-
公开(公告)号：JP2012084926A
公开(公告)日：2012-04-26
申请号：JP2012014835
申请日：2012-01-27
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVICH , JOHANNES JACOBS MATEUS BASELMANS , SECHELT NICHOLAS LAMBELDUS DONDERS , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA MERTENS , MULKENS JOHANNES CATHARINUS HUBERTUS , FELIX GOTTFRIED PETER PETERS , BOB STREEFKERK , FRANCISCUS JOHANNES HERMAN MARIA TEUNISSEN , HELMAR VAN SANTEN
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid.SOLUTION: A substrate table WT comprises: a drainage ditch, that is, a barrier 40 surrounding an outer circumferential edge of a substrate W; and a barrier 100 surrounding other objects 20 such as a sensor positioned substantially on the same plane as an upper surface of the substrate W. Because the barriers 40 and 100 are configured to be able to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, a risk of contamination of fine components in a lithographic projection apparatus is reduced.
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT包括：排水沟，即围绕衬底W的外周边缘的阻挡层40; 以及围绕其它物体20的阻挡物100，例如基本上位于与基板W的上表面相同的平面上的传感器。因为阻挡层40和100构造成能够收集从液体供应系统溢出的所有液体，同时 基板W被暴露，光刻投影装置中的微细成分的污染的风险降低。 版权所有（C）2012，JPO＆INPIT
-
公开(公告)号：JP2012074745A
公开(公告)日：2012-04-12
申请号：JP2012006051
申请日：2012-01-16
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a device and a method for reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system.SOLUTION: To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system. The closing surface is maintained at a prescribed distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.
Abstract translation: 要解决的问题：提供一种用于在封闭表面用于将液体限制在液体供应系统中时减少光刻设备中的浸没液体污染的装置和方法。
解决方案：避免或减少由与液体供应系统碰撞的关闭表面引起的颗粒物污染。 闭合表面保持在离液体供应系统规定距离处，使得闭合表面和液体供应系统之间不存在碰撞，但液体仍被限制。 版权所有（C）2012，JPO＆INPIT
-
公开(公告)号：JP2011238940A
公开(公告)日：2011-11-24
申请号：JP2011134159
申请日：2011-06-16
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS , MARCO KOERT STAVENGA , BAUKE JANSEN , RAYMOND GERARDUS MARIUS BEEREN , KORNELIS TIJMEN HOEKERD , JANSEN HANS , PETER FRANCISCUS WANTEN , JOHANNES WILHELMUS JACOBUS LEONARDUS CUIJPERS
IPC: H01L21/027
CPC classification number: G03F7/70925 , B08B3/12 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be cleaned easily and effectively, and to provide a method of effectively cleaning an immersion lithographic apparatus.SOLUTION: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of cleaning the immersion lithographic projection apparatus using megasonic waves through a liquid are disclosed. A flow, desirably a radial flow, is induced in the liquid.
-
74.发明专利Immersion lithographic apparatus, method of preventing or reducing contamination of the apparatus, and method of manufacturing device 有权倾斜平版印刷装置，防止或减少装置污染的方法，以及制造装置的方法
公开(公告)号：JP2011199304A
公开(公告)日：2011-10-06
申请号：JP2011115335
申请日：2011-05-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS , JANSEN HANS , ANTONIUS LEENDERS MARTINUS HENDRIKUS , VAN DER NET ANTONIUS JOHANNUS , WANTEN PETER FRANCISCUS , VAN DER DONCK JACQUES COR JOHAN , WATSO ROBERT DOUGLAS , VAN DEN DOOL TEUNIS CORNELIS , SCHUH NADJA , CROMWIJK JAN WILLEM
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。解决方案：浸没式光刻设备通过使用基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或 （b）浓度高达5％的过氧化氢，或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（ 广告）。
-
公开(公告)号：JP2011193017A
公开(公告)日：2011-09-29
申请号：JP2011115337
申请日：2011-05-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： ANTONIUS LEENDERS MARTINUS HENDRIKUS , VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA , JANSEN HANS , WATSO ROBERT DOUGLAS , DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS , CROMWIJK JAN WILLEM , THOMAS LAURSEN
IPC: H01L21/027
CPC classification number: G03F7/70925 , G03F7/2041 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To easily execute cleaning of contamination of a lithographic apparatus. SOLUTION: The outer (top) surface of the reflective member 100 is co-planar with an outer (top) surface of the substrate table WT. This allows the reflective member 100 to be moved under the liquid supply system 12 without turning off the supply of liquid or the leaking of liquid. In that way the immersion space can be kept full of liquid as the reflective member 100 is moved under the projection system PS so that the reflective member 100 can be used in line. Cleaning fluid is applied to the immersion space and the cleaning liquid extends between the barrier member 12 and the reflective member 100 to a porous member 21. If the under pressure applied to the other side of the porous member 21 is reduced, the meniscus extending between the liquid supply system 12 and the reflective member 100 which defines the outer most edge of liquid moves radially outwardly to the outer edge of the porous member 21. Thus, the cleaning fluid covers all of the porous member 21. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：易于执行光刻设备污染的清洁。
解决方案：反射构件100的外（顶）表面与衬底台WT的外（顶）表面共面。 这允许反射构件100在液体供应系统12下移动而不关闭液体供应或液体泄漏。 以这种方式，当反射构件100在投影系统PS下方移动时，浸没空间可以保持充满液体，使得可以使用反射构件100。 清洁液被施加到浸没空间，清洁液体在阻挡构件12和反射构件100之间延伸到多孔构件21.如果施加到多孔构件21的另一侧的下压力减小， 液体供应系统12和限定液体最外边缘的反射构件100径向向外移动到多孔构件21的外边缘。因此，清洁流体覆盖所有多孔构件21.版权：（ C）2011，JPO＆INPIT
-
Patent Agency Ranking
公开(公告)号：JP2011082511A
公开(公告)日：2011-04-21
申请号：JP2010212952
申请日：2010-09-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： HOEKERD KORNELIS TIJMEN , DE GRAAF ROELOF FREDERIK , JANSEN HANS , ANTONIUS LEENDERS MARTINUS HENDRIKUS , VAN DER NET ANTONIUS JOHANNUS , KRAMER PIETER JACOB , KUIJPER ANTHONIE , MARTENS ARJAN HUBRECHT JOSEF ANNA , VAN DER GRAAF SANDRA , PADIY ALEXANDRE VIKTOROVYCH
IPC: H01L21/027 , G03F7/20 , H01L21/304
CPC classification number: G03F7/70925 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To supply a cleaning liquid, having a rate of a base liquid and an emulsified component within a desirable work region, to an immersion system to be cleaned. SOLUTION: A cleaning liquid supply apparatus is configured to supply an emulsified cleaning fluid to an immersion lithographic apparatus. The apparatus includes a mixer configured to mix an additive fluid from an additive fluid supply section and an immersion liquid from an immersion supply section so as to prepare the emulsified cleaning fluid, a sensor system configured to sense physical characteristics of the emulsified cleaning fluid, and a controller connected to the sensor and mixer. The controller controls the supply of the additive fluid from the additive fluid supply section to the mixer and physical characteristics of the emulsified cleaning fluid. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：将要在所需工作区域中的基础液体和乳化成分的比率的清洗液供给到要清洁的浸渍系统。 解决方案：清洁液体供给装置构造成将乳化的清洁流体供应到浸没式光刻设备。 该装置包括混合器，其被配置为将来自添加剂流体供应部分的添加剂流体和来自浸没供应部分的浸没液体混合以制备乳化清洁流体;被配置为感测乳化清洁流体的物理特性的传感器系统，以及 连接到传感器和混合器的控制器。 控制器控制添加剂流体从添加剂流体供应部分到混合器的供应以及乳化清洁流体的物理特性。 版权所有（C）2011，JPO＆INPIT
-
公开(公告)号：JP2011029657A
公开(公告)日：2011-02-10
申请号：JP2010220937
申请日：2010-09-30
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JACOBS HERNES , GILISSEN NOUD JAN , JANSEN HANS , KATE NICOLAAS TEN , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LOOPSTRA ERIK R , HUBERTUS MULKENS JOHANNES C , HARMEN KLAAS VAN DER SCHOOT , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MARIA , STEIJAART PETER PAUL , VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS , VAN DER HOEVEN JAN CORNELIS
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate.
SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high.
COPYRIGHT: (C)2011,JPO&INPIT-
78.发明专利Lithography equipment and method of manufacturing device 有权LITHOGRAPHY EQUIPMENT AND METHODS MANUFACTURING DEVICE
公开(公告)号：JP2011029656A
公开(公告)日：2011-02-10
申请号：JP2010220936
申请日：2010-09-30
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JACOBS HERNES , GILISSEN NOUD JAN , JANSEN HANS , KATE NICOLAAS TEN , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LOOPSTRA ERIK R , HUBERTUS MULKENS JOHANNES C , HARMEN KLAAS VAN DER SCHOOT , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MARIA , STEIJAART PETER PAUL , VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS , VAN DER HOEVEN JAN CORNELIS
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and an atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示为阻挡构件12）移动并被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台上方的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT
-
公开(公告)号：JP2011003900A
公开(公告)日：2011-01-06
申请号：JP2010137799
申请日：2010-06-17
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JACOBS JOHANNES HENRICUS WILHELMUS , JANSEN HANS , BRUIJSTENS JEROEN PETER JOHANNES , THOMAS IVO ADAM JOHANNES , KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA , MIRANDA MARCIO ALEXANDRE CANO , TANASA GHEORGHE
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic device capable of keeping the position of a liquid as constant as possible by controlling the position of an immersion liquid in the immersion lithographic device.SOLUTION: The immersion lithographic device includes a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface. In relation to a liquid trapping structure constructed or configured to trap a liquid in an immersion space between a final element of a projection system and a board table and/or a board supported to the board table, a liquid trapping structure is also provided including a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface.
Abstract translation: 要解决的问题：提供一种能够通过控制浸没式光刻设备中的浸液的位置来保持液体位置尽可能恒定的浸没式光刻设备。解决方案：浸没式光刻设备包括弯曲的曲面 使得表面张力的排水力在弯曲表面上的浸没液体的膜上沿某一方向作用。 关于构造或构造成将液体捕获到投影系统的最终元件和板台之间的浸没空间中的液体捕获结构和/或支撑在板台上的板，还提供了液体捕获结构，其包括 弯曲的曲面，使得表面张力的排水力在一定方向上作用在弯曲表面上的浸没液体的膜上。
-
公开(公告)号：JP2009177143A
公开(公告)日：2009-08-06
申请号：JP2008318283
申请日：2008-12-15
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
IPC: H01L21/027
CPC classification number: G03F7/70925 , G03F7/70341 , G03F7/7085
Abstract: PROBLEM TO BE SOLVED: To cope with a problem of contamination in a lithographic apparatus. SOLUTION: An immersion type lithographic apparatus includes an immersion system for filling at least partially an immersion space with an immersion liquid. The apparatus includes an indicator for indicating whether the portion of the immersion system should be cleaned or not, and a cleaning liquid supply system for supplying a cleaner to the portion of the lithographic apparatus. The cleaner is at least one of different cleaners. The cleaner or the combination of cleaners is selected to clean the contamination of different types or levels in the portion of the lithographic apparatus. The apparatus also includes a controller for control which of the cleaners should be supplied to the lithographic apparatus based on indication received from the indicator. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：为了解决光刻设备中的污染问题。 解决方案：浸没式光刻设备包括用于至少部分地用浸没液体填充浸没空间的浸渍系统。 该设备包括用于指示浸没系统的部分是否应被清洁的指示器，以及用于向光刻设备的该部分提供清洁剂的清洁液体供应系统。 清洁剂是不同清洁剂中的至少一种。 选择清洁剂或清洁剂的组合以清洁光刻设备部分中不同类型或水平的污染物。 该装置还包括控制器，用于根据从指示器接收到的指示，控制哪个清洁器应该被提供给光刻设备。 版权所有（C）2009，JPO＆INPIT
-
-
-
-
-
-
-
-
-
Search Results
131
records
(took 0.045 seconds)
