Abstract:
본 발명은 CRT(Cathod Ray Tube) 유리표면의 코팅에 이용되는 코팅제 조성물, 특히 폴리에틸렌디옥시티오펜 수용액, 알콜 및 아마이드계 혼합용매, 알콕시실란, 수용성 고분자, 술폰산 모노머 도판트, 수분산성 카본블랙, 수분산성 유색안료, 알콜가용성 유색염료를 포함하는 대전방지성 착색 코팅제 조성물, 그의 제조 방법, 및 그를 이용한 유리표면의 코팅방법에 관한 것으로, 본 발명의 코팅제 조성물은 CRT 유리표면에 코팅되어 양호한 외관과 대전방지성을 가진 CRT를 제공한다.
Abstract:
본 발명은 CRT(Cathod Ray Tube) 유리표면의 코팅에 이용되는 코팅제 조성물, 특히 폴리에틸렌디옥시티오펜 수용액, 알콜 및 아마이드계 혼합용매, 알콕시실란, 수용성 고분자, 술폰산 모노머 도판트, 수분산성 카본블랙, 및 수분산성 유색안료를 포함하는 대전방지성 착색 코팅제 조성물, 그의 제조 방법, 및 그를 이용한 유리표면의 코팅방법에 관한 것으로 본 발명의 코팅제 조성물은 내후성, 밀착성, 경도 등의 물성이 우수할 뿐만 아니라 CRT 유리표면에 코팅되는 경우 양호한 외관을 제공함과 동시에 생산비용이 저렴한 이점이 있다.
Abstract:
본 발명은 도전성 재료로서 금속 분말, 구체적으로 은 분말 또는 은이 코팅된 동 분말을 매질을 매개체로 하여 혼합기의 임펠라에 의한 금속 분말과 매질간의 충격력 및 전단력에 의해서 비히클에 분산시키는 것을 특징으로 하는 도전성 페인트의 제조 방법 및 상기 방법으로 제조된 도전성 페인트 조성물에 관한 것으로서, 본 발명에 의한 도전성 페인트는 MHz 내지 GHz 영역의 전자파를 차단할 수 있기 때문에 특히 이동 통신 단말기, 사무기기, 의료기기등의 내부 소자로부터 발생되는 전자파에 의한 EMI(Electro Magnetic Interference; 전자파 방해) 및 RFI(Radio Frequency Interference; 무선 주파 방해) 문제를 해결하는 데에 유용하다.
Abstract:
PURPOSE: Provided are an antistatic coloring coating agent used in coating the surface of CRT(Cathode Ray Tube) glass, the preparation method thereof, and the coating method using the agent. CONSTITUTION: The antistatic coloring coating agent comprises 6-26 wt.% of polyethylene dioxythiophene solution having 0.6-3.0 wt.% of solid concentration; 64-90 wt.% of alcohol and amide-based mixing solvent; 3-10 wt.% of alkoxy silane; 0.005-0.1 wt.% of water-soluble polymer; 0.005-0.05 wt.% of sulfonic acid monomer dopant; and 0.05-0.40 wt.% of water-dispersive carbon black. The method for preparing antistatic coloring coating agent comprises (a) putting polyethylene dioxythiophene solution into a reactor and stirring it; (b) adding an alcohol and amide-based mixing solvent, alkoxy silane, a sulfonic acid monomer dopant, and a water-soluble polymer and stirring the solution for 6 hours; and (c) adding water-dispersive carbon black to (b) and stirring it for at least 2 hours.
Abstract:
PURPOSE: A coating composition is provided that can be prepared by using a dispersion solvent and a high refractive inorganic sol which is a metal oxide dispersible in a conductive polymer solution with a high ratio and has a refraction ratio of RI = 1.60. CONSTITUTION: A coating composition for a conductive polymeric transparent thin film having a high refraction ratio comprises 2 to 20 wt% of an aqueous conductive polymer solution with a solid content of 1.2 to 1.5 wt%, 0.5 to 20 wt% of high refractive inorganic sol with a solid content of 14 to 16 wt%, 50 to 97.4 wt% of alcohol solvent having a carbon atom of 1 to 3 below, 0.1 to 10 wt% of amide solvent, 0.005 to 0.05 wt% of water-soluble or alcohol-soluble resin binder, and 0.005 to 0.05 wt% of sulfonic acid monomer dopant.
Abstract:
PURPOSE: A composition is provided to produce conductive film which has good conductivity and transparency and used for shielding electromagnetic wave. CONSTITUTION: A PEDT is a conductive polymer which is water-soluble, stable against temperature and atmosphere and has good transparency while forming film. The PEDT 16 to 32 wt% is needed to have both good transparency and conductivity. Alcohol solvent used for the PEDT polymer is methanol, ethanol, propanol, isopropanol and butanol. The solution composition is to add sulfonate monomer dopant, alcohol solvent and amide-based organic solvent in turn in a minute while stirring PEDT solution in the blunger: and to mix it homogeneously.
Abstract:
PURPOSE: A transparent conductive hard coating film is applied to computers, television Braun tube glass surface, clean room's wall, hand carrier surface, CPP and PET film and PC and PMMA panel surface, portable telephone housing and PVC resin with good conductivity and transparency. CONSTITUTION: The hard coating film comprises a laminated coating of a polythiopene-based solution and a silica sol solution on a substrate. The polythiopene-based solution is prepared by mixing at least one solvent selected from the group consisting of alcohol, aldehydes and ketones with an aqueous or alcohol soluble polymer in an amide solvent. The silica sol solution is prepared by hydrolyzing and condensing silane compounds having three and four functional groups with an organic coupling agent. The substrate is selected from the group consisting of glass, polymethamethylacryl resin, polyacryl resin, polycarbonate resin, PET resin and PVC resin. The polyethylenedioxythiopene is doped with polystyrene sulfonate. The solvent is at least one selected from the group consisting of lower alcohol having one to four carbon atoms such as methanol, ethanol, propanol, isopropanol or acetaldehyde represented by the formula 1, and ketones such as acetone, methyl ethyl ketone or methyl isobutyl ketone. Formula 1:R1-C(O)-R2 (wherein R1 is H or C1-C10 alkyl or aryl; and R2 is C1-C10 alkyl or aryl).
Abstract:
PURPOSE: A composition containing silica sol comprising polythiophene conductive polymer, alkoxysilane, C1-4 alcohol, and amide organic solvent is coated on glass or synthetic film to give an excellent scratchless and electromagnetic wave shielding performance. CONSTITUTION: The composition comprises 20-40 weight% of polythiophene conductive polymer solution, 4-12 weight% of alkoxysilane, 38-74 weight% of C1-4 alcohol such as methanol, ethanol, propanol, isopropanol, or butanol, and 2-10 weight% of amide organic solvent. The polythiophene conductive polymer solution is a mixture of polyethylenedioxythiophene and polystyrenesulfonate with a solid concentration of 1.0-1.5 weight%. The amide solvent is selected from formamide, N-methylformamide, N,N-dimethylformamide, acetamide, N-methylacetamide, N,N-dimethylacetamide, N-methylpropionamide, or N-methylpyrrolidone. The composition gives a high conductivity and transparency with a conductivity of below 1-20 (1 / kilo ohm), a transparency of 90-98%, and a film hardness of 4-6H.
Abstract:
600℃ 이하의 공기분위기에서 소성이 가능하고, 반복소성 공정을 거치더라도 저항의 절대치 및 저항의 증가가 미미한 전극 형성용 조성물이 제공된다. 본 발명에 따른 전극 형성용 조성물은 하기 식 (1)의 입도분포폭이 2.0 이하이고 및 0.1≤D50≤20㎛ 범위의 D50 값을 가지는 가지는 알루미늄 분말 5~95중량%; 유기바인더 3~60 중량%; 잔량으로서 용제를 포함한다 .
(상기 식(1)에서, D10, D50, D90은 전체중량을 100%하여 입도 분포의 누적곡선을 구할 때 이 누적 곡선이 각각 10%, 50%, 90%로 되는 점의 입경을 의미함) 또한, 상기 조성물을 이용하여 형성된 전극 및 PDP 소자도 제공된다. 600℃, 저항값, 조성물, 전극, 알루미늄, 분말, 입도분포
Abstract:
PURPOSE: A conductive paste for preparing a bus electrode of a plasma display panel is provided to improve withstand voltage of a bus electrode of a PDP apparatus by reducing edge curl and suppressing the increase of line resistance of bilayered bus electrode. CONSTITUTION: A conductive paste for preparing a bus electrode of a plasma display panel comprises conductive materials, glass frit, 1 - 10 weight% of urethane resin as an organic binder, and solvent. The conductive material includes one or more selected from the group consisting of silver(Ag), gold(Au), palladium(Pd), platinum(Pt), copper(Cu), chrome(Cr), cobalt(Co), aluminum(Al), tin(Sn), lead(Pb), zinc(Zn), iron(Fe), iridium(Ir), osmium(Os), rhodium(Rh), tungsten(W), molybdenum(Mo), nickel and ITO(Indium-Tin-Oxide).