公开(公告)号：JP2011237769A

公开(公告)日：2011-11-24

申请号：JP2011052964

申请日：2011-03-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NARUSE HIDENORI ,  TAKAMI TOMOHIRO ,  LIU ZHENG WAN ,  KAJITA TORU

IPC: G02B5/20 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/027

Abstract: PROBLEM TO BE SOLVED: To provide a color filter coloring composition which is excellent in chromaticity characteristic and has good development property and storage stability.SOLUTION: A color filter coloring composition includes following components (A), (B) and (C); (A) a colorant including pigment, (B) a blocked polymer having repeating units expressed by the following formula (1), repeating units expressed by the following formula (2) and repeating units (3) with acid groups and having a A-block including the repeating units (1) and a B-block having the repeating units (2) and the repeating units (3), and (C) a cross-linking agent.

Abstract translation: 要解决的问题：提供一种色度特性优异且显影性好，保存稳定性好的滤色器着色组合物。 滤色器着色组合物包含以下组分（A），（B）和（C）; （A）包含颜料的着色剂，（B）具有由下式（1）表示的重复单元的嵌段聚合物，由下式（2）表示的重复单元和具有酸基的重复单元（3） 包含重复单元（1）和具有重复单元（2）和重复单元（3）的B嵌段的嵌段，和（C）交联剂。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010049238A

公开(公告)日：2010-03-04

申请号：JP2009143083

申请日：2009-06-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/031 ,  C08F2/44 ,  G02F1/1339 ,  G03F7/033 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which, even when a short wavelength cut-off light source is used, exhibits high sensitivity and gives an adequate spacer shape, e.g., with an amount of light exposure of ≤1,000 J/m 2 , and which enables to form a spacer for a liquid crystal display element excellent in elastic recovery property, rubbing resistance, adhesion to a transparent substrate, heat resistance and the like. SOLUTION: The radiation-sensitive resin composition contains (A) a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound other than (a1), (B) a polymerizable unsaturated compound, and (C) a specific oxime ester typified by the compound No.1. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种辐射敏感性树脂组合物，其即使在使用短波长截止光源时也显示出高灵敏度并且产生足够的间隔物形状，例如， ≤1,000J/ m 2 ，能够形成弹性恢复性，耐摩擦性，对透明基板的粘附性，耐热性等优异的液晶显示元件的间隔物。 解决方案：辐射敏感性树脂组合物含有（A）（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）除（a1）以外的不饱和化合物， ，（B）可聚合不饱和化合物，（C）以化合物No.1为代表的特定肟酯。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009075329A

公开(公告)日：2009-04-09

申请号：JP2007243728

申请日：2007-09-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/023 ,  C08F220/32 ,  G02B1/04 ,  G03F7/004 ,  G03F7/075 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming an interlayer dielectric excellent in adhesion and various resistances under a baking condition of ≤200°C when used to form the interlayer dielectric, and capable of forming microlenses having a good melt shape when used to form microlenses. SOLUTION: The radiation-sensitive resin composition comprises [A] a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound other than the component (a1), [B] a 1,2-quinonediazide compound, and [C] a specific onium-fluorinated alkylfluorophosphate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够形成层状电介质的辐射敏感性树脂组合物，当用于形成层间电介质时，在≤200℃的烘烤条件下，在粘合性和各种电阻上具有优异的层间电介质，并且能够形成微透镜 当用于形成微透镜时具有良好的熔体形状。 解决方案：辐射敏感性树脂组合物包含[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）不同于组分（ a1），[B] 1,2-醌二叠氮化合物和[C]特定的氟化氟化烷基氟磷酸酯。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009075326A

公开(公告)日：2009-04-09

申请号：JP2007243718

申请日：2007-09-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  HANAMURA MASAAKI ,  KAJITA TORU

IPC: G03F7/023 ,  G02B1/04 ,  G03F7/004 ,  G03F7/075 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming an interlayer dielectric excellent in adhesion and various resistances under a baking condition of ≤200°C when used to form the interlayer dielectric, and capable of forming microlenses having a good melt shape when used to form microlenses. SOLUTION: The radiation-sensitive resin composition comprises (A) a polysiloxane having at least one group selected from the group consisting of an oxiranyl group and an oxetanyl group, and a functional group capable of addition reaction to an oxiranyl group or an oxetanyl group, (B) a 1,2-quinonediazide compound, and (C) a specific onium-fluorinated alkylfluorophosphate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够形成层状电介质的辐射敏感性树脂组合物，当用于形成层间电介质时，在≤200℃的烘烤条件下，在粘合性和各种电阻上具有优异的层间电介质，并且能够形成微透镜 当用于形成微透镜时具有良好的熔体形状。 解决方案：辐射敏感性树脂组合物包含（A）具有至少一个选自环氧乙烷基和氧杂环丁烷基的基团的聚硅氧烷，以及能够与环氧乙烷基或 氧杂环丁烷基，（B）1,2-醌二叠氮化合物，和（C）特定的氟化氟化烷基氟磷酸酯。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007249056A

公开(公告)日：2007-09-27

申请号：JP2006075405

申请日：2006-03-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  HAMADA KENICHI ,  KAJITA TORU

IPC: G03F7/004 ,  G02F1/1339 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition for spacers which has ample process margin and high sensitivity, is capable of easily forming spacers that are superior in various performances, such as cross-sectional form, compressive strength, rubbing resistance and adhesion to a transparent substrate, does not require extension of developing time nor post-baking time in a spacer-forming process, and excels in storage stability. SOLUTION: The radiation-sensitive resin composition contains a copolymer of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, at least one unsaturated compound containing an onium salt structure selected from an unsaturated compound containing a sulfonium salt structure and an unsaturated compound containing an iodonium salt structure, (meth)acrylic esters of oxetane, and another unsaturated compound that differs from any of these compounds. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有充分的工艺余量和高灵敏度的用于间隔物的辐射敏感性树脂组合物，能够容易地形成各种性能优异的间隔物，例如横截面形状，抗压强度， 对透明基材的耐擦伤性和粘合性不需要在间隔物形成工序中延长显影时间，也不需要后烘烤时间，并且存储稳定性优异。 解决方案：辐射敏感性树脂组合物包含不饱和羧酸和/或不饱和羧酸酐的共聚物，至少一种含有鎓盐结构的不饱和化合物，其选自含有锍盐结构的不饱和化合物和 含有碘鎓盐结构的不饱和化合物，氧杂环丁烷的（甲基）丙烯酸酯，以及不同于这些化合物的其它不饱和化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007128062A

公开(公告)日：2007-05-24

申请号：JP2006273678

申请日：2006-10-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAJITA TORU ,  KAWAMOTO TATSUYOSHI ,  MATSUMOTO TATSU ,  ICHINOHE DAIGO

IPC: G02F1/1339 ,  C08F4/40 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high radiation sensitivity and sufficiently high resolution, excels in adhesion to a substrate, a base or an upper layer, and suppresses generation of a sublimate during baking in a film forming process. SOLUTION: The radiation-sensitive resin composition contains (A) a polymer obtained by living radical polymerization in the presence of a specific thiocarbonyl thio compound and having carboxyl groups, wherein the ratio (Mw/Mn) between weight average molecular weight (Mw) and number average molecular weight (Mn) in terms of polystyrene measured by gel permeation chromatography is ≤1.7, (B) a polymerizable unsaturated compound and (C) a radiation-sensitive polymerization initiator. The composition is used for forming spacers. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：为了提供具有高辐射敏感性和足够高分辨率的辐射敏感性树脂组合物，对基材，基底或上层的粘附性优异，并且抑制在烘烤过程中产生升华 成膜工艺。 解决方案：辐射敏感性树脂组合物含有（A）在特定硫代羰基硫代化合物存在下具有羧基的活性自由基聚合获得的聚合物，其中重均分子量（Mw / Mw）和通过凝胶渗透色谱法测定的聚苯乙烯换算的数均分子量（Mn）≤1.7，（B）聚合性不饱和化合物和（C）辐射敏感性聚合引发剂。 该组合物用于形成间隔物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007065607A

公开(公告)日：2007-03-15

申请号：JP2005325817

申请日：2005-11-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  NISHIO HISAHIRO ,  HAMAGUCHI HITOSHI ,  IWABUCHI TOMOKO ,  YONEKURA ISAMU ,  KAJITA TORU

IPC: G03F7/031 ,  G02F1/1339 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of faithfully reproducing the design size of a mask pattern with high sensitivity, superior in adhesion to a substrate, capable of giving satisfactory spacer shape and film thickness with an exposure energy of ≤1,500 J/m 2 , superior also in strength and heat resistance, excellent in controllability of spacer shape and film thickness in a low exposure energy region, less liable to generate foreign substances during the storage period and during use, and capable of forming spacers for a display panel that is superior in process stability and temporal stability, and to provide spacers for a display panel and a display panel. SOLUTION: The photosensitive resin composition contains [A] a copolymer of (a1) an ethylenically unsaturated carboxylic acid and/or an ethylenically unsaturated carboxylic acid anhydride and (a2) another ethylenically unsaturated compound, [B] a polymerizable compound having an ethylenically unsaturated bond, and [C] an o-acyloxime type photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够以高灵敏度忠实地再现掩模图案的设计尺寸的感光性树脂组合物，其对基材的粘附性优异，能够以曝光能量赋予令人满意的间隔物形状和膜厚度 ≤1,500J/ m 2 ，在强度和耐热性方面也优异，在低曝光能量区域中间隔物形状和膜厚度的可控性优异，在储存期间和期间不太可能产生异物 使用并且能够形成用于显示面板的间隔物，该显示面板的工艺稳定性和时间稳定性优异，并且为显示面板和显示面板提供间隔物。 解决方案：感光性树脂组合物含有[a1]烯键式不饱和羧酸和/或烯属不饱和羧酸酐的共聚物和（a2）另一种烯属不饱和化合物，[B]具有 烯键式不饱和键，和[C]邻酰肟型光聚合引发剂。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006309157A

公开(公告)日：2006-11-09

申请号：JP2006030545

申请日：2006-02-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  HAMAGUCHI HITOSHI ,  KAJITA TORU

IPC: G02F1/1339 ,  G03F7/031 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is suitably used for simultaneously forming protrusions and spacers of a vertical alignment liquid crystal display element. SOLUTION: The radiation-sensitive resin composition for simultaneously forming the protrusions and the spacers for the vertical alignment liquid crystal display element is characterized to contain: a copolymer [A], obtained by copolymerizing an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride (a1), and an unsaturated compound (a2) other than the component (a1), a polymerizable unsaturated compound [B], and a radiation-sensitive polymerization initiator [C] having a specified structure, represented by ethanone, 1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylmethoxy benzoyl)-9.H.-carbazole-3-yl]-, 1-(O-acetyloxime). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供适合用于同时形成垂直取向液晶显示元件的突起和间隔物的辐射敏感性树脂组合物。 解决方案：用于同时形成突起的辐射敏感性树脂组合物和用于垂直取向液晶显示元件的间隔物的特征在于包含：通过使不饱和羧酸和/或不饱和羧酸共聚得到的共聚物[A] 羧酸酐（a1）和不同于组分（a1）的不饱和化合物（a2），可聚合不饱和化合物[B]和具有特定结构的辐射敏感聚合引发剂[C]，由乙酮代表，1 - [9-乙基-6-（2-甲基-4-四氢呋喃基甲氧基苯甲酰基）-9.H-咔唑-3-基] - ，1-（O-乙酰肟）。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005227525A

公开(公告)日：2005-08-25

申请号：JP2004035973

申请日：2004-02-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  IWABUCHI TOMOKO ,  NISHIO HISAHIRO ,  KAJITA TORU

IPC: G03F7/031 ,  G02B5/20 ,  G02F1/13 ,  G02F1/1339 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high sensitivity, capable of faithfully reproducing the design sizes of a mask pattern, excellent in adhesiveness to a substrate, capable of achieving a satisfactory space shape and thickness even with a light exposure of ≤1,500 J/m 2 , and capable of forming spacers for a display panel excellent also in compressive strength and rubbing resistance. SOLUTION: The radiation sensitive resin composition contains as essential components a copolymer of (a1) an unsaturated carboxylic acid and/or an ethylenically unsaturated carboxylic acid anhydride, (a2) an epoxy-containing unsaturated compound and (a3) another unsaturated compound, a polymerizable compound having an ethylenically unsaturated bond, and a compound represented by formula (1) or formula (2). In the formulae (1) and (2), R 1 denotes alkyl or phenyl; R 2 denotes H, alkyl or phenyl; and R 3 denotes H or alkyl. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供具有高灵敏度的辐射敏感性树脂组合物，能够忠实地再现掩模图案的设计尺寸，对基材的粘合性优异，即使使用具有良好的空间形状和厚度也能实现令人满意的空间形状和厚度 曝光≤1,500J/ m 2 ，并且能够形成耐压强度和耐摩擦性优异的显示面板用间隔物。 解决方案：辐射敏感性树脂组合物含有（a1）不饱和羧酸和/或烯键式不饱和羧酸酐的共聚物，（a2）含环氧基的不饱和化合物和（a3）另一种不饱和化合物 ，具有烯键式不饱和键的可聚合化合物和由式（1）或式（2）表示的化合物。 在式（1）和（2）中，R“1”表示烷基或苯基; R 2 表示H，烷基或苯基; R 3表示H或烷基。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003005372A

公开(公告)日：2003-01-08

申请号：JP2001185662

申请日：2001-06-19

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： SANO KIMIYASU ,  MISHIMA KENJI ,  KAJITA TORU ,  MIYAMATSU TAKASHI

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency particularly to ArF excimer laser light and excellent in basic solid state properties as a resist such as sensitivity, resolution and pattern shape.
SOLUTION: The radiation sensitive resin composition contains (A) an acid dissociable group-containing resin which is made alkali-soluble by the action of an acid, such as a copolymer of an unsaturated ether typified by n-butyl vinyl ether or 3,4-dihydro-2H-pyran, maleic anhydride and 2-methyl-2-adamantyl (meth)acrylate and (B) a radiation sensitive acid generator typified by 2,5- hexylene-(1-n-butoxynapht-4-yl) sulfonium nonafluoro-n-butanesulfonate, 4-(2- norbornylmethoxy)naphthyltetrahydrothiophenium nonafluoro-n-butanesulfonate or 2,5-hexylene-(1-hydroxy-2,6-dimethylphen-4-yl)sulfonium nonafluoro-n- butanesulfonate.
COPYRIGHT: (C)2003,JPO

Abstract translation: 要解决的问题：提供具有高透明度的辐射敏感性树脂组合物，特别是ArF准分子激光，并且具有优异的基本固态特性，作为诸如灵敏度，分辨率和图案形状的抗蚀剂。 解决方案：辐射敏感性树脂组合物含有（A）含酸解离基团的树脂，其通过酸的作用而制成碱溶性，例如以正丁基乙烯基醚为代表的不饱和醚或3,4 - 二氢-2H-吡喃，马来酸酐和（甲基）丙烯酸2-甲基-2-金刚烷酯和（B）以2,5-亚己基 - （1-正丁氧基萘-4-基）锍为代表的辐射敏感酸产生剂 九氟正丁磺酸盐，4-（2-降冰片基甲氧基）萘基四氢噻吩六氟正丁磺酸盐或2,5-亚己基 - （1-羟基-2,6-二甲基苯-4-基）锍九氟正丁基磺酸盐。