公开(公告)号：EP3474074A1

公开(公告)日：2019-04-24

申请号：EP17196893.6

申请日：2017-10-17

Applicant: ASML Netherlands B.V.

Inventor： PISARENCO, Maxim ,  PANDEY, Nitesh ,  POLO, Alessandro

IPC: G03F7/20 ,  G01N29/04 ,  G01N29/06

Abstract: An acoustic scatterometer 502 has an acoustic source 520 operable to project acoustic radiation 526 onto a periodic structure 538 and 540 formed on a substrate 536. An acoustic detector 518 is operable to detect the -1st acoustic diffraction order 528 diffracted by the periodic structure 538 and 540 while discriminating from specular reflection (0th order 532). Another acoustic detector 522 is operable to detect the +1st acoustic diffraction order 530 diffracted by the periodic structure, again while discriminating from the specular reflection (0th order 532). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation 526 and location of the detectors 518 and 522 are arranged with respect to the periodic structure 538 and 540 such that the detection of the -1st and +1st acoustic diffraction orders 528 and 530 discriminates from the 0th order specular reflection 532.

公开(公告)号：EP4252074A1

公开(公告)日：2023-10-04

申请号：EP21807070.4

申请日：2021-11-08

Applicant: ASML Netherlands B.V.

Inventor： HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  YEGEN, Halil, Gökay ,  OVERKAMP, Jim, Vincent ,  GOORDEN, Sebastianus, Adrianus ,  HUMBLET, Alexis ,  KLEIN, Alexander, Ludwig ,  BRONDANI TORRI, Guilherme ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G03F7/20 ,  B81B7/00 ,  G02B26/08 ,  H01L41/09

公开(公告)号：EP4018265A1

公开(公告)日：2022-06-29

申请号：EP20750273.3

申请日：2020-08-05

Applicant: ASML Netherlands B.V. ,  IMEC VZW

Inventor： HASPESLAGH, Luc Roger Simonne ,  ROCHUS, Veronique ,  BRONDANI TORRI, Guilherme ,  HALBACH, Alexandre ,  PANDEY, Nitesh ,  GOORDEN, Sebastianus Adrianus

IPC: G03F7/20 ,  G02B26/08

公开(公告)号：EP4009107A1

公开(公告)日：2022-06-08

申请号：EP20210884.1

申请日：2020-12-01

Applicant: ASML Netherlands B.V.

Inventor： VERSCHUREN, Coen, Adrianus ,  ZIJP, Ferry ,  PANDEY, Nitesh ,  KONIJNENBERG, Alexander, Prasetya

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/956 ,  G02B27/64 ,  G03F1/84

Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module (SM) configured to support an object (WA) such that an area of the object is illuminated by an illumination beam (IB); an objective lens (OB) configured to collect at least one signal beam (DB1, DB2), the at least one signal beam originating from the illuminated area of the object; an image sensor (IS) configured to capture an image formed by the at least one signal beam collected by the objective lens; and
a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element (OE1) thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.

公开(公告)号：EP3964892A1

公开(公告)日：2022-03-09

申请号：EP20193990.7

申请日：2020-09-02

Applicant: Stichting VU ,  ASML Netherlands B.V. ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam

Inventor： VAN SCHAIJK, Theodorus, Thomas, Marinus ,  MESSINIS, Christos ,  DEN BOEF, Arie, Jeffrey ,  PANDEY, Nitesh ,  De BOER, Johannes Fitzgerald

IPC: G03F7/20 ,  G03H1/04

Abstract: An illumination arrangement operable to provide at least a first pair of radiation beams is disclosed. The illumination arrangement comprises a first beam path for providing a first beam of the first pair of radiation beams, the first beam path comprising a first optical fiber and a second beam path for providing a second beam of the first pair of radiation beams, the second beam path comprising a second optical fiber. The at least one dispersion compensation arrangement is operable to minimize a wavelength dependent optical path length difference between the first beam path and second beam path, at least over a wavelength range of interest.

公开(公告)号：EP3388896A1

公开(公告)日：2018-10-17

申请号：EP17166691.0

申请日：2017-04-14

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  LIAN, Jin ,  SAMEE-UR-REHMAN,

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70616

Abstract: Methods and apparatus for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method comprises obtaining data from a first measurement process. The first measurement process comprises individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process comprises illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.

公开(公告)号：EP4002015A1

公开(公告)日：2022-05-25

申请号：EP20207848.1

申请日：2020-11-16

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  DEN BOEF, Arie, Jeffrey ,  CRAMER, Hugo, Augustinus Joseph ,  TENNER, Vasco, Tomas

IPC: G03H1/04 ,  G03F7/20 ,  G03H1/00 ,  G03H1/26

Abstract: A dark field digital holographic microscope and associated metrology method is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination branch for providing illumination radiation to illuminate said structure; an detection arrangement for capturing object radiation resulting from diffraction of the illumination radiation by said structure; and a reference branch for providing reference radiation for interfering with the object beam to obtain a holographic image. The reference branch has an optical element operable to vary a characteristic of the reference radiation so as to reduce and/or minimize variation in a contrast metric of the holographic image within a field of view of the dark field digital holographic microscope at a detector plane.

公开(公告)号：EP3839635A1

公开(公告)日：2021-06-23

申请号：EP19216970.4

申请日：2019-12-17

Applicant: ASML Netherlands B.V. ,  Stichting VU ,  Stichting Nederlandse Wetenschappelijk ,  Universiteit van Amsterdam

Inventor： DEN BOEF, Arie, Jeffrey ,  TENNER, Vasco, Tomas ,  PANDEY, Nitesh ,  MESSINIS, Christos ,  De BOER, Johannes Fitzgerald

IPC: G03H1/04 ,  G03H1/26 ,  G03F7/20

Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure (1060). The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1080) operable to capture a first scattered radiation (1011) and to capture a second scattered radiation (1021) scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (AD1, fig 11) between the first beam pair and second beam pair.

公开(公告)号：EP3611569A1

公开(公告)日：2020-02-19

申请号：EP18189237.3

申请日：2018-08-16

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  F21V8/00

Abstract: A metrology apparatus for determining a parameter of interest of a structure on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.

公开(公告)号：EP3477391A1

公开(公告)日：2019-05-01

申请号：EP17198461.0

申请日：2017-10-26

Applicant: ASML Netherlands B.V.

Inventor： VAN DER ZOUW, Gerbrand ,  VAN WEERT, Martinus Hubertus Maria ,  ZHOU, Zili ,  PANDEY, Nitesh ,  VAN KRAAIJ, Markus Gerardus Martinus Maria ,  TSIATMAS, Anagnostis

IPC: G03F7/20 ,  G03F1/24

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.