中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

241 records (took 0.039 seconds)

    Motion detection system, lithographic apparatus, and device manufacturing method
    54.
    发明专利
    Motion detection system, lithographic apparatus, and device manufacturing method 有权
    运动检测系统，平面设备和设备制造方法

    公开(公告)号：JP2013048240A

    公开(公告)日：2013-03-07

    申请号：JP2012184855

    申请日：2012-08-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EIJK JAN ,  LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN

    IPC: H01L21/027 ,  G01B11/00 ,  G01B11/26

    CPC classification number: G01B11/14 ,  G01D5/38 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide an improved precision measurement system which is not easily influenced by errors and does not occupy a large space.SOLUTION: A system to detect motion of a main body comprises: the main body; a first diffraction grating 40, 42 substantially stationarily attached to a reference frame; a second diffraction grating 50, 52 attached to the main body; and a detector 60, 61, 62, 63 configured to receive one or more radiation beams diffracted by the first and second diffraction gratings and detect motion of the main body relative to the reference frame. The detector 60, 61, 62, 63 is coupled to the main body, and movable relative to the main body.

    Abstract translation: 要解决的问题：提供不容易受到误差影响并且不占用大空间的改进的精密测量系统。 检测主体运动的系统包括：主体; 基本上固定地连接到参考系的第一衍射光栅40,42; 附接到主体的第二衍射光栅50,52; 以及被配置为接收由第一和第二衍射光栅衍射的一个或多个辐射束并检测主体相对于参考系的运动的检测器60,61,62,63。 检测器60,61,62,63联接到主体，并且可相对于主体移动。 版权所有（C）2013，JPO＆INPIT

    Radiation source and lithographic apparatus
    55.
    发明专利
    Radiation source and lithographic apparatus 有权
    辐射源和光刻设备

    公开(公告)号：JP2013008683A

    公开(公告)日：2013-01-10

    申请号：JP2012177503

    申请日：2012-08-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  BANINE VADIM YEVGENYEVICH ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  ERIK PETRUS BUEHLMANN

    IPC: H05G2/00 ,  H01L21/027

    CPC classification number: G03F7/70108 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide more uniform EUV radiation.SOLUTION: A radiation source configured to generate EUV radiation comprises: a fuel droplet generator configured to deliver a fuel droplet to an interaction point; an optical system configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate plasma; and a collector arranged to collect the EUV radiation emitted by the plasma. The optical system is configured such that in use the fuel vaporizing and the exciting radiation are entered upon more than one side of the fuel droplet at the interaction point.

    Abstract translation: 要解决的问题：提供更均匀的EUV辐射。 解决方案：被配置为产生EUV辐射的辐射源包括：燃料液滴发生器，被配置为将燃料液滴输送到相互作用点; 光学系统，被配置为将燃料蒸发和激发辐射传递到所述相互作用点以产生等离子体; 以及收集器，用于收集等离子体发射的EUV辐射。 光学系统被配置为使得在使用中燃料蒸发和激发的辐射进入到相互作用点处的燃料液滴的多于一侧。 版权所有（C）2013，JPO＆INPIT

    Method for operating detector within gas conditioned environment
    57.
    发明专利
    Method for operating detector within gas conditioned environment 审中-公开
    在气体环境条件下操作探测器的方法

    公开(公告)号：JP2012004598A

    公开(公告)日：2012-01-05

    申请号：JP2011216998

    申请日：2011-09-30

    Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Gmbh ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・ゲーエムベーハー

    Inventor： VAN EMPEL TJARKO ADRIAAN R ,  LOOPSTRA ERIK ROELOF ,  VAN DER NET ANTONIUS J ,  YURI JOHANNES GABRIEL VAN DE VIJVER ,  BERNARD GERLICH ,  BAUKE JANSEN ,  RENS SANDERSE

    IPC: H01L21/027

    CPC classification number: G03F7/70933 ,  G03F7/70908

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is provided with a projection lens system having a gas conditioned environment that is less sensitive to ambient atmosphere variations.SOLUTION: A lithographic apparatus is disclosed. The lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The lithographic apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

    Abstract translation: 要解决的问题：提供一种设置有具有对环境大气变化较不敏感的气体调节环境的投影透镜系统的光刻设备。 解决方案：公开了一种光刻设备。 光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 光刻设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，用于在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。 版权所有（C）2012，JPO＆INPIT

    Lithographic device and patterning device
    58.
    发明专利
    Lithographic device and patterning device 有权
    光刻设备和图案设备

    公开(公告)号：JP2011109083A

    公开(公告)日：2011-06-02

    申请号：JP2010236005

    申请日：2010-10-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF

    IPC: H01L21/027

    CPC classification number: G03F7/7085 ,  G03F7/70358 ,  G03F7/70516

    Abstract: PROBLEM TO BE SOLVED: To enhance projection accuracy in a lithographic device. SOLUTION: The lithographic device is equipped with an illumination system constituted to adjust an irradiation beam, a supporting body constituted to support a patterning device capable of forming a patterned irradiation beam by setting a pattern on the sectional surface of the irradiation beam, a substrate table constituted to support a substrate, and a projection system constituted to project the patterned irradiation beam to the target of the substrate. Furthermore, the lithographic device has a projection and transcription measuring structure to measure the optical projection and transcription data of the projection system. The projection and transcription measuring structure is equipped with an optical device to introduce a measuring beam into the projection system during scanning, a detector to detect the measuring beam passing through the projection system during scanning, and a measuring processor to determine the optical projection and transcription data from the detected measuring beam. The optical device and the detector are arranged at the upper-stream end of the projection system. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提高光刻设备中的投影精度。 解决方案：光刻设备配备有用于调节照射束的照明系统，支撑体，其构造成支撑能够通过在照射光束的截面上设置图案来形成图案化照射光束的图案形成装置， 构成为支撑基板的基板台，以及将图案化的照射光束投射到基板的靶上的投影系统。 此外，光刻设备具有投影和转录测量结构，以测量投影系统的光学投影和转录数据。 投影和转录测量结构配备有在扫描期间将测量光束引入投影系统的光学装置，用于检测在扫描期间通过投影系统的测量光束的检测器，以及用于确定光学投影和转录的测量处理器 来自检测的测量光束的数据。 光学装置和检测器布置在投影系统的上游端。 版权所有（C）2011，JPO＆INPIT

    Radiation system, and lithographic device
    59.
    发明专利
    Radiation system, and lithographic device 审中-公开
    辐射系统和光刻设备

    公开(公告)号：JP2011018903A

    公开(公告)日：2011-01-27

    申请号：JP2010151526

    申请日：2010-07-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  IVANOV VLADIMIR VITALEVICH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  YAKUNIN ANDREY MIKHAILOVICH ,  DE GRAAF DENNIS ,  STAMM UWE BRUNO HEINI

    IPC: H01S3/08 ,  H01L21/027 ,  H01S3/00

    CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation system capable of improving conversion efficiency of EUV radiation/emission plasma, and to provide a lithographic device.SOLUTION: The radiation system includes a target material source for supplying droplets of a target material along a track, and a laser system including an amplifier and an optical system. The optical system establishes a first beam path which passes through the amplifier and a first point on the track, and establishes a second beam path which passes through the amplifier and a second point on the track. When a photon emitted from the amplifier is reflected along the first beam path by the droplet of the target material at the first point on the track, the laser system generates a first pulse of laser radiation. When a photon emitted from the amplifier is reflected along the second beam path by the droplet of the target material at the second point on the track, the laser system generates a second pulse of laser radiation.

    Abstract translation: 要解决的问题：提供能够提高EUV辐射/发射等离子体的转换效率并提供光刻设备的辐射系统。解决方案：辐射系统包括用于沿着轨道提供目标材料的液滴的靶材料源， 以及包括放大器和光学系统的激光系统。 光学系统建立通过放大器和轨道上的第一点的第一光束路径，并建立通过放大器的第二光束路径和轨道上的第二点。 当从放大器发射的光子沿着第一光束路径被轨道上的第一点处的目标材料的液滴反射时，激光系统产生第一激光辐射脉冲。 当从放大器发射的光子在轨道上的第二点处由靶材料的液滴沿着第二光束路径反射时，激光系统产生激光辐射的第二脉冲。

    Alignment apparatus
    60.
    发明专利
    Alignment apparatus 审中-公开
    对齐设备

    公开(公告)号：JP2011009753A

    公开(公告)日：2011-01-13

    申请号：JP2010155780

    申请日：2010-07-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MULKENS JOHANNES CATHARINUS HUBERTUS ,  VAN DEN BRINK MARINUS A ,  LOOPSTRA ERIK ROELOF

    IPC: G03F7/20 ,  H01L21/027 ,  B41C1/10 ,  B41N3/00 ,  G03F9/00

    CPC classification number: G03F7/70341 ,  B41C1/1075 ,  B41C1/1083 ,  G03F7/70258 ,  G03F9/7026

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, an alignment apparatus, a device manufacturing method, an alignment method, and a method of converting an apparatus.SOLUTION: A detector 22 detects the amount of liquid in the optical path of a projection beam PB or alignment beam and then a controller 21 determines optical elements necessary to focus the projection beam or alignment beam on the surface of a substrate from among a plurality of compensating optical elements 9, 10, 11, 12. The appropriate optical elements are arranged directly in the projection beam path or the alignment beam path as a final element of the projection system or the projection alignment system.

    Abstract translation: 要解决的问题：提供光刻设备，对准设备，设备制造方法，对准方法和转换设备的方法。解决方案：检测器22检测投影光束的光路中的液体量 PB或对准光束，然后控制器21确定从多个补偿光学元件9,10,11,12中将投影光束或对准光束聚焦在衬底的表面上所需的光学元件。适当的光学元件直接布置 在投影光束路径或对准光束路径中作为投影系统或投影对准系统的最终元件。

Patent Agency Ranking