公开(公告)号：EP3470926A1

公开(公告)日：2019-04-17

申请号：EP17196670.8

申请日：2017-10-16

Applicant: ASML Netherlands B.V.

Inventor： RAVENSBERGEN, Janneke ,  AKBULUT, Duygu ,  PANDEY, Nitesh

IPC: G03F7/20

Abstract: A metrology apparatus is disclosed that comprises an optical system to focus radiation onto the structure and direct reflected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after reflection from the structure, such that a corresponding plurality of different offsets are provided to reflected radiation derived from a first point of a pupil plane field distribution relative to reflected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the reflected radiation derived from the first point of the pupil plane field distribution and the reflected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of said plurality of different offsets.

公开(公告)号：EP3454123A1

公开(公告)日：2019-03-13

申请号：EP17189662.4

申请日：2017-09-06

Applicant: ASML Netherlands B.V.

Inventor： JAK, Martin Jacobus Johan ,  EBERT, Martin ,  DEN BOEF, Arie Jeffrey ,  PANDEY, Nitesh

IPC: G03F7/20

Abstract: A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters.

公开(公告)号：EP3385685A1

公开(公告)日：2018-10-10

申请号：EP17165318.1

申请日：2017-04-06

Applicant: ASML Netherlands B.V.

Inventor： POLO, Alessandro ,  PANDEY, Nitesh ,  KOOLEN, Armand, Eugene, Albert

IPC: G01J3/02 ,  G01J3/18 ,  G01J3/28 ,  G01J3/36 ,  G03F7/20

CPC classification number: G03F7/7065 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7088

Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.

公开(公告)号：EP3279736A1

公开(公告)日：2018-02-07

申请号：EP16182256.4

申请日：2016-08-01

Applicant: ASML Netherlands B.V.

Inventor： GOORDEN, Sebastianus, Adrianus ,  PANDEY, Nitesh ,  AKBULUT, Duygu ,  TUKKER, Teunis, Willem ,  DE WIT, Johannes, Matheus, Marie

IPC: G03F7/20 ,  G02B6/42

CPC classification number: G03F7/7015 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2201/0631 ,  G02B6/262 ,  G02B6/4204 ,  G02B6/4296 ,  G03F7/70075 ,  G03F7/70583 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: Devices (30) and methods for processing a radiation beam (1) with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam (1) comprises components distributed over one or more radiation beam spatial modes. A waveguide (20) supports a plurality of waveguide spatial modes. The optical system (10) directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the input interface (26) of the waveguide (20) in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes, e. g. by directing by the optical system (10) the plurality of components of the radiation beam (1) belonging to a common radiation spatial mode onto different positions (61-63) of the input interface (26).

Abstract translation: 公开了用于以相干处理辐射束（1）的设备（30）和方法。 在一种布置中，光学系统接收具有相干性的辐射束。 辐射束（1）包括分布在一个或多个辐射束空间模式上的分量。 波导（20）支持多个波导空间模式。 光学系统（10）将属于公共辐射束空间模式且具有不同频率的辐射束的多个分量引导到波导（20）的输入接口（26）上，使得多个 的组件耦合到一组不同的波导空间模式，每组包括一个或多个波导空间模式， G。 通过光学系统（10）将属于公共辐射空间模式的辐射束（1）的多个分量引导到输入接口（26）的不同位置（61-63）上。