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    Multi-stage system, control method for the same, and lithographic apparatus
    61.
    发明专利
    Multi-stage system, control method for the same, and lithographic apparatus 有权
    多级系统，其控制方法和平面设备

    公开(公告)号：JP2012248838A

    公开(公告)日：2012-12-13

    申请号：JP2012118423

    申请日：2012-05-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN

    IPC: H01L21/027 ,  G03F7/20 ,  G05D3/12 ,  H01L21/68

    CPC classification number: G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

    Abstract: PROBLEM TO BE SOLVED: To provide a multi-stage system in which two stages are able to approach each other.SOLUTION: There is provided a method for controlling a multi-stage system. The multi-stage system comprises: a stator extending parallel in a first direction; and first and second stages that are moveable relative to the stator. The stages have a magnet system to generate a magnetic field. The stator has a plurality of coils. The coils interact with the magnetic fields to position the stages relative to the stator. The method includes: determining the positions of the stages; selecting first and second subsets of coils that may have a non-negligible interaction with the magnetic field of each of the first and the second stages; and driving electric coils of both subsets. Driving the coils includes: determining the coils that are a part of both subsets; and excluding a coil that is a part of both subsets from a driving target.

    Abstract translation: 要解决的问题：提供两级能够彼此接近的多级系统。 解决方案：提供了一种用于控制多级系统的方法。 多级系统包括：沿第一方向平行延伸的定子; 以及相对于定子可移动的第一和第二级。 这些级具有产生磁场的磁体系统。 定子具有多个线圈。 线圈与磁场相互作用以相对于定子定位。 该方法包括：确定阶段的位置; 选择可能与第一和第二级中的每一个的磁场具有不可忽略的相互作用的第一和第二线圈子集; 并驱动两个子集的电线圈。 驱动线圈包括：确定作为两个子集的一部分的线圈; 并且排除作为来自驾驶目标的两个子集的一部分的线圈。 版权所有（C）2013，JPO＆INPIT

    Method of measuring property of dynamic positioning error in lithographic apparatus, data processing apparatus, and computer program product
    64.
    发明专利
    Method of measuring property of dynamic positioning error in lithographic apparatus, data processing apparatus, and computer program product 有权
    数字处理设备和计算机程序产品测量动态定位错误属性的方法

    公开(公告)号：JP2011142319A

    公开(公告)日：2011-07-21

    申请号：JP2010280598

    申请日：2010-12-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STAALS FRANK ,  VAN DER LAAN HANS ,  HOFMANS GERARDUS CAROLUS JOHANNUS ,  MAGNUSSON SVEN GUNNAR KRISTER ,  BUTLER HANS

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70666 ,  G03F7/70725 ,  G03F9/7088

    Abstract: PROBLEM TO BE SOLVED: To improve the measurement of a variability of MSD that influences the uniformity of CD.
    SOLUTION: A test method includes operating a lithographic apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes (504). Variations (CDU) in the error (CD) in an applied pattern are measured for different frequencies and amplitudes of the injected error over a frequency band of interest for a given axis. Calculation using the measurements and knowledge of the frequencies injected (508, 510) allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency. Based on parameters of patterning operations and a relationship between the injected axis and the measured axis, a correlation function (CF) is used in the calculation. A CD sensitivity is measured by operating the apparatus at a reduced speed and injecting errors at frequencies determined by the null frequency of scanning slit filter response.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：改善影响CD均匀性的MSD变异性的测量。 解决方案：测试方法包括多次操作光刻设备，同时在不同的特定频率和轴处故意施加相对大的动态定位误差（504）。 对于给定轴的感兴趣频带上的注入误差的不同频率和幅度，测量应用模式中误差（CD）中的变化（CDU）。 使用测量和注入频率知识进行计算（508,510）可以分析与每个注入的误差频率相关的频带中的动态定位误差变化。 基于图案化操作的参数和注入轴与测量轴之间的关系，在计算中使用相关函数（CF）。 通过以降低的速度操作设备并且以由扫描狭缝滤波器响应的零频率确定的频率注入误差来测量CD灵敏度。 版权所有（C）2011，JPO＆INPIT

    Lithographic device and patterning device
    65.
    发明专利
    Lithographic device and patterning device 有权
    光刻设备和图案设备

    公开(公告)号：JP2011109083A

    公开(公告)日：2011-06-02

    申请号：JP2010236005

    申请日：2010-10-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF

    IPC: H01L21/027

    CPC classification number: G03F7/7085 ,  G03F7/70358 ,  G03F7/70516

    Abstract: PROBLEM TO BE SOLVED: To enhance projection accuracy in a lithographic device. SOLUTION: The lithographic device is equipped with an illumination system constituted to adjust an irradiation beam, a supporting body constituted to support a patterning device capable of forming a patterned irradiation beam by setting a pattern on the sectional surface of the irradiation beam, a substrate table constituted to support a substrate, and a projection system constituted to project the patterned irradiation beam to the target of the substrate. Furthermore, the lithographic device has a projection and transcription measuring structure to measure the optical projection and transcription data of the projection system. The projection and transcription measuring structure is equipped with an optical device to introduce a measuring beam into the projection system during scanning, a detector to detect the measuring beam passing through the projection system during scanning, and a measuring processor to determine the optical projection and transcription data from the detected measuring beam. The optical device and the detector are arranged at the upper-stream end of the projection system. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提高光刻设备中的投影精度。 解决方案：光刻设备配备有用于调节照射束的照明系统，支撑体，其构造成支撑能够通过在照射光束的截面上设置图案来形成图案化照射光束的图案形成装置， 构成为支撑基板的基板台，以及将图案化的照射光束投射到基板的靶上的投影系统。 此外，光刻设备具有投影和转录测量结构，以测量投影系统的光学投影和转录数据。 投影和转录测量结构配备有在扫描期间将测量光束引入投影系统的光学装置，用于检测在扫描期间通过投影系统的测量光束的检测器，以及用于确定光学投影和转录的测量处理器 来自检测的测量光束的数据。 光学装置和检测器布置在投影系统的上游端。 版权所有（C）2011，JPO＆INPIT

    Imprint lithography apparatus
    66.
    发明专利
    Imprint lithography apparatus 有权
    IMPRINT LITHOGRAPHY APPARATUS

    公开(公告)号：JP2011023715A

    公开(公告)日：2011-02-03

    申请号：JP2010147032

    申请日：2010-06-29

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JEUNINK ANDRE BERNARDUS ,  BANINE VADIM YEVGENYEVICH ,  BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  KRUIJT-STEGEMAN YVONNE WENDELA

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

    Abstract: PROBLEM TO BE SOLVED: To avoid a problem related to expansion and contraction of a template. SOLUTION: The imprint lithography apparatus is arranged away from a substrate holder 58 and arranged between a structure 64 and the substrate holder 58 during the use of imprint template arrangements 50, 52. The structure 64 includes one or more arrays of lines or one or more encoders, and a substrate 56 or the substrate holder 58 and the imprint template have one or more encoders 68 that face the one or more arrays of lines or one or more arrays of lines that face the one or more encoders 68. The configuration determination arrangement is configured to determine a relative configuration between the substrate 56 or substrate holder 58 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the substrate 56 or substrate holder 58. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：避免与模板的伸缩有关的问题。 解决方案：压印光刻设备远离衬底保持器58布置，并且在使用压印模板布置50,52期间布置在结构64和衬底保持器58之间。结构64包括一个或多个线阵列或 一个或多个编码器以及衬底56或衬底保持器58和压印模板具有面向一个或多个线阵列或面向一个或多个编码器68的线阵列的一个或多个编码器68。 配置确定装置被配置为确定衬底56或衬底保持器58和结构64之间的相对配置，和/或压印模板布置50,52和结构64之间的相对配置，和/或其间的相对配置 压印模板布置50,52和基板56或基板支架58.版权所有：（C）2011，JPO＆INPIT

    Projection assembly and the lithographic apparatus
    68.
    发明专利
    Projection assembly and the lithographic apparatus 有权
    投影装配和平版印刷设备

    公开(公告)号：JP2010093253A

    公开(公告)日：2010-04-22

    申请号：JP2009225779

    申请日：2009-09-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS

    IPC: H01L21/027 ,  F16F15/02

    CPC classification number: G03B27/42 ,  F16F7/1011 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a projection assembly wherein the bandwidth for which vibrations of the projection system or parts thereof can be damped, is increased. SOLUTION: The projection assembly PA includes: a projection system PS; and a damper system including an interface damping mass IDM and an active damping subsystem configured to dampen a vibration of at least part of the interface damping mass IDM. The interface damping mass IDM is connected to the projection system PS. The active damping subsystem includes a sensor SENS configured to measure a position of the interface damping mass IDM, an electromagnetic actuator ACT configured to exert a force on the interface damping mass IDM, and a controller CONT configured to drive the electromagnetic actuator ACT based on signals provided by the sensor SENS. The active damping subsystem includes a reaction mass RM for the electromagnetic actuator, configured to exert a counterforce based on a signal provided by the first sensor. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种投影组件，其中投影系统或其部件的振动可被阻尼的带宽增加。

    解决方案：投影组件PA包括：投影系统PS; 以及阻尼器系统，其包括界面阻尼块IDM和被配置为抑制至少部分界面阻尼块IDM的振动的主动阻尼子系统。 接口阻尼质量IDM连接到投影系统PS。 主动阻尼子系统包括被配置为测量接口阻尼质量IDM的位置的传感器SENS，被配置为对接口阻尼质量IDM施加力的电磁致动器ACT以及被配置为基于信号驱动电磁致动器ACT的控制器CONT 由传感器SENS提供。 主动阻尼子系统包括用于电磁致动器的反作用质量RM，其构造成基于由第一传感器提供的信号施加反作用力。 版权所有（C）2010，JPO＆INPIT

    Support device and lithographic apparatus
    69.
    发明专利
    Support device and lithographic apparatus 有权
    支持设备和平面设备

    公开(公告)号：JP2009299896A

    公开(公告)日：2009-12-24

    申请号：JP2009163911

    申请日：2009-07-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  AUER FRANK ,  DUIJNHOVEN MARTINUS V ,  GERTRUDIS MEIJERS PIETER J ,  VAN DER TOORN JAN-GERARD C ,  DE PEE JOOST

    IPC: F16F15/04 ,  F16F15/02 ,  H01L21/027

    CPC classification number: G03F7/709 ,  F16F9/003 ,  F16F9/3235 ,  F16F15/0232 ,  F16F15/0275 ,  G03F7/70833

    Abstract: PROBLEM TO BE SOLVED: To provide a support device and a lithographic apparatus small in rigidity.
    SOLUTION: An air mount 20 includes gas 8 between a gas chamber wall 10 and a movable member 12, and thus, provides a supporting force between a target 4 and a floor 6. In the air mount 20, a flexible film 22 is formed on the gas chamber wall 10. When pressure in a gas chamber is increased, the flexible film 22 is moved outwardly. Thus, the volume of the gas chamber is increased so as to at least partially compensate an increase in the pressure. When the pressure in the gas chamber is reduced, the flexible film 22 is moved inwardly. Thus, the volume of the gas chamber is reduced so as to at least partially compensate a decrease in the pressure. Therefore, the flexible film 22 effectively alleviates an effect of vibration on the gas chamber wall 10, and the rigidity of the air mount 20 is effectively reduced.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供刚性小的支撑装置和光刻设备。 解决方案：空气支架20包括在气体室壁10和可动构件12之间的气体8，从而在目标4和地板6之间提供支撑力。在空气支架20中，柔性膜22 形成在气室壁10上。当气室中的压力增加时，柔性膜22向外移动。 因此，增加了气室的体积，以便至少部分地补偿压力的增加。 当气室中的压力减小时，柔​​性膜22向内移动。 因此，气室的体积减小，以便至少部分地补偿压力的降低。 因此，柔性膜22有效地减轻了对气室壁10的振动的影响，并且有效地降低了空气支架20的刚度。 版权所有（C）2010，JPO＆INPIT

    Stage system calibration method, stage system and lithographic apparatus with such stage system
    70.
    发明专利
    Stage system calibration method, stage system and lithographic apparatus with such stage system 有权
    阶段系统校准方法，阶段系统和具有这种系统的平面设备

    公开(公告)号：JP2009271062A

    公开(公告)日：2009-11-19

    申请号：JP2009095375

    申请日：2009-04-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/00 ,  G01D5/36 ,  H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70775 ,  G03F7/70516

    Abstract: PROBLEM TO BE SOLVED: To achieve accurate calibration of encoder stage position measurement. SOLUTION: In a calibration method to calibrate an encoder position measurement system of a stage, the encoder position measurement system includes an encoder grid and at least two sensor heads cooperating with the encoder grid, each sensor head providing a sensor head output signal showing position sensitivity in a horizontal and a vertical direction, and the method includes: (a) moving the stage such that the sensor heads are moved with respect to the encoder grid, or vice versa; (b) during the moving, measuring the position of the stage with respect to the encoder grid by the two sensor heads; (c) determining a vertical position data map from the sensor head output signals of the two sensor heads; (d) calculating a horizontal position data map from the vertical position data map; and (e) calibrating the encoder position measurement system by using the calculated horizontal position data map. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：实现编码器级位置测量的精确校准。 解决方案：在用于校准级的编码器位置测量系统的校准方法中，编码器位置测量系统包括编码器网格和与编码器网格协作的至少两个传感器头，每个传感器头提供传感器头部输出信号 显示在水平和垂直方向上的位置灵敏度，并且该方法包括：（a）移动台，使得传感器头相对于编码器网格移动，反之亦然; （b）在移动期间，通过两个传感器头测量相对于编码器网格的平台位置; （c）从所述两个传感器头的所述传感器头输出信号确定垂直位置数据图; （d）从垂直位置数据图计算水平位置数据图; 和（e）使用计算出的水平位置数据图校准编码器位置测量系统。 版权所有（C）2010，JPO＆INPIT

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