公开(公告)号：WO2010020481A1

公开(公告)日：2010-02-25

申请号：PCT/EP2009/058923

申请日：2009-07-13

Applicant: ASML NETHERLANDS B.V. ,  BUTLER, Hans ,  DE JONGH, Robertus ,  VAN DER WIJST, Marc ,  TOUSAIN, Rob ,  OUDE NIJHUIS, Marco ,  KOEVOETS, Adrianus

Inventor： BUTLER, Hans ,  DE JONGH, Robertus ,  VAN DER WIJST, Marc ,  TOUSAIN, Rob ,  OUDE NIJHUIS, Marco ,  KOEVOETS, Adrianus

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/70258 ,  G03F7/70483

Abstract: A projection system (PS) is provided that includes a sensor system (20) that measures at least one parameter that relates to the physical deformation of a frame (10) that supports the optical elements (11) within the projection system (PS), and a control system (30) that, based on the measurements from the sensor system (20.), determines an expected deviation of.the position of the beam of radiation projected by the projection system (PS) that is caused by the physical deformation of the frame (10).

Abstract translation: 提供了一种投影系统（PS），其包括测量与投影系统（PS）内的支撑光学元件（11）的框架（10）的物理变形有关的至少一个参数的传感器系统（20） 以及基于来自传感器系统（20）的测量值的控制系统（30），确定由物理变形引起的由投影系统（PS）投射的辐射束的位置的预期偏差 （10）。

公开(公告)号：EP4455785A1

公开(公告)日：2024-10-30

申请号：EP23169762.4

申请日：2023-04-25

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans

IPC: G03F7/00 ,  G02B7/182

Abstract: The present disclosure provides a method of controlling a position of an optical element for projecting an image, the method comprising the steps of: - providing the optical element having at least one actuator to allow movement of the optical element in at least a first degree of freedom and at least a second degree of freedom; - determining a movement error of the optical element in at least the second degree of freedom; - correcting an image projection error caused by the movement error in the second degree of freedom using a movement of the optical element in the first degree of freedom.

公开(公告)号：EP4261619A1

公开(公告)日：2023-10-18

申请号：EP22168671.0

申请日：2022-04-15

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  REIJNDERS, Marinus, Petrus ,  TINNEMANS, Patricius, Aloysius, Jacobus

IPC: G03F9/00 ,  G03F7/20

Abstract: A method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components is described, the method comprising:
- performing a plurality of alignment measurements, wherein for each alignment measurement the moveable optical components are arranged in respective predetermined positions,
- combining the alignment measurements, and
- spatially aligning the patterning device and the substrate based on the combination of the alignment measurements.

公开(公告)号：EP4116772A1

公开(公告)日：2023-01-11

申请号：EP21184807.2

申请日：2021-07-09

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans

IPC: G03F7/20

Abstract: The invention provides a method of determining a motor-dependent commutation model for an electromagnetic motor, whereby the electromagnetic motor comprises a first member comprising a coil array comprising at least M coils, and a second member comprising a magnet array configured to generate a spatially alternating magnetic field, whereby the first member and the second member are configured to displace relative to each other in N degrees of freedom, N

公开(公告)号：EP3394676A1

公开(公告)日：2018-10-31

申请号：EP16797561.4

申请日：2016-11-17

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  BUKKEMS, Björn, Hubertus, Maria ,  DE HOON, Cornelius, Adrianus, Lambertus ,  WIJCKMANS, Maurice, Willem, Jozef, Etiënne

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.

公开(公告)号：EP4521169A1

公开(公告)日：2025-03-12

申请号：EP23195956.0

申请日：2023-09-07

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： FUCHS, Sebastian ,  FISCHBACH, Joachim ,  VON HODENBERG, Martin ,  GRUNER, Toralf ,  MANGER, Matthias ,  SCHOORMANS, Carolus J. C. ,  VAN DER WIJST, Marc Wilhelmus Maria ,  BUTLER, Hans

IPC: G03F7/20

Abstract: A method of operating a microlithographic projection exposure apparatus (10) is described. The exposure apparatus comprises a mask holder (20) for holding a mask (18), a substrate holder (26) for holding a substrate (24), a projection lens (30) having several optical elements (R1 - R4) for imaging mask structures of the mask onto the substrate and a manipulator system (34), wherein the optical elements, the mask holder and the substrate holder each are an optical path element in an exposure optical path of the projection exposure apparatus and the manipulator system is configured for adjusting several travels, defined by travel variables (68), at the optical path elements of the projection lens. The method comprises the following steps: providing a wave front deviation (50) of the projection lens, and determining a control command (42) comprising travels for the manipulator system for correcting the wave front deviation using a model (60). The model describes the wave front deviation as a function of the travel variables and for this comprises a group of offset coefficients (62), which are independent of the travel variables, a group of linear coefficients (64), which are each attributed to one of the travel variables to the power of one, and a group of quadratic coefficients (66), which are each attributed to a product of two of the travel variables or to a square of one of the travel variables. The offset coefficients (62) are calibrated more frequently than the linear coefficients (64).

公开(公告)号：EP4394502A1

公开(公告)日：2024-07-03

申请号：EP22216697.7

申请日：2022-12-27

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  KAMIDI, Ramidin, Izair

IPC: G03F7/00 ,  G05B19/416

CPC classification number: G03F7/70725

Abstract: The invention provides a method to generate an acceleration setpoint profile for a movable object, wherein the method comprises:
providing a time domain acceleration curve with finite acceleration time length, providing a time domain jerk curve with finite jerk time length,
calculating a time domain convolution of the time domain acceleration curve and the time domain jerk curve to generate the acceleration setpoint profile,
wherein the time domain jerk curve has a zero value at a start and an end of the finite jerk time length, and
wherein an amplitude profile of the time domain jerk curve, when Fourier transformed into frequency domain, has an amplitude that decreases for higher frequencies with at least 60 dB per decade.

公开(公告)号：EP3596547A1

公开(公告)日：2020-01-22

申请号：EP18712507.5

申请日：2018-02-15

Applicant: ASML Netherlands B.V.

Inventor： KIMMAN, Maarten Hartger ,  BUTLER, Hans ,  FISCHER, Olof Martinus Josephus ,  HOOGENDAM, Christiaan Alexander ,  HUIZINGA, Theodorus Mattheus Joannus Maria ,  ROVERS, Johannes Marinus Maria ,  VENNAT, Eric Pierre-Yves ,  WIJCKMANS, Maurice Willem Jozef Etiënne

IPC: G03F7/20 ,  F16C39/06

公开(公告)号：EP3084525A1

公开(公告)日：2016-10-26

申请号：EP14802416.9

申请日：2014-11-21

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  BREUKERS, Marcus Joseph Elisabeth Godfried ,  HEERTJES, Marcel François

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725

Abstract: A control device configured to determine a primary first drive signal, based on a first error signal representing a difference between desired and measured positions of a first body, for driving a positioner driving the first body; determine a primary second drive signal, based on a second error signal representing a difference between desired and measured positions of a second body, for driving a positioner driving the second body; determine, based on the second error signal, a secondary first drive signal for driving the first body positioner; determine, based on the first error signal, a secondary second drive signal for driving the second body positioner; combine the primary and secondary first drive signals and combine the primary and secondary second drive signals; and output the combined first and second drive signals to the respective positioning devices.

公开(公告)号：EP3876036A1

公开(公告)日：2021-09-08

申请号：EP20160840.3

申请日：2020-03-04

Applicant: ASML Netherlands B.V.

Inventor： VAN DEN BERG, Christiaan Ruben ,  BAGGEN, Marcel Koenraad Marie ,  BAGGEN, Mark Constant Johannes ,  BUTLER, Hans ,  PEIJSTER, Jerry Johannes Martinus ,  KUINDERSMA, Lucas

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/21

Abstract: An apparatus for improving vibration isolation for a vibration sensitive device, such as metrology device or lithographic apparatus is disclosed. The apparatus comprises a module frame for supporting a projection module of the vibration sensitive device; and an intermediate frame for supporting an object support system of the vibration sensitive device, said object support system being configured for supporting an object. The intermediate frame is suspended from the module frame with a connection between the module frame and the intermediate frame being stiff in at least a first direction, the first direction being perpendicular to a main surface plane of said object.