저마찰 윤활 어셈블리
    63.
    发明公开
    저마찰 윤활 어셈블리 有权
    低摩擦润滑装置

    公开(公告)号:KR1020080110651A

    公开(公告)日:2008-12-18

    申请号:KR1020087026218

    申请日:2007-04-27

    Abstract: [PROBLEMS] To provide a low-friction lubrication assembly. [MEANS FOR SOLVING PROBLEMS] A novel excellent friction lubrication assembly. The friction lubrication assembly comprises a first member which is slidable relatively against a second member. The first member is a member which has chemical affinity for OH groups on its sliding surface. The first member includes one or a plurality of oxygen-containing compounds which are located on the sliding surface of the fist member and can form a tribofilm deposited on the sliding surface of the first member typically through hydrogen bond interaction. The second member has a similar OH end sliding surface. Preferably, the interface supported by the oxygen-containing compound (lubricating agent) between the first and second sliding surfaces has an H-and/or OH-end interface, and repulsion is provided between these interfaces. ® KIPO & WIPO 2009

    Abstract translation: [问题]提供低摩擦润滑组件。 [解决问题的方法]一种新型优良的摩擦润滑组件。 摩擦润滑组件包括相对于第二构件可滑动的第一构件。 第一个成员是在其滑动表面上对OH基具有化学亲和力的成员。 第一构件包括位于第一构件的滑动表面上的一个或多个含氧化合物,并且可以通过氢键相互作用形成沉积在第一构件的滑动表面上的摩擦膜。 第二构件具有类似的OH端滑动表面。 优选地,由第一和第二滑动表面之间的含氧化合物(润滑剂)支撑的界面具有H和/或OH-端界面,并且在这些界面之间提供排斥。 ®KIPO&WIPO 2009

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