公开(公告)号：JP2012118279A

公开(公告)日：2012-06-21

申请号：JP2010267683

申请日：2010-11-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHI NOBUHIRO ,  KODAMA SEIICHIRO ,  MATSUMOTO KIMINARI

IPC: G03F7/033 ,  C08F220/34 ,  G02F1/1333 ,  G02F1/1339 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having full resolution even when fired at a low temperature, a cured film for a display element excellent in heat resistance, chemical resistance, transmissivity and curability, and the display element excellent in voltage retaining ratio.SOLUTION: A radiation-sensitive resin composition contains [A] a copolymer containing 1-35 mol% of (a1) structural unit represented by the following formula (1), [B] a polymerizable compound having an ethylenically unsaturated bond, and [C] a radiation-sensitive polymerization initiator.

Abstract translation: 要解决的问题：为了提供即使在低温下烧制时具有全分辨率的辐射敏感性树脂组合物，耐热性，耐化学性，透光性和固化性优异的显示元件用固化膜和显示元件 电压保持率优异。 解决方案：辐射敏感性树脂组合物含有[A]含有1-35mol％（a1）由下式（1）表示的结构单元的共聚物，[B]具有烯键式不饱和键的可聚合化合物， 和[C]辐射敏感聚合引发剂。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012107192A

公开(公告)日：2012-06-07

申请号：JP2011133572

申请日：2011-06-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  EHATA SATOSHI ,  YOSHIZAWA EITETSU ,  YAMAGUCHI MURASAKI ,  ITO JUNJI

IPC: C09B67/20 ,  C09B11/28 ,  C09B69/06 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a coloring composition containing a xanthene-based colorant excellent in heat resistance.SOLUTION: The coloring composition contains a colorant (A), a binder resin (B) and a cross-linking agent (C), and is characterized by containing as the colorant (A), a colorant represented by formula (1): XZ(wherein Xis a xanthene chromophore; and Zis a conjugate base of an acid having a halogenated hydrocarbon group).

Abstract translation: 待解决的问题：提供含有耐热性优异的呫吨系着色剂的着色组合物。 解决方案：着色组合物含有着色剂（A），粘合剂树脂（B）和交联剂（C），其特征在于含有着色剂（A），由式（1）表示的着色剂 ）：X + Z - （其中X + 是呫吨发色团 ; Z - 是具有卤代烃基的酸的共轭碱）。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012063745A

公开(公告)日：2012-03-29

申请号：JP2011122937

申请日：2011-05-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NARUSE SHINGO ,  ICHINOHE DAIGO

IPC: G03F7/004 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a colored composition simultaneously achieving storage stability and low temperature calcination, a colored pattern excellent in development resistance, heat resistance, solvent resistance, voltage holding ratio, or the like, a color filter, a color display element having a color filter, and a method for manufacturing a color filter.SOLUTION: A colored composition contains a compound [A] having an epoxy group, a colorant [B], a compound [C] having a hydroxyl group or a carboxyl group, and an amine compound [D]; and has a viscosity of 1.0 mPa s or more and 50 mPa s at or less 25°C. Preferably the amine compound [D] can be included in the compound [C]. The compound [C] is at least one compound selected from a group consisting of isophthalic acid derivatives and 1,1,2,2-tetrahydroxy phenylethane derivatives. Preferably the amine compound [D] is an imidazole compound or a benzimidazole compound.

Abstract translation: 要解决的问题：为了提供同时实现储存稳定性和低温煅烧的着色组合物，显影性，耐热性，耐溶剂性，电压保持率等优异的着色图案，滤色器，颜色 具有滤色器的显示元件和滤色器的制造方法。 解决方案：着色组合物含有具有环氧基的化合物[A]，着色剂[B]，具有羟基或羧基的化合物[C]和胺化合物[D]; 并且在25℃以下的粘度为1.0mPa·s以上且50mPa·s。 胺化合物[D]优选可以包括在化合物[C]中。 化合物[C]是选自间苯二甲酸衍生物和1,1,2,2-四羟基苯乙基衍生物中的至少一种化合物。 胺化合物[D]优选为咪唑化合物或苯并咪唑化合物。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012048201A

公开(公告)日：2012-03-08

申请号：JP2011135759

申请日：2011-06-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KODAMA SEIICHIRO ,  YONEDA EIJI ,  NISHI NOBUHIRO ,  INOMATA KATSUMI

IPC: G03F7/004 ,  C08F2/44 ,  C08F2/46 ,  G02B5/20 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that achieves both storage stability and short-time, low-temperature firing and has adequate resolution, radiation sensitivity and developability; a cured film excellent in adhesion, light resistance, heat resistance, chemical resistance, transmission, flatness, voltage retention and dimensional stability; a method of forming the same; and a color film excellent in heat resistance, chemical resistance and voltage retention.SOLUTION: The radiation-sensitive resin composition contains [A] an alkali-soluble resin which is obtained by copolymerizing (A1) at least one type of compound selected from the group consisting of unsaturated carboxylic acid and unsaturated carboxylic acid anhydride and (A2) an epoxy group-containing unsaturated compound; [B] a polymerizable compound having an ethylenically unsaturated bond; [C] a radiation-sensitive polymerization initiator; and [D] a compound expressed by the following formula (1).

Abstract translation: 要解决的问题：提供一种能够实现储存稳定性和短时间，低温烧制两者的放射线敏感性树脂组合物，并具有适当的分辨率，辐射敏感性和显影性; 耐粘连性，耐光性，耐热性，耐化学性，透光性，平坦性，保压性和尺寸稳定性优异的固化膜。 其形成方法; 以及耐热性，耐化学性和电压保持性优异的彩色胶片。 解决方案：辐射敏感性树脂组合物含有[A]一种碱溶性树脂，其通过使（A1）至少一种选自不饱和羧酸和不饱和羧酸酐的化合物和（ A2）含环氧基的不饱和化合物; [B]具有烯属不饱和键的聚合性化合物; [C]辐射敏感聚合引发剂; 和[D]由下式（1）表示的化合物。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009079049A

公开(公告)日：2009-04-16

申请号：JP2008247762

申请日：2008-09-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHIMURA YUKIO ,  O ISAMU

IPC: C07D333/46

Abstract: PROBLEM TO BE SOLVED: To provide an onium salt suitable for a radiation-sensitive acid generating agent, to provide a radiation-sensitive acid generating agent comprising the onium salt as an essential component, and to provide a positive-type radiation-sensitive resin composition containing the radiation-sensitive acid generating agent. SOLUTION: The onium salt is represented by formula (5) (wherein, Ar 3 is a divalent aromatic hydrocarbon or the like; R 5 and R 6 are an alkyl group or the like; w is an integer of 1-10; y is an integer of 0-6; and v is an integer of 0-3), the radiation-sensitive acid generating agent comprising the onium salt as an essential component is provided, and the positive-type radiation-sensitive resin composition comprises the acid generating agent. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供适合于辐射敏感性的酸产生剂的鎓盐，以提供包含鎓盐作为必需组分的辐射敏感性酸产生剂，并提供阳离子型辐射 - 含有辐射敏感性酸产生剂的敏感性树脂组合物。 解决方案：鎓盐由式（5）表示（其中，Ar 3为二价芳烃等; R 5为SP＆ 6是烷基等; w是1-10的整数; y是0-6的整数; v是0-3的整数），辐射敏感的酸产生剂包括 提供鎓盐作为必需组分，正型辐射敏感性树脂组合物包含酸产生剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007114244A

公开(公告)日：2007-05-10

申请号：JP2005302535

申请日：2005-10-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  SHIHO KOUJI

IPC: G03F7/023 ,  C08F2/48 ,  C08F212/32 ,  C08F220/26 ,  C08F220/38 ,  G02B1/04 ,  G02B3/00 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition free of any safety problem, excellent in sensitivity, resolution and storage stability as a solution, and having such a good development margin that a good pattern profile can be formed in a developing step even after the lapse of the optimum developing time, and to provide an interlayer dielectric and microlenses formed of the same. SOLUTION: The radiation-sensitive resin composition contains (A) a copolymer of (a1) an unsaturated compound having a carboxylic acid thioacetal structure represented by formula (1) (wherein R 1 is H, methyl, ethyl, a 1-4C hydroxyalkyl or a 1-4C perfluoroalkyl; X is O or S; and R 2 and R 3 are each independently H, a 1-20C alkyl or a 3-20C alicyclic hydrocarbon or R 2 and R 3 bond to each other to form a 4- to 20-membered ring in combination with C to which R 2 bonds and X to which R 3 bonds) and (a2) an unsaturated compound having an epoxy group or an oxetanyl group and (B) a 1,2-quinonediazido compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：为了提供不存在任何安全问题的辐射敏感性树脂组合物，作为溶液的灵敏度，分辨率和储存稳定性优异，并且具有如此良好的显影余量，可以形成良好的图案轮廓 即使经过最佳显影时间后的显影步骤，并且提供由其形成的层间电介质和微透镜。 解决方案：辐射敏感性树脂组合物含有（A）（a1）具有由式（1）表示的羧酸硫代缩醛结构的不饱和化合物的共聚物（其中R 1 为H， 甲基，乙基，1-4C羟基烷基或1-4C全氟烷基; X为O或S;且R“SP”2和R“SP 3各自独立地为H， 20C烷基或3-20C脂环族烃或R 2 SP 3和R SP 3键彼此键合以形成与C结合的4-至20-元环，其中R （a2）具有环氧基或氧杂环丁烷基的不饱和化合物和（B）1,2-醌二叠氮基化合物 。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006126365A

公开(公告)日：2006-05-18

申请号：JP2004312826

申请日：2004-10-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  KAWAKAMI MINEKI ,  HARA HIROMICHI

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having excellent basic physical properties as a resist and low line edge roughness.
SOLUTION: The radiation sensitive resin composition contains (A) a resin having a group expressed by a specified formula at an end of the molecular chain and having a repeating unit expressed by formula (2) and a specified repeating unit, and (B) a radiation-sensitive acid generator.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有优异的基础物理性能作为抗蚀剂的辐射敏感性树脂组合物和低边缘粗糙度。 解决方案：辐射敏感性树脂组合物含有（A）具有在分子链末端由特定式表示的基团并具有由式（2）表示的重复单元和指定的重复单元的树脂和（A） B）辐射敏感酸产生器。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005206548A

公开(公告)日：2005-08-04

申请号：JP2004016352

申请日：2004-01-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAMATSU TAKASHI ,  YONEDA EIJI ,  NISHIMURA YUKIO ,  O ISAMU

IPC: C07D307/93 ,  C07D307/33 ,  C08F24/00

Abstract: PROBLEM TO BE SOLVED: To provide a sparingly alkali-soluble resin-containing new polymer having a lactone ring substituted with an ether group, in which a carbon atom constituting the lactone ring forms a polymer main chain and a new unsaturated compound useful as a synthetic raw material, etc., for polymers.
SOLUTION: The unsaturated compound is represented by general formula (1) [wherein R
1 is a substituted or unsubstituted 1-14C monovalent non-aromatic hydrocarbon group and R
2 is a hydrogen atom or a 1-14C alkyl group and n is an integer of 1-3] and its polymer has a recurring unit represented by general formula (I) [wherein R
1 , R
2 and n are each as defined above].
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有由醚基取代的内酯环的微溶碱性树脂的新型聚合物，其中构成内酯环的碳原子形成聚合物主链和新的不饱和化合物有用 作为聚合物的合成原料等。 解决方案：不饱和化合物由通式（1）表示[其中R 1是取代或未取代的1-14C一价非芳族烃基，R SP SP 2 >是氢原子或1-14C烷基，n是1-3的整数]，其聚合物具有由通式（I）表示的重复单元[其中R 1， SP> 2 和n各自如上所定义]。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005075824A

公开(公告)日：2005-03-24

申请号：JP2003312281

申请日：2003-09-04

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  EHATA SATOSHI ,  O ISAMU

IPC: G03F7/004 ,  C07C23/38 ,  C07C309/19 ,  C07C309/80 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an acid generator free from problem of flammability and accumulation in the human body, generating an acid with high acidity and high boiling point, being suitably short in a diffusion distance in a resist film, and having a small dependency on degree of roughness and fineness of mask patterns, forming a resist pattern with improved nano edge roughness, a sulfonic acid generated from the acid generator, a suflonic acid derivative useful for raw material for synthesis of the acid generator, and a radiation-sensitive resin composition containing the acid generator. SOLUTION: The acid generator has a structure represented by general formula (I). Wherein R 1 is a monovalent substituent such as an alkoxyl group, an alkoxycarbonyl group or an alkylsulfonyl group, an alkoxysufonyl group or the like, m is an integer of >0, n is 1 or 2. The radiation-sensitive resin composition contains except the acid generator, an acid-dissociable-group-containing resin when it is a positive one; it contains an alkali-soluble resin and a crosslinking agent when it is a negative one. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种不存在人体易燃性和积聚问题的酸发生剂，产生酸度高，沸点高的酸，在抗蚀剂膜中的扩散距离适当短，并且具有 对掩模图案的粗糙度和细度的微小依赖性，形成具有改善的纳米边缘粗糙度的抗蚀剂图案，由酸产生剂产生的磺酸，用于合成酸产生剂的原料的磺化衍生物和辐射 含有酸发生剂的敏感性树脂组合物。 解决方案：酸产生剂具有由通式（I）表示的结构。 其中R <1> 是烷氧基，烷氧基羰基或烷基磺酰基，烷氧基磺酰基等的一价取代基，m为0以上的整数，n为1或2. 辐射敏感性树脂组合物除酸产生剂外还含有含酸解离基团的树脂，当其为阳性时; 当它是负的时，它含有碱溶性树脂和交联剂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004250427A

公开(公告)日：2004-09-09

申请号：JP2003182089

申请日：2003-06-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHIMURA YUKIO ,  O ISAMU

IPC: G03F7/004 ,  C07C381/12 ,  C08F2/50 ,  C09K3/00 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain an onium salt compound having excellent storage stability and suitable as a radiation-sensitive acid generator used in a radiation-sensitive resin composition useful as a chemical amplification type photoresist having high sensitivity and high resolution, the radiation-sensitive acid generator composed of the onium salt compound, and the positive-type radiation-sensitive resin composition containing the radiation-sensitive acid generator. SOLUTION: The onium salt compound has a cationic part expressed by formula (1) [A is I or S; (m) is an integer of ≥1; (n) is an integer of ≥0; (x) is an integer of 1-15; Ar 1 and Ar 2 are each a univalent (substituted)aromatic hydrocarbon group, or the like; and OZ is a sulfonic acid (ester) residue or a sulfinic acid (ester) residue]. The positive-type radiation-sensitive resin composition contains (A) the radiation-sensitive acid generator composed of the onium salt compound and (B) a resin containing an acid-dissociating group. COPYRIGHT: (C)2004,JPO&NCIPI

Abstract translation: 要解决的问题为了获得具有优异的储存稳定性并且适合作为用作用作具有高灵敏度和高分辨率的化学放大型光致抗蚀剂的辐射敏感性树脂组合物中的辐射敏感性酸产生剂的鎓盐化合物， 由鎓盐化合物组成的辐射敏感酸产生剂和含有辐射敏感性酸产生剂的正型辐射敏感性树脂组合物。 解决方案：鎓盐化合物具有由式（1）表示的阳离子部分[A是I或S; （m）为≥1的整数; （n）为≥0的整数; （x）为1-15的整数; Ar 1 和Ar 2 分别为一价（取代）芳烃基等; OZ是磺酸（酯）残基或亚磺酸（酯）残基]。 正型辐射敏感性树脂组合物含有（A）由鎓盐化合物构成的辐射敏感性酸产生剂和（B）含有酸解离基团的树脂。 版权所有（C）2004，JPO＆NCIPI