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    Pattern forming method and resist composition
    61.
    发明专利
    Pattern forming method and resist composition 有权
    图案形成方法和阻力组成

    公开(公告)号：JP2011215333A

    公开(公告)日：2011-10-27

    申请号：JP2010082701

    申请日：2010-03-31

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： KAMIMURA SATOSHI ,  TARUYA SHINJI ,  IWATO KAORU ,  KATAOKA SHOHEI ,  MIZUTANI KAZUYOSHI ,  DOBASHI TORU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  KATO KEITA

    IPC: G03F7/038 ,  G03F7/004 ,  G03F7/32 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a pattern having a small number of development defects, and to provide a resist composition.SOLUTION: The pattern forming method includes (A) forming a film using the resist composition, (B) exposing the film, and (C) developing the exposed film using developing solution containing an organic solvent. The resist composition contains resin containing a repeating unit having a group that is decomposed by action of acid to generate an alcoholic hydroxy group, and a solvent containing at least one of the following component (S1) and component (S2). The component (S1) is propylene glycol monochrome alkyl ether carboxylate. The component (S2) is at least one selected from a group including propylene glycol monochrome alkyl ether, lactate, acetic acid ester, alkoxy propionic acid ester, chain ketone, cyclic ketone, lactone, and alkylene carbonate.

    Abstract translation: 要解决的问题：提供一种用于形成具有少量显影缺陷的图案的图案形成方法，并提供抗蚀剂组合物。解决方案：图案形成方法包括（A）使用抗蚀剂组合物形成膜（B ）曝光，和（C）使用含有机溶剂的显影溶液显影曝光的薄膜。 抗蚀剂组合物含有含有具有通过酸作用分解的基团的重复单元以产生醇羟基的树脂，和含有至少一种以下组分（S1）和组分（S2）的溶剂。 组分（S1）是丙二醇单烷基醚羧酸酯。 组分（S2）是选自丙二醇单烷基醚，乳酸，乙酸酯，烷氧基丙酸酯，链酮，环酮，内酯和碳酸亚烷基中的至少一种。

    Actinic ray-sensitive or radiation sensitive resin composition, and resist film and pattern forming method using the same
    63.
    发明专利
    Actinic ray-sensitive or radiation sensitive resin composition, and resist film and pattern forming method using the same 有权
    丙烯酸类敏感性或辐射敏感性树脂组合物，以及使用其的耐蚀膜和图案形成方法

    公开(公告)号：JP2011070162A

    公开(公告)日：2011-04-07

    申请号：JP2010142061

    申请日：2010-06-22

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  SHIRAKAWA MICHIHIRO ,  KATO TAKAYUKI ,  TANGO NAOHIRO

    IPC: G03F7/004 ,  C07C381/12 ,  C08F20/28 ,  G03F7/039

    CPC classification number: C08F20/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that has improved performance of Line Width Roughness and Depth of Focus and also adapted to a liquid immersion process with a line width of ≤45 nm, and to provide a pattern forming method employing the same.
    SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition includes: (PA) a compound having a proton acceptor functional group and undergoing decomposition upon irradiation with an actinic ray or radiation to generate a compound reduced in or deprived of proton acceptor property or changed to be acidic from being proton acceptor-functioning, wherein a molar extinction coefficient ε of the compound (PA) at a wavelength of 193 nm as measured in acetonitrile solvent is 55,000 or less. The pattern forming method uses the composition.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供具有改善线宽粗糙度和焦深的性能的光化射线敏感或辐射敏感性树脂组合物，并且还适用于线宽≤45nm的液浸法， 并提供使用该图案形成方法的图案形成方法。 光敏射线敏感或辐射敏感性树脂组合物包括：（PA）具有质子受体官能团的化合物，并且在用光化射线或辐射照射时经历分解，以产生还原或去除质子的化合物 受体特性或由质子受体功能变为酸性，其中在乙腈溶剂中测定的波长193nm下的化合物（PA）的摩尔消光系数ε为55,000以下。 图案形成方法使用该组合物。 版权所有（C）2011，JPO＆INPIT

    Actinic ray- or radiation-sensitive resin composition and pattern forming method using the same
    64.
    发明专利
    Actinic ray- or radiation-sensitive resin composition and pattern forming method using the same 审中-公开
    丙酰基紫外线或辐射敏感性树脂组合物和使用其的图案形成方法

    公开(公告)号：JP2011033839A

    公开(公告)日：2011-02-17

    申请号：JP2009180206

    申请日：2009-07-31

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： INAZAKI TAKESHI ,  ITO TAKAYUKI ,  KATAOKA SHOHEI ,  TAKAHASHI HIDETOMO ,  TSUCHIMURA TOMOTAKA

    IPC: G03F7/004 ,  C08F212/02 ,  G03F7/039

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition which ensures high resolution, high sensitivity and good line edge roughness, and a pattern forming method using the same. SOLUTION: A resin (P) in the actinic ray- or radiation-sensitive resin composition comprises a repeating unit (A) which generates an acid in a side chain upon irradiation with actinic rays or radiation and a repeating unit (C) having an alkali-soluble group. The resin (P) has a plurality of aromatic ring structures which may contain a heteroatom and has a structural moiety (X) in which the plurality of aromatic ring structures are condensed or coupled together by a single bond. The pattern forming method using the composition is also provided. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供确保高分辨率，高灵敏度和良好的线边缘粗糙度的光化射线或辐射敏感性树脂组合物以及使用其的图案形成方法。 光解射线或辐射敏感性树脂组合物中的树脂（P）包含在用光化射线或辐射照射时在侧链中产生酸的重复单元（A）和重复单元（C） 具有碱溶性基团。 树脂（P）具有可以含有杂原子的多个芳环结构，并且具有多个芳环结构通过单键缩合或偶联在一起的结构部分（X）。 还提供了使用该组合物的图案形成方法。 版权所有（C）2011，JPO＆INPIT

    Active light sensitive or radiation sensitive resin composition and pattern forming method using the same
    65.
    发明专利
    Active light sensitive or radiation sensitive resin composition and pattern forming method using the same 有权
    活性光敏或辐射敏感性树脂组合物和使用其的图案形成方法

    公开(公告)号：JP2010237334A

    公开(公告)日：2010-10-21

    申请号：JP2009083707

    申请日：2009-03-30

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： KATAOKA SHOHEI ,  TAKAHASHI HIDETOMO ,  ITO TAKAYUKI ,  INAZAKI TAKESHI ,  TSUCHIMURA TOMOTAKA

    IPC: G03F7/039 ,  C08F212/08 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an active light sensitive or radiation sensitive resin composition which has high resolution, high sensitivity, and good line edge roughness and is hardly affected by variations of an exposure, and a pattern forming method using the same. SOLUTION: The active light sensitive or radiation sensitive resin composition includes a resin (P) containing a recurring unit (a) having such a structure as to generate an acid anion in a side chain of the resin by irradiation of active light or radiation, a recurring unit (b) having a protected phenolic hydroxyl, and a recurring unit (x) having a group which is decomposed by action of an alkali developer to increase the dissolution rate in the alkali developer. The pattern forming method uses this resin composition. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供具有高分辨率，高灵敏度和良好的线边缘粗糙度并且几乎不受曝光变化的影响的有源光敏或辐射敏感性树脂组合物，以及使用其的图案形成方法 。 活性光敏性或辐射敏感性树脂组合物包含含有重复单元（a）的树脂（P），该重复单元（a）具有通过活性光的照射在树脂的侧链中产生酸性阴离子的结构，或 辐射，具有受保护的酚羟基的重复单元（b）和具有通过碱显影剂的作用分解的基团的重复单元（x），以增加碱显影剂中的溶解速率。 图案形成方法使用该树脂组合物。 版权所有（C）2011，JPO＆INPIT

    Composition, molded product, its manufacturing method, film and its manufacturing method
    66.
    发明专利
    Composition, molded product, its manufacturing method, film and its manufacturing method 审中-公开
    组合物，成型产品及其制造方法，薄膜及其制造方法

    公开(公告)号：JP2009052016A

    公开(公告)日：2009-03-12

    申请号：JP2008085519

    申请日：2008-03-28

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TAKAMOTO TETSUFUMI ,  ISHIZUKA TAKAHIRO ,  KATAOKA SHOHEI

    IPC: C08L101/00 ,  B29C41/24 ,  B29C47/00 ,  C08L1/02 ,  C08L67/00 ,  C08L101/02

    CPC classification number: C08K9/00 ,  Y10T428/2982

    Abstract: PROBLEM TO BE SOLVED: To provide a composite material which enables mixing even when a broad range of matrix materials is used and excels in transparency and low thermal expansibility. SOLUTION: A composition comprises an organic crystal having a minor axis length of 3-100 nm and a major axis length of 10-2,000 nm and a matrix material, and the organic crystal may contain a surface active agent adsorbed, or an inorganic element such as silicon, titanium, aluminum, phosphorus, zirconium, and barium, or an organic group represented by the formula: -(L 1 ) n -R 1 (wherein L 1 is -O-, -CO-, -COO- or the like; n is 0-4; and R 1 is an organic group). COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供即使使用宽范围的基质材料也能够混合并且透明性和低热膨胀性优异的复合材料。 解决方案：组合物包含短轴长度为3-100nm，长轴长度为10-2000nm的有机晶体和基质材料，并且有机晶体可以含有吸附的表面活性剂，或 无机元素如硅，钛，铝，磷，锆和钡，或由下式表示的有机基团： - （L 1 ） > 1 （其中L 1 是-O - ， - CO-，-COO-等; n是0-4;并且R 1 一个有机组）。 版权所有（C）2009，JPO＆INPIT

    Active ray-sensitive or radiation-sensitive resin composition, resist film using the composition, pattern formation method, method for manufacturing electronic device, and electronic device
    68.
    发明专利
    Active ray-sensitive or radiation-sensitive resin composition, resist film using the composition, pattern formation method, method for manufacturing electronic device, and electronic device 审中-公开
    活性敏感性或辐射敏感性树脂组合物，使用组合物的耐腐蚀膜，图案形成方法，制造电子器件的方法和电子器件

    公开(公告)号：JP2014182154A

    公开(公告)日：2014-09-29

    申请号：JP2013054397

    申请日：2013-03-15

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： TANGO NAOHIRO ,  YOSHITOME MASAHIRO ,  YAMAMOTO KEI ,  YAMAMOTO OSAO ,  KATAOKA SHOHEI

    IPC: G03F7/075 ,  C08F20/10 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

    CPC classification number: G03F7/2041 ,  C08F2230/085 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0755

    Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition capable of inhibiting pattern collapses within an ultrafine region (e.g., region of line width=50 nm or less) and of improving the margin of focus (DOF: Depth of Focus); a resist film using the composition; a pattern formation method; a method for manufacturing an electronic device; and an electronic device.SOLUTION: The provided active ray-sensitive or radiation-sensitive resin composition includes: (A) a resin possessing repeating units including groups generating polar groups as a result of the decomposition thereof based on the function of an acid; (B) a compound generating an acid as a result of the irradiation thereof with active rays or radiations; and (F) a compound expressed by the following general formula (1): in the general formula (1), X expresses: an organic group including at least one type selected from the group consisting of amino groups, nitrogen-containing heterocyclic groups, epoxy groups, methacryloyl groups, vinyl groups, and mercapto groups; alkyl group; cycloalkyl group; aryl group; or alkoxy group; n is an integer of 0 to 3).

    Abstract translation: 要解决的问题：提供能够抑制超细区域（例如，线宽= 50nm或更小的区域）内的图案塌陷并提高聚焦余量的活性射线敏感或辐射敏感性树脂组合物（DOF： 焦点深度）; 使用该组合物的抗蚀剂膜; 图案形成方法; 电子设备的制造方法; 和电子装置。解决方案：提供的活性射线敏感或辐射敏感性树脂组合物包括：（A）具有重复单元的树脂，其包含基于酸的功能而分解产生极性基团的基团; （B）由于用活性射线或辐射照射而产生酸的化合物; 和（F）由以下通式（1）表示的化合物：在通式（1）中，X表示：包括选自氨基，含氮杂环基， 环氧基，甲基丙烯酰基，乙烯基和巯基; 烷基; 环烷基 芳基; 或烷氧基; n为0〜3的整数）。

    Pattern forming method and a resist composition
    69.
    发明专利
    Pattern forming method and a resist composition 有权
    图案形成方法和阻力组成

    公开(公告)号：JP2014167628A

    公开(公告)日：2014-09-11

    申请号：JP2014060928

    申请日：2014-03-24

    Applicant: Fujifilm Corp ,  富士フイルム株式会社

    Inventor： KAMIMURA SATOSHI ,  TARUYA SHINJI ,  IWATO KAORU ,  KATAOKA SHOHEI ,  MIZUTANI KAZUYOSHI ,  DOBASHI TORU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  KATO KEITA

    IPC: G03F7/038 ,  C08F20/26 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method and a resist composition from which a pattern having fewer development defects can be formed.SOLUTION: The resist composition is used for a specified pattern forming method and comprises the following resin, a hydrophobic resin having a fluorine atom or a silicon atom, and a solvent comprising a specified component. The resin contains a repeating unit (P) having a group that is decomposed by an action of an acid to generate an alcoholic hydroxyl group, contains neither a fluorine atom nor a silicon atom, and shows decrease in the solubility with a developing solution containing an organic solvent by an action of an acid; and in the resin, the repeating unit (P) contains no lactone structure, and the group that is decomposed by an action of an acid to generate an alcoholic hydroxyl group is a group expressed by at least one of specified general formulae. The compounding rate of the resin showing decrease in the solubility with a developing solution containing an organic solvent by an action of an acid is 60 to 95 mass% in the total solid content.

    Abstract translation: 要解决的问题：提供一种能够形成具有较少显影缺陷的图案的图案形成方法和抗蚀剂组合物。解决方案：抗蚀剂组合物用于指定的图案形成方法，并且包括以下树脂，疏水性树脂具有 氟原子或硅原子，以及包含特定成分的溶剂。 树脂含有具有通过酸作用而分解以产生醇羟基的基团的重复单元（P），既不含氟原子也不含硅原子，并且显示出与含有 有机溶剂通过酸的作用; 并且在树脂中，重复单元（P）不含有内酯结构，通过酸的作用而分解以产生醇羟基的基团是由至少一个指定的通式表示的基团。 与通过酸作用而含有有机溶剂的显影溶液的溶解性显示出降低的树脂的配合比率，在总固体成分中为60〜95质量％。

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