公开(公告)号：US20040027448A1

公开(公告)日：2004-02-12

申请号：US10636421

申请日：2003-08-06

Applicant: Kodak Polychrome Graphics

Inventor： Dallas K. Pierson

IPC: B41J002/47

CPC classification number: H04N1/405 ,  B41J2/455 ,  B41J2/4753 ,  G06K15/029

Abstract: The invention is directed to compensating for imaging aberrations that result from repeated passes by an imaging laser array. The aberrations may result from swath lines formed by thermal heating and from the ruling and screen angle of the image. The techniques described herein reduce the undesirable aberrations in thermal laser generated images by breaking up and/or reducing the swath lines. In general, the techniques provide for overlapping swaths and providing masking for one or both passes that print the overlapped region.

Abstract translation: 本发明旨在补偿由成像激光器阵列重复通过而产生的成像像差。 像差可能是由热加热形成的条纹线和图像的刻划和屏幕角度造成的。 本文描述的技术通过破碎和/或减少条纹线来减少热激光产生的图像中的不期望的像差。 通常，这些技术提供重叠的条带并为打印重叠区域的一个或两个传递提供掩蔽。

公开(公告)号：US20030124454A1

公开(公告)日：2003-07-03

申请号：US10039164

申请日：2002-01-03

Applicant: Kodak Polychrome Graphics LLC

Inventor： Celin Savariar-Hauck ,  Hans-Joachim Timpe

IPC: G03F007/038

CPC classification number: B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/0382 ,  G03F7/203 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

Abstract: A process for making thermally imageable negative working compositions comprising the steps of: (1) providing a patterning composition layer on a substrate, said patterning composition comprising: (a) at least one acid generator which is sensitive to UV radiation; (b) at least one cross-linking resin or compound; (c) at least one binder resin comprising a polymer containing at least one reactive pendent group consisting of hydroxyl, carboxylic acid, sulfonamide, alkoxymethylamide and mixtures thereof; and (d) at least one infrared absorber; (2) subjecting the patterning composition layer to a two-stage radiation exposure; (a) one stage being a flood UV-exposure; and (b) the other stage being a imagewise infrared exposure stage; (3) treating the exposed patterning composition with heat energy; and (4) developing the heat treated, exposed patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition and leaving the imaged areas substantially unaffected.

Abstract translation: 一种制备可热成像负性组合物的方法，包括以下步骤：（1）在基底上提供图案化组合物层，所述图案化组合物包含：（a）至少一种对UV辐射敏感的酸产生剂; （b）至少一种交联树脂或化合物; （c）至少一种粘合剂树脂，其包含含有至少一个由羟基，羧酸，磺酰胺，烷氧基甲基酰胺及其混合物组成的反应性侧基的聚合物; 和（d）至少一个红外线吸收剂; （2）对图案化组合物层进行两级辐射曝光; （a）一个阶段是泛滥紫外线曝光; 和（b）另一个阶段是成像红外曝光阶段; （3）用热能处理曝光的图案化组合物; 和（4）用含水碱性显影剂显影经热处理的曝光的图案化组合物以除去图案化组合物的非成像区域，并使成像区域基本上不受影响。

公开(公告)号：US20030113655A1

公开(公告)日：2003-06-19

申请号：US09933884

申请日：2001-08-21

Applicant: Kodak Polychrome Graphics, L.L.C

Inventor： Eiji Hayakawa ,  Jianbing Huang ,  Thomas Jordan ,  Yasushi Miyamoto ,  Jeffrey Collins

IPC: G03F007/021 ,  G03F007/30

CPC classification number: G03F7/0382 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/10 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/262 ,  G03F7/0045 ,  G03F7/016 ,  G03F7/021

Abstract: The present invention provides an imageable composition, which includes an acid curable composition, an acid generator, an infrared absorber, optionally a colorant, such as, a colorant dye or colorant pigment, wherein at least one of the infrared absorber and the colorant has a counter anion derived from a non-volatile acid, and further optionally, a strong acid. The present invention further provides an imageable element, which includes a substrate and an imageable composition according to the present invention coated on a surface of the substrate. Also provided is method of producing an imaged element according to the present invention.

Abstract translation: 本发明提供一种可成像组合物，其包括酸可固化组合物，酸产生剂，红外吸收剂，任选的着色剂，例如着色剂染料或着色剂颜料，其中至少一种红外吸收剂和着色剂具有 衍生自非挥发性酸的抗衡阴离子，还可任选地含有强酸。 本发明还提供了可成像元件，其包括基材和涂覆在基材表面上的根据本发明的可成像组合物。 还提供了根据本发明的成像元件的制造方法。

公开(公告)号：US20030099888A1

公开(公告)日：2003-05-29

申请号：US09899741

申请日：2001-07-05

Applicant: Kodak Polychrome Graphics L.L.C.

Inventor： Mathias Jarek

IPC: G03F007/004 ,  G03F007/023

CPC classification number: G03F7/0233

Abstract: A coating solution useful in the preparation of printing plate precursors comprises: a) a radiation sensitive composition C comprising a phenolic resin; b) at least one thermoplastic polymer P which has a solubility in aqueous alkaline media ranging from sparingly soluble to insoluble; c) a first solvent component A which is capable of solubilizing both composition C and thermoplastic polymer P; d) a second solvent component B having a volatility less than component A, wherein component B is capable of volatilizing composition C but not thermoplastic polymer P, and composition C and thermoplastic P are homogeneously dissolved in a mixture of components A and B; and e) at least one further polymer AP having a higher molecular weight than the phenolic resin of composition C, wherein polymer AB is miscible with the phenolic resin and immiscible with thermoplastic polymer P. The coating provides a radiation-sensitive layer for the substrate, and the coating contains homogeneously distributed thermoplastic polymer particles.

Abstract translation: 用于制备印版前体的涂布溶液包括：a）包含酚醛树脂的辐射敏感组合物C; b）至少一种热塑性聚合物P，它在水性碱性介质中具有从微溶到不溶的溶解度; c）能够溶解组合物C和热塑性聚合物P的第一溶剂组分A; d）挥发性小于组分A的第二溶剂组分B，其中组分B能够挥发组合物C而不是热塑性聚合物P，组合物C和热塑性P均匀地溶解在组分A和B的混合物中; 和e）至少一种具有比组合物C的酚醛树脂更高分子量的其它聚合物AP，其中聚合物AB可与酚醛树脂混溶并与热塑性聚合物P不混溶。涂层为基底提供辐射敏感层， 并且涂层含有均匀分布的热塑性聚合物颗粒。

公开(公告)号：US20020108519A1

公开(公告)日：2002-08-15

申请号：US09783776

申请日：2001-02-15

Applicant: Kodak Polychrome Graphics LLC.

Inventor： Patrick R. Friedman

IPC: B41C001/00 ,  B41N006/00 ,  B41N003/00

CPC classification number: B41C1/1016 ,  B41C1/05 ,  B41C1/1066 ,  B41C2201/04 ,  B41C2201/10 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/16

Abstract: A method of producing a printing plate comprises: (a) providing a printing plate precursor comprising a topmost etchable first layer and a second layer located below the first layer, wherein the first and second layers have different affinities for at least one printing liquid; (b) imagewise providing atomized fluid particles in an interaction zone located above the surface of the first layer; and (c) imagewise directing laser energy into the interaction zone, wherein the laser energy has a wavelength which is substantially absorbed by the atomized fluid particles in the interaction zone, and the absorption of the laser energy causes the atomized fluid particles to imagewise impart kinetic energy to and etch the first layer. Lithographic and flexographic printing plates may be prepared according to this method, including waterless plates, negative-and positive-working plates, and processless plates.

Abstract translation: 制造印版的方法包括：（a）提供包含最顶层可蚀刻第一层和位于第一层下方的第二层的印版前体，其中第一和第二层对至少一种印刷液具有不同的亲和力; （b）在位于第一层表面上方的相互作用区域中成像提供雾化流体颗粒; 并且（c）将激光能量成像地引导到相互作用区域中，其中激光能量具有被相互作用区域中的雾化流体颗粒基本吸收的波长，并且激光能量的吸收导致雾化的流体颗粒成像赋予动力学 能量和蚀刻第一层。 可以根据这种方法制备平版印刷版和柔版印刷版，包括无水版，负片和正片，以及无处理版。

公开(公告)号：US20020048721A1

公开(公告)日：2002-04-25

申请号：US09839906

申请日：2001-04-20

Applicant: Kodak Polychrome Graphics L.L.C.

Inventor： Masamichi Kamiya ,  Koji Hayashi ,  Hirotaka Komine ,  Miyuki Makino

IPC: G03F007/004

CPC classification number: G03F7/32 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/021 ,  G03F7/027 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

Abstract: The present invention provides a photosensitive lithographic printing plate which displays superior ink receptivity and superior film strength of the photosensitive layer (image area). The photosensitive lithographic printing plate is produced by providing, on top of a support, a photosensitive composition comprising a fluororesin having a fluoro aliphatic group of 3 to 20 carbon atoms in which at least two of three terminal hydrogen atoms are substituted for fluorine atoms, and an ethylene based unsaturated group, as well as a negative photosensitive compound.

Abstract translation: 本发明提供了一种感光性平版印刷版，其显示出优异的感光性和感光层的膜强度（图像面积）。 感光性平版印刷版是通过在支撑体的上面设置感光性组合物来制造的，所述感光性组合物含有具有3-20个碳原子的氟代脂族基团的氟树脂，其中三个末端氢原子中的至少两个被氟原子取代， 乙烯基不饱和基团以及负性感光性化合物。

公开(公告)号：US20040063022A1

公开(公告)日：2004-04-01

申请号：US10664179

申请日：2003-09-17

Applicant: Kodak Polychrome Graphics, LLC.

Inventor： Stephan J. Platzer ,  Maria T. Sypek ,  Paul Perron ,  Harald Baumann ,  Melinda Alden

IPC: G03F007/021 ,  G03F007/004

CPC classification number: G03F7/016 ,  G03F7/021 ,  G03F7/0215 ,  G03F7/0217

Abstract: The present invention includes an imageable element, which can be: (a) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; a polyvinyl acetal binder; and a sheet substrate; or (b) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; and a sheet substrate. The imaging layer includes a total aromatic diazonium salt containing compound content of at least 10 weight percent. The molar ratio of the aromatic diazonium salt containing compound having an alkoxy substituent to the aromatic diazonium salt containing compound that is free of an alkoxy substituent is from about 1.0:1 to 70:1. Upon imagewise exposure and development, an imaged element is obtained.

Abstract translation: 本发明包括可成像元件，其可以是：（a）包含成像层的可成像元件，其包含：含有烷氧基取代基的芳族重氮盐盐化合物和不含烷氧基取代基的含芳族重氮盐的化合物; 聚乙烯醇缩醛粘合剂; 和片基材; 或（b）包含成像层的可成像元件，其包含：含有烷氧基取代基的芳族重氮盐盐化合物和不含烷氧基取代基的含芳族重氮盐盐化合物; 和片状基材。 成像层包括含有至少10重量％的化合物含量的总芳族重氮盐。 具有烷氧基取代基的含芳族重氮盐的化合物与不含烷氧基取代基的含芳族重氮盐化合物的摩尔比为约1.0:1至70:1。 在成像曝光和显影时，获得成像元件。

公开(公告)号：US20040058135A1

公开(公告)日：2004-03-25

申请号：US10663969

申请日：2003-09-16

Applicant: Kodak Polychrome Graphics, LLC

Inventor： Ranjan C. Patel ,  Jon C. Vogel ,  Keith P. Parsons ,  Graham Spence ,  Alan J. Lindsay ,  Rachel J. Hobson ,  Luke C. Williams

IPC: B32B005/24

CPC classification number: B41M5/508 ,  B41M5/0047 ,  B41M5/0064 ,  B41M5/52 ,  B41M5/5218 ,  B41M5/5236 ,  B41M5/5254 ,  C08J9/26 ,  C08J2201/0462 ,  Y10T428/24802 ,  Y10T428/249962 ,  Y10T428/2933

Abstract: A method for manufacturing a microporous film comprising the steps of: (a) providing a first polymer which is a hydrophobic thermoplastic polymer and a second polymer which is a hydrophilic polymer or copolymer of N-vinylpyrrolidone; (b) dissolving said first and second polymers in a solvent system which is compatible with both polymers, said solvent system comprising a blend of an aprotic organic solvent and an alcohol; (c) coating the resulting solution on a support; (d) effecting at least a partial drying of the resulting coating; and (e) washing the coating in an aqueous medium so as to extract at least 50% by weight of the said second polymer. Image accepting members comprising a microporous film made by the above method, and preferably comprising a support which is also microporous.

Abstract translation: 一种制造微孔薄膜的方法，包括以下步骤：（a）提供作为疏水性热塑性聚合物的第一聚合物和作为N-乙烯基吡咯烷酮的亲水性聚合物或共聚物的第二聚合物; （b）将所述第一和第二聚合物溶解在与两种聚合物相容的溶剂体系中，所述溶剂体系包含非质子有机溶剂和醇的共混物; （c）将所得溶液涂布在支撑体上; （d）对所得涂层进行至少一部分干燥; 和（e）在水性介质中洗涤涂层，以提取至少50重量％的所述第二聚合物。 包含由上述方法制成的微孔膜的图像承载构件，优选包括也是微孔的载体。

公开(公告)号：US20020146633A1

公开(公告)日：2002-10-10

申请号：US09801538

申请日：2001-03-08

Applicant: Kodak Polychrome Graphics L.L.C.

Inventor： Stephan Platzer ,  Paul Perron ,  Melinda Alden

IPC: G03F007/021 ,  G03C001/54 ,  G03C001/77

CPC classification number: G03F7/0215 ,  C08F8/18 ,  G03F7/0046

Abstract: A novel fluorinated aromatic acetal polymer comprises at least one unit of A and at least one unit of B or C, or at least one unit of each of A, B and C and optionally further comprises at least one unit of either D or E or at least one unit of each of D and E, wherein the units A and B and/or C, and optionally D and/or E are linked together by single covalent C-C bonds and have the formulae: 1 wherein RA is H or C1-C11 alkyl, or an aryl group that does not contain fluorine, and RB and RC are an aryl groups that contain fluorine. The polymer is prepared by reacting a hydrolyzed polyvinyl acetate polymer or copolymer with at least one non-fluorinated aldehyde component, and at least one fluorinated aromatic component. The polymer is useful is preparing a photosensitive composition which comprises at least one diazo resin and at least one such fluorinated aromatic acetal polymer. Such a photosensitive composition may be applied to a support to form an imageable member which may be imaged to form a lithographic printing plates.p

Abstract translation: 一种新的含氟芳族缩醛聚合物包含至少一个单元A和至少一个单元B或C，或每个A，B和C中的至少一个单元，并且任选地还包含至少一个D或E单元或 D和E各自的至少一个单元，其中单元A和B和/或C以及任选的D和/或E通过单个共价CC键连接在一起并具有下式：其中RA是H或C 1 -C 11 烷基或不含氟的芳基，RB和RC是含氟的芳基。 聚合物通过使水解的聚乙酸乙烯酯聚合物或共聚物与至少一种非氟化醛组分和至少一种氟化芳族组分反应来制备。 聚合物可用于制备包含至少一种重氮树脂和至少一种这种氟化芳族缩醛聚合物的光敏组合物。 这种光敏组合物可以施加到支撑体上以形成可成像的成像构件，以形成平版印刷版

公开(公告)号：US20020090566A1

公开(公告)日：2002-07-11

申请号：US09751183

申请日：2000-12-29

Applicant: Kodak Polychrome Graphics LLC.

Inventor： Hans-Joachim Timpe ,  Ursula Muller

IPC: G03F007/038

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/145

Abstract: A polyvinyl acetal copolymer compound comprises the units A, B, C and D, wherein A is present in an amount of 0.5 to 30 wt.-% and is of the formula 1 wherein R is hydrogen, C1-C6 alkyl, nullCHnullCHCOOH or 2 B is present in an amount of 5 to 35 wt.-% and is of the formula 3 C is present in an amount of 10 to 55 wt.-% and is of the formula 4 wherein R1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halogen atoms, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group ZnullNR2nullCOnullYnullCOOH, wherein Z is an aliphatic, aromatic or araliphatic spacer group, R2 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and unit C may have one or more occurrences in the copolymer with various moieties R1 independent of one another; and D is present in an amount of 10 to 40 wt.-% and is of the formula 5 wherein X is C1-C6 alkylene, a 5 or 6 membered saturated carbocyclic moiety optionally substituted with one or more substituents selected from the group consisting of C1-C4 alkyl, C1-C4 alkoxy or halogen, a 5 or 6 membered saturated heterocyclic moiety which comprises in the nucleus one or more heteroatoms selected from oxygen, nitrogen and sulfur, or a group of the formula I 6 wherein n is an integer from 0 to 4 and each R3 is independently selected from the group consisting of C1-C4 alkyl, halogen or C1-C4 alkoxy. A radiation-sensitive composition useful in a lithographic printing plate comprises (i) the above-described polyvinyl acetal copolymer; and (ii) a light-to-heat transformer compound.

Abstract translation: 聚乙烯醇缩醛共聚物化合物包括单元A，B，C和D，其中A以0.5至30重量％的量存在并具有下式：其中R是氢，C 1 -C 6烷基，-CH = CHCOOH 或B以5至35重量％的量存在，并且具有式C的存在量为10至55重量％，并且具有下式：其中R 1是具有至多4个碳的烷基 或任选被酸基取代的苯基或其中连接有酸基的苯基，其中苯基任选地包含1至2个选自卤素原子，氨基，甲氧基，乙氧基，甲基和乙基的其它取代基，或 是Z-NR2-CO-Y-COOH基团，其中Z是脂族，芳族或芳脂族间隔基，R2是氢或脂族，芳族或芳脂族部分，Y是饱和或不饱和的链或环形间隔基 基团和单元C可以在共聚物中具有一个或多个出现的各种部分R1彼此独立; 并且D以10至40重量％的量存在并且具有下式：其中X为C 1 -C 6亚烷基，任选被一个或多个选自以下的取代基取代的5或6元饱和碳环部分：C1 C 4烷基，C 1 -C 4烷氧基或卤素，5或6元饱和杂环部分，其在核中包含一个或多个选自氧，氮和硫的杂原子，或式I的基团，其中n是0的整数 至4，并且每个R 3独立地选自C 1 -C 4烷基，卤素或C 1 -C 4烷氧基。 可用于平版印刷版的辐射敏感组合物包含（i）上述聚乙烯醇缩醛共聚物; 和（ii）光 - 热变压器化合物。