公开(公告)号：JP2005183959A

公开(公告)日：2005-07-07

申请号：JP2004361720

申请日：2004-12-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  NEERHOF HENDRIK ANTONY JOHANNE ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  LE KLUSE MARCO

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: H01L21/6831 ,  G03F7/707 ,  G03F7/70708

Abstract: PROBLEM TO BE SOLVED: To provide a substrate holder in which a fixing force between the top face of the substrate holder and the rear of a substrate is out of the question. SOLUTION: A lithographic device contains an illumination system supplying the beams of a radiation, and an article supporter supporting a flat article arranged in the path of the beam of the radiation. The lithographic device further contains a back-fill gas supply arranged to the article supporter for supplying the rear of the article with a back-fill gas when the back-fill gas supply is supported by a supporting means and a clamp clamping the article to the article supporter during a projection. The device based on one mode has a controller adjusting the clamp and/or a back-fill supply pressure with the object of the release of the clamp before the back-fill gas supply pressure is reduced. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种基板保持器，其中基板保持器的顶面和基板的后部之间的固定力不在问题之中。 解决方案：光刻设备包含供应辐射束的照明系统和支撑布置在辐射束的路径中的平坦物品的物品支撑件。 平版印刷装置还包含一个背面填充气体供应装置，该填充气体供应装置设置在物品支撑件上，用于当背面填充气体供应由支撑装置支撑时，用于向物品的后部供应填充气体，夹具将夹具夹持到 投影中的物品支持者。 基于一种模式的装置具有控制器，在填充气体供应压力降低之前，调整夹具和/或补充供给压力，释放夹具。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005175490A

公开(公告)日：2005-06-30

申请号：JP2004356114

申请日：2004-12-09

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOX WILHELMUS JOSEPHUS ,  GILLISEN NOUD JAN ,  OTTENS JOOST JEROEN

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a lithography system and a device manufacturing method in which a wafer chuck is thermally satisfactorily adjusted. SOLUTION: The lithography system is provided, comprising an illumination system for providing a radiation beam, and a support structure for supporting a pattern forming device. The pattern forming device functions to pattern a sectional face of the radiation beam. Also, the lithography system has a substrate table for holding a substrate, and a projection system for projecting a patterned beam on a target portion of the substrate. The lithography system further has a chuck for supporting a target object and a frame for supporting the chuck over other portion of the lithography system. The chuck is thermally separated from at least the frame. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻系统和装置制造方法，其中晶片卡盘被热满意地调节。 解决方案：提供光刻系统，其包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于对辐射束的截面进行图案化。 此外，光刻系统具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻系统还具有用于支撑目标物体的卡盘和用于将卡盘支撑在光刻系统的其它部分上的框架。 卡盘与至少框架热分离。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005123627A

公开(公告)日：2005-05-12

申请号：JP2004301690

申请日：2004-10-15

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  BAKKER LEVINUS PIETER ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN ,  SCHUURMANS FRANK JEROEN PIETER ,  VAN DER WERF JAN EVERT

IPC: G03F7/20 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

Abstract: PROBLEM TO BE SOLVED: To provide a device manufacturing method, a lithographic apparatus, and a device manufactured by it. SOLUTION: The device manufacturing method includes the steps of supplying a substrate W, supplying a projection radiation beam PB by using an illumination system IL, using a patterning means MA so as to furnish a pattern to a cross-section of the projection beam PB, sequentially projecting the patterned radiation beam PB to some external target parts CO of the substrate W, prior to projecting the beam on an internal target part CI of the substrate W, and separating each of the continuous external target parts CO i+1 , by spaces from external target parts CO i that precede the continuous external parts CO i+1 . COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种器件制造方法，光刻设备及其制造的器件。 解决方案：器件制造方法包括以下步骤：使用图案形成装置MA提供衬底W，通过使用照明系统IL提供投影辐射束PB，以便向突起的横截面提供图案 在将光束投射到基板W的内部目标部分CI之前，将图案化的辐射束PB顺序地投影到基板W的一些外部目标部分CO，并且分离连续的外部目标部分CO i + 1 ，在外连续的外部部分CO i + 1之前的外部目标部分CO i 之间。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005039274A

公开(公告)日：2005-02-10

申请号：JP2004207032

申请日：2004-07-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  Y10T279/23

Abstract: PROBLEM TO BE SOLVED: To provide photolithographic equipment which solves the problem wherein supporting of a wafer becomes unequal near the border of a substrate holder, and flattens a substrate by a method controllable near the edge of the substrate. SOLUTION: The lithographic projection equipment comprises a radiation system for supplying a projection beam of radiation, a support structure member for supporting a patterning means which serves to patternize the projection beam according to a desired pattern, the substrate holder which has a plurality of projection forming the projection configurations of supplying mostly flat supporting face to support an almost flat substrate, and the projection system of projecting the beam patternized on the target section of the substrate. The substrate holder comprises at least one clamped electrode for generating electric field, in order to clamp the substrate against the substrate holder by the electric field; further, a peripheral supporting edge portion is arranged so that it touches the substrate. At least one electrode extends across the peripheral supporting edge portion. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，其解决了在基板保持器的边界附近的晶片的支撑不平等的问题，并且通过在基板的边缘附近可控制的方法使基板平坦化。 解决方案：光刻投影设备包括用于提供投射辐射束的辐射系统，用于支撑用于根据期望图案对投影光束进行图案化的图案形成装置的支撑结构构件，具有多个 的突起形成突起构造，其主要供应平坦的支撑面以支撑几乎平坦的基底;以及投影系统，其投影图案化在基底的目标部分上的光束。 衬底保持器包括用于产生电场的至少一个夹持电极，以便通过电场将衬底夹持在衬底保持器上; 此外，外围支撑边缘部分被布置成使其接触基板。 至少一个电极延伸穿过周边支撑边缘部分。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004343110A

公开(公告)日：2004-12-02

申请号：JP2004138363

申请日：2004-05-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MIEDEMA JAN REIN ,  OTTENS JOOST JEROEN

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus wherein although during processings in a lithography projection apparatus a wafer is clamped onto a wafer holder with retaining force such as vacuum, and although when the wafer is released from the wafer holder after the completion of the processings, releasing force is applied to the wafer by an exhaust pin, the wafer and/or the wafer holder might be damaged in the last step of the release of energy stored in the wafer due to distortion by the releasing force, so that such harmful energy is prevented from being left behind. SOLUTION: The wafer retained on the wafer holder is released by applying the releasing force by a discharge pin. Since the releasing force is weakened by a control device just before final release, the quantity of energy absorbed by the wafer is decreased, and hence the energy during the release is prevented from damaging the wafer and/or the wafer holder. Further, surplus energy may be absorbed by providing a protective rim on an outer periphery of protrusions forming the retaining surface of the wafer holder. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004214653A

公开(公告)日：2004-07-29

申请号：JP2003422401

申请日：2003-12-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN BALLEGOIJ ROBERTUS NICODEM ,  CUIJPERS MARTINUS AGNES WILLEM ,  MEIJERS PIETER J G ,  VAN NUNEN GERARDUS P M ,  OTTENS JOOST JEROEN

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a substrate holder which can clamp a concave substrate more securely. SOLUTION: A substrate holder 10 has burls 12 having a height of 100 μm or less and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thus, a concave wafer W' can be securely clamped by generating an initial vacuum in the central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen so that the wafer is fully clamped. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004104114A

公开(公告)日：2004-04-02

申请号：JP2003296503

申请日：2003-08-20

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HOEKS MARTINUS HENDRICUS HENDR ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H02N13/00 ,  H01L21/68

CPC classification number: G03F7/70708 ,  G03F7/707 ,  H01L21/6833

Abstract: PROBLEM TO BE SOLVED: To provide an electrostatic chuck, capable of suppressing a Johnson-Rahbek effect to a minimum and further increasing the throughput of a substrate. SOLUTION: In this device, an electrostatic chuck 10 is provided with a dielectric element 12, with a plurality of pins 16, having at least a conductive layer on the surface making contact with an article formed on a first surface. The article is secured at a fixed position on the chuck 10, by applying potential difference between an electrode 14 that is located on the surface of a dielectric member on a side opposite to the securing surface and an electrode 20, that is located on the securing surface of the article 18 to be secured. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2012147003A

公开(公告)日：2012-08-02

申请号：JP2012055728

申请日：2012-03-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS J M ,  OTTENS JOOST JEROEN ,  STOELDRAIJER JUDOCUS MARIE DOMINICUS ,  DE KORT ANTONIUS J ,  FRANCISCUS VAN DE MAST ,  DE JONG MARTEIJN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70858 ,  G03F7/70516 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To compensate disturbance on a mirror surface.SOLUTION: A lithographic apparatus includes a system for compensating the effect of heat strain of a substrate table WT on position measurement of the substrate table WT by using lateral mirrors 66 and 68 in the substrate table WT. The lithographic apparatus is calibrated by using various substrate table scan loci, and measurement of rotation and local position of the lateral mirrors 66 and 68 in the substrate table WT. A dual stage lithographic apparatus is so provided with an alignment mark for specifying geometric shape of the lateral mirrors 66 and 68 used only by an exposure station, as to measure the geometric shape of the lateral mirrors 66 and 68 in the case where the substrate table WT is at a measurement station.

Abstract translation: 要解决的问题：补偿镜面上的干扰。 光刻设备包括用于通过使用衬底台WT中的侧向反射镜66和68补偿衬底台WT的热应变对衬底台WT的位置测量的影响的系统。 通过使用各种衬底台扫描位置校准光刻设备，以及测量衬底台WT中侧向反射镜66和68的旋转和局部位置。 双级光刻设备设置有用于指定仅由曝光站使用的侧面反射镜66和68的几何形状的对准标记，以便在衬底台的情况下测量侧面反射镜66和68的几何形状 WT在测量站。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011205128A

公开(公告)日：2011-10-13

申请号：JP2011129964

申请日：2011-06-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  OTTENS JOOST JEROEN ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  SERGEI SHULEPOV

IPC: H01L21/027

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To make liquid to be removed from a gap between the edge of an object and a substrate table on which the object is placed.SOLUTION: For example, in the embodiment of the drain pipe 10 of the lithographic projection apparatus, the inflow of gas into the drain pipe is reduced in a period the liquid is absent at all in a drain pipe 10. In an embodiment, a passive liquid removal mechanism is provided so that the gas pressure in the drain pipe is the same as the ambient gas pressure. In another embodiment, a flap is prepared to close a chamber during the removing of liquid is not needed.

Abstract translation: 要解决的问题：使液体从物体的边缘与放置有物体的基板台之间的间隙移除。解决方案：例如，在平版印刷设备的排水管10的实施例中， 在排水管10中完全不存在液体的期间，气体进入排水管的流入减少。在一个实施例中，提供了一种被动液体移除机构，使排水管中的气体压力与 环境气体压力。 在另一个实施例中，在不需要去除液体的过程中制备一个瓣来关闭一个室。

公开(公告)号：JP2011192992A

公开(公告)日：2011-09-29

申请号：JP2011049279

申请日：2011-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a substrate table configured to support the substrate on a substrate supporting area and including a plurality of heaters 400 and/or temperature sensors 500 arranged adjacently to a center part of the substrate supporting area. The plurality of heaters and/or sensors are elongated in a parallel direction substantially, and extend over the substrate support area from one edge end part to an opposite edge end part. A time when they are under a projection system during a period of imaging becomes shorter than a case where an elongated direction of the heaters and/or sensors are perpendicularly oriented to a first direction. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备包括：衬底台，其被配置为将衬底支撑在衬底支撑区域上，并且包括多个与衬底支撑区域的中心部分相邻布置的加热器400和/或温度传感器500。 多个加热器和/或传感器基本上在平行方向上伸长，并且在基板支撑区域上从一个边缘端部延伸到相对边缘端部。 在成像期间它们处于投影系统下方的时间比加热器和/或传感器的细长方向垂直地朝向第一方向的情况变短。 版权所有（C）2011，JPO＆INPIT