公开(公告)号：JP2014078681A

公开(公告)日：2014-05-01

申请号：JP2013073980

申请日：2013-03-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MATSUSHITA YASUAKI ,  MATSUMURA SUEHIKO

IPC: H05K1/09 ,  C07C69/732 ,  C07D249/18 ,  C07D285/125 ,  C08F8/00 ,  C08F220/32 ,  C23C24/08

CPC classification number: H05K1/0353 ,  H05K1/092 ,  H05K3/247 ,  H05K2201/0769

Abstract: PROBLEM TO BE SOLVED: To provide a wiring board excellent in a conductive property and an ion migration suppression function of a wiring layer.SOLUTION: A wiring board comprises: an insulation substrate; and a wiring layer including a first metal layer arranged on the insulation substrate and a second metal layer arranged so as to cover a surface of the first metal layer, which does not contact the insulation substrate. A thickness of the second metal layer is 1/10 of an entire thickness of the wiring layer. The wiring layer includes a migration inhibitor in which a mass Y of the migration inhibitor included in the second metal layer is larger than a mass X of the migration inhibitor included in the first metal layer.

Abstract translation: 要解决的问题：提供布线层的导电性和离子迁移抑制功能优异的布线基板。布线板包括：绝缘基板; 以及布线层，包括布置在所述绝缘基板上的第一金属层和布置成覆盖不接触所述绝缘基板的所述第一金属层的表面的第二金属层。 第二金属层的厚度为布线层整体厚度的1/10。 布线层包括迁移抑制剂，其中包含在第二金属层中的迁移抑制剂的质量Y大于包含在第一金属层中的迁移抑制剂的质量X.

公开(公告)号：JP2013145278A

公开(公告)日：2013-07-25

申请号：JP2012005064

申请日：2012-01-13

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： HIRONAKA KOJI ,  ARIOKA DAISUKE ,  ISOBE HIDEMI ,  MATSUSHITA YASUAKI

IPC: G03F7/027 ,  C08F299/00 ,  G03F7/004 ,  G03F7/031 ,  G03F7/09

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition suitable for forming a solder resist excellent in insulating property as well as in folding resistance.SOLUTION: The photosensitive resin composition comprises (A) an acid-modified ethylenically unsaturated group-containing polyurethane resin, (B) a radical polymerizable compound, (C) a thermal crosslinking agent and (D) a photopolymerization initiator having two oxime ester groups in the molecule. The (A) polyurethane resin has a partial structure expressed by general formula (U1). In general formula (U1), Lrepresents a divalent connecting group including neither an ethylenically unsaturated group nor a carboxyl group.

Abstract translation: 要解决的问题：提供适于形成绝缘性能和耐折叠性优异的阻焊剂的感光性树脂组合物。溶解性：感光性树脂组合物含有（A）含酸烯键式不饱和基团的聚氨酯树脂， （B）自由基聚合性化合物，（C）热交联剂和（D）分子中具有两个肟酯基的光聚合引发剂。 （A）聚氨酯树脂具有由通式（U1）表示的部分结构。 在通式（U1）中，L表示不包括烯键式不饱和基团和羧基的二价连接基团。

公开(公告)号：JP2012208391A

公开(公告)日：2012-10-25

申请号：JP2011075092

申请日：2011-03-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MATSUSHITA YASUAKI

IPC: G02B5/00 ,  C09D11/00 ,  C09D11/322 ,  C09D11/324 ,  C09D11/38 ,  G02B3/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical lens with a light-shielding material, by which an optical lens with a light-shielding material having an excellent light-shielding property and low glossiness can be effectively manufactured.SOLUTION: An optical lens 20 with a light-shielding material is obtained by performing an ink applying step of applying ink 12 for forming a light-shielding material, which contains a predetermined component and has a viscosity equal to or less than 25 mPa s, to an optical lens 10 by an ink jet method, a temporarily hardening step of hardening an outermost surface 14 of the applied ink by light exposure while leaving an unhardened part 16 inside the applied ink, and a full hardening step of hardening the unhardened part 16 inside the ink, which has been applied by heating treatment or light-exposure treatment, to obtain a light-shielding material 18 having concavo-convex shapes on its surface.

Abstract translation: 解决的问题：提供一种制造具有遮光材料的光学透镜的方法，通过该方法可以有效地制造具有优异的遮光性和低光泽度的遮光材料的光学透镜。 解决方案：具有遮光材料的光学透镜20通过执行油墨施加步骤获得，该涂墨步骤施加用于形成遮光材料的油墨12，其含有预定组分并且具有等于或小于25的粘度 mPa·s，通过喷墨法到达光学透镜10，暂时硬化步骤，通过曝光使所施加的油墨的最外表面14硬化，同时在施加的油墨中留下未硬化部分16，并且将硬化步骤 通过加热处理或曝光处理而施加的油墨内的未硬化部16，以获得其表面具有凹凸形状的遮光材料18。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011148950A

公开(公告)日：2011-08-04

申请号：JP2010013289

申请日：2010-01-25

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MATSUSHITA YASUAKI

IPC: C08F2/44 ,  C09D11/00 ,  C09D11/328 ,  C09D11/38 ,  G02B5/20 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a curable composition for blue or magenta formable of a color pixel that exhibits good luminance and hue and is excellent in heat resistance and chemical resistance and applicable to a thermosetting process.
SOLUTION: The curable composition contains a dipyrromethene-based dye, a polymerizable monomer, an organic solvent, and a hydrogen donating compound which has at least two predetermined functional groups and is solid at 25°C and under atmospheric pressure.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种呈现出良好的亮度和色调并具有优异的耐热性和耐化学性的彩色像素的蓝色或品红色可固化组合物，并且适用于热固性处理。 解决方案：可固化组合物含有二吡咯亚甲基染料，可聚合单体，有机溶剂和给氢化合物，其具有至少两个预定的官能团，并且在25℃和大气压下为固体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011012256A

公开(公告)日：2011-01-20

申请号：JP2010128007

申请日：2010-06-03

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MATSUSHITA YASUAKI

IPC: B41M5/00 ,  C09D11/00 ,  C09D11/326 ,  C09D11/328 ,  C09D11/38 ,  C09D11/40 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide an ink set for inkjet from which a color filter having excellent chemical resistance, color reproducibility and the like can be produced, to provide the color filter obtained by using the ink set for the inkjet, to provide a method for producing the color filter, and to provide an image display device.SOLUTION: The ink set for inkjet includes an ink for the inkjet which contains an organic solvent-soluble dye, a polymerizable monomer and an organic solvent, and in which the polymerizable monomer exhibits a prescribed octanol/water distribution coefficient ClogP.

Abstract translation: 要解决的问题：为了提供可以制造具有优异的耐化学性，色彩再现性等的滤色器的喷墨用油墨组件，以提供通过使用用于喷墨的油墨组获得的滤色器，以提供一种方法 用于制造滤色器，并提供图像显示装置。解决方案：用于喷墨的油墨组包括用于喷墨的油墨，其包含有机溶剂可溶性染料，可聚合单体和有机溶剂，并且其中可聚合单体 表现出规定的辛醇/水分配系数ClogP。

公开(公告)号：JP2009192736A

公开(公告)日：2009-08-27

申请号：JP2008032169

申请日：2008-02-13

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SOEJIMA SUSUMU ,  MATSUSHITA YASUAKI

IPC: G03F1/54 ,  G03F1/56

Abstract: PROBLEM TO BE SOLVED: To provide a light-shielding material excellent in light-shielding property against UV light (in particular, i-line near 365 nm) suitably used for a photomask, with which an image with high resolution can be formed with high accuracy, and to provide a method for producing the material. SOLUTION: The light-shielding material has, on a glass substrate, a light-shielding film containing silver fine particles that absorb exposure light, and a binder, wherein the frequency of silver fine particles having a diameter L of 3 nm to 30 nm is ≥95% in the light-shielding film. There is also provided a method for producing the light-shielding material. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供适合用于光掩模的紫外线（特别是365nm附近的i线）的遮光性优异的遮光材料，具有高分辨率的图像可以是 高精度地形成，并且提供一种生产该材料的方法。 解决方案：遮光材料在玻璃基板上具有含有吸收曝光的银微粒的遮光膜和粘合剂，其中直径L为3nm的银微粒的频率为 30nm在遮光膜中≥95％。 还提供了一种制造遮光材料的方法。 版权所有（C）2009，JPO＆INPIT