公开(公告)号：US06198793B1

公开(公告)日：2001-03-06

申请号：US09305017

申请日：1999-05-04

Applicant: Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

Inventor： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

IPC: G21K504

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K2201/06

Abstract: The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the raster elements of the one or more mirror or lenses are shaped and arranged in such a way that the images of the raster elements cover by means of the optical elements the major portion of the reticle plane and that the exit pupil defined by aperture and filling degree is illuminated.

Abstract translation: 本发明涉及用于波长<= 193nm的照明系统，特别是对于EUV光刻，具有至少一个在预定表面具有照明A的光源; 至少一个用于产生二次光源的装置; 至少一个镜子或透镜装置，其包括至少一个反射镜或一个透镜，其被组合成光栅元件; 布置在包括至少一个反射镜或一个透镜的反射镜或透镜装置之间的一个或多个光学元件，其被组织成光栅元件和光罩平面，由此光学元件将出射光瞳中的次级光源成像 照明系统的特征在于，一个或多个镜子或透镜的光栅元件被成形和布置成使得光栅元件的图像通过光学元件覆盖主要部分 并且照明由孔径和填充度限定的出射光瞳。

公开(公告)号：US08934085B2

公开(公告)日：2015-01-13

申请号：US12726081

申请日：2010-03-17

Applicant: Udo Dinger ,  Christopher Weth

Inventor： Udo Dinger ,  Christopher Weth

IPC: G03B27/54 ,  G03F7/20 ,  G02B5/08 ,  G02B5/09

CPC classification number: G03F7/70175 ,  G02B5/0891 ,  G02B5/09 ,  G03F7/70083 ,  G03F7/70116 ,  G03F7/702 ,  G21K2201/064

Abstract: A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector. In other words, the illumination distribution generated by the collector in a defined manner in the plane downstream of the collector has a shape which is freely selectable to the greatest possible extent.

Abstract translation: 束引导光学收集器收集辐射源的发射并从收集的发射形成辐射束。 收集器的反射表面是辐射源下游的第一束形成表面。 反射表面形成为使得其在下游平面中将辐射源转换成一系列图像。 图像系列包括在垂直于变换辐射束的光束方向的方向上以二维（x，y）彼此偏移的多个辐射源图像，并且以非旋转方式相对于彼此布置 相对于变换辐射束的束方向的对称方式。 下游平面中的变换的辐射束相对于变换的辐射束的光束方向具有非旋转对称的束边缘轮廓。 其结果是由收集器产生的辐射束形状的收集器。 换句话说，集电体在集电体下游的平面中以规定的方式产生的照明分布具有可以最大可能地自由选择的形状。

公开(公告)号：US08587767B2

公开(公告)日：2013-11-19

申请号：US12915785

申请日：2010-10-29

Applicant: Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

Inventor： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

IPC: G03B27/72 ,  G03B27/54 ,  G03B27/68 ,  G03B27/42 ,  G03B27/32

CPC classification number: G03F7/70191 ,  G03F7/70083

Abstract: Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.

Abstract translation: 用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有较长场尺寸和较短场尺寸之间的延伸比，其中该比率显着大于1。

公开(公告)号：US08253927B2

公开(公告)日：2012-08-28

申请号：US12470092

申请日：2009-05-21

Applicant: Udo Dinger

Inventor： Udo Dinger

IPC: G03B27/54

CPC classification number: G03B27/54 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/7005 ,  G03F7/702 ,  G03F7/70391

Abstract: The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour.

Abstract translation: 本公开涉及照明系统，例如用于微光刻的照明系统。 照明系统可以包括具有多个主要光源的光学元件。 照明系统可以照射具有场轮廓的场平面中的场。 照明系统可以被配置为使得每个主光源照亮场平面中的小于由场轮廓包围的区域的尺寸的区域。

公开(公告)号：US07977651B2

公开(公告)日：2011-07-12

申请号：US12547135

申请日：2009-08-25

Applicant: Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

Inventor： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC: G01T1/20 ,  A61N5/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358

Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

Abstract translation: 提供了一种用于投影曝光装置的投影物镜，该投影曝光装置具有用于发射具有波长＆nlE; 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

公开(公告)号：US20110001947A1

公开(公告)日：2011-01-06

申请号：US12848603

申请日：2010-08-02

Applicant: Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

Inventor： Udo Dinger ,  Martin Endres ,  Armin Werber ,  Norbert Muehlberger ,  Florian Bach

IPC: G03F7/20 ,  G02B7/185 ,  G03B27/54 ,  G03B27/70

CPC classification number: G03F7/702 ,  G02B5/09 ,  G02B26/06 ,  G02B26/0816 ,  G02B26/0833 ,  G02B27/0927 ,  G03F7/70075 ,  G03F7/70116

Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.

Abstract translation: 在用于微光刻的投影曝光装置中，将使用小平面镜作为束引导光学部件。 小平面镜具有多个独立的反射镜。 对于入射照明光的单独偏转，分离的反射镜在每种情况下都以致动器的方式连接，使得它们可以围绕至少一个倾斜轴线单独倾斜。 连接到致动器的控制装置被配置成使得可以将分离的反射镜的给定分组分组成分离的反射镜组，每个反射镜组在每种情况下包括至少两个分离的反射镜。 其结果是，当安装在投影曝光装置中时，增加了用于设置由投影曝光装置照亮的对象场的各种照明几何形状的可变性的刻面镜。 描述了用于形成小平面反射镜的分立反射镜的各种实施例。

公开(公告)号：US07077533B2

公开(公告)日：2006-07-18

申请号：US10477772

申请日：2002-05-28

Applicant: Martin Weiser ,  Udo Dinger ,  Siegfried Stacklies ,  Markus Haidl

Inventor： Martin Weiser ,  Udo Dinger ,  Siegfried Stacklies ,  Markus Haidl

IPC: G02B5/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/2008 ,  G03F7/70958 ,  G21K1/06

Abstract: A device serves for reflecting electromagnetic waves, in particular in a length range less than 200 nm. It has a mirror carrier made of a material with at least approximately vanishing thermal expansion and at least one reflective layer applied on said mirror carrier. An intermediate layer made of a material which is formed such that its surface roughness is not significantly increased after beam processing methods is fitted between the mirror carrier and the reflective layer.

Abstract translation: 装置用于反射电磁波，特别是在小于200nm的长度范围内。 它具有由至少近乎消失的热膨胀的材料制成的反射镜载体，并且至少一个反射层施加在所述反射镜载体上。 由在反射镜载体和反射层之间装配光束处理方法之后形成为使得其表面粗糙度不显着增加的材料制成的中间层。

公开(公告)号：US06985210B2

公开(公告)日：2006-01-10

申请号：US10454831

申请日：2003-06-04

Applicant: Russell Hudyma ,  Hans-Jürgen Mann ,  Udo Dinger

Inventor： Russell Hudyma ,  Hans-Jürgen Mann ,  Udo Dinger

IPC: G03B27/54 ,  G03B27/42

CPC classification number: G02B17/0657 ,  G02B17/0652 ,  G03B27/54 ,  G03F7/70233 ,  G03F7/70275

Abstract: An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).

Abstract translation: EUV光学投影系统包括用于对图像（IM）上的物体（OB）进行成像的至少六个反射表面。 该系统优选地配置成沿着从物体（OB）到次级反射镜（M 2）和第三反射镜（M 3）之间的图像（IM）的光路形成中间图像（IMI），使得主 反射镜（M 1）和副镜（M 2）形成第一光学组（G 1）和第三反射镜（M 3），第四反射镜（M 4），第五反射镜（M5）和第六反射镜 （M 6）形成第二光学组（G 2）。 该系统还优选地包括沿着从物体（OB）到主镜（M 1）和副镜（M 2）之间的图像（IM）的光路定位的孔径光阑（APE）。 副镜（M 2）优选为凹面，第三反射镜（M 3）优选为凸面。 六个反射表面中的每一个优选地以小于大约15°的入射角从中心场点接收主光线（CR）。 该系统优选地在图像（IM）处具有大于0.18的数值孔径。 优选地，该系统构造成使得主光线（CR）在副反射镜（M 2）和第三反射镜（M 3）之间传播的同时朝向光轴（OA）会聚。

公开(公告)号：US20050201514A1

公开(公告)日：2005-09-15

申请号：US10983362

申请日：2004-11-08

Applicant: Hans-Jurgen Mann ,  Udo Dinger ,  Wilhelm Ulrich ,  Wolfgang Reinecke ,  Thomas Engel ,  Axel Zibold ,  Wolfgang Harnisch ,  Marco Wedowski ,  Dieter Pauschinger

Inventor： Hans-Jurgen Mann ,  Udo Dinger ,  Wilhelm Ulrich ,  Wolfgang Reinecke ,  Thomas Engel ,  Axel Zibold ,  Wolfgang Harnisch ,  Marco Wedowski ,  Dieter Pauschinger

IPC: G03F1/16 ,  G21K1/06 ,  G21K7/00 ,  H01L21/027

CPC classification number: G21K7/00 ,  B82Y10/00 ,  G21K1/062

Abstract: There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength

Abstract translation: 提供了用于检查物平面中的物体的反射X射线显微镜。 所述反射型X射线显微镜包括：（a）具有第一反射镜和第二反射镜的第一子系统，该第一子系统设置在从所述物体平面到所述像面的光束路径中，以及（b）具有第三反射镜的第二子系统， 位于光束路径中的第一子系统的下游。 用波长<100nm的辐射照射物体，反射X射线显微镜将物体放大成像到平面内。

公开(公告)号：US06902283B2

公开(公告)日：2005-06-07

申请号：US10603368

申请日：2003-06-25

Applicant: Udo Dinger

Inventor： Udo Dinger

IPC: G02B17/06 ,  G03F7/20 ,  G02B5/10

CPC classification number: G03F7/70233 ,  G02B17/0657 ,  G03F7/70275

Abstract: A projection objective formed from six mirrors arranged in a light path between an object plane and an image plane is provided. The projection objective, in some examples, is characterized by having a physical distance between the vertexes of adjacent mirrors that is large enough to allow for the six mirrors to have sufficient thickness and stability properties to prevent surface deformations due to high layer tensions. In some embodiments, mirror thickness are such that surface deformations are prevented with mirrors having layer tensions lower than 350 MPa. Mirror surfaces may comprise multilayer systems of Mo/Be or Mo/Si layer pairs. In some examples, the physical distance between a vertex of the third mirror and a vertex of the sixth mirror (S3S6) satisfies the following relationship: 0.3×(a used diameter of the third mirror S3+a used diameter of the sixth mirror S6)

Abstract translation: 提供由布置在物平面和图像平面之间的光路中的六个反射镜形成的投影物镜。 在一些示例中，投影物镜的特征在于在相邻反射镜的顶点之间具有足够大的物理距离，以允许六个反射镜具有足够的厚度和稳定性，以防止由于高层张力而引起的表面变形。 在一些实施例中，镜面厚度使得通过具有低于350MPa的层张力的反射镜来防止表面变形。 镜面可以包括Mo / Be或Mo / Si层对的多层体系。 在一些示例中，第三反射镜的顶点与第六反射镜的顶点（S 3 S 6）之间的物理距离满足以下关系：0.3x（第三反射镜的使用直径S 3 + 第六镜S 6）