公开(公告)号：JP2009246384A

公开(公告)日：2009-10-22

申请号：JP2009169087

申请日：2009-07-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To disclose varieties of pressure adjusting means in order to reduce pressure gradient in a liquid supply system of a lithography apparatus. SOLUTION: The liquid supply system includes a liquid sealing structure constituted so as to at least partially close liquid between a projection system of a lithography apparatus and a substrate table. There is the possibility that high pressure gradient might cause particulate contamination in the liquid supply system/in sealing liquid structure. The pressure gradient is reduced for example by means of the use of slow switching of one valve or a plurality of valves, by means of the use of an extraction flow detouring one valve or a plurality of valves or passing through the valve, not switching the valve to a closed position or additionally to by means of the use of a branch for liquid flowing to a liquid discharge passage, by means of the use of a pressure control device or a flow rate limiter for preventing shock waves, and by means of the use of liquid/damper of a buffering capacity for compensating pressure variation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了降低光刻设备的液体供应系统中的压力梯度，公开各种压力调节装置。 解决方案：液体供应系统包括液体密封结构，其构造成在光刻设备的投影系统和基板台之间至少部分地关闭液体。 高压梯度有可能导致液体供应系统/密封液体结构中的颗粒污染。 例如，通过使用一个阀或多个阀的缓慢切换，通过使用迂回一个阀或多个阀或通过阀的提取流来降低压力梯度，而不切换 阀门到关闭位置，或另外通过使用液体流向液体排放通道的分支，借助于使用压力控制装置或流量限制器来防止冲击波，并借助于 使用缓冲能力的液体/阻尼器来补偿压力变化。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009218587A

公开(公告)日：2009-09-24

申请号：JP2009045257

申请日：2009-02-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KIVITS KOEN ,  JANSEN HANS ,  MATTHIAS SERAO VASCO MIGUEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a system which cleans an object located on a limited area on the upper surface of a substrate table or the upper surface of the substrate table. SOLUTION: An optical system used in an usual imaging is adjusted to limit a sectional area of a radiation beam and form a cleaning radiation beam correspondent to the limited area. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洁位于衬底台的上表面或衬底台的上表面上的有限区域上的物体的系统。 解决方案：调整在通常成像中使用的光学系统以限制辐射束的截面面积并形成与受限区域对应的清洁辐射束。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009164622A

公开(公告)日：2009-07-23

申请号：JP2009043678

申请日：2009-02-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERHAGEN MARTINUS CORNELIS MAR ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS L H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, and to provide a device manufacturing method. SOLUTION: A liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus, and has a liquid confinement structure 12 fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered with the liquid during exposure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，并提供一种器件制造方法。 解决方案：液体供应系统被配置为将液体供应到基板W和光刻设备的投影系统PL之间的区域，并且具有固定在基本上垂直于光刻设备的光轴的平面中的液体限制结构12 投影系统PL并且被配置为保持基板W，以便将液体限制在基板台WT的上表面上方的区域，使得在曝光期间待暴露的基板W的一侧基本上被液体覆盖。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033163A

公开(公告)日：2009-02-12

申请号：JP2008187826

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus. SOLUTION: The lithographic apparatus has an in-situ ozonizer used for generating ozone gas by the UV radiation of gas containing oxygen. Ozone generated in this manner is dissolved in ultra-pure water and becomes a cleaning liquid by allowing the ozone to come into contact with the ultra-pure water through a permeable membrane. The cleaning liquid passes through an immersion hood to remove contamination on the surface of an immersion space. The used cleaning liquid is fed to an outlet system from the immersion hood with air and ozone gas confined in the immersion hood. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 解决方案：光刻设备具有用于通过含氧气体的紫外线辐射产生臭氧气体的原位臭氧发生器。 以这种方式产生的臭氧被溶解在超纯水中，并且通过允许臭氧通过可渗透膜与超纯水接触而变成清洁液体。 清洗液通过浸没罩以去除浸没空间表面上的污染物。 使用的清洁液体从浸没罩被供给到出口系统，空气和臭氧气体限制在浸没罩中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009016838A

公开(公告)日：2009-01-22

申请号：JP2008173127

申请日：2008-07-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOO ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN BOGAARD FREDERICK JOHA ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method for removing contamination from a device used for lithography as an immersion liquid may be contaminated by resist separated from a substrate or the layer deposited on the substrate or particles or flakes of other materials and such contamination, and can make it difficult or impossible to correctly project a (patterned) beam of radiation on the substrate via the immersion liquid. SOLUTION: The method comprises mounting the substrate on a device, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the device from which the contamination is removed, and introducing a relative motion between the deformable layer and the surface of the device from which the contamination is removed, thereby separating the contamination from the surface for removal, taking and removing the separated contamination. Other embodiments are described and claimed. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种从用于平版印刷的装置中去除污染物的方法作为浸没液体可能被从基底或沉积在基底上的层或其它材料的颗粒或薄片等分离的抗蚀剂污染 污染，并且可能使得难以或不可能通过浸没液体将（图案化的）辐射束正确投影到基底上。 解决方案：该方法包括将衬底安装在器件上，衬底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得衬底的可变形层与器件的表面接触， 污染被去除，并且在可变形层和去除污染物的装置的表面之间引入相对运动，从而将污染物与表面分离，以除去，取出和除去分离的污染物。 描述和要求保护其他实施例。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008277854A

公开(公告)日：2008-11-13

申请号：JP2008161707

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of a liquid immersion lithographic apparatus. SOLUTION: A cleaning fluid is introduced into a space between the projection system and the substrate table of the lithographic apparatus using the liquid supply system of the lithographic apparatus. Additionally or replacing above, a cleaning device is installed on the substrate table, or an ultrasonic emitter is provided for generating an ultrasonic liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗液浸式光刻设备内部的方法和设备。 解决方案：使用光刻设备的液体供应系统将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 另外或者更换以上，清洁装置安装在基板台上，或者提供超声发射器用于产生超声波液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007013150A

公开(公告)日：2007-01-18

申请号：JP2006176023

申请日：2006-06-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOL ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus preventing the existence of bubbles in a liquid through which an emitted projection beam is passed, or taking countermeasures to reduce them.
SOLUTION: This is performed, for example, by ensuring that a gap between a substrate and a substrate table is filled with an immersion liquid, or by inducing a local flow from an optical axis toward a radially outward side in the vicinity of the edge of the substrate.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其防止在发射的投射光束通过的液体中存在气泡，或采取对策来减少它们。 解决方案：例如，这通过确保衬底和衬底台之间的间隙被浸没液体填充，或者通过引起局部从光轴朝向径向向外的侧面 衬底的边缘。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005294839A

公开(公告)日：2005-10-20

申请号：JP2005100831

申请日：2005-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7096 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment that has improved focusing, for example, in immersion lithography equipment. SOLUTION: A substrate is exposed to light in an immersion liquid supplied from a liquid supply system. Before exposure, a map of the substrate surface is generated at a measuring section. The liquid supply system fills the space between a measuring system and the substrate with a liquid so that measurement is performed in the liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供例如在浸没式光刻设备中改进聚焦的光刻设备。 解决方案：将衬底暴露于从液体供应系统供应的浸没液中的光。 在曝光之前，在测量部分产生基板表面的图。 液体供应系统用液体填充测量系统和基板之间的空间，以便在液体中进行测量。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005150734A

公开(公告)日：2005-06-09

申请号：JP2004328567

申请日：2004-11-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012138631A

公开(公告)日：2012-07-19

申请号：JP2012088182

申请日：2012-04-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets on a last optical element or substantially to avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. A humid gas space is defined between the projection system, the liquid confinement structure and the immersion liquid in the immersion space, the humid gas space being configured to confine humid gas.

Abstract translation: 要解决的问题：提供一种降低液滴对最后一个光学元件的影响或基本上避免这种液滴形成的系统。 解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。 在投影系统，液体限制结构和浸没空间中的浸没液体之间限定湿气空间，湿气空间被配置为限制湿气。 版权所有（C）2012，JPO＆INPIT