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公开(公告)号：US20150297767A1
公开(公告)日：2015-10-22
申请号：US14747235
申请日：2015-06-23
Applicant: Sensor Electronic Technology, Inc.
Inventor： Remigijus Gaska , Michael Shur , Alexander Dobrinsky , Timothy James Bettles , Maxim S. Shatalov
IPC: A61L2/10
CPC classification number: A61N5/0601 , A61L2/0047 , A61N5/0624 , A61N2005/0609 , A61N2005/0651 , A61N2005/0661
Abstract: A system for sterilizing at least one surface of an object is provided. The system includes a set of ultraviolet radiation sources and a set of wave guiding structures configured to direct ultraviolet radiation having a set of target attributes to a desired location on at least one surface of the object. The set of wave guiding structures can include at least one ultraviolet reflective surface having an ultraviolet reflection coefficient of at least thirty percent. Furthermore, the system can include a computer system for operating the ultraviolet radiation sources to deliver a target dose of ultraviolet radiation to the at least one target surface of the object.
Abstract translation: 提供了一种用于对物体的至少一个表面进行灭菌的系统。 该系统包括一组紫外线辐射源和一组波导结构，其被配置为将具有一组目标属性的紫外线辐射引导到物体的至少一个表面上的期望位置。 该波导构造可包括至少一个具有至少百分之三十的紫外反射系数的紫外线反射表面。 此外，该系统可以包括用于操作紫外线辐射源以将目标剂量的紫外线辐射传送到物体的至少一个目标表面的计算机系统。
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公开(公告)号：US20150165079A1
公开(公告)日：2015-06-18
申请号：US14629508
申请日：2015-02-24
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim S. Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska , Igor Agafonov
CPC classification number: A61L2/10 , A61L2202/14 , A61L2202/21 , F21V9/06 , F25D17/042 , F25D2317/0417
Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
Abstract translation: 紫外线辐射指向一个区域内。 在一段时间内监视位于该区域内的区域和/或该区域的一个或多个条件。 基于监测，通过调节由紫外线辐射源产生的紫外线辐射的方向，强度，图案和/或光谱功率来控制紫外线辐射源。 对紫外线辐射源的调整可以对应于多个可选操作配置中的一个，包括存储寿命保存操作配置，消毒操作配置和乙烯分解操作配置。
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公开(公告)号：US09034271B2
公开(公告)日：2015-05-19
申请号：US14012682
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
CPC classification number: A61L2/10 , A61L2202/14 , A61L2202/21 , F25D17/042 , F25D27/005 , F25D2317/0417
Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
Abstract translation: 紫外线辐射指向一个区域内。 在一段时间内监视位于该区域内的区域和/或该区域的一个或多个条件。 基于监测，通过调节由紫外线辐射源产生的紫外线辐射的方向，强度，图案和/或光谱功率来控制紫外线辐射源。 对紫外线辐射源的调整可以对应于多个可选操作配置中的一个，包括存储寿命保存操作配置，消毒操作配置和乙烯分解操作配置。
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公开(公告)号：US20140264076A1
公开(公告)日：2014-09-18
申请号：US14217689
申请日：2014-03-18
Applicant: Sensor Electronic Technology, Inc.
Inventor： Timothy James Bettles , Alexander Dobrinsky , Michael Shur , Remigijus Gaska
IPC: A61L2/10
Abstract: A solution in which an ultraviolet radiation source is mounted on a flexible substrate is provided. The flexible substrate is capable of having a deformation curvature of at least 0.1 inverse meters. The flexible substrate may be incorporated within an existing enclosure or included in the enclosure. The flexible substrate can be utilized as part of a solution for disinfecting one or more items located within the enclosure. In this case, while the items are within the enclosure, ultraviolent radiation is generated and directed at the items. Wiring for the ultraviolet radiation source can be embedded within the flexible substrate and the flexible substrate can have at least one of: a wave-guiding structure, an ultraviolet absorbing surface, or an ultraviolet reflective surface. A control system can be utilized to manage generation of the ultraviolet radiation within the enclosure.
Abstract translation: 提供紫外线辐射源安装在柔性基板上的方案。 柔性基板能够具有至少0.1毫米的变形曲率。 柔性基板可以结合在现有外壳内或包含在外壳中。 柔性基底可用作消毒位于外壳内的一个或多个物品的溶液的一部分。 在这种情况下，当物品在外壳内时，会产生超轻的辐射并指向物品。 紫外线辐射源的接线可以嵌入在柔性基板内，并且柔性基板可以具有波导结构，紫外线吸收表面或紫外线反射表面中的至少一个。 可以利用控制系统来管理外壳内的紫外线辐射的产生。
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公开(公告)号：US20140202962A1
公开(公告)日：2014-07-24
申请号：US14157874
申请日：2014-01-17
Applicant: SENSOR ELECTRONIC TECHNOLOGY, INC.
Inventor： Yuri Bilenko , Alexander Dobrinsky , Saulius Smetona , Michael Shur , Remigijus Gaska , Timothy James Bettles
IPC: C02F1/32
CPC classification number: C02F1/325 , C02F1/001 , C02F1/008 , C02F2201/3222 , C02F2201/3227 , C02F2201/3228 , C02F2201/326 , C02F2209/001 , C02F2209/005 , C02F2301/028 , C02F2303/04 , C02F2307/04
Abstract: A solution for treating a fluid, such as water, is provided. The solution determines an ultraviolet transparency of a fluid before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates.
Abstract translation: 提供了一种用于处理诸如水的流体的溶液。 该溶液在流体进入消毒室之前或当流体进入消毒室时确定流体的紫外线透明度。 在消毒室中，可以通过紫外线照射流体来损害可能存在于流体中的微生物。 可以基于透明度来调节消毒室，流体流动和/或紫外线辐射的一个或多个属性，以提供更有效的照射和/或更高的消毒率。
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Patent Agency Ranking
公开(公告)号：US20140183377A1
公开(公告)日：2014-07-03
申请号：US14144053
申请日：2013-12-30
Applicant: Sensor Electronic Technology, Inc.
Inventor： Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Michael Shur , Remigijus Gaska
IPC: A61L2/10
Abstract: A solution for disinfecting electronic devices is provided. An ultraviolet radiation source is embedded within an ultraviolet absorbent case. While the electronic device is within the ultraviolet absorbent case, ultraviolent radiation is directed at the electronic device. A monitoring and control system monitors a plurality of attributes for the electronic device, which can include: a frequency of usage for the device, a biological activity at a surface of the device, and a disinfection schedule history for the device. Furthermore, the monitoring and control system can detect whether the device is being used. Based on the monitoring, the monitoring and control system controls the ultraviolet radiation directed at the electronic device.
Abstract translation: 提供了一种消毒电子设备的解决方案。 紫外线辐射源嵌入紫外线吸收剂盒内。 当电子设备在紫外线吸收剂盒内时，超低辐射被引导到电子设备。 监视和控制系统监视电子设备的多个属性，其可以包括：设备的使用频率，设备表面的生物活动以及设备的消毒调度历史。 此外，监控系统可以检测设备是否被使用。 基于监控，监控系统控制指向电子设备的紫外线辐射。
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公开(公告)号：US20140061509A1
公开(公告)日：2014-03-06
申请号：US14012644
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
IPC: A23L3/28
CPC classification number: A23L3/28 , A23L3/003 , A23L3/3409 , A61L2/10 , A61L2/24
Abstract: Ultraviolet radiation is directed within an area. The target wavelength ranges and/or target intensity ranges of the ultraviolet radiation sources can correspond to at least one of a plurality of selectable operating configurations including a sterilization operating configuration and a preservation operating configuration.
Abstract translation: 紫外线辐射指向一个区域内。 紫外线辐射源的目标波长范围和/或目标强度范围可以对应于包括灭菌操作配置和保存操作配置的多个可选操作配置中的至少一个。
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公开(公告)号：US10907055B2
公开(公告)日：2021-02-02
申请号：US15422749
申请日：2017-02-02
Applicant: Sensor Electronic Technology, Inc.
Inventor： Timothy James Bettles , Michael Shur , Alexander Dobrinsky , Maxim S. Shatalov
IPC: B05C9/14 , C09D5/32 , B05D3/06 , C09D11/101 , C09D201/00 , C09J9/00 , C09J201/00 , G21K5/02
Abstract: An approach for curing ultraviolet sensitive polymer materials (e.g., polymer inks, coatings, and adhesives) using ultraviolet radiation is disclosed. The ultraviolet sensitive polymer materials curing can utilize ultraviolet light at different wavelength emissions arranged in a random, mixed or sequential arrangement. In one embodiment, an ultraviolet light C (UV-C) radiation emitter having a set of UV-C sources that emit UV-C radiation at a predetermined UV-C duration and intensity operate in conjunction with an ultraviolet light B (UV-B) radiation emitter having a set of UV-B sources configured to emit UV-B radiation at a predetermined UV-B duration and intensity and/or an ultraviolet light A (UV-A) radiation emitter having a set of UV-A sources configured to emit UV-A radiation at a predetermined UV-A duration and intensity, to cure the ultraviolet sensitive polymer materials.
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公开(公告)号：US10442704B2
公开(公告)日：2019-10-15
申请号：US14157874
申请日：2014-01-17
Applicant: Sensor Electronic Technology, Inc.
Inventor： Yuri Bilenko , Alexander Dobrinsky , Saulius Smetona , Michael Shur , Remigijus Gaska , Timothy James Bettles
Abstract: A solution for treating a fluid, such as water, is provided. The solution determines an ultraviolet transparency of a fluid before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates.
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公开(公告)号：US10441670B2
公开(公告)日：2019-10-15
申请号：US15388394
申请日：2016-12-22
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim S. Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska , Igor Agafonov
Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
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