公开(公告)号：JP2012238868A

公开(公告)日：2012-12-06

申请号：JP2012157590

申请日：2012-07-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHAEL ,  KUIPER ANTONY ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus by which a two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized.SOLUTION: In order to allow a liquid-rich flow to preferentially flow along a surface, gas of a two-phase flow is more easily diverted and enters a dry chamber 127 via a gap between a divider 124 and a second wall 123. The width of a channel 125, as well as a surface coating thereon if desired, encourages the liquid to enter and the gas not to enter.

Abstract translation: 要解决的问题：提供一种浸入式光刻设备，通过该浸没式光刻设备，两相流可以被稳定和/或至少基本上分离成液态和气体流，并且期望地基本上最小化。 解决方案：为了使液体丰富的流优先沿着表面流动，两相流的气体更容易转向并经由分隔件124和第二壁123之间的间隙进入干燥室127 如果需要，通道125的宽度以及其上的表面涂层鼓励液体进入并且气体不进入。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011205121A

公开(公告)日：2011-10-13

申请号：JP2011124242

申请日：2011-06-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS H ,  OTTENS JOOST JEROEN ,  KEMPER NICOLAAS R

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To improve throughput in immersion lithography.SOLUTION: There is disclosed an immersion photolithographic apparatus, in which at least a part of a liquid supply system which provides liquid between a projection system and a substrate is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between the part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

Abstract translation: 要解决的问题：提高浸没光刻中的生产量。解决方案：公开了一种浸没式光刻设备，其中在投影系统和基板之间提供液体的液体供应系统的至少一部分可在基本上平行的平面中移动 在扫描期间到达基板的顶表面。 移动部件以减小部件和基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

公开(公告)号：JP2010212728A

公开(公告)日：2010-09-24

申请号：JP2010118223

申请日：2010-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  OTTENS JOOST JEROEN ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  SERGEI SHULEPOV

IPC: H01L21/027

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To precisely remove liquid in an immersion exposure device. SOLUTION: Embodiments of a drain 10 in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain 10. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain 10 is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：精确地去除浸没曝光装置中的液体。 解决方案：描述了在光刻投影设备中的漏极10的实施例，其具有例如在排出口10中没有液体存在的期间减少气体进入排水管的特征。在一个示例中， 提供了一种被动液体去除机构，使得排水管10中的气体压力等于环境气体压力，并且在另一个实施例中，提供了一个挡板，以在不需要液体移除的时间内关闭室。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010161421A

公开(公告)日：2010-07-22

申请号：JP2010097301

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010068003A

公开(公告)日：2010-03-25

申请号：JP2009287652

申请日：2009-12-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS J M ,  OTTENS JOOST JEROEN

IPC: H01L21/027

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system and the like for improving accuracy for positioning a substrate with respect to a projection system or the like. SOLUTION: A lithographic apparatus with a cover plate formed separately from a substrate table and a means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with a thermal insulation material provided between a cover plate and a substrate table so that the cover plate acts as a thermal shielding material for the substrate table is disclosed. A lithographic apparatus comprising a means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于提高相对于投影系统等定位基板的精度的系统等。 公开了一种具有与衬底台分开形成的盖板的光刻设备和通过控制盖板的温度来稳定衬底台的温度的装置。 公开了一种具有隔热材料的光刻设备，其设置在盖板和基板台之间，使得盖板用作用于基板台的热屏蔽材料。 公开了一种光刻设备，其包括参考衬底台变形来确定衬底台变形和改善衬底的位置控制的装置。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010010707A

公开(公告)日：2010-01-14

申请号：JP2009234094

申请日：2009-10-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminate energy loss in a lithographic apparatus where a related component is locally cooled by evaporation of a supplied liquid and may be deformed and change in quality to possibly cause defocusing and lens aberrations during immersion lithography in which the part between a projection system and a substrate is filled with an immersion liquid so as to increase a numerical aperture. SOLUTION: A schedule table 34 is prepared which contains information regarding time when the supplied liquid 11 is most apt to evaporate, the position, speed, acceleration, etc. of the substrate, and a liquid evaporation controller 30 heats at least part of the substrate W by a heater or sends humidifying air according to the schedule table 34 to prevent local evaporation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的能量损失，其中相关部​​件通过供应液体的蒸发局部冷却，并且可能变形并且质量变化以可能引起散焦和透镜 浸渍光刻期间的像差，其中投影系统和衬底之间的部分被浸没液体填充以增加数值孔径。 解决方案：准备一个计划表34，其中包含关于所供应的液体11最易蒸发的时间的信息，基板的位置，速度，加速度等，并且液体蒸发控制器30加热至少部分 或者根据附表表34发送加湿空气以防止局部蒸发。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008277856A

公开(公告)日：2008-11-13

申请号：JP2008163625

申请日：2008-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS H ,  OTTENS JOOST JEROEN ,  KEMPER NICOLAAS R

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To improve throughput in liquid immersion lithography. SOLUTION: A liquid immersion exposure apparatus is disclosed. At least a part of a liquid supply system to supply a liquid between a projection system and a substrate is moveable in a plane substantially parallel to a top face of the substrate during scanning. The part is moved to reduce the relative speed between that part and the substrate, so that the speed of the substrate relative to the projection system may be increased. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提高液浸光刻中的生产率。 解决方案：公开了一种浸液曝光装置。 在投影系统和基板之间供应液体的液体供应系统的至少一部分可在扫描期间在基本上平行于基板的顶面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，从而可以增加基板相对于投影系统的速度。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007180535A

公开(公告)日：2007-07-12

申请号：JP2006338021

申请日：2006-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS J M ,  JACOBS JOHANNES HENRICUS WILHE ,  LOOPSTRA ERIK R ,  OTTENS JOOST JEROEN ,  DE JONG FREDERIK E

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device for projecting an image of a desired pattern via a liquid onto a substrate. SOLUTION: The device is provided with: a plurality of substrate holders, each adapted to hold at least one substrate and having a conduit therein for transporting a temperature-control fluid; a fluid supply system adapted to supply a temperature-control fluid of a substantially predetermined temperature; and a flow-rate controller adapted to control the flow rate of the temperature-control fluid in each substrate holder so that the flow rate in a first one of the plurality of substrate holders will differ from the flow rate in a second one among the plurality of substrate holders. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种通过液体将期望图案的图像投影到基板上的光刻设备。 解决方案：装置设置有：多个基板保持器，每个基板保持器适于保持至少一个基板并且具有用于输送温度控制流体的导管; 适于提供基本上预定温度的温度控制流体的流体供应系统; 以及流量控制器，其适于控制每个基板保持器中的温度控制流体的流量，使得多个基板保持器中的第一个中的流量与多个基板保持器中的第二个中的流量不同 的基板支架。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007123872A

公开(公告)日：2007-05-17

申请号：JP2006278745

申请日：2006-10-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  VAN MEER ASCHWIN LODEWIJK HEND ,  TEL WIM TJIBBO ,  VINK JACOB W ,  COMPEN RENE THEODORUS P ,  GERRITS PETRUS J

IPC: H01L21/027 ,  G01B11/02

CPC classification number: G03F7/70916 ,  G03F7/7065 ,  G03F7/707 ,  G03F9/7003

Abstract: PROBLEM TO BE SOLVED: To provide a height detector for a lithography apparatus.
SOLUTION: The height detector includes a height map creation unit for creating at least one height map on the top surface of an object placed on a radiation beam of the lithography apparatus. The object is held on a support configured to support the object by a holding power applied to the object. The height detector also comprises a control unit for controlling the height map creation unit so as to create at least one height map of the object relative to at least two different holding pressure levels.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于光刻设备的高度检测器。 解决方案：高度检测器包括高度图创建单元，用于在放置在光刻设备的辐射束上的物体的顶表面上产生至少一个高度图。 对象被保持在被配置为通过施加到对象的保持力来支持对象的支撑上。 高度检测器还包括控制单元，用于控制高度图创建单元，以便相对于至少两个不同的保持压力水平创建对象的至少一个高度图。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006148101A

公开(公告)日：2006-06-08

申请号：JP2005329914

申请日：2005-11-15

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  OTTENS JOOST JEROEN ,  HOPMAN JAN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70716 ,  B32B38/0012 ,  B32B38/06 ,  B32B2315/02 ,  G03F7/70708 ,  Y10T428/24479

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus that is hardly affected by the existence of contamination in the manufacturing process, and to provide a device manufacturing method. SOLUTION: This lithography apparatus is disclosed. The lithography apparatus is equipped with a lighting system that specifies a condition of irradiation beams, and articles support that supports articles to be arranged on the optical path of radiation beams. The articles support is equipped with multiple connecting layers. At least one of the multiple connecting layers is equipped with multiple concavities that counter other connecting layers of the multiple connecting layers. As a result, connecting surface between the connecting layers is made small. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供在制造过程中几乎不受污染的影响的光刻设备，并提供一种器件制造方法。 解决方案：公开了该光刻设备。 光刻设备配备有指定照射光束的状态的照明系统，以及支撑要布置在辐射光束的光路上的物品的物品支撑件。 物品支架配有多个连接层。 多个连接层中的至少一个配备有多个凹陷，其对应于多个连接层的其它连接层。 结果，连接层之间的连接表面变小。 版权所有（C）2006，JPO＆NCIPI