物掺入含二氧化硅的多孔和无孔玻璃材料中的方法的发现，通过将以MxOy为特征的添加剂氧化物的可溶性化合物溶解在可溶性硅酸盐的溶液，胶体溶液或悬浮液中，使混合物 与有机化合物反应，然后在低于特定玻璃组合物的软化点的温度下焙烧如此形成的本体足够长的时间以产生包含与二氧化硅紧密结合的添加氧化物的多孔体或无孔玻璃体 网络。

    합성 불투명 석영유리 및 그 제조방법
    44.
    发明公开
    합성 불투명 석영유리 및 그 제조방법 有权
    合成OPAQUE QUARTZ玻璃及其生产工艺

    公开(公告)号：KR1020090089329A

    公开(公告)日：2009-08-21

    申请号：KR1020097010257

    申请日：2007-12-04

    Applicant: 신에쯔 세끼에이 가부시키가이샤

    Inventor： 사토,타츠히로 ,  요시다,노부마사 ,  오리카사,카츠히데 ,  다나카,마코토

    IPC: C03B20/00 ,  C03B8/04 ,  C03C11/00

    CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/80 ,  Y10T428/24967 ,  Y10T428/249969

    Abstract: The invention provides a process for simply and easily producing high-purity flame-processable synthetic opaque quartz glass including large-sized one; and synthetic opaque quartz glass. The invention relates to a process for the production of synthetic opaque quartz glass which comprises the step of heating and firing a porous quartz glass under a pressure of 0.15 to 1000MPa at a temperature of 1200 to 2000‹C. The porous quartz glass is one prepared by accumulating quartz glass fine particles formed by the hydrolysis of a silicon compound with oxyhydrogen flame. ® KIPO & WIPO 2009

    Abstract translation: 本发明提供了简单且容易地生产包括大型可熔融加工的合成不透明石英玻璃的方法; 和合成不透明石英玻璃。 本发明涉及一种生产合成不透明石英玻璃的方法，该方法包括在1200至2000℃的温度下，在0.15至1000MPa的压力下加热和焙烧多孔石英玻璃的步骤。 多孔石英玻璃是通过聚集通过硅氢化合物与氢氧焰的水解形成的石英玻璃微粒而制备的。 ®KIPO＆WIPO 2009

    Vitreous silica crucible for pulling single-crystal silicon and method of manufacturing the same
    46.
    发明授权
    Vitreous silica crucible for pulling single-crystal silicon and method of manufacturing the same 有权
    用于拉制单晶硅的玻璃状硅石坩埚及其制造方法

    公开(公告)号：US08871026B2

    公开(公告)日：2014-10-28

    申请号：US12303147

    申请日：2008-09-29

    Applicant: Hiroshi Kishi

    Inventor： Hiroshi Kishi

    IPC: C30B35/00 ,  C30B15/10 ,  C03C3/06 ,  C03C19/00

    CPC classification number: C30B15/10 ,  C03C3/06 ,  C03C19/00 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2204/08 ,  C30B35/002 ,  Y10T117/10 ,  Y10T117/1024 ,  Y10T117/1032

    Abstract: In order to provide a vitreous silica crucible which does not employ a crystallization accelerator but is difficult to deform during its use even under high temperature, and is easily manufactured, there is provided a vitreous silica crucible for pulling single-crystal silicon wherein the outer surface layer is formed of a bubble-containing vitreous silica layer, the inner surface layer is formed of a vitreous silica layer whose bubbles are invisible to the naked eye, a surface of the outer surface layer includes an unmelted or half-melted silica layer (abbreviated as a half-melted silica layer), and the center line average roughness (Ra) of the half-melted silica layer is 50 to 200 μm, also preferably, and the thickness of the half-melted silica layer is 0.5 to 2.0 mm.

    Abstract translation: 为了提供即使在高温下使用结晶促进剂也难以变形的石英玻璃坩埚，容易制造，提供了一种用于拉拔单晶硅的玻璃状石英坩埚，其中外表面 层由含气泡的玻璃状二氧化硅层形成，内表面层由气泡对肉眼不可见的玻璃状二氧化硅层形成，外表面层的表面包含未熔融或半熔融的二氧化硅层（缩写为 作为半熔融二氧化硅层），半熔融二氧化硅层的中心线平均粗糙度（Ra）优选为50〜200μm，半熔融二氧化硅层的厚度为0.5〜2.0mm。

    Optical glass and method for producing the same
    48.
    发明申请
    Optical glass and method for producing the same 有权
    光学玻璃及其制造方法

    公开(公告)号：US20050274150A1

    公开(公告)日：2005-12-15

    申请号：US10504876

    申请日：2003-02-18

    Applicant: Kumi Onodera ,  Manabu Saitou ,  Masahiro Horikoshi

    Inventor： Kumi Onodera ,  Manabu Saitou ,  Masahiro Horikoshi

    IPC: C03B8/04 ,  C03B20/00 ,  C03B37/014 ,  C03B37/018 ,  C03C3/06

    CPC classification number: C03B37/0142 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/36 ,  C03B2207/70 ,  C03C3/06 ,  C03C2201/80

    Abstract: This invention provides a method for manufacturing an optical glass in order to prevent the deterioration of the burner used in the synthesis of glass particles that form the optical glass, and to obtain a stable quality optical glass. In this invention, the number of residual bubbles with a diameter of 0.3 mm and more is 0.005/cm3 or less per unit volume of the optical glass. Such optical glass is obtained by controlling the temperature of an end face of the burner for glass synthesis during the deposition of the glass particles by regulating the relationship of the flow velocity or the flow volume between an inflammable gas and a combustion-supporting gas.

    Abstract translation: 本发明提供一种制造光学玻璃的方法，以防止在形成光学玻璃的玻璃颗粒的合成中所使用的燃烧器的劣化，并获得稳定质量的光学玻璃。 在本发明中，每单位体积的光学玻璃的直径为0.3mm以上的残留气泡的数量为0.005 / cm 3以下。 这样的光学玻璃是通过调节在可燃性气体和助燃气体之间的流动速度或流量之间的关系来控制玻璃粒子沉积时的玻璃合成用燃烧器的端面的温度而得到的。

    Quartz glass crucible and process for the production thereof
    49.
    发明申请
    Quartz glass crucible and process for the production thereof 有权
    石英玻璃坩埚及其制造方法

    公开(公告)号：US20030041623A1

    公开(公告)日：2003-03-06

    申请号：US09913632

    申请日：2001-08-16

    Inventor： Waltraud Werdecker ,  Johann Leist

    IPC: C03B019/09 ,  C03B020/00

    CPC classification number: C03C3/06 ,  C03B19/09 ,  C03B19/095 ,  C03B2201/04 ,  C03C2201/02 ,  C03C2201/23 ,  C03C2201/80 ,  C30B15/10 ,  C30B35/002 ,  Y10S65/04 ,  Y10T428/131

    Abstract: In order to provide a quartz glass crucible distinguished by high purity, high opacity and/or low transmissibility in the IR spectrum, it is proposed on the basis of a known quartz glass crucible of opaque quartz glass with a crucible body symmetrical in relation to a rotational axis, an outer zone (3) of opaque quartz glass transitioning radially toward the inside into an inner zone (2) of transparent quartz glass and with a density of at least 2.15 g/cm3, that according to the invention, the crucible body (1) be made of a synthetic SiO2 granulate with a specific BET surface ranging from 0.5 m2/g to 40 m2/g, a tamped volume of at least 0.8 g/cm3 and produced from at least partially porous agglomerates of SiO2 primary particles. A process for producing a quartz glass crucible of this kind is distinguished according to the invention in that for the production of the crucible a SiO2 granulate is used which was formed from at least partially porous agglomerates of synthetically manufactured SiO2 primary particles and that it has a specific BET surface ranging from 0.5 m2/g to 40 m2/g and a tamped volume of at least 0.8 g/cm3, the heating effected in such a way that a vitrification front advances from the inside outward while an inner zone (4) of transparent quartz glass is being formed.

    Abstract translation: 为了提供在IR光谱中具有高纯度，高不透明性和/或低透射率的石英玻璃坩埚，提出了在已知的不透明石英玻璃的石英玻璃坩埚的基础上，坩埚体相对于 旋转轴线，不透明石英玻璃的外部区域（3），径向朝向内部转变成透明石英玻璃的内部区域（2），密度为至少2.15g / cm 3，根据本发明，坩埚体 （1）由具有0.5m 2 / g至40m 2 / g的比BET表面的合成SiO 2颗粒制成，捣实体积至少为0.8g / cm 3并由SiO 2一次颗粒的至少部分多孔的附聚物制成。 根据本发明，制造这种石英玻璃坩埚的方法的不同之处在于，对于坩埚的制造，使用由至少部分多孔的合成SiO 2原生颗粒的聚集体形成的SiO 2颗粒，并且其具有 比表面积为0.5m2 / g〜40m2 / g，捣实体积为0.8g / cm 3以上，使玻璃化前沿从内侧向前方前进，同时将内部区域（4） 正在形成透明的石英玻璃。

    Process for making opaque quartz, for carrying out the process suitable SiO2 granulate, and component of opaque quartz glass
    50.
    发明授权
    Process for making opaque quartz, for carrying out the process suitable SiO2 granulate, and component of opaque quartz glass 有权
    制造不透明石英的方法，用于进行适合SiO 2颗粒的工艺，以及不透明石英玻璃的组分

    公开(公告)号：US06380110B1

    公开(公告)日：2002-04-30

    申请号：US09484113

    申请日：2000-01-14

    Applicant: Waltraud Werdecker ,  Heinz Fabian ,  Udo Gertig ,  Johann Leist ,  Rolf Göbel

    Inventor： Waltraud Werdecker ,  Heinz Fabian ,  Udo Gertig ,  Johann Leist ,  Rolf Göbel

    IPC: C03B2000

    CPC classification number: C03C1/026 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/54

    Abstract: In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO2 granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO2 granulate to be used is a SiO2 granulate (21; 31) composed of at least partially porous agglomerates of SiO2 primary particles, with a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.8 g/cm3. A SiO2 granulate (21; 31) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO2 primary particles and in that it has a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.6 g/cm3.

    Abstract translation: 在制造不透明石英玻璃的已知方法中，由合成SiO 2颗粒形成坯料，并在玻璃化温度下加热以形成不透明石英玻璃体。 为了在此基础上提供具有均匀孔分布，高密度，高粘度和低失透倾向的纯不透明石英玻璃的制备方法，根据本发明提出使用的SiO 2颗粒是 SiO 2颗粒（21; 31），其由SiO 2一次颗粒的至少部分多孔的附聚物组成，BET比表面积为1.5m 2 / g至40m 2 / g，表观密度为至少0.8g / cm 3。 适用于实施该方法的SiO 2颗粒（21; 31）的特征在于其由SiO 2一次颗粒的至少部分多孔的附聚物形成，并且其具有范围为1.5m 2 / g至40m 2的比BET表面积 / g，表观密度为0.6g / cm 3以上。

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