公开(公告)号：JP2008081538A

公开(公告)日：2008-04-10

申请号：JP2006260381

申请日：2006-09-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU

IPC: C08F38/00 ,  C08F2/00 ,  H01L21/312

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming insulated films having low dielectric constants and excellent mechanical strengths and used for interlayer films for electronic devices and the like, to provide a method for producing the same, to provide an interlayer insulated film for an electronic device and obtained from the composition, and to provide an electronic device using the insulated film as a layer-constituting layer.
SOLUTION: This method for producing a carbon-carbon triple bond-having compound is characterized by polymerizing the compound in a reaction process including (1) a process for heating a reaction solution containing the carbon-carbon triple bond-having compound at least at a radical-generating temperature of the radical-generating agent and (2) a process for adding a liquid containing a radical-generating agent to the reaction solution.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种用于形成具有低介电常数和优异机械强度的绝缘膜的组合物，并且用于电子器件等的中间膜，以提供其制造方法，以提供层间绝缘 从该组合物获得的电子器件用膜，提供使用该绝缘膜作为层构成层的电子器件。 解决方案：这种制备具有碳 - 碳三键的化合物的方法的特征在于在反应过程中使化合物聚合，所述反应过程包括（1）将含有碳 - 碳三键化合物的反应溶液加热到 至少在自由基产生剂的自由基产生温度下和（2）向反应溶液中加入含有自由基产生剂的液体的方法。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008038118A

公开(公告)日：2008-02-21

申请号：JP2006218460

申请日：2006-08-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KODAMA KUNIHIKO ,  IWATO KAORU ,  SATO KENICHIRO

IPC: C08F6/06 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a resin for photosensitive composition, from which high molecular weight component is removed, by a simple method and to provide a resin for resist produced by the method and a resist composition in which development defect and pattern collapse are improved by using the resin for resist and to provide a pattern-forming method using the resin for resist. SOLUTION: The method for producing the resin for photosensitive composition comprises a step for depositing a high-molecular weight component of the resin by bringing a resin solution in which the resin is dissolved in a solvent into contact with a solvent having low ability to dissolve the resin and removing the high-molecular weight component to provide the resin solution from which the high-molecular weight component is removed. The resin for resist is produced by the above method. The resist composition improved in development defect and pattern collapse is obtained by using the resin for resist produced by the method. The pattern-forming method is obtained by using the resist composition. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种通过简单的方法制备用于感光组合物树脂的高分子量组分的制备方法，并提供通过该方法制备的抗蚀剂树脂和抗蚀剂组合物，其中 通过使用树脂作为抗蚀剂来改善显影缺陷和图案塌陷，并提供使用该抗蚀剂树脂的图案形成方法。 解决方案：用于制备感光组合物树脂的方法包括通过将树脂溶解在溶剂中的树脂溶液与低能力的溶剂接触来沉积树脂的高分子量组分的步骤 溶解树脂并除去高分子量组分以提供除去高分子量组分的树脂溶液。 通过上述方法制造抗蚀剂用树脂。 通过使用通过该方法制造的抗蚀剂用树脂，获得显影缺陷的抗蚀剂组合物，并获得图案塌陷。 通过使用抗蚀剂组合物获得图案形成方法。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008013733A

公开(公告)日：2008-01-24

申请号：JP2006189266

申请日：2006-07-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KODAMA KUNIHIKO ,  IWATO KAORU

IPC: C08J3/14 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for efficiently producing a resin for resist without reducing resist properties, to provide the resin for the resist produced by the production method, to provide a resist composition having improved resolution and exposure latitude, and to provide a method for forming a pattern by using the resist composition. SOLUTION: The method for producing the resin for the resist involves a step for adding a solvent having a lower capacity for dissolving the resin to a resin solution to precipitate the powdery resin and collecting the powdery resin. The resin for the resist produced by the production method, the resist composition containing the resin for the resist, and the method for forming the pattern by using the resist are also provided. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决问题的方案：提供一种高效率地制造抗蚀剂用树脂而不降低抗蚀剂性能的方法，提供通过制造方法制造的抗蚀剂树脂，以提供具有改进的分辨率和曝光宽容度的抗蚀剂组合物，以及 以提供通过使用抗蚀剂组合物形成图案的方法。 解决方案：用于制造抗蚀剂树脂的方法包括将溶解树脂的能力较低的溶剂加入到树脂溶液中以沉淀粉末状树脂并收集粉末状树脂的步骤。 还提供了通过制造方法制造的抗蚀剂树脂，含有抗蚀剂用树脂的抗蚀剂组合物，以及通过使用抗蚀剂形成图案的方法。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007249074A

公开(公告)日：2007-09-27

申请号：JP2006075532

申请日：2006-03-17

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TARUYA SHINJI ,  TSUBAKI HIDEAKI ,  KODAMA KUNIHIKO ,  IWATO KAORU

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive composition that is used for processes of manufacturing semiconductors such as an IC, manufacturing circuit boards of liquid crystals, thermal heads or the like and for other photofabrication processes, and to provide a patterning method that uses the composition, wherein superior line width roughness (LWR) performance can be obtained. SOLUTION: The positive photosensitive composition comprises (A) a compound which generates acid by the irradiation of active rays or radiation; (B1) a resin, having a repeating unit having a polycyclic aliphatic group which is decomposed by acid to generate an alkali soluble group; and (B2) a resin, having a repeating unit that has a predetermined lactone structure and a repeating unit, having a monocyclic aliphatic group which is decomposed by acid and generates an alkali soluble group. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供用于制造半导体（例如IC），液晶，热敏头等的制造电路板和用于其它光制造工艺的半导体工艺的正性感光组合物，并提供图案化 使用该组合物的方法，其中可获得优异的线宽粗糙度（LWR）性能。 正光敏组合物包含（A）通过活性射线或辐射的照射产生酸的化合物; （B1）具有由酸分解以产生碱溶性基团的具有多环脂肪族基团的重复单元的树脂; 和（B2）具有具有预定内酯结构的重复单元的树脂和具有被酸分解并产生碱溶性基团的单环脂肪族基团的重复单元的树脂。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007178621A

公开(公告)日：2007-07-12

申请号：JP2005375705

申请日：2005-12-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KODAMA KUNIHIKO

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive resist composition for use in the production process of a semiconductor, such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes and a pattern forming method, using the positive resist composition, which are a positive resist composition capable of satisfying both of improvement of exposure latitude (EL) and pattern collapse and scum-preventing properties on a high level and a pattern-forming method by using the positive resist composition. SOLUTION: The positive resist composition comprises (A) a resin comprising at least two kinds of repeating units, having a cyano group, at least one of which is a repeating unit (A1) further having a lactone structure, and, having solubility in an alkali developer, increased by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. The pattern forming method using the positive resist composition is also provided. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供用于诸如IC的半导体的制造过程中的正性抗蚀剂组合物，用于制造液晶，热敏头等的电路基板或其它光制造工艺中，以及 使用正性抗蚀剂组合物的图案形成方法，其为能够同时满足曝光宽容度（EL）的提高和图案塌陷以及防浮渣性能的正性抗蚀剂组合物，并且通过使用图案形成方法 正抗蚀剂组成。 正型抗蚀剂组合物包含（A）包含至少两种具有氰基的重复单元的树脂，其中至少一种是还具有内酯结构的重复单元（A1），并且具有 在碱性显影剂中的溶解度由酸的作用而增加，和（B）在用光化射线或辐射照射时能够产生酸的化合物。 还提供了使用正性抗蚀剂组合物的图案形成方法。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2014178542A

公开(公告)日：2014-09-25

申请号：JP2013053055

申请日：2013-03-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TAKIZAWA HIROO ,  IWATO KAORU

IPC: G03F7/039 ,  C08F12/30 ,  C08F20/10 ,  C08F28/02 ,  C08F30/02 ,  G03F7/004 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F20/28 ,  C08F212/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/32 ,  C08F2220/281 ,  C08F232/08 ,  C08F220/18 ,  C08F2220/282

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method achieving excellent sensitivity, resolving power, LWR (line width roughness) and a pattern shape in forming a fine pattern having a line width of 60 nm or less, and to provide a composition kit, a resist film using the kit, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The pattern forming method includes the steps of: (1) forming a film on a substrate by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition; (2) forming a topcoat layer on the above film by using a topcoat composition comprising a resin (T) having at least one of repeating units expressed by general formulae (I-1) to (I-5) shown below; (3) exposing the film with the topcoat layer by using an electron beam or an extreme ultraviolet ray; and (4) developing the film with the topcoat layer after exposure to form a pattern.

Abstract translation: 要解决的问题：为了提供在形成线宽度为60nm以下的微细图案中实现优异的灵敏度，分辨率，LWR（线宽粗糙度）和图案形状的图案形成方法，并且提供组合试剂盒， 使用该试剂盒的抗蚀剂膜，电子器件的制造方法和电子器件。解决方案：图案形成方法包括以下步骤：（1）通过使用电子束敏感或极紫外线在基底上形成膜 射线敏感树脂组合物; （2）通过使用包含具有下述通式（I-1）至（I-5）表示的重复单元中的至少一种的树脂（T）的面漆组合物在上述膜上形成顶涂层; （3）通过使用电子束或极紫外线将该膜与顶涂层进行曝光; 和（4）在曝光后用面涂层显影膜以形成图案。

公开(公告)号：JP2013182023A

公开(公告)日：2013-09-12

申请号：JP2012043845

申请日：2012-02-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TOKUGAWA YOKO ,  KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  ITO JUNICHI ,  MATSUDA TOMOKI ,  IWATO KAORU ,  SUGIYAMA SHINICHI ,  TANGO NAOHIRO ,  FUKUHARA TOSHIAKI ,  YOSHITOME MASAHIRO

IPC: G03F7/004 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/22 ,  C07C311/09 ,  C07C381/12 ,  C08F220/28 ,  C09K3/00 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition excellent in DOF and pattern roughness characteristics such as LWR without much deterioration in performance over time; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin whose solubility in an alkaline developer is increased by the action of an acid, (B) a compound which is represented by the specified general formula (1) and generates an acid upon exposure to an actinic ray or radiation, and (C) a low molecular weight compound having on a nitrogen atom a group leaving by the action of an acid. (The meaning of each symbol in the formula is described in the claims.)

Abstract translation: 要解决的问题：提供：具有优异的DOF和图案粗糙度特性如LWR的光化射线敏感或辐射敏感性树脂组合物，随着时间的推移性能不会降低; 光化射线敏感或辐射敏感膜和使用该组合物的图案形成方法; 电子器件的制造方法和电子器件。光解射线敏感性或辐射敏感性树脂组合物含有（A）通过酸的作用使在碱性显影剂中的溶解度增加的树脂，（B）化合物 其由指定的通式（1）表示，并且在暴露于光化射线或辐射时产生酸，和（C）在氮原子上具有通过酸作用离去的基团的低分子量化合物。 （公式中每个符号的含义在权利要求中描述。）

公开(公告)号：JP2013137338A

公开(公告)日：2013-07-11

申请号：JP2011287025

申请日：2011-12-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： FUKUHARA TOSHIAKI ,  KATAOKA SHOHEI ,  TANGO NAOHIRO ,  SHIBUYA AKINORI ,  ITO JUNICHI ,  MATSUDA TOMOKI ,  IWATO KAORU ,  SUGIYAMA SHINICHI ,  YOSHITOME MASAHIRO ,  TOKUGAWA YOKO

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition, capable of forming a resist film that is excellent in a pattern cross-sectional shape and in suppressing occurrence of pattern collapse and defects attributed to residual water and is never deteriorated in performance of suppressing occurrence of the defects attributed to residual water and obtaining the excellent pattern cross-sectional shape even when the resist film is produced by using a resist solution left to stand for a certain time, to provide a resist film formed by using the composition, a pattern forming method using the composition, and to provide a method for manufacturing an electronic device and an electronic device.SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin having a repeating unit expressed by general formula (1) and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group; (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) a resin having at least any of a fluorine atom and a silicon atom. In general formula (1), L represents a single bond or a divalent connecting group, and Z represents a cyclic acid anhydride group.

Abstract translation: 要解决的问题：为了提供能够形成图案截面形状优异的抗蚀剂膜并抑制图案塌陷的发生和残留水分的缺陷的光化射线敏感性或辐射敏感性树脂组合物，并且为 即使当通过使用静置一定时间的抗蚀剂溶液制造抗蚀剂膜时，也不会降低由残留水引起的缺陷的发生的性能，并获得优异的图案横截面形状，以提供由 使用该组合物，使用该组合物的图案形成方法，并提供一种电子器件和电子器件的制造方法。解决方案：提供一种光化射线敏感或辐射敏感性树脂组合物，其包含：（A）树脂 具有由通式（1）表示的重复单元和通过酸的作用分解以产生碱的重复单元 流氓小组 （B）通过用光化射线或辐射照射产生酸的化合物; 和（C）至少具有氟原子和硅原子的任何一种的树脂。 在通式（1）中，L表示单键或二价连接基，Z表示环状酸酐基。

公开(公告)号：JP2013117693A

公开(公告)日：2013-06-13

申请号：JP2011266158

申请日：2011-12-05

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  SHIBUYA AKINORI

IPC: G03F7/004 ,  C07C309/04 ,  C07C309/09 ,  C07C309/11 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition allowing formation of a resist pattern showing further excellent development defect prevention performance compared to a conventional composition, fewer blob defects and an excellent profile, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device and an electronic device using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin having a cyclic carbonic acid ester structure, and decomposed by an action of an acid to increase the solubility with an alkali developing solution, and (B) a compound expressed by following general formula (B-I), generating an acid by irradiation with actinic rays or radiation. The composition is used for the resist film, the pattern forming method, the method for manufacturing an electronic device, and the electronic device. In general formula (B-I), Rrepresents a monovalent substituent having carbon number of one or more; and Mrepresents a sulfonium cation or an iodonium cation.

Abstract translation: 要解决的问题：提供与常规组合物相比显示出更好的显影缺陷防止性能的抗蚀剂图案的光化学射线敏感或辐射敏感性树脂组合物，更少的斑点缺陷和优异的轮廓，以及 提供抗蚀剂膜，图案形成方法，制造电子器件的方法和使用该组合物的电子器件。 光敏射线敏感性或辐射敏感性树脂组合物包含（A）具有环状碳酸酯结构的树脂，并且通过酸的作用分解以提高与碱性显影液的溶解度，和（ B）由以下通式（BI）表示的化合物，通过用光化射线或辐射照射产生酸。 该组合物用于抗蚀剂膜，图案形成方法，电子器件的制造方法和电子器件。 在通式（B-I）中，R 1 表示碳数为1以上的一价取代基; 并且M + 表示锍阳离子或碘鎓阳离子。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013080004A

公开(公告)日：2013-05-02

申请号：JP2011218548

申请日：2011-09-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  TSUBAKI HIDEAKI ,  HIRANO SHUJI

IPC: G03F7/038 ,  C08F212/14 ,  C08F220/30 ,  C08F232/08 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/11 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/2059 ,  G03F7/325 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition that is highly sensitive, capable of suppressing a pattern collapse after development and has a large residual film ratio, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device, and an electronic device using the same.SOLUTION: There is provided a pattern forming method including the steps of: (1) forming a film using an electron beam sensitive or extreme ultraviolet ray sensitive resin composition including, (A) a resin including a repeating unit having a partial structure represented by the following general formula (A0) in which a solubility of the resin in a developer having an organic solvent is decreased by an action of an acid, and (B) a compound that generates an acid by irradiation with an electron beam or an extreme ultraviolet ray; (2) exposing the film using the electron beam or the extreme ultraviolet ray; and (4) developing the exposed film using a developer having an organic solvent after exposure to form a negative pattern. In the general formula, Ar represents an aromatic ring group that links with a main chain of the resin (A) directly or indirectly, and, Rrepresents a hydrogen atom or a group to be eliminated by an action of an acid.

Abstract translation: 要解决的问题：为了提供高度敏感的光化射线敏感或辐射敏感性树脂组合物，能够抑制显影后的图案塌陷并具有大的残留膜比，并且提供抗蚀剂膜，形成图案 方法，电子设备的制造方法和使用该方法的电子设备。 解决方案：提供了一种图案形成方法，包括以下步骤：（1）使用电子束敏感或极紫外线敏感性树脂组合物形成膜，所述组合物包含：（A）包含具有部分结构的重复单元的树脂 由以下通式（A0）表示，其中树脂在具有有机溶剂的显影剂中的溶解度通过酸的作用而降低，和（B）通过用电子束照射产生酸的化合物或 极紫外线 （2）使用电子束或极紫外线曝光胶片; 和（4）在曝光后使用具有有机溶剂的显影剂显影曝光的薄膜以形成负图案。 在通式中，Ar表示直接或间接地与树脂（A）的主链连接的芳环基，R a 表示氢原子或基团 通过酸的作用消除。 版权所有（C）2013，JPO＆INPIT