公开(公告)号：EP4261618A1

公开(公告)日：2023-10-18

申请号：EP22168402.0

申请日：2022-04-14

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  TISSINGH, Luc ,  EISENBERG, Martin ,  DE JONGH, Robertus, Johannes, Marinus

IPC: G03F7/20

Abstract: Disclosed is a method of determining a correction for control of at least one first component of a lithographic or metrology apparatus, and associated apparatuses. The method comprises obtaining a trained regression tree model which has been trained to map input data relating to at least one second component of the lithographic or metrology apparatus to a disturbance parameter related to a disturbance of said at least one first component, said disturbance having been caused by said at least one second component; obtaining input data relating to said at least one second component; and determining a compensatory correction for the disturbance parameter from said input data using the trained regression tree model.

公开(公告)号：EP3488293A1

公开(公告)日：2019-05-29

申请号：EP17730175.1

申请日：2017-06-16

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： BUTLER, Hans ,  GEUPPERT, Bernhard, Mathias ,  LOOPSTRA, Erik Roelof ,  WIJCKMANS, Maurice Willem Jozef Etiënne

IPC: G03F7/20