公开(公告)号：JP2013016865A

公开(公告)日：2013-01-24

申请号：JP2012227010

申请日：2012-10-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or an interface between gas/liquid and a final element on the final element or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets lying on a final element of the projection system or substantially avoiding such droplet formation.

Abstract translation: 要解决的问题：提供一种降低液滴和/或气体/液体与最终元件上的最终元件之间的界面的作用的系统，或基本避免这种液滴的形成。 解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。 在光刻设备中，采取手段来例如降低位于投影系统的最终元件上的液滴的作用或基本上避免这种液滴形成。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012039137A

公开(公告)日：2012-02-23

申请号：JP2011220593

申请日：2011-10-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  JANSEN HANS ,  MARCO COELHO STAUFEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method.SOLUTION: In an immersion lithography apparatus in which an immersion liquid is supplied to a local space, the shape of a top view of the local space is substantially a polygon which is substantially parallel to a substrate. In an embodiment, a radius of curvature of two corners of the space is equal to or less than the width of a transition zone between the space configured to contain the liquid and a periphery configured not to contain the liquid.

Abstract translation: 要解决的问题：提供一种光刻设备和设备制造方法。 解决方案：在其中向局部空间供应浸没液体的浸没式光刻设备中，局部空间的顶视图的形状基本上是与基板平行的多边形。 在一个实施例中，空间的两个角的曲率半径等于或小于构造成容纳液体的空间与构造成不含液体的周边之间的过渡区的宽度。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012015549A

公开(公告)日：2012-01-19

申请号：JP2011220594

申请日：2011-10-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  JANSEN HANS ,  MARCO COELHO STAUFEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method.SOLUTION: In an immersion lithographic apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：在将浸没液体供应到局部空间的浸没式光刻设备中，该空间基本上平行于基板平行设计为多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含液体的周围之间的过渡区域的宽度的曲率半径。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011187971A

公开(公告)日：2011-09-22

申请号：JP2011093700

申请日：2011-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEONARDUS CUIJPERS

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种容易且有效地清洁的光刻设备，并提供一种有效地清洁液浸式光刻设备的清洁方法。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011159986A

公开(公告)日：2011-08-18

申请号：JP2011065516

申请日：2011-03-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERICK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method of removing contamination from an immersion hood and/or an immersion fluid in an immersion lithography device.
SOLUTION: A cleaning substrate CW1 having a rigid support layer and a deformable layer provided on the rigid support layer is loaded in the device, the deformable layer 2 of the cleaning substrate CW1 is brought into contact with a surface of the device from which the contamination is removed, and a relative movement between the deformable layer 2 and the surface of the device from which the contamination is removed is introduced to remove the contamination separated from an immersion hood surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在浸没式光刻装置中去除浸没罩和/或浸液的污染物的方法。 解决方案：具有刚性支撑层和设置在刚性支撑层上的可变形层的清洁基板CW1装载在该装置中，清洁基板CW1的可变形层2与装置的表面接触 污染物被去除，并且引入可变形层2和去除污染物的装置的表面之间的相对运动，以去除与浸没罩表面分离的污染物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011129951A

公开(公告)日：2011-06-30

申请号：JP2011033186

申请日：2011-02-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS

IPC: H01L21/027

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic apparatus.
SOLUTION: A cleaning apparatus for immersion lithographic apparatus comprises a substrate table so configured as to hold a substrate, a projection system PS configured to project a patterned radiation beam onto the substrate, a megasonic transducer 20 configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithographic projection apparatus is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 解决方案：一种用于浸没式光刻设备的清洁设备，包括：被配置为保持基板的基板台，配置成将图案化的辐射束投影到基板上的投影系统PS，配置成清洁表面的兆声换能器20，以及 液体供应系统，构造成在所述兆声换能器和待清洁表面之间提供液体。 浸没式光刻投影装置的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010103530A

公开(公告)日：2010-05-06

申请号：JP2009236994

申请日：2009-10-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  VAN DER DONCK JACQUES COR JOHAN ,  GORTER HARRIE ,  VAN DER BERG JOHANNES HENDRIK

IPC: H01L21/027 ,  C11D1/722 ,  C11D3/20 ,  C11D3/43 ,  C11D17/08 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method with which a surface of a lithographic apparatus can be effectively cleaned. SOLUTION: The lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt.% water; from 1 to 74.99 wt.% solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt.% surfactant. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供可以有效地清洁光刻设备的表面的系统和方法。 解决方案：光刻设备包括被配置为向要清洁的表面提供清洁流体的流体供应系统。 清洗流体包括25至98.99重量％的水; 1至74.99重量％的溶剂，其选自一种或多种二醇醚，酯，醇和酮; 和0.01至5重量％的表面活性剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010074160A

公开(公告)日：2010-04-02

申请号：JP2009208754

申请日：2009-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet to a final element and/or an influence of gas and liquid to the interface of the final element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. In the lithography device, for example, the influence of the droplet on the final element of the projection system PS is reduced, or the formation of such a droplet is avoided substantially. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低液滴对最终元素的影响和/或气体和液体对最终元件的界面的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在光刻装置中，例如，液滴对投影系统PS的最终元件的影响减小，或者基本上避免了形成这样的液滴。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009283987A

公开(公告)日：2009-12-03

申请号：JP2009204590

申请日：2009-09-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  LAMBERTUS DONDERS SJOERD NICOL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  HUBERTUS MULKENS JOHANNES C ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To take countermeasures against a bad influence of a liquid in an immersion lithographic apparatus. SOLUTION: The lithographic apparatus includes a supporting structure MT for supporting a pattern providing device MA. The pattern providing device provides a pattern to a radiation beam PB in accordance with a desired pattern. The lithographic apparatus further includes a substrate table WT for supporting a substrate; a projection system PL for projecting a pattern-provided beam to a target portion of the substrate W; a measurement system for measuring a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system or (d) a combination of any of (a)-(c); and a liquid supplying system for supplying a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield arranged near one part of the measurement system, and shielding the part of the measurement system from the liquid. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：采取对抗浸没式光刻设备中液体的不良影响的对策。 解决方案：光刻设备包括用于支撑图案提供装置MA的支撑结构MT。 图案提供装置根据期望的图案向辐射束PB提供图案。 光刻设备还包括用于支撑衬底的衬底台WT; 用于将图案提供的光束投影到基板W的目标部分的投影系统PL; 用于测量（a）衬底台的参数的测量系统，或（b）衬底，或（c）由投影系统投影的图像，或（d）（a） - （c）中任何一个的组合; 以及用于将液体供应到基板和投影系统之间的空间的液体供应系统。 光刻设备还包括靠近测量系统的一部分附近的屏蔽，并且将测量系统的一部分与液体隔离。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009283970A

公开(公告)日：2009-12-03

申请号：JP2009176829

申请日：2009-07-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which immersion liquid is provided between the last element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the immersion liquid and to help reduce residue on the elements after being in contact with the immersion liquid.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻投影装置。 公开了浸没式光刻投影装置，其中浸没液体设置在投影系统的最后一个元件和基板之间。 提供了在设备的各种元件上使用疏水层和亲水层两者以帮助防止在浸液中形成气泡并有助于在与浸液接触之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT