公开(公告)号：JP2013080002A

公开(公告)日：2013-05-02

申请号：JP2011218546

申请日：2011-09-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TAKIZAWA HIROO ,  IWATO KAORU ,  TSUBAKI HIDEAKI

IPC: G03F7/038 ,  C08F220/18 ,  G03F7/004 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method capable of simultaneously satisfying high sensitivity, high resolution (such as high resolution power), and high line width roughness (LWR) performance at an extremely high level, an electron beam sensitive or extreme ultraviolet ray sensitive resin composition and a resist film, and to provide a method for manufacturing an electronic device and an electronic device using the same.SOLUTION: A pattern forming method includes; (1) forming a film using an electron beam sensitive or extreme ultraviolet ray sensitive resin composition; (2) exposing the film with an electron beam or an extreme ultraviolet ray; and (3) developing the exposed film using a developer including an organic solvent. The electron beam sensitive or extreme ultraviolet ray sensitive resin composition includes: (A) a resin having a repeating unit (R) having a structural moiety decomposed by irradiation with an electron beam or an extreme ultraviolet ray to generate an acid; and (B) a solvent.

Abstract translation: 要解决的问题：为了提供能够以极高水平同时满足高灵敏度，高分辨率（例如高分辨率功率）和高线宽粗糙度（LWR）性能的图案形成方法，电子束敏感 或极紫外线敏感性树脂组合物和抗蚀剂膜，并且提供一种制造电子器件的方法和使用该方法的电子器件。 解决方案：图案形成方法包括： （1）使用电子束敏感或极紫外线敏感性树脂组合物形成膜; （2）用电子束或极紫外线曝光胶片; 和（3）使用包含有机溶剂的显影剂显影曝光的膜。 电子束敏感或极紫外线敏感性树脂组合物包括：（A）具有通过用电子束照射或极紫外线分解的结构部分的重复单元（R）的树脂以产生酸; 和（B）溶剂。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013076946A

公开(公告)日：2013-04-25

申请号：JP2011218278

申请日：2011-09-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  ITO JUNICHI ,  MATSUDA TOMOKI ,  FUKUHARA TOSHIAKI ,  TANGO NAOHIRO ,  IWATO KAORU ,  YOSHITOME MASAHIRO ,  SUGIYAMA SHINICHI ,  TOKUGAWA YOKO

IPC: G03F7/039 ,  C08F220/28

CPC classification number: G03F7/038 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition capable of suppressing occurrence of pattern collapse and improving line edge roughness, and to provide an actinic ray sensitive or radiation sensitive film and pattern forming method using the same.SOLUTION: An actinic ray sensitive or radiation sensitive resin composition includes: (A) a resin comprising a repeating unit represented by the following general formula (1) and a repeating unit that is decomposed by action of an acid to generate an alkali-soluble group; and (B) a compound generating an acid by irradiation with an actinic ray or radiation. In the general formula (1), L represents a divalent linking group. Rrepresents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.

Abstract translation: 要解决的问题：提供能够抑制图案塌陷的发生和线边缘粗糙度的光化射线敏感或辐射敏感性树脂组合物，并且提供使用其的光化学敏感或辐射敏感的膜和图案形成方法 。 光敏射线敏感性树脂组合物包括：（A）包含由以下通式（1）表示的重复单元的树脂和通过酸作用分解产生碱的重复单元 可溶组合 和（B）通过用光化射线或辐射照射产生酸的化合物。 在通式（1）中，L表示二价连接基团。 R 1 表示氢原子或烷基，Z表示环状酸酐结构。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012159688A

公开(公告)日：2012-08-23

申请号：JP2011019327

申请日：2011-01-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  FUJITA MITSUHIRO ,  TOKUGAWA YOKO ,  MATSUDA TOMOKI

IPC: G03F7/004 ,  C08F20/28 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of reducing generation of scum and giving a pattern excellent in in-plane uniformity of line width (CDU (critical dimension uniformity)), and to provide a resist film and a pattern forming method using the composition.SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that has a repeating unit represented by general formula (1) and exhibits increase in solubility with an alkali developing solution by an action of an acid; (B) an onium salt compound that has a nitrogen atom in a cationic moiety and is decomposed by irradiation with actinic rays or radiation to generate an acid; and (D) a solvent. A resist film and a pattern forming method using the above composition are also provided.

Abstract translation: 要解决的问题：提供能够减少浮渣产生并产生线宽（CDU（临界尺寸均匀性））的面内均匀性优异的图案的光化射线敏感或辐射敏感性树脂组合物，以及 以提供使用该组合物的抗蚀剂膜和图案形成方法。 解决方案：提供了一种光化射线敏感或辐射敏感性树脂组合物，其包含：（A）具有由通式（1）表示的重复单元并且显示出与碱性显影溶液的溶解度增加的树脂 酸的作用 （B）在阳离子部分具有氮原子并通过用光化射线或辐射照射而分解产生酸的鎓盐化合物; 和（D）溶剂。 还提供了使用上述组合物的抗蚀剂膜和图案形成方法。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012137698A

公开(公告)日：2012-07-19

申请号：JP2010291381

申请日：2010-12-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  IWATO KAORU ,  FUJII KANA

IPC: G03F7/039 ,  C08F220/10 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an excellent in resolution such as a critical dimension with no bridge defects, LWR and DOF, and having favorable sensitivity and PED stability; and to provide a resist film using the composition, and a pattern forming method.SOLUTION: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a repeating unit of a structure represented by the following general formula (EI), a resist film using the composition, and a pattern forming method. Each of R, R, and Rindependently represents an alkyl group or a cycloalkyl group. The Rand Rmay be bonded to form a ring. Each of Rand Rindependently represents a hydrogen atom, an alkyl group or a cycloalkyl group. Each of Rand Rindependently represents a hydrogen atom or a univalent organic group. Brepresents a single bond or a bivalent linking group. The R, R, R, R, and Bmay be bonded respectively to form a ring. (*) represents a bonding hand of a main chain or a side chain bond of the resin (A).

Abstract translation: 要解决的问题：提供具有优异的分辨率的光化学敏感或辐射敏感性树脂组合物，如临界尺寸，无桥接缺陷，LWR和DOF，并且具有良好的灵敏度和PED稳定性; 并提供使用该组合物的抗蚀剂膜和图案形成方法。 提供了含有由以下通式（EI）表示的结构的重复单元，使用该组合物的抗蚀剂膜和图案形成方法的光化射线敏感或辐射敏感性树脂组合物。 独立地表示R E1 ，R E2 和R E3 烷基或环烷基。 可以将R E1 和R E2 键合以形成环。 R E4 和R E5 分别独立地表示氢原子，烷基或环烷基。 E 和R E7 中的每一个独立地表示氢原子或一价有机基团。 B c1 表示单键或二价连接基团。 R E4 ，R E5 ，R E6 ，R E7 ，并且可以分别结合B C1 以形成环。 （*）表示树脂（A）的主链或侧链键合的键。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012073402A

公开(公告)日：2012-04-12

申请号：JP2010217967

申请日：2010-09-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KATO KEITA

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/0382 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a pattern formation method which is excellent in sensitivity, capability of reducing development defects, and pattern shape in negative pattern formation with a developer containing an organic solvent, and to provide a chemical amplification type resist composition and resist film.SOLUTION: A pattern formation method includes the steps of: (i) forming a film from a chemical amplification type resist composition which contains (A) a resin of which solubility in developer containing an organic solvent reduces due to increased polarity by an action of acid, (B) a compound which generates an acid upon exposure to actinic rays or radiation, and (C) a tertiary alcohol; (ii) exposing the film; and (iii) developing with the developer containing an organic solvent.

Abstract translation: 要解决的问题：提供一种图案形成方法，其具有优异的灵敏度，减少显影缺陷的能力和使用含有有机溶剂的显影剂形成负图案的图案形状，并提供化学放大型抗蚀剂组合物 并抗拒电影。 解决方案：图案形成方法包括以下步骤：（i）从化学放大型抗蚀剂组合物形成膜，其包含（A）由于极性增加而使含有有机溶剂的显影剂的溶解度降低的树脂 酸的作用，（B）暴露于光化学射线或辐射时产生酸的化合物，和（C）叔醇; （ii）曝光胶片; 和（iii）用含有机溶剂的显影剂显影。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011215333A

公开(公告)日：2011-10-27

申请号：JP2010082701

申请日：2010-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KAMIMURA SATOSHI ,  TARUYA SHINJI ,  IWATO KAORU ,  KATAOKA SHOHEI ,  MIZUTANI KAZUYOSHI ,  DOBASHI TORU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  KATO KEITA

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/32 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a pattern having a small number of development defects, and to provide a resist composition.SOLUTION: The pattern forming method includes (A) forming a film using the resist composition, (B) exposing the film, and (C) developing the exposed film using developing solution containing an organic solvent. The resist composition contains resin containing a repeating unit having a group that is decomposed by action of acid to generate an alcoholic hydroxy group, and a solvent containing at least one of the following component (S1) and component (S2). The component (S1) is propylene glycol monochrome alkyl ether carboxylate. The component (S2) is at least one selected from a group including propylene glycol monochrome alkyl ether, lactate, acetic acid ester, alkoxy propionic acid ester, chain ketone, cyclic ketone, lactone, and alkylene carbonate.

Abstract translation: 要解决的问题：提供一种用于形成具有少量显影缺陷的图案的图案形成方法，并提供抗蚀剂组合物。解决方案：图案形成方法包括（A）使用抗蚀剂组合物形成膜（B ）曝光，和（C）使用含有机溶剂的显影溶液显影曝光的薄膜。 抗蚀剂组合物含有含有具有通过酸作用分解的基团的重复单元以产生醇羟基的树脂，和含有至少一种以下组分（S1）和组分（S2）的溶剂。 组分（S1）是丙二醇单烷基醚羧酸酯。 组分（S2）是选自丙二醇单烷基醚，乳酸，乙酸酯，烷氧基丙酸酯，链酮，环酮，内酯和碳酸亚烷基中的至少一种。

公开(公告)号：JP2011203644A

公开(公告)日：2011-10-13

申请号：JP2010072840

申请日：2010-03-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  IWATO KAORU ,  KAMIMURA SATOSHI ,  DOBASHI TORU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  MIZUTANI KAZUYOSHI ,  TARUYA SHINJI ,  KATO KEITA

IPC: G03F7/004 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/30 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/325 ,  Y10T428/24802

Abstract: PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition excellent in etching resistivity and the stability during a post-exposure delay (PED) period, and to provide a method of forming a pattern using the same.SOLUTION: The actinic-ray- or radiation-sensitive resin composition contains: a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group; and a compound that generates an acid of pKa≥-1.5 when exposed to actinic rays or radiation.

Abstract translation: 要解决的问题：提供蚀刻电阻率和曝光延迟（PED）期间的稳定性优异的光化射线或辐射敏感性树脂组合物，并提供使用其形成图案的方法。 ：光化学射线或辐射敏感性树脂组合物含有：含有重复单元的树脂，该重复单元含有当被酸作用时分解的基团，从而产生醇羟基; 以及当暴露于光化射线或辐射时产生pKa≥-1.5的酸的化合物。

公开(公告)号：JP2011033843A

公开(公告)日：2011-02-17

申请号：JP2009180211

申请日：2009-07-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  IIZUKA YUSUKE ,  SAEGUSA HIROSHI ,  HIRANO SHUJI

IPC: G03F7/039 ,  C08F220/22 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition capable of pattern formation that is improved in the pattern collapse, line edge roughness and scum occurrence, being free from any profile deterioration, and that exhibits appropriate following properties for the liquid for liquid immersion at the stage of liquid immersion exposure, while improving performance of reducing bubble defects, and to provide a method of forming a pattern with the use of the composition.
SOLUTION: The actinic ray- or radiation-sensitive resin composition includes a resin (A) which has at least two polar conversion groups, includes a repeating unit (a) having at least either a fluorine atom or a silicon atom, and exhibits increased solubility in an alkali developer by the action of an acid.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够形成图案的光化射线或辐射敏感性树脂组合物，其在图案塌陷，线边缘粗糙度和浮渣发生方面得到改善，没有任何轮廓劣化，并且表现出适当的 在液浸式暴露阶段进行液浸的液体性能，同时提高减少气泡缺陷的性能，并提供使用该组合物形成图案的方法。 光解射线或辐射敏感性树脂组合物包括具有至少两个极性转化基团的树脂（A），包括具有至少一个氟原子或硅原子的重复单元（a），和 通过酸的作用在碱性显影剂中表现出增加的溶解度。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010256879A

公开(公告)日：2010-11-11

申请号：JP2010072839

申请日：2010-03-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SUGIYAMA SHINICHI ,  TARUYA SHINJI ,  KATO TAKAYUKI ,  IWATO KAORU ,  SAEGUSA HIROSHI

IPC: G03F7/004 ,  C08F32/08 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F24/00 ,  C08F32/08 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition having good conformability to a liquid for liquid immersion during liquid immersion exposure and having good coverage dependence, from which a pattern reduced in the occurrence of watermark defects, bubble defects and development scum defects can be formed, and to provide a method for forming a pattern using the composition.
SOLUTION: The actinic ray- or radiation-sensitive resin composition comprises a hydrophobic resin (HR) containing a fluorine atom, wherein the hydrophobic resin (HR) has any of repeating units (a) of formula (I) or (II). In the formulae, each of R
1 , R
2 , R
3 and R
4 independently represents a hydrogen atom, fluorine atom, chlorine atom, carboxyl, alkyl, cycloalkyl, alkyloxy, alkylcarbonyl, arylcarbonyl, alkylcarbonyloxy, arylcarbonyloxy, alkyloxycarbonyl, aryloxycarbonyl, alkylether, arylether, hydroxyl, alkylamide, arylamide, aryl, cyano, acid-decomposable group or alkali-decomposable group.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种对于液浸期间浸液液体具有良好适应性的光化射线或辐射敏感性树脂组合物，并且具有良好的覆盖依赖性，从而降低水印缺陷发生的图案 可以形成气泡缺陷和显影浮渣缺陷，并且提供使用该组合物形成图案的方法。 光解射线或辐射敏感性树脂组合物包含含有氟原子的疏水性树脂（HR），其中疏水性树脂（HR）具有式（I）或（II）的重复单元（a） ）。 在该式中，R SB 1，R SB 2，R SB 3和R SB 4各自独立地表示氢原子 氟原子，氯原子，羧基，烷基，环烷基，烷氧基，烷基羰基，芳基羰基，烷基羰基氧基，芳基羰基氧基，烷氧基羰基，芳氧基羰基，烷基醚，芳基醚，羟基，烷基酰胺，芳基酰胺，芳基，氰基，酸可分解基团或碱可分解基团 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250076A

公开(公告)日：2010-11-04

申请号：JP2009099437

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KONDO DAISUKE ,  SAEGUSA HIROSHI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE ,  YAMAGUCHI SHUHEI

IPC: G03F7/039 ,  C08F20/26 ,  C08F32/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition, with which a pattern having good corner proximity and fewer developing defects can be formed, and which causes little elution of an acid into an immersion liquid and shows proper properties to the immersion liquid, and to provide a method for forming a pattern by using the composition. SOLUTION: The composition includes (A) a resin whose solubility with an alkali developing solution is increased by the action of an acid; (B) a compound generating an acid by irradiation with active rays or radiation; and (C) a resin containing a repeating unit having a polarity conversion group that is decomposed by the action of an alkali developing solution, to increase the solubility with the alkali developing solution, and containing at least either a fluorine atom or a silicon atom, and (D) a nitrogen-containing organic compound, having a nitrogen-containing hetero ring expressed by formula (1). In the formula, R 1 represents a 2-20C straight-chain, branched or cyclic divalent substituent forming, together with nitrogen atoms bonded to both ends, a nitrogen-containing hetero aliphatic ring or a nitrogen-containing hetero aromatic ring, which may include an oxygen atom, nitrogen atom, sulfur atom or halogen atom; R 2 represents a 2-10C straight-chain or branched alkylene group which may include a carbonyl group; and R 3 represents a saturated or unsaturated hydrocarbon group or acyl group which may include a hydroxyl group, carbonyl group, ester group, ether group, cyano group or steroid skeleton or a combination of two or more of them. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种主动射线敏感或辐射敏感性树脂组合物，可以形成具有良好角接近性和较少显影缺陷的图案，并且几乎不会使酸洗到浸液中 并且对浸渍液体显示适当的性质，并提供通过使用该组合物形成图案的方法。 解决方案：组合物包括（A）其与碱性显影液的溶解度通过酸的作用而增加的树脂; （B）通过用活性射线或辐射照射产生酸的化合物; 和（C）含有具有通过碱性显影液的作用分解的极性转换基的重复单元的树脂，以增加与碱性显影液的溶解性，并且至少含有氟原子或硅原子， 和（D）含有式（1）表示的含氮杂环的含氮有机化合物。 在该式中，R 1 表示2-20C直链，支链或环状二价取代基，与二价键合的氮原子一起形成含氮杂脂族环或含氮杂环 杂芳环，其可以包括氧原子，氮原子，硫原子或卤素原子; R 2表示可包括羰基的2-10C直链或支链亚烷基; R 3表示可以包括羟基，羰基，酯基，醚基，氰基或类固醇骨架的饱和或不饱和烃基或酰基，或者它们中的两个或多个的组合 。 版权所有（C）2011，JPO＆INPIT