Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns
    63.
    发明专利
    Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns 审中-公开
    用于集成光学和干涉计算以生产复杂图案的方法和装置

    公开(公告)号:JP2010177687A

    公开(公告)日:2010-08-12

    申请号:JP2010069007

    申请日:2010-03-24

    Abstract: PROBLEM TO BE SOLVED: To provide methods and apparatus for defining a single structure (11) on a semiconductor wafer by spatial frequency components. SOLUTION: Some of the spatial frequency components (12-16) are derived by optical lithography and some by interferometric lithography techniques. Interferometric lithography images the high frequency components while optical lithography images the low frequency components. Optics collects many spatial frequencies and the interferometry shifts the spatial frequencies to high spatial frequencies. Thus, since the mask does not need to provide high spatial frequencies, the masks are configured to create only low frequency components, thereby allowing fabrication of simpler masks having larger structures. These methods and apparatus facilitate writing more complex repetitive as well as non-repetitive patterns in a single exposure with a resolution which is higher than that currently available using known optical lithography alone. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题:提供用于通过空间频率分量在半导体晶片上定义单个结构(11)的方法和装置。 解决方案:一些空间频率分量(12-16)是通过光学光刻得到的,一些通过干涉光刻技术得到。 干涉光刻成像高频分量,而光刻成像低频分量。 光学收集许多空间频率,干涉测量将空间频率移动到高空间频率。 因此,由于掩模不需要提供高空间频率,掩模被配置为仅产生低频分量,从而允许制造具有较大结构的更简单的掩模。 这些方法和设备有助于在单次曝光中以比目前可用的已知光刻单独的分辨率更高的分辨率编写更复杂的重复和非重复图案。 版权所有(C)2010,JPO&INPIT

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