SILICON-BASED MEMRISTIVE DEVICE
    74.
    发明申请
    SILICON-BASED MEMRISTIVE DEVICE 审中-公开
    基于硅的力学装置

    公开(公告)号:WO2010082928A1

    公开(公告)日:2010-07-22

    申请号:PCT/US2009/031140

    申请日:2009-01-15

    Abstract: A memristive device (100) includes a first and a second electrode (110, 115); a silicon memristive matrix (105) interposed between the first electrode (110) and the second electrode (115); and a mobile dopant species (210, 215) within the silicon memristive matrix (105) which moves in response to a programming electrical field and remains substantially in place after the removal of the programming electrical field. A method for using a crossbar architecture (610) containing a silicon memristive matrix (105) includes: applying a programming electrical field by applying a voltage bias across a first conductor (602) and a second conductor (604); a silicon memristive matrix (105, 606) containing mobile dopants (210, 215) being interposed between the first conductor (602) and the second conductor (604), the programming voltage repositioning the mobile dopants (210, 215) within the silicon memristive matrix (105, 606); and reading a state of the silicon memristive matrix (105, 606) by applying a reading energy across the silicon memristive matrix (105, 606), the reading energy producing a measurable indication of the state of the silicon memristive matrix (105, 606).

    Abstract translation: 忆阻器(100)包括第一和第二电极(110,115); 插入在所述第一电极(110)和所述第二电极(115)之间的硅忆阻矩阵(105); 以及在所述硅忆阻矩阵(105)内的移动掺杂剂物质(210,215),其响应于编程电场而移动并且在去除所述编程电场之后保持基本上就位。 一种使用包含硅忆阻矩阵(105)的交叉结构(610)的方法包括:通过跨第一导体(602)和第二导体(604)施加电压偏置来施加编程电场; 包含位于第一导体(602)和第二导体(604)之间的移动掺杂剂(210,215)的硅忆阻矩阵(105,606),所述编程电压重新定位硅忆阻器内的移动掺杂剂(210,215) 矩阵(105,606); 以及通过在所述硅忆阻矩阵(105,606)上施加读取能量来读取所述硅忆阻矩阵(105,606)的状态,所述读取能量产生所述硅忆阻矩阵(105,606)的状态的可测量指示, 。

    MICRORESONANTOR SYSTEMS AND METHODS OF FABRICATING THE SAME
    76.
    发明申请
    MICRORESONANTOR SYSTEMS AND METHODS OF FABRICATING THE SAME 审中-公开
    微型助剂系统及其制备方法

    公开(公告)号:WO2009017770A3

    公开(公告)日:2009-04-02

    申请号:PCT/US2008009225

    申请日:2008-07-30

    Abstract: Various embodiments of the present invention are related to microresonator systems and to methods of fabricating the microresonator systems. In one embodiment, a microresonator system (200) comprises a substrate (206) having a top surface layer (204) and at least one waveguide (214,216) embedded in the substrate and positioned adjacent to the top surface layer of the substrate. The microresonator system also includes a microresonator (202,402) having a top layer (218), an intermediate layer (222), a bottom layer (220), a peripheral region, and a peripheral coating (224). The bottom layer (220) of the microresonator is attached to and in electrical communication with the top surface layer (204) of the substrate. The microresonator is positioned so that at least a portion of the peripheral region is located above the at least one waveguide (214, 216). The peripheral coating (224) covers at least a portion of the peripheral surface and has a relatively lower index of refraction than the top, intermediate, and bottom layers of the microresonator.

    Abstract translation: 本发明的各种实施例涉及微谐振器系统和制造微谐振器系统的方法。 在一个实施例中,微谐振器系统(200)包括具有顶表面层(204)和至少一个波导(214,216)的衬底(206),所述波导嵌入衬底中并且与衬底的顶表面层相邻定位。 微谐振器系统还包括具有顶层(218),中间层(222),底层(220),周边区域和周边涂层(224)的微谐振器(202,402)。 微谐振器的底层(220)附着于基底的顶表面层(204)并与之电连通。 微谐振器被定位成使得外围区域的至少一部分位于至少一个波导(214,216)的上方。 外围涂层(224)覆盖周边表面的至少一部分并且具有比微谐振器的顶层,中间层和底层低的折射率。

    ELECTRIC-FIELD-ENHANCEMENT STRUCTURE AND DETECTION APPARATUS USING SAME
    77.
    发明申请
    ELECTRIC-FIELD-ENHANCEMENT STRUCTURE AND DETECTION APPARATUS USING SAME 审中-公开
    使用相同的电场增强结构和检测装置

    公开(公告)号:WO2009002524A2

    公开(公告)日:2008-12-31

    申请号:PCT/US2008007934

    申请日:2008-06-25

    Abstract: Various aspects of the prsent invention are directed to electric-field-enhancement structures (100) and detection apparatuses (600, 700, 800) that employ such electric-field-enhancement structures. In one aspect of the present invention, an electric-field-enhancement structure (100) includes a substrate (102) having a surface (104). The substrate (102) is capable of supporting a planar mode (114) having a planar-mode frequency. A plurality of nanofeatures (106) is associated with the surface (104), and each of nanofeatures (106) exhibits a localized-surface-plasmon mode (116) having a localized-surface-plasmon frequency approximately equal to the planar-mode frequency.

    Abstract translation: 本发明的各个方面涉及采用这种电场增强结构的电场增强结构(100)和检测装置(600,700,800)。 在本发明的一个方面,电场增强结构(100)包括具有表面(104)的基底(102)。 基板(102)能够支撑具有平面模式频率的平面模式(114)。 多个纳米尺度(106)与表面(104)相关联,并且纳米尺度(106)中的每一个表现出具有近似等于平面模式频率的局部表面等离子体激元频率的局部表面等离子体模式(116) 。

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