公开(公告)号：JP2010237627A

公开(公告)日：2010-10-21

申请号：JP2009088472

申请日：2009-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO TAKAYUKI ,  SAEGUSA HIROSHI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/004 ,  C08F32/08 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active light or radiation sensitive resin composition which allows formation of a pattern having less water residue defects, bubble defects, and development residue defects and is superior in LWR, and a pattern forming method using this resin composition. SOLUTION: The active light or radiation sensitive resin composition includes a resin (HR) having a recurring unit (a) which has a polycyclic structure in its main chain and has a portion where the polycyclic structure is decomposed by the action of an acid to increase the solubility in an alkaline developer. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有源光或辐射敏感性树脂组合物，其能够形成具有较少缺水缺陷，气泡缺陷和显影残渣缺陷的图案，并且在LWR中优异，并且使用该图案形成方法 树脂组合物。 解决方案：活性光或辐射敏感性树脂组合物包括具有重复单元（a）的树脂（HR），该重复单元（a）在其主链中具有多环结构，并且具有多环结构通过 酸以增加在碱性显影剂中的溶解度。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2013204034A

公开(公告)日：2013-10-07

申请号：JP2012078046

申请日：2012-03-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  OBAYASHI TATSUHIKO ,  MOROOKA NAOYUKI ,  NAGAI TAKAYASU ,  SOMEYA AYUMI

IPC: C08F220/30 ,  C08F265/04 ,  C08F290/12 ,  G02B1/04

CPC classification number: C08F222/14 ,  C08F212/08 ,  C08F212/32 ,  C08F212/36 ,  C08F220/30 ,  C08F220/40 ,  C08F220/68 ,  C08F265/04 ,  C08F265/06 ,  C08F290/12 ,  C08F2222/145 ,  G02B1/04 ,  G02B1/041 ,  C08L23/00 ,  C08L33/10 ,  C08L33/08 ,  C08F2220/301

Abstract: PROBLEM TO BE SOLVED: To provide a curable resin composition capable of producing a cured product in which generation of burrs during molding is suppressed, the rate of excellent articles after molding is high, thermal discoloration resistance is sufficient, and Abbe number is low.SOLUTION: A curable resin composition includes a (meth)acrylate monomer having an aromatic ring, a nonconjugated vinylidene group-containing compound represented by general formula (1), and at least one of heat/photo-radical polymerization initiators, wherein the nonconjugated vinylidene group-containing compound does not contain the (meth)acrylate monomer. In the formula, R, R, Rand Reach independently represent a substituent, and A represents a group of atoms necessary to form a ring structure.

Abstract translation: 要解决的问题：为了提供能够制造成型时产生毛刺的固化物的固化性树脂组合物，成型后的优良物品的比例高，耐热变色性足够，阿贝数低。 ：可固化树脂组合物包括具有芳环的（甲基）丙烯酸酯单体，由通式（1）表示的非共轭亚乙烯基化合物和热/光自由基聚合引发剂中的至少一种，其中非共轭亚乙烯基 （甲基）丙烯酸酯单体。 在该式中，R，R，Rand Reach独立地表示取代基，A表示形成环结构所必需的原子团。

公开(公告)号：JP2013061624A

公开(公告)日：2013-04-04

申请号：JP2012075045

申请日：2012-03-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  TANGO NAOHIRO ,  KATAOKA SHOHEI

IPC: G03F7/004 ,  C08F220/28 ,  C08F220/38 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

Abstract: PROBLEM TO BE SOLVED: To provide an activating-light-sensitive or radiation-sensitive resin composition capable of improving roughness performance and pattern collapse, an activating-light-sensitive or radiation-sensitive film using the composition, and a method for forming patterns.SOLUTION: The composition includes a resin (A) effected by an acid to increase the solubility to an alkaline development liquid, and compounds (C) expressed by formulae (ZI-3), (ZI-4) and (ZI-5) that produce an acid due to irradiation of an activating light or radiation. The resin (A) includes at least one kind of repeating unit that has a group being decomposed due to acid. A group released by decomposition of the acid decomposable group has a ring structure, the ring structure has a polar group as a substituent, or the ring structure has a polar atom as a part of the ring structure, and the logP value of the compound derived from the release of the releasing group is equal to or larger than 0 and less than 2.8.

Abstract translation: 要解决的问题：提供能够改善粗糙性能和图案塌陷的活化光敏感或辐射敏感性树脂组合物，使用该组合物的活化光敏感或辐射敏感膜，以及用于 形成图案。 组合物包含由酸提高对碱性显影液的溶解度的树脂（A），由式（ZI-3），（ZI-4）和（ZI-4）表示的化合物（C） 5）由于激活光或辐射的照射而产生酸。 树脂（A）包括至少一种具有由酸分解的基团的重复单元。 通过酸分解基团分解释放的基团具有环结构，环结构具有极性基团作为取代基，或者环结构具有极性原子作为环结构的一部分，并且衍生化合物的logP值 从释放组的释放等于或大于0且小于2.8。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012181272A

公开(公告)日：2012-09-20

申请号：JP2011042911

申请日：2011-02-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  TANGO NAOHIRO

IPC: G03F7/039 ,  C08F220/28 ,  C09K3/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of achieving both line edge roughness and sensitivity and an actinic ray-sensitive or radiation-sensitive film using the same and a pattern formation method.SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin having an acid-decomposable repeating unit represented by the general formula (I) and a compound generating acid by irradiation of active light or radiant ray (wherein, Rrepresents a hydrogen atom, an alkyl group, a halogen atom, a cyano group, or an alkyl oxy-carbonyl group. Rrepresents an alkyl group or a cycloalkyl group. Rrepresents a monovalent substituent. W represents an alkylene group or a cycloalkylene group. X represents an oxygen atom or a sulfur atom, and a ring including X represents a structure including an ether bond or a thioether group. l or n each independently represents an integer of 0 or more. When n is 2 or more, a plurality of Rs are respectively independent and may be bonded together to form a ring.)

Abstract translation: 要解决的问题：提供能够实现线边缘粗糙度和灵敏度的光化射线敏感或辐射敏感性树脂组合物和使用其的光化学敏感或辐射敏感性薄膜和图案形成方法。 解决方案：提供了含有具有由通式（I）表示的可酸分解的重复单元的树脂和通过活性光或辐射线的照射产生酸的化合物的光化射线敏感或辐射敏感性树脂组合物 （其中，R 1 表示氢原子，烷基，卤素原子，氰基或烷基氧基 - 羰基R SB SB =“POST” > 2 表示烷基或环烷基，R 3 分别是独立的，可以结合在一起形成环。）版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012137686A

公开(公告)日：2012-07-19

申请号：JP2010291237

申请日：2010-12-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  TANGO NAOHIRO

IPC: G03F7/004 ,  C08F220/10 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which may suppress the elution of a photoacid generator to an immersion liquid and have an excellent immersion liquid follow-up property and further is excellent in roughness characteristics, and an actinic-ray-sensitive or radiation-sensitive film and a pattern forming method using the composition.SOLUTION: An actinic-ray-sensitive or radiation-sensitive resin composition contains (A) a compound represented by the following formula (I) which generates an acid upon irradiation of an actinic ray or a radiation and (B) a resin which decomposes by an action of an acid to increase the solubility of the resin in an alkaline developer. (In the general formula (I), n represents an integer of 2 or more and X represents a hydrocarbon group.)

Abstract translation: 要解决的问题：提供可抑制光致酸产生剂向浸液中的洗脱的光化射线敏感性或辐射敏感性树脂组合物，并且具有优异的浸渍液追随性，并且还具有优异的粗糙度 特性和光化学敏感性或辐射敏感性膜以及使用该组合物的图案形成方法。 光敏射线敏感性或辐射敏感性树脂组合物含有（A）下述式（I）表示的化合物，其在光化射线或辐射照射时产生酸，（B）树脂 其通过酸的作用而分解，以增加树脂在碱性显影剂中的溶解度。 （通式（I）中，n表示2以上的整数，X表示烃基。）COPYRIGHT：（C）2012，JPO＆INPIT

公开(公告)号：JP2012058268A

公开(公告)日：2012-03-22

申请号：JP2010198241

申请日：2010-09-03

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TANGO NAOHIRO ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  IIZUKA YUSUKE

IPC: G03F7/004 ,  C08L101/02 ,  C09K3/00 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition with which a pattern having an excellent exposure latitude (EL) and a good pattern profile and line edge roughness (LER) can be formed, and to provide a active ray-sensitive or radiation-sensitive film formed by using the composition and a method for forming a pattern using the composition.SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having solubility with an alkali developing solution increased by action of an acid; (B) a compound that generates an acid expressed by general formula (B-1) by irradiation with active rays or radiation; and (C) a compound (PDA) that generates a compound expressed by general formula (PDA-1) by irradiation with the active rays or radiation.

Abstract translation: 要解决的问题：提供一种可以形成具有优异的曝光宽容度（EL）和良好的图案轮廓和线条粗糙度（LER）的图案的主动射线敏感或辐射敏感性树脂组合物，以及 以提供通过使用该组合物形成的主动射线敏感或辐射敏感膜以及使用该组合物形成图案的方法。 活性射线敏感性或辐射敏感性树脂组合物含有：（A）通过酸的作用使碱显影溶液具有溶解性的树脂; （B）通过用活性射线或辐射照射产生由通式（B-1）表示的酸的化合物; 和（C）通过用活性射线或辐射照射产生由通式（PDA-1）表示的化合物的化合物（PDA）。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011033843A

公开(公告)日：2011-02-17

申请号：JP2009180211

申请日：2009-07-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  IIZUKA YUSUKE ,  SAEGUSA HIROSHI ,  HIRANO SHUJI

IPC: G03F7/039 ,  C08F220/22 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition capable of pattern formation that is improved in the pattern collapse, line edge roughness and scum occurrence, being free from any profile deterioration, and that exhibits appropriate following properties for the liquid for liquid immersion at the stage of liquid immersion exposure, while improving performance of reducing bubble defects, and to provide a method of forming a pattern with the use of the composition.
SOLUTION: The actinic ray- or radiation-sensitive resin composition includes a resin (A) which has at least two polar conversion groups, includes a repeating unit (a) having at least either a fluorine atom or a silicon atom, and exhibits increased solubility in an alkali developer by the action of an acid.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够形成图案的光化射线或辐射敏感性树脂组合物，其在图案塌陷，线边缘粗糙度和浮渣发生方面得到改善，没有任何轮廓劣化，并且表现出适当的 在液浸式暴露阶段进行液浸的液体性能，同时提高减少气泡缺陷的性能，并提供使用该组合物形成图案的方法。 光解射线或辐射敏感性树脂组合物包括具有至少两个极性转化基团的树脂（A），包括具有至少一个氟原子或硅原子的重复单元（a），和 通过酸的作用在碱性显影剂中表现出增加的溶解度。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250076A

公开(公告)日：2010-11-04

申请号：JP2009099437

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KONDO DAISUKE ,  SAEGUSA HIROSHI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE ,  YAMAGUCHI SHUHEI

IPC: G03F7/039 ,  C08F20/26 ,  C08F32/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition, with which a pattern having good corner proximity and fewer developing defects can be formed, and which causes little elution of an acid into an immersion liquid and shows proper properties to the immersion liquid, and to provide a method for forming a pattern by using the composition. SOLUTION: The composition includes (A) a resin whose solubility with an alkali developing solution is increased by the action of an acid; (B) a compound generating an acid by irradiation with active rays or radiation; and (C) a resin containing a repeating unit having a polarity conversion group that is decomposed by the action of an alkali developing solution, to increase the solubility with the alkali developing solution, and containing at least either a fluorine atom or a silicon atom, and (D) a nitrogen-containing organic compound, having a nitrogen-containing hetero ring expressed by formula (1). In the formula, R 1 represents a 2-20C straight-chain, branched or cyclic divalent substituent forming, together with nitrogen atoms bonded to both ends, a nitrogen-containing hetero aliphatic ring or a nitrogen-containing hetero aromatic ring, which may include an oxygen atom, nitrogen atom, sulfur atom or halogen atom; R 2 represents a 2-10C straight-chain or branched alkylene group which may include a carbonyl group; and R 3 represents a saturated or unsaturated hydrocarbon group or acyl group which may include a hydroxyl group, carbonyl group, ester group, ether group, cyano group or steroid skeleton or a combination of two or more of them. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种主动射线敏感或辐射敏感性树脂组合物，可以形成具有良好角接近性和较少显影缺陷的图案，并且几乎不会使酸洗到浸液中 并且对浸渍液体显示适当的性质，并提供通过使用该组合物形成图案的方法。 解决方案：组合物包括（A）其与碱性显影液的溶解度通过酸的作用而增加的树脂; （B）通过用活性射线或辐射照射产生酸的化合物; 和（C）含有具有通过碱性显影液的作用分解的极性转换基的重复单元的树脂，以增加与碱性显影液的溶解性，并且至少含有氟原子或硅原子， 和（D）含有式（1）表示的含氮杂环的含氮有机化合物。 在该式中，R 1 表示2-20C直链，支链或环状二价取代基，与二价键合的氮原子一起形成含氮杂脂族环或含氮杂环 杂芳环，其可以包括氧原子，氮原子，硫原子或卤素原子; R 2表示可包括羰基的2-10C直链或支链亚烷基; R 3表示可以包括羟基，羰基，酯基，醚基，氰基或类固醇骨架的饱和或不饱和烃基或酰基，或者它们中的两个或多个的组合 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250075A

公开(公告)日：2010-11-04

申请号：JP2009099418

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAMOTO KEI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F12/04 ,  C08F20/04 ,  C08F20/12 ,  C08F32/08 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active-ray sensitive or radiation-sensitive resin composition which is improved in development defects and distance dependence of a pattern, and to provide a method for forming a pattern that uses the composition. SOLUTION: The active-ray sensitive or radiation-sensitive resin composition comprises (A) a resin having a specified repeating unit having a norbornane structure in a side chain, and the solubility of which with an alkali developing solution is increased by an action of an acid; (B) a compound generating an acid by irradiation with active rays or radiation; and (C) a resin containing at least either a fluorine atom or a silicon atom and having a group that is decomposed by an action of an alkali developing solution, to increase the solubility with the alkali developing solution. The method for forming a pattern is carried out by using the composition. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供改善图案的显影缺陷和距离依赖性的主动射线敏感或辐射敏感性树脂组合物，并提供形成使用该组合物的图案的方法。 解决方案：主动射线敏感或辐射敏感性树脂组合物包含（A）具有侧链中具有降冰片烷结构的特定重复单元的树脂，其与碱性显影液的溶解度增加 酸的作用 （B）通过用活性射线或辐射照射产生酸的化合物; 和（C）至少含有氟原子或硅原子的树脂，并且具有通过碱性显影液的作用分解的基团的树脂，以提高与碱性显影液的溶解性。 通过使用该组合物进行形成图案的方法。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010039147A

公开(公告)日：2010-02-18

申请号：JP2008201285

申请日：2008-08-04

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  SHIRAKAWA MICHIHIRO

IPC: G03F7/039 ,  C08F220/12 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive resist composition that provides a pattern having a small line width roughness and forms a pattern having a large exposure latitude. SOLUTION: The positive resist composition contains at least two kinds of repeat units where alkali solubility is increased by action of acid, and two kinds of repeat units have mutually different reaction activation energy of acidolysis group. The positive resist composition contains resin where the difference of the reaction activation energy is 40.0 kJ/mol or smaller. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种提供具有小线宽粗糙度的图案并形成具有大曝光宽容度的图案的正光刻胶组合物。 解决方案：正型抗蚀剂组合物含有至少两种重复单元，其中通过酸的作用增加碱溶解度，并且两种重复单元具有相互不同的酸解组的反应活化能。 正型抗蚀剂组合物含有反应活化能的差为40.0kJ / mol以下的树脂。 版权所有（C）2010，JPO＆INPIT