公开(公告)号：WO2007081547A2

公开(公告)日：2007-07-19

申请号：PCT/US2006049148

申请日：2006-12-22

Applicant: QUALCOMM INC ,  KOTHARI MANISH ,  KOGUT LIOR ,  CHUI CLARENCE

Inventor： KOTHARI MANISH ,  KOGUT LIOR ,  CHUI CLARENCE

CPC classification number: G01L5/0047 ,  G02B26/001

Abstract: The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.

Abstract translation: 本发明包括确定残余应力的系统和方法，例如在干涉式调制器中发现的。 在一个示例中，测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜，其中膜被构造为平行四边形，其中每侧的至少一部分附着到基底，以及形成在膜的一部分和基底的一部分之间的干涉腔， 并且其中膜被配置为基于膜中的残余应力而变形并且调制指示膜变形量的光。

公开(公告)号：WO2007014022A1

公开(公告)日：2007-02-01

申请号：PCT/US2006/028342

申请日：2006-07-20

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  CHUI, Clarence ,  CHUNG, Wonsuk ,  GANTI, Surya, Prakash ,  KOTHARI, Manish ,  MILES, Mark, W. ,  SAMPSELL, Jeffrey, B. ,  SASAGAWA, Teruo

Inventor： CHUI, Clarence ,  CHUNG, Wonsuk ,  GANTI, Surya, Prakash ,  KOTHARI, Manish ,  MILES, Mark, W. ,  SAMPSELL, Jeffrey, B. ,  SASAGAWA, Teruo

IPC: B81B3/00 ,  G02B26/00

CPC classification number: G02B26/001 ,  B81B3/007 ,  B81B2201/047 ,  B81B2203/0307 ,  B81B2203/053

Abstract: Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.

Abstract translation: MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或者由导电可移动层中的凹陷下方的柱支撑。 在某些实施例中，铆钉结构的部分延伸穿过可移动层并接触下面的层。 在其他实施例中，用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线，保护电引线免受损坏或其他干扰。

公开(公告)号：WO2006036427A2

公开(公告)日：2006-04-06

申请号：PCT/US2005030682

申请日：2005-08-29

Applicant: IDC LLC ,  CHUI CLARENCE ,  KOTHARI MANISH

Inventor： CHUI CLARENCE ,  KOTHARI MANISH

IPC: G02B26/00

CPC classification number: G02B26/001

Abstract: The width and location of a hysteresis window of an interferometric modulator may be altered by adjusting various physical characteristics of the interferometric modulator. Thus, depending on the particular application for which the interferometric modulators are manufactured, the width and location of the hysteresis window may be altered. For example, in some applications, reducing the power required to operate an array of interferometric modulators may be an important consideration. In other applications, the speed of the interferometric modulators may be of more importance, where the speed of an interferometric modulator, as used herein, refers to the speed of actuating and relaxing the movable mirror. In other applications, the cost and ease of manufacturing may be of most importance. Systems and methods are introduced that allow selection of a width and location of a hysteresis window by adjusting various physical characteristics.

Abstract translation: 可以通过调整干涉式调制器的各种物理特性来改变干涉式调制器的滞后窗的宽度和位置。 因此，根据制造干涉式调制器的特定应用，可以改变滞后窗口的宽度和位置。 例如，在某些应用中，降低操作干涉式调制器阵列所需的功率可能是重要的考虑因素。 在其他应用中，干涉式调制器的速度可能更为重要，其中如本文所使用的干涉式调制器的速度是指致动和放松可移动反射镜的速度。 在其他应用中，制造的成本和易用性可能是最重要的。 引入了通过调整各种物理特性来选择滞后窗口的宽度和位置的系统和方法。

公开(公告)号：WO2006036399A1

公开(公告)日：2006-04-06

申请号：PCT/US2005/030033

申请日：2005-08-23

Applicant: IDC, LLC ,  CHUI, Clarence ,  SAMPSELL, Jeffrey, B.

Inventor： CHUI, Clarence ,  SAMPSELL, Jeffrey, B.

IPC: G02B26/00 ,  G02B26/08 ,  B81B3/00

CPC classification number: G02B26/0841 ,  G02B26/001

Abstract: Described herein are systems, devices, and methods relating to packaging electronic devices, for example, microelectromechanical systems (MEMS) devices, including optical modulators such as interferometric optical modulators. The interferometric modulator disclosed herein comprises a movable mirror. Some embodiments of the disclosed movable mirror exhibit a combination of improved properties compared to known mirrors, including reduced moving mass, improved mechanical properties, and reduced etch times.

Abstract translation: 这里描述了与包装电子设备有关的系统，设备和方法，例如包括光学调制器（例如干涉式光学调制器）的微机电系统（MEMS）设备。 本文公开的干涉式调制器包括可移动反射镜。 所公开的可移动镜的一些实施例与已知反射镜相比具有改进的性能的组合，包括减少的移动质量，改进的机械性能和减少的蚀刻时间。

公开(公告)号：WO2006014247A3

公开(公告)日：2006-02-09

申请号：PCT/US2005/022592

申请日：2005-06-24

Applicant: IDC, LLC ,  CHUI, Clarence ,  ZEE, Stephen

Inventor： CHUI, Clarence ,  ZEE, Stephen

IPC: G02B26/08 ,  G02B26/00 ,  G01J3/26

Abstract: A modulator has a transparent substrate with a first surface. At least one interferometric modulator element resides on the first surface. At least one thin film circuit component electrically connected to the element resides on the surface. When more than one interferometric element resides on the first surface, there is at least one thin film circuit component corresponding to each element residing on the first surface.

公开(公告)号：WO2006014247A2

公开(公告)日：2006-02-09

申请号：PCT/US2005022592

申请日：2005-06-24

Applicant: IDC LLC ,  CHUI CLARENCE ,  ZEE STEPHEN

Inventor： CHUI CLARENCE ,  ZEE STEPHEN

IPC: G02B26/08 ,  G01J3/26 ,  G02B26/00

CPC classification number: G02B26/001 ,  G02B26/0841

Abstract: A modulator has a transparent substrate with a first surface. At least one interferometric modulator element resides on the first surface. At least one thin film circuit component electrically connected to the element resides on the surface. When more than one interferometric element resides on the first surface, there is at least one thin film circuit component corresponding to each element residing on the first surface.

Abstract translation: 调制器具有带有第一表面的透明衬底。 至少一个干涉式调制器元件驻留在第一表面上。 电连接到元件的至少一个薄膜电路部件驻留在表面上。 当多于一个干涉测量元件位于第一表面上时，存在至少一个对应于驻留在第一表面上的每个元件的薄膜电路部件。

公开(公告)号：WO2005001545A1

公开(公告)日：2005-01-06

申请号：PCT/US2004/020330

申请日：2004-06-23

Applicant: IRIDIGM DISPLAY CORPORATION ,  MILES, Mark, W. ,  GALLY, Brian, J. ,  CHUI, Clarence

Inventor： MILES, Mark, W. ,  GALLY, Brian, J. ,  CHUI, Clarence

IPC: G02B26/00

CPC classification number: B81C1/00182 ,  B81B2201/047 ,  B81C1/0038

Abstract: This invention provides a precursor film stack for use in the production of MEMS devices. The precursor film stack comprises a carrier substrate, a first layer formed on the carrier substrate, a second layer of an insulator material formed on the first layer, and a third layer of a sacrificial material formed on the second layer.

Abstract translation: 本发明提供了用于制造MEMS器件的前体膜叠层。 前体膜叠层包括载体衬底，形成在载体衬底上的第一层，形成在第一层上的绝缘体材料的第二层和形成在第二层上的牺牲材料的第三层。