公开(公告)号：JP2009188405A

公开(公告)日：2009-08-20

申请号：JP2009021061

申请日：2009-02-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DEN BRINK MARINUS AART ,  BUTLER HANS ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO ,  VAN DER WIJST MARC WILHELMUS M ,  ANGELIS GEORGO ,  KLAVER RENATUS GERARDUS ,  HAMELS MARTIJN ROBERT ,  VERHAAR BOUDEWIJN THEODOROS ,  HOEKSTRA PETER

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which improves the calibration precision of stage position measurement. SOLUTION: A calibration method of a stage system includes moving a stage to an encoder grid in response to a set point signal and measuring the position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal showing a difference between the position of the state measured by the sensor head and the set point signal is registered. The stage system is calibrated on the basis of the registered signal showing the difference. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供提高台架位置测量的校准精度的光刻设备。 解决方案：舞台系统的校准方法包括响应于设定点信号将舞台移动到编码器电网并且通过与编码器电网协作的传感器头来测量舞台的位置。 舞台的位置由舞台控制器控制。 记录表示由传感器头测量的状态的位置与设定点信号之间的差异的信号。 基于显示差异的登记信号校准舞台系统。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009141349A

公开(公告)日：2009-06-25

申请号：JP2008303286

申请日：2008-11-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/709

Abstract: PROBLEM TO BE SOLVED: To reduce a possible impact of acoustic vibration to a part of a lithographic apparatus, and to thereby enhance the precision of the lithographic apparatus, overlay, or all other parameters. SOLUTION: A lithographic apparatus may be provided with an acoustic resonator to attenuate acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The Helmholtz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress the transfer of acoustical vibration caused by e.g. the movement of the patterning device stage to the projection system. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：减少声波振动对光刻设备的一部分的可能影响，从而提高光刻设备，覆盖层或所有其他参数的精度。 解决方案：光刻设备可以设置有声谐振器以衰减光刻设备中的声振动。 声谐振器可以包括亥姆霍兹共振器。 亥姆霍兹共振器可以设置有有源元件，以提供由谐振器形成的质量弹簧组件的主动阻尼和/或改变弹簧特性。 谐振器可以设置在图案形成装置台和投影系统之间的屏蔽中的狭缝处，以抑制由例如导电层引起的声振动的传递。 图案形成装置台到投影系统的移动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008311647A

公开(公告)日：2008-12-25

申请号：JP2008148792

申请日：2008-06-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS

IPC: H01L21/027 ,  G02B7/02

CPC classification number: G03F7/709 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which imaging accuracy and/or throughput is improved.
SOLUTION: The lithographic apparatus comprises a projection system housing for supporting internally one or more lens elements, and a movement damper for damping the movement of the projection system housing at a natural frequency of at least one of the lens elements and/or the projection system housing.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供其中成像精度和/或吞吐量提高的光刻设备。 解决方案：光刻设备包括用于在内部支撑一个或多个透镜元件的投影系统壳体和用于以至少一个透镜元件的固有频率阻尼投影系统壳体的运动的运动阻尼器和/或 投影系统外壳。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007258695A

公开(公告)日：2007-10-04

申请号：JP2007043039

申请日：2007-02-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70766

Abstract: PROBLEM TO BE SOLVED: To provide a drive system for a substrate support of the lithographic apparatus or the support of a patterning device, which is compact and requires no thermal conditioning. SOLUTION: A component 11 is moved relative to a reference within a lithographic apparatus by a first actuator 12. A second actuator 15 that exerts force between the component 11 and a reaction mass 13 is used to adjust at least one from among the position, velocity, and acceleration of the component 11, relative to the reference within the lithographic apparatus. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供用于光刻设备的基板支撑件或图案形成装置的支撑件的驱动系统，其是紧凑的并且不需要热调节。 解决方案：组件11通过第一致动器12相对于光刻设备中的参考元件移动。在部件11和反作用块13之间施加力的第二致动器15用于调整至少一个 组件11的位置，速度和加速度相对于光刻设备内的参考。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007258676A

公开(公告)日：2007-10-04

申请号：JP2007000743

申请日：2007-01-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： COX HENRIKUS HERMAN MARIE ,  BUTLER HANS ,  HOL SVEN ANTOIN JOHAN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68 ,  H02K41/03 ,  H02K41/035 ,  H02P25/06

CPC classification number: H02P25/06

Abstract: PROBLEM TO BE SOLVED: To compensate a change of a motor constant caused by a temperature change of permanent magnet in a motor control system for positioning a lithography device. SOLUTION: A positioning system positions a patterning support and a substrate support. The positioning system has a motor including a stator and a mover connected to the supports, and the motor control system including a controller for providing an output for controlling a current applied to the motor. The motor control system determines a controller output required for compensating for the weights of the mover and the related supports, determines a deviation from an output required for compensating for weights applied to the mover and the related supports, and corrects a current applied to the motor based on the deviation. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了补偿由用于定位光刻装置的电动机控制系统中的永久磁铁的温度变化引起的电动机常数的变化。 解决方案：定位系统定位图形支撑件和基板支撑件。 该定位系统具有电动机，该电动机包括定子和与该支撑件连接的动子，该电动机控制系统包括用于提供用于控制施加到电动机的电流的输出的控制器。 电机控制系统确定用于补偿动子和相关支架的重量所需的控制器输出，确定与用于补偿施加到动子的重量和相关支架所需的输出的偏差，并校正施加到电动机的电流 基于偏差。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007235179A

公开(公告)日：2007-09-13

申请号：JP2007159104

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007005796A

公开(公告)日：2007-01-11

申请号：JP2006168255

申请日：2006-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  DRAAIJER EVERT HENDRIK JAN ,  BREUKERS MARCUS JOSEPH E G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a projection apparatus and a method of manufacturing the same. SOLUTION: A lithographic apparatus has a control system to control a position of a substrate table. The control system includes: a first detection device for generating a projection system position signal showing a position of a projection system; a second detection device for generating a projection system feed/forward signal; a comparison unit for deducting a signal showing the actual position of the substrate table from a substrate table position reference signal, and generating a servo error signal by adding the projection system position signal; a control unit for generating a first control signal based on the servo error signal; an addition unit for generating a second control signal by adding the feed/forward signal and the first control signal; and an actuator unit for driving the substrate table to a desired substrate table position based on a second control signal. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，投影设备及其制造方法。 解决方案：光刻设备具有控制衬底台的位置的控制系统。 所述控制系统包括：第一检测装置，用于产生表示投影系统的位置的投影系统位置信号; 用于产生投影系统进给/转发信号的第二检测装置; 比较单元，用于从衬底台位置参考信号中扣除表示衬底台的实际位置的信号，并通过加上投影系统位置信号产生伺服误差信号; 控制单元，用于基于所述伺服误差信号产生第一控制信号; 加法单元，用于通过将所述进给/前向信号和所述第一控制信号相加来产生第二控制信号; 以及用于基于第二控制信号将衬底台驱动到期望的衬底台位置的致动器单元。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006191019A

公开(公告)日：2006-07-20

申请号：JP2005357356

申请日：2005-12-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS ,  AUER FRANK ,  DUIJNHOVEN MARTINUS V ,  GERTRUDIS MEIJERS PIETER J ,  VAN DER TOORN JAN-GERARD C ,  DE PEE JOOST

IPC: H01L21/027 ,  F16F9/02 ,  F16F9/04 ,  F16F15/02 ,  G03F7/20 ,  H01L21/677

CPC classification number: G03F7/709 ,  F16F9/003 ,  F16F9/3235 ,  F16F15/0232 ,  F16F15/0275 ,  G03F7/70833

Abstract: PROBLEM TO BE SOLVED: To provide a vibration isolation device with a small rigidity and a lithography equipment. SOLUTION: To adequately transport a pattern to a substrate or any other pattern with a micro structure, the vibration isolation device like an air mount is used to minimize vibration from an external support structure like a floor. To improve the vibration isolation property of the air mount, a pressure controller is provided that can reduce pressure gas pressure variation within a gas chamber, resulting in decrease in air mount (positive) rigidity. The volume of the above gas chamber changes due to vibration. In addition, the corresponding pressure variation is decreased through the use of a rigidity reduction device and a force applied to the supported object itself is additionally reduced, so that the air mount rigidity can be reduced. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有小刚度的隔振装置和光刻设备。 解决方案：为了将图案充分地传送到基板或具有微结构的任何其它图案，使用诸如空气支架的隔振装置来最小化来自诸如地板的外部支撑结构的振动。 为了提高空气安装座的隔振性能，提供了能够减小气室内的压力气体压力变化的压力控制器，导致空气安装（正）刚度的降低。 上述气室的体积由于振动而变化。 此外，通过使用刚性减小装置来减小相应的压力变化，并且额外减小施加到被支撑物体的力的力，从而可以降低空气安装刚度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005303318A

公开(公告)日：2005-10-27

申请号：JP2005116023

申请日：2005-04-13

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70533 ,  G03F7/70508 ,  G03F7/70525

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device for making full use of a desired exposure function, namely an optimum exposure function, and also to provide a control system and a device manufacturing method.
SOLUTION: The lithographic device comprises: a lighting system IL for providing radiation beams; a support MT for supporting a patterning device MA to give a pattern onto a cross section of the radiation beams; a substrate table WT for retaining the substrate; a projection system PL for projecting patterned beams to a target portion on the substrate; a measurement system for generating an information signal containing information regarding at least one position of a patterning device, the substrate, the projection system, and a component in the projection system; and a control system for controlling a position.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于充分利用期望的曝光功能，即最佳曝光功能的光刻设备，以及提供控制系统和设备制造方法。 光刻设备包括：用于提供辐射束的照明系统IL; 支撑MT，用于支撑图案形成装置MA以在辐射束的横截面上给出图案; 用于保持衬底的衬底台WT; 用于将图案化的光束投射到基板上的目标部分的投影系统PL; 用于产生信息信号的测量系统，该信息信号包含关于投影系统中的图案形成装置，基板，投影系统和部件的至少一个位置的信息; 以及用于控制位置的控制系统。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005236296A

公开(公告)日：2005-09-02

申请号：JP2005040321

申请日：2005-02-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS ,  BOONMAN MARCUS EMILE JOANNES ,  VAN DEN BIGGELAAR PETRUS MARIN

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7034 ,  G03F9/7003 ,  G03F9/7015

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which has an improved focus control system. SOLUTION: The lithography device comprises servo units which position board holders, sensor units which determine the distance of at least one positional point on the surface of a board from a reference surface, a memory unit which stores the surface information of the board, on the basis of each distance of at least one positional point on the surface of the board from the reference distance, and computing units which determine a feed-forward setting point signal, on the basis of the memorized surface information. The feed-forward setting signal is supplied in forward direction to the servo units to position the board holders. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有改进的聚焦控制系统的光刻设备。 解决方案：光刻设备包括定位板固定器的伺服单元，确定板的表面上的至少一个位置点与参考表面的距离的传感器单元，存储板的表面信息的存储单元 基于基准距离上的板的表面上的至少一个位置点的每个距离，以及基于存储的表面信息来确定前馈设定点信号的计算单元。 前馈设置信号以正向方式提供给伺服单元以定位电路板支架。 版权所有（C）2005，JPO＆NCIPI