公开(公告)号：JP2008235930A

公开(公告)日：2008-10-02

申请号：JP2008120507

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU ,  BASELMANS JOHANNES JACOBUS MAT ,  GRAEUPNER PAUL ,  ENGELEN ADRIANUS FRANCISCUS PE ,  FINDERS JOSEF MARIA ,  VAN SCHOOT JAN BERNARD PLECHEL

IPC: H01L21/027 ,  G03F7/20 ,  G03F7/207

CPC classification number: G03F7/70341 ,  G03F7/70333

Abstract: PROBLEM TO BE SOLVED: To increase focus latitude and/or stabilize contrast control of an immersion lithographic apparatus in which focus position varies when a substrate table is accelerated during exposure.
SOLUTION: The final element 50 of a projection system PL which is parallel plate used to seal the projection system from the immersion liquid 10 in the immersion lithography varies incident angle of a projected beam when it tilts relative to the optical axis of the apparatus. Focus is continuously varied at every point on the substrate by passively using force generated in this immersion liquid or by moving the final element to improve focal latitude. Moreover, several embodiments are disclosed such as inclining a projection beam against the substrate.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：当在曝光期间加速衬底台时，增加聚焦位置变化的浸没式光刻设备的对焦宽容度和/或稳定对比度控制。 解决方案：在浸没式光刻中用于将投影系统与浸没液体10密封的平行板的投影系统PL的最终元件50当投影光束相对于光刻机的光轴倾斜时的入射角度变化 仪器。 通过被动地使用在该浸液中产生的力或通过移动最终元件以改善焦点纬度，聚焦在基底上的每个点处连续变化。 此外，公开了若干实施例，例如将投射束倾斜抵靠衬底。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008078648A

公开(公告)日：2008-04-03

申请号：JP2007237470

申请日：2007-09-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  VAN DOMMELEN YOURI JOHANNES LA ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and an operation method which reduce defects caused by using an immersion liquid in an immersion liquid lithographic apparatus. SOLUTION: A lithographic apparatus comprises: a support configured to support a patterning device, where the patterning device can impart a radiation beam with a pattern in its cross-section, to form a patterned radiation beam; a substrate table configured to hold a substrate; a liquid supply system configured to provide a liquid to a local area of a top surface of a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate through the liquid; and a controller adapted to coordinate movement of the substrate table and the support during imaging of a line of dies across the substrate and this is accomplished by movement of the line of dies under the projection system backwards and/or forwards only in a direction substantially parallel to a first direction, where the first direction is in a plane substantially parallel to the top surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减少在浸没液体光刻设备中使用浸没液体引起的缺陷的设备和操作方法。 光刻设备包括：构造成支撑图案形成装置的支撑件，其中图案形成装置可以在其横截面中赋予具有图案的辐射束，以形成图案化的辐射束; 被配置为保持基板的基板台; 液体供应系统，被配置为向衬底的顶表面的局部区域提供液体; 投影系统，被配置为通过液体将图案化的辐射束投影到基板的目标部分上; 以及控制器，其适于在穿过衬底的一行模具成像期间协调衬底台和支撑件的运动，并且这通过在投影系统下方的模具线在大致平行的方向上向后和/或向前移动来实现 到第一方向，其中第一方向在基本上平行于顶表面的平面中。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007235179A

公开(公告)日：2007-09-13

申请号：JP2007159104

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006179909A

公开(公告)日：2006-07-06

申请号：JP2005364310

申请日：2005-12-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: In particular, the liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于清洁浸没式光刻设备内部的方法和设备。 特别地，光刻设备的液体供应系统可用于将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005322906A

公开(公告)日：2005-11-17

申请号：JP2005130901

申请日：2005-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU

IPC: H01L21/027 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7034 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method which eliminates the need for a double stage in an immersion exposure divice and enables quick and accurate measurement of height.
SOLUTION: Immersion lithography equipment comprises a single stage, where the height of a substrate is measured, and exposure is performed at the same time; measurement information is stored by a sensor for measuring the height of the substrate, and the stored information is read to control the positioning of the substrate, such that a measured part is moved from a projection optical system underneath the optical axis separated by a predetermined distance.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种在浸没曝光分离中不需要双阶段的方法，并且能够快速和准确地测量高度。 解决方案：浸渍光刻设备包括单个阶段，其中测量基底的高度，同时进行曝光; 测量信息由用于测量基板的高度的传感器存储，并且读取所存储的信息以控制基板的定位，使得测量部分从光轴下方的预定距离的投影光学系统移动 。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005303316A

公开(公告)日：2005-10-27

申请号：JP2005115241

申请日：2005-04-13

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of a immersion lithographic equipment which is made so as to prevent contamination due to an immersion liquid.
SOLUTION: A substrate table WT is provided with a drainage groove, i.e. a barrier 40 which surrounds an outer periphery of a substrate W and a barrier 100 which surrounds another object 20 such as a sensor which exists in the substantially same surface as the upper surface of the substrate W. Since the barriers 40 and 100 can collect all liquid which falls from a liquid feed system while exposing the substrate W, a risk that fine components of the lithographic projection equipment is contaminated is reduced.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被制成以防止由于浸没液体而引起的污染。 解决方案：衬底台WT设置有排水槽，即围绕衬底W的外周的阻挡层40和围绕另一物体20的阻挡物100，例如传感器，其存在于基本相同的表面中 基板W的上表面。由于阻挡层40和100可以收集从液体供给系统落下的所有液体同时暴露基板W，所以降低了光刻投影设备的精细分量被污染的风险。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005051215A

公开(公告)日：2005-02-24

申请号：JP2004190786

申请日：2004-06-29

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MULKENS JOHANNES CATHARINUS HU ,  ANTONIUS THEODORUS ANNA MARIA ,  LOF JOERI ,  SIMON KLAUS ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7026 ,  G03F7/70341 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide leveling means which can be used in an immersion lithography apparatus.
SOLUTION: Measuring devices 20a and 20b for determining the height and/or inclination of a substrate W obtain the pressure and/or height of a liquid 11 in a liquid reservoir 10 of the immersion lithography apparatus. From the measurement results, it is possible to obtain the vertical position of the substrate with respect to a projection system or at least a change of the position.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供可用于浸没式光刻设备中的调平装置。 解决方案：用于确定基板W的高度和/或倾斜度的测量装置20a和20b获得浸没式光刻设备的液体储存器10中的液体11的压力和/或高度。 从测量结果可以获得基板相对于投影系统的垂直位置或者至少改变位置。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2014241425A

公开(公告)日：2014-12-25

申请号：JP2014152937

申请日：2014-07-28

Applicant: エーエスエムエル ネザーランズ ビー.ブイ. ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: 【課題】液浸投影露光装置において、基板および浸漬液の温度勾配による画像のゆがみを減じる。【解決手段】投影露光装置PLの最終段の部材、基板および浸漬液体の温度を共通の目標温度T4に調整する温度制御器を含む浸漬リトグラフ装置であって、これら構成部材の全温度を調整し、温度勾配を減少させることで、画像形成の整合性と全体的性能を向上させる。使用する手段は、フィードバック回路によって浸漬液の流速および温度を制御することを含む。【選択図】図4

公开(公告)号：JP2014158053A

公开(公告)日：2014-08-28

申请号：JP2014110008

申请日：2014-05-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller for adjusting temperature of a member in a final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Image forming consistency and whole performance can be improved, by adjusting all of the temperature of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit.

Abstract translation: 要解决的问题：为了减少由浸没投影曝光装置中的基板和浸没液中的温度梯度引起的图像失真。解决方案：浸没式光刻装置包括温度控制器，用于在投影曝光的最后阶段中调节部件的温度 设备PL，基板和浸入液体到共同目标温度T4。 通过调节这些结构件的所有温度和降低温度梯度，可以提高成像的一致性和整体性能。 用于调节温度的手段可以包括通过反馈电路来控制浸入液体的流量和温度。

公开(公告)号：JP2012182498A

公开(公告)日：2012-09-20

申请号：JP2012135571

申请日：2012-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which generation of bubbles in the immersion liquid is reduced.SOLUTION: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate. The confinement structure having a buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface. The recess, when in use, is normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 解决方案：浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间。 具有缓冲表面的约束结构在使用时位于基本上包括基板的上表面的平面和保持基板的基板台之间，以限定具有流动阻力的通道。 在缓冲表面设有凹槽。 当使用时，凹槽通常充满浸没液体，以便当间隙在缓冲表面下移动时，能够快速填充衬底和衬底台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2012，JPO＆INPIT