公开(公告)号：EP0753671B1

公开(公告)日：2002-03-20

申请号：EP96401540.8

申请日：1996-07-11

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE

Inventor： Vilain, Michel

IPC: F15C5/00 ,  G01J5/02

CPC classification number: B81C1/00658 ,  B81B3/007 ,  B81B2203/0118 ,  B81C2201/0109 ,  B81C2201/038 ,  F15C5/00 ,  G01J5/20

公开(公告)号：JP2012513312A

公开(公告)日：2012-06-14

申请号：JP2011542787

申请日：2009-12-18

Applicant: ジルテクトラ ゲゼルシャフト ミット ベシュレンクテル ハフツング

Inventor： ルーカス リヒテンシュタイガー

IPC: B81B7/02 ,  H01L21/304 ,  H01L31/04 ,  H01L41/09 ,  H01L41/22

CPC classification number: B28D1/221 ,  B81C1/00634 ,  B81C2201/038 ,  H01L21/304 ,  H01L21/76251 ,  Y10T225/10

Abstract: 少なくとも１つの露出面を有する固体状材料を提供する工程と；露出面に補助層を適用して複合物構造（応力パターンを有する補助層）を形成する工程と；その中の深さで面に沿って固体状材料の破壊を促進する条件に複合物構造をさらす工程と；補助層および、それと共に、破壊深さで終了する固体状材料の層（応力パターンに対応する表面トポロジーを有する固体状材料の除去された層の露出面）を除去する工程とを含む印刷方法が開示される。

公开(公告)号：JP3795611B2

公开(公告)日：2006-07-12

申请号：JP4026397

申请日：1997-02-25

Applicant: 独立行政法人科学技術振興機構

Inventor： 正典 国枝

IPC: B21D37/20 ,  C25D5/08 ,  B81C1/00

CPC classification number: B81C1/00634 ,  B81C2201/038

公开(公告)号：KR1020110110781A

公开(公告)日：2011-10-07

申请号：KR1020117017441

申请日：2009-12-18

Applicant: 실텍트라 게엠베하

Inventor： 리히텐스타이거루카스

IPC: B81C1/00 ,  B28D1/22

CPC classification number: B28D1/221 ,  B81C1/00634 ,  B81C2201/038 ,  H01L21/304 ,  H01L21/76251 ,  Y10T225/10

Abstract: 하나 이상의 노출면을 갖는 고상 재료를 제공하는 단계; 복합 구조체를 형성하기 위해 상기 노출면에 보조층을 적용하는 단계; 상기 보조층과 상기 고상 재료에 스트레스 패턴을 유발하는 조건에 상기 복합 구조체를 두고, 이에 의해 상기 고상 재료 내의 소정 깊이에서 실질적으로 평면을 따라 상기 고상 재료의 파괴를 촉진하는 단계; 및 상기 파괴 깊이에서 종료하는 상기 고상 재료의 층과 함께 상기 보조층을 제거하는 단계를 포함하고, 상기 고상 재료의 제거된 층의 노출면은 상기 스트레스 패턴에 상응하는 표면 토폴로지를 갖는 것을 특징으로 하는 인쇄 방법이 제공된다.

公开(公告)号：EP2620409B1

公开(公告)日：2017-03-01

申请号：EP13163979.1

申请日：2009-12-18

Applicant: Siltectra GmbH

Inventor： Lichtensteiger, Lukas

IPC: B81C1/00 ,  H01L21/762 ,  H01L21/304 ,  B28D1/00 ,  B28D1/22

CPC classification number: B28D1/221 ,  B81C1/00634 ,  B81C2201/038 ,  H01L21/304 ,  H01L21/76251 ,  Y10T225/10

公开(公告)号：EP2753573A2

公开(公告)日：2014-07-16

申请号：EP12770305.6

申请日：2012-08-27

Applicant: Qualcomm Mems Technologies, Inc.

Inventor： STEPHANOU, Philip Jason ,  LONDERGAN, Ana Rangelova ,  GOUSEV, Evgeni Petrovich ,  SHENOY, Ravindra Vaman

IPC: B81C1/00 ,  C25D5/10 ,  C25D5/18 ,  C23C28/02

CPC classification number: B81C1/0038 ,  B81B2203/0392 ,  B81C2201/0107 ,  B81C2201/0188 ,  B81C2201/038 ,  C23C18/1653 ,  C25D5/10 ,  C25D5/18 ,  C25D5/48 ,  C25D7/00 ,  Y10T428/12493 ,  Y10T428/24612

Abstract: This disclosure provides implementations of high surface area stacked layered metallic structures, devices, apparatus, systems, and related methods. A plurality of stacked layers on a substrate may be manufactured from a plating bath including a first metal and a second metal. A modulated plating current can deposit alternate first metal layers and alloy layers, the alloy layers including the first metal and the second metal. Gaps between the alloy layers can be formed by selectively etching some portions of the first metal layers to define a stacked layered structure. Stacked layered structures may be useful in applications to form capacitors, inductors, catalytic reactors, heat transfer tubes, non-linear springs, filters, batteries, and heavy metal purifiers.

公开(公告)号：EP2580071A1

公开(公告)日：2013-04-17

申请号：EP11770679.6

申请日：2011-05-27

Applicant: BPE e. K.

Inventor： HORNIG, Wolfgang

IPC: B44B5/00 ,  B29C59/02

CPC classification number: B29C59/022 ,  B29C59/007 ,  B29C2059/023 ,  B44B5/0052 ,  B81B2201/035 ,  B81C99/0085 ,  B81C2201/038

Abstract: The invention relates to a method for producing bodies having surface structures in the micrometer or nanometer range, wherein the stamping section of a stamping tool is pressed several times against various locations of the surface of a body by means of a hardness testing device, whereby recesses are stamped at the pressing locations, and wherein a stamping tool having an elongated stamping section is used and corresponding channels or line-like structure are produced in the body.

公开(公告)号：EP2379440A2

公开(公告)日：2011-10-26

申请号：EP09807540.1

申请日：2009-12-18

Applicant: Siltectra GmbH

Inventor： LICHTENSTEIGER, Lukas

IPC: B81C1/00

CPC classification number: B28D1/221 ,  B81C1/00634 ,  B81C2201/038 ,  H01L21/304 ,  H01L21/76251 ,  Y10T225/10

Abstract: It is disclosed a method of printing comprising the steps of: providing a solid state material having at least one exposed surface; applying an auxiliary layer to the exposed surface to form a composite structure, the auxiliary layer having a stress pattern; subjecting the composite structure to conditions facilitating fracture of the solid state material along a plane at a depth therein; and removing the auxiliary layer and, therewith, a layer of the solid state material terminating at the fracture depth, an exposed surface of the removed layer of solid state material having a surface topology corresponding to the stress pattern.

公开(公告)号：EP2073940A2

公开(公告)日：2009-07-01

申请号：EP07855358.3

申请日：2007-08-17

Applicant: The Regents of the University of California

Inventor： MASON, Thomas, G. ,  HERNANDEZ, Carlos, J.

IPC: B05D3/06 ,  B82B1/00 ,  B82B3/00

CPC classification number: G03F7/40 ,  B81C99/008 ,  B81C2201/038

Abstract: A method of producing particles includes providing a substrate structure that comprises a solid substrate; forming a target structure on said substrate structure, said target structure comprising a radiation-reactive material; forming a spatially patterned beam of radiation using a patterned mask; exposing at least a portion of the target structure to the spatially patterned beam of radiation to which the radiation-reactive material reacts while leaving other portions of the target structure unexposed to the radiation; removing substantially all of one of the exposed or the unexposed patterned portions of the target structure to provide a plurality of non-contiguous structures that include at least a portion of the radiation-reactive material; and separating the plurality of non-contiguous structures comprising the radiation-reactive material from the substrate structure into a fluid material. Each non-contiguous structure of the radiation-reactive material provides at least a portion of a separate particle after the separation.

公开(公告)号：WO2012052007A2

公开(公告)日：2012-04-26

申请号：PCT/DE2011/075118

申请日：2011-05-24

Applicant: BPE E. K. ,  HORNIG, Wolfgang

Inventor： HORNIG, Wolfgang

CPC classification number: B29C59/022 ,  B29C59/007 ,  B29C2059/023 ,  B44B5/0052 ,  B81B2201/035 ,  B81C99/0085 ,  B81C2201/038

Abstract: Die Erfindung betrifft ein Verfahren zum Herstellen von Körpern mit Oberflächenstrukturen im Mikrometer- oder Nanometerbereich, wobei der Prägeabschnitt eines Prägewerkzeugs mittels eines Härteprüfgeräts mehrfach auf verschiedene Stellen der Oberfläche eines Körpers gepresst wird, wodurch an den jeweiligen Aufpressstellen Vertiefungen eingeprägt werden, und wobei ein Prägewerkzeug mit einem länglich geformten Prägeabschnitt eingesetzt und entsprechende Kanäle oder linienartige Strukturen in dem Körper erzeugt werden.

Abstract translation:

本发明涉及一种用于生产K＆ouml; rpern与范围微米或纳米范围的表面BEAR结构，其中，所述镨＆AUML; geabschnitt一个镨AUML;一个手gewerk zeugs手段AUML fger＆;; rtepr导航使用TS上不同多次 表面＆AUML的位点;枝一个K＆ouml;被rpers按压，从而留下深刻印象＆AUML在相应Aufpressstellen孔;是GT，和PR AUML; gewerk生成升BEAR使用geabschnitt和相应的阚BEAR;触及成形镨＆在K＆AUML LE或线状结构ouml 被生成。