中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

46 records (took 0.032 seconds)

    Method, substrate, and apparatus for fine particle measurement
    42.
    发明专利
    Method, substrate, and apparatus for fine particle measurement 有权
    方法，基板和微粒测量装置

    公开(公告)号：JP2009115473A

    公开(公告)日：2009-05-28

    申请号：JP2007285671

    申请日：2007-11-02

    Applicant: Sony Corp ,  ソニー株式会社

    Inventor： FURUKI MOTOHIRO ,  IMANISHI SHINGO ,  SHINODA MASATAKA ,  SUZUKI AKITOSHI ,  MIYAKE KAZUJI

    IPC: G01N15/14

    CPC classification number: G01N15/1425 ,  G01N15/1436 ,  G01N15/1459 ,  G01N15/1484 ,  G01N21/6428 ,  G01N21/645 ,  G01N2015/1006 ,  G01N2015/1497 ,  G01N2021/058 ,  G01N2021/6419 ,  G01N2021/6421 ,  G01N2201/10 ,  G01N2201/11

    Abstract: PROBLEM TO BE SOLVED: To provide a measuring method capable of obtaining high accuracy of measurement, when scanning light with respect to a plurality of channels for samples which are arranged on a substrate, and optically measuring fine particles introduced to the channels for samples.
    SOLUTION: In the fine particle measuring method for scanning light with respect to the plurality of channels 111 for samples which are arranged on the substrate 11, and optically measuring fine particles introduced to the channels 111 for samples, by sequentially irradiating light to at least two reference regions 113, which are juxtaposed to the channels 111 for samples and detecting changes in the optical characteristics generated in the light by the reference regions 113, the emission timing of the light to the channels 111 for samples is controlled.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种能够获得高精度测量的测量方法，当相对于布置在基板上的样品的多个通道扫描光时，并且光学测量引入到通道的细颗粒 样品。 解决方案：在相对于布置在基板11上的样品的多个通道111扫描光的微粒测量方法中，并且通过顺序地将光照射到 至少两个参考区域113，它们与采样的通道111并列并且检测由参考区域113在光中产生的光学特性的变化，控制对样品的通道111的光的发射定时。 版权所有（C）2009，JPO＆INPIT

Patent Agency Ranking