公开(公告)号：JP2008203573A

公开(公告)日：2008-09-04

申请号：JP2007040067

申请日：2007-02-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： INAGAKI YOSHIO ,  KAWAMURA KOICHI

IPC: G03C1/675 ,  G03C11/00 ,  G11B7/24 ,  G11B7/244

CPC classification number: G03F7/2053 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a two-photon absorption photosensitive composition which excites two-photon absorption with a relatively low output laser, and utilizes energy in a highly excited state produced as the result of two-photon absorption for initiation energy of a chemical reaction such as polymerization, and also to provide a two-photon absorption optical recording medium using the same. SOLUTION: The photosensitive composition contains a binder polymer, a polymerizable compound and a compound represented by a general formula (I): D-L-A, wherein D represents a light absorption moiety comprising a two-photon absorption compound residue the two-photon absorption cross-sectional area of which at a wavelength longer than 400 nm is ≥100 GM; A represents an active moiety which interacts with the photoexcited light absorption moiety D and generates a free radical; and L represents a linking group which links the light absorption moiety D and the active moiety A together. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种双光子吸收光敏组合物，其以相对低的输出激光激发双光子吸收，并且利用作为引发能量的双光子吸收的结果产生的高激发态的能量 的化学反应如聚合，并且还提供使用其的双光子吸收光学记录介质。 光敏组合物含有粘合剂聚合物，可聚合化合物和由通式（I）表示的化合物：DLA，其中D表示包含双光子吸收化合物残基的光吸收部分，双光子吸收 波长在400nm以上的截面积≥100GG; A表示与光激发光吸收部分D相互作用并产生自由基的活性部分; L表示将光吸收部分D和活性部分A连接在一起的连接基团。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008083200A

公开(公告)日：2008-04-10

申请号：JP2006260971

申请日：2006-09-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SATO KOJI ,  KAWAMURA KOICHI ,  HIDA TSUTOMU ,  NAKAYAMA MASAYA ,  OGAWA TEPPEI

IPC: G03F7/40 ,  C08J7/18 ,  G03F7/38 ,  H01B13/00 ,  H01L21/3205 ,  H01L51/50 ,  H05B33/06 ,  H05K3/18

Abstract: PROBLEM TO BE SOLVED: To provide a graft polymer pattern forming method which achieves formation of a graft pattern of high resolution to which various functional materials can be attached, and which provides excellent adhesion of a graft polymer to a substrate, and a conductive pattern forming method which achieves formation of a metal film excellent in adhesion to a substrate and having small irregularity at the interface between the metal film and the substrate by using the graft polymer pattern forming method. SOLUTION: The graft polymer pattern forming method includes: (a) a step of forming a photosensitive resist pattern on a substrate; (b) a step of attaching a photopolymerization initiator to an area in which the photosensitive resist pattern is not formed on the substrate; (c) a step of stripping the photosensitive resist pattern; and (d) a step of forming a graft polymer in the area to which the photopolymerization initiator has been attached by bringing a compound having a double bond into contact with the entire surface of the substrate and applying energy to the entire surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决问题的方案：提供一种接枝聚合物图案形成方法，其能够形成能够附着各种功能材料的高分辨率的接枝图案，并且提供接枝聚合物对基材的优异粘附性，以及 导电图案形成方法，其通过使用接枝聚合物图案形成方法来实现形成具有优异的与基底的粘合性并且在金属膜和基底之间的界面处具有小的不规则性的金属膜。 解决方案：接枝聚合物图案形成方法包括：（a）在基材上形成光敏抗蚀剂图案的步骤; （b）将光聚合引发剂附着在基板上未形成感光性抗蚀剂图案的区域的工序; （c）剥离光敏抗蚀剂图案的步骤; 和（d）通过使具有双键的化合物与基板的整个表面接触并将能量施加到整个表面上而在已经附着光聚合引发剂的区域中形成接枝聚合物的步骤。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008006784A

公开(公告)日：2008-01-17

申请号：JP2006182290

申请日：2006-06-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： AOSHIMA TOSHIE ,  KAWAMURA KOICHI

IPC: B32B9/00

Abstract: PROBLEM TO BE SOLVED: To provide a super water-repellent material which has a water repellency-treated surface showing an excellent adhesion to a support and has a high anti-fouling property and its durability, and to provide its manufacturing method. SOLUTION: The super water-repellent material has a support and an organic-inorganic composite layer containing a crosslink structure formed by hydrolysis and condensation polymerization of alkoxide of an element selected from Si, Ti, Zr and Al in a graft polymer layer composed of a graft polymer chain directly bonded to the support surface, and has a water repellency-treated uneven surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种具有拒水性处理表面，对支撑体表现出优异粘附性并具有高防污性和耐久性的超级防水材料，并提供其制造方法。 解决方案：超疏水材料具有载体和含有通过在接枝聚合物层中选自Si，Ti，Zr和Al的元素的醇盐的醇盐的水解和缩聚形成的交联结构的有机 - 无机复合层 由直接结合到支撑表面的接枝聚合物链组成，并且具有防水处理的凹凸表面。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007256270A

公开(公告)日：2007-10-04

申请号：JP2007041607

申请日：2007-02-22

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： NISHIMI TAISEI ,  KAWAMURA KOICHI

IPC: G01N33/543 ,  G01N21/27 ,  G01N33/547 ,  G01N33/553

Abstract: PROBLEM TO BE SOLVED: To provide a method for simply immobilizing hydrogel, capable of immobilizing a physiologically active substance on a surface of a biosensor by using a safe material. SOLUTION: This method for manufacturing a biosensor, comprising a substrate coated with a hydrophilic polymer, includes the bonding of the hydrophilic polymer to a surface of the substrate via a covalent bond to a reactive group, by giving external stimulus to the hydrophilic polymer with the hydrophilic polymer, capable of forming the covalent bond to the reactive group, that is kept in contact with the substrate, after making a compound that generates the reactive group due to the external stimulus bond with the surface of the substrate. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种简单地固定水凝胶的方法，其能够通过使用安全材料将生理活性物质固定在生物传感器的表面上。 解决方案：用于制造生物传感器的方法，包括涂布有亲水性聚合物的基材，包括通过共价键将亲水性聚合物与基材的表面键合到反应性基团上，通过向亲水性聚合物外部刺激 聚合物与亲水性聚合物一起形成与反应性基团的共价键，该反应性基团由于与基材的表面的外部刺激键而产生反应性基团而与基材保持接触。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011079877A

公开(公告)日：2011-04-21

申请号：JP2009230774

申请日：2009-10-02

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI ,  MATSUMURA SUEHIKO ,  TAKANO YUKIO

IPC: C08F299/00 ,  C08F4/00

Abstract: PROBLEM TO BE SOLVED: To provide a polymeric ultrathin film and a pattern thereof, having little variance in the film thickness and excellent adhesiveness to a substrate, showing sufficient pattern resolution by irradiation exposure to electron beams, short-wavelength exposure light or the like, and having a structure controlled in a nanometer level, and to provide a method for forming a polymeric ultrathin film pattern. SOLUTION: The polymeric ultrathin film is formed on a substrate surface through direct coupling of a polymer having a radical polymerizable group with the substrate surface that can generates a radical by exposure, wherein the radical polymerizable group is an α-site substituted acryloyl group expressed by formula (1) and the film has a film thickness of 1 to 10 nm. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种聚合物超薄膜及其图案，其膜厚度差异性和对基材的粘合性优异，通过照射暴露于电子束，短波长曝光光或者 并且具有以纳米级控制的结构，并且提供形成聚合超薄膜图案的方法。 解决方案：聚合物超薄膜通过具有自由基聚合性基团的聚合物与可以通过暴露产生自由基的基材表面的直接偶合形成在基材表面上，其中自由基聚合性基团是α-位取代的丙烯酰基 （1）表示的膜，膜的膜厚为1〜10nm。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2008248181A

公开(公告)日：2008-10-16

申请号：JP2007093707

申请日：2007-03-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWANAGA HIROSHI ,  KAWAMURA KOICHI

IPC: C08J9/36

Abstract: PROBLEM TO BE SOLVED: To provide a porous film usable for various applications, by suitably modifying the surface of the porous film, and a method for producing the same. SOLUTION: The porous film 12 having a large number of pores 18 formed therein and a hydrophilic graft polymer 14 on surfaces of the pores is provided. Preferably, the porous film is produced by a process comprising a step of forming a film of an organic solvent solution by applying an organic solvent and the organic solvent solution containing a polymer compound, a step of forming the porous film in which holes are formed where droplets are vaporized by forming the droplets in the film of the organic solvent solution and vaporizing the organic solvent in the film and the droplets and a step of applying the hydrophilic graft polymer on the surface of the porous film. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：通过适当地改性多孔膜的表面，提供可用于各种应用的多孔膜及其制造方法。 解决方案：提供其中形成有大量孔18的多孔膜12和在孔的表面上的亲水性接枝聚合物14。 优选地，通过包括通过施加有机溶剂和含有高分子化合物的有机溶剂溶液形成有机溶剂溶液膜的步骤的方法制备多孔膜，形成其中形成有空穴的多孔膜的步骤 通过在有机溶剂溶液的膜中形成液滴并蒸发薄膜和液滴中的有机溶剂并使亲水接枝聚合物在多孔膜的表面上施加的步骤，使液滴蒸发。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008201913A

公开(公告)日：2008-09-04

申请号：JP2007040026

申请日：2007-02-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI

IPC: C08G59/68

CPC classification number: C08F2/50

Abstract: PROBLEM TO BE SOLVED: To provide a photopolymerizable composition which has a high sensitivity and shows little coloration.
SOLUTION: The photopolymerizable composition comprises a cationically polymerizable compound and a cation generator represented by formula (1): D-L-A (wherein D is a light-absorbing moiety showing an absorption having an absorption coefficient of ≥1,000 in a wavelength range longer than 300 nm; A is an active moiety which interacts with the light-excited light-absorbing moiety D to generate a cation; and L is a linking group which links the light-absorbing moiety D with the active moiety A).
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高灵敏度且显色性低的可光聚合组合物。 光聚合性组合物包含阳离子聚合性化合物和由式（1）表示的阳离子发生剂：DLA（其中D是在比波长范围长的吸收系数≥1000的吸光部分， 300nm; A是与光激发光吸收部分D相互作用以产生阳离子的活性部分; L是将光吸收部分D与活性部分A）连接的连接基团。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008201912A

公开(公告)日：2008-09-04

申请号：JP2007040021

申请日：2007-02-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAWAMURA KOICHI

IPC: C08F2/50 ,  C09B23/00 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a photopolymerizable composition which has a high sensitivity and is excellent in polymerizability. SOLUTION: The photopolymerizable composition comprises a polymerizable compound having an ethylenically unsaturated bond, a free-radical generator represented by formula (1): D-L-A (wherein D is a light-absorbing moiety showing an absorption having an absorption coefficient of ≥1,000 in a wavelength range longer than 300 nm; A is an active moiety which interacts with the light-excited light-absorbing moiety D to generate a radical; and L is a linking group which links the light-absorbing moiety D with the active moiety A) and a cosensitizer. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决的问题：提供具有高灵敏度和聚合性优异的光聚合性组合物。 光聚合性组合物包含具有烯键式不饱和键的聚合性化合物，式（1）表示的自由基发生剂：DLA（其中，D表示吸收系数≥1000的吸光部分 在长于300nm的波长范围内; A是与光激发光吸收部分D相互作用以产生自由基的活性部分; L是连接光吸收部分D与活性部分A的连接基团 ）和增感剂。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008201888A

公开(公告)日：2008-09-04

申请号：JP2007039305

申请日：2007-02-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： AMAMIYA TAKUMA ,  NAKAI YOSHIHIRO ,  KAWAMURA KOICHI ,  UCHIDA OSAMU

IPC: C08F2/50 ,  C07D409/04 ,  C07D409/14 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a photo-polymerization initiator having high sensitivity even in a small addition amount, a photo-polymerizable composition containing it, and a photo-curing method. SOLUTION: The photo-polymerization initiator is represented by general formula (I): D-L-A represented by an exemplary compound of the formula. In general formula (I), D represents a light absorption part having a specific structure, A represents an activation part for generating a free group, and L represents a connection group for connecting the light absorption part D and the activation part A. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决的问题：为了提供即使以小的添加量具有高灵敏度的光聚合引发剂，含有它的光聚合组合物和光固化方法。 解决方案：光聚合引发剂由通式（I）表示：由具有下式的示例性化合物表示的D-L-A。 在通式（I）中，D表示具有特定结构的光吸收部分，A表示用于产生游离基团的活化部分，L表示用于连接光吸收部分D和活化部分A的连接基团。

版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008104411A

公开(公告)日：2008-05-08

申请号：JP2006290645

申请日：2006-10-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： OZEKI KATSUHISA ,  NEMORI RIYOUICHI ,  KOBAYASHI TAKAYUKI ,  KAWAMURA KOICHI

IPC: C12M3/00 ,  C12N5/07 ,  C12N5/071

CPC classification number: C12M23/20 ,  C12M25/00

Abstract: PROBLEM TO BE SOLVED: To provide a substrate enabling the culture, peeling and recovery of cells and to provide a method for producing the substrate.
SOLUTION: The substrate is composed of a supporting member having a surface coating layer composed of a heat-responsive polymer, wherein the average coating rate of the heat-responsive polymer is 1.0-10.0 μg/cm
2 and the in-plane variation coefficient of the coating rate of the polymer is ≤30%.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够进行细胞的培养，剥离和回收的基材，并提供一种生产该基材的方法。 解决方案：基材由具有由热响应性聚合物构成的表面被覆层的支撑体构成，其中，热响应性聚合物的平均涂布速度为1.0〜10.0μg/ cm 2， SP>，聚合物的涂布速度的面内变化系数≤30％。 版权所有（C）2008，JPO＆INPIT