Abstract:
There is disclosed an improved method of manufacturing an optical device using an impurity induced Quantum Well Intermixing (QWI) process. Reported QWI methods, and particularly Impurity Free Vacancy Diffusion (IFVD) methods, suffer from a number of disadvantages, eg the temperature at which Gallium Arsenide (GaAs) out-diffuses from the semiconductor material to the Silica (SiO>2
Abstract:
Angiopoietin analogs capable of binding to and activating TIE2 receptors by dimerization thereof, the angiopoietin analogs being proteinaceous molecules having at least 2 angiopoietin-like TIE2 binding domains.
Abstract:
Various embodiments of the present invention are directed to electronic devices, which combine reconfigurable diode rectifying states with nonvolatile memristive switching. In one aspect, an electronic device (210,230,240) comprises an active region (212) sandwiched between a first electrode (104) and a second electrode (106). The active region includes two or more semiconductor layers and at least one dopant that is capable of being selectively positioned within the active region to control the flow of charge carriers through the device.
Abstract:
A memristive device (100) includes a first and a second electrode (110, 115); a silicon memristive matrix (105) interposed between the first electrode (110) and the second electrode (115); and a mobile dopant species (210, 215) within the silicon memristive matrix (105) which moves in response to a programming electrical field and remains substantially in place after the removal of the programming electrical field. A method for using a crossbar architecture (610) containing a silicon memristive matrix (105) includes: applying a programming electrical field by applying a voltage bias across a first conductor (602) and a second conductor (604); a silicon memristive matrix (105, 606) containing mobile dopants (210, 215) being interposed between the first conductor (602) and the second conductor (604), the programming voltage repositioning the mobile dopants (210, 215) within the silicon memristive matrix (105, 606); and reading a state of the silicon memristive matrix (105, 606) by applying a reading energy across the silicon memristive matrix (105, 606), the reading energy producing a measurable indication of the state of the silicon memristive matrix (105, 606).
Abstract:
An electrically actuated device includes a first electrode, a second electrode, and an active region disposed between the first and second electrodes. The device further includes at least one of dopant initiators or dopants localized at an interface between i) the first electrode and the active region, or ii) the second electrode and the active region, or iii) the active region and each of the first and second electrodes.
Abstract:
Various embodiments of the present invention are related to microresonator systems and to methods of fabricating the microresonator systems. In one embodiment, a microresonator system (200) comprises a substrate (206) having a top surface layer (204) and at least one waveguide (214,216) embedded in the substrate and positioned adjacent to the top surface layer of the substrate. The microresonator system also includes a microresonator (202,402) having a top layer (218), an intermediate layer (222), a bottom layer (220), a peripheral region, and a peripheral coating (224). The bottom layer (220) of the microresonator is attached to and in electrical communication with the top surface layer (204) of the substrate. The microresonator is positioned so that at least a portion of the peripheral region is located above the at least one waveguide (214, 216). The peripheral coating (224) covers at least a portion of the peripheral surface and has a relatively lower index of refraction than the top, intermediate, and bottom layers of the microresonator.
Abstract:
Various aspects of the prsent invention are directed to electric-field-enhancement structures (100) and detection apparatuses (600, 700, 800) that employ such electric-field-enhancement structures. In one aspect of the present invention, an electric-field-enhancement structure (100) includes a substrate (102) having a surface (104). The substrate (102) is capable of supporting a planar mode (114) having a planar-mode frequency. A plurality of nanofeatures (106) is associated with the surface (104), and each of nanofeatures (106) exhibits a localized-surface-plasmon mode (116) having a localized-surface-plasmon frequency approximately equal to the planar-mode frequency.
Abstract:
An optical interconnect (100, 200, 300, 400, 500, 645) has a plurality of optical sources (110, 360, 460, 560), a first lens (115, 225, 325, 425, 525, 625) configured to collimate optical beams (320, 350) from the plurality of optical sources (110, 360, 460. 560), a second lens (120, 230, 335, 435, 535, 640) configured to refocus the optical beams (320, 350), and a plurality of optical receivers (125, 365, 465, 565) configued to receive the refocused optical beams (320, 350) from the second lens (120, 230, 335, 435, 535, 640).
Abstract:
One embodiment in accordance with the invention is an apparatus (100) that can include an optical circuit wafer (102) and an integrated circuit wafer (104). The optical circuit wafer and the integrated circuit wafer are bonded together by a wafer bonding process.
Abstract:
A control layer (26, 26', 28, 28', 28") for use in a junction of a nanoscale electronic switching device (10) is disclosed. The control layer (26, 26', 28, 28', 28") includes a material that is chemically compatible with a connecting layer (16) and at least one electrode (12, 14) in the nanoscale switching device (10). The control layer (26, 26', 28, 28', 28") is adapted to control at least one of electrochemical reaction paths, electrophysical reaction paths, and combinations thereof during operation of the device (10).