公开(公告)号：JP2008199034A

公开(公告)日：2008-08-28

申请号：JP2008050997

申请日：2008-02-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  NIJMEIJER GERRIT JOHANNES ,  VAN ASTEN NICOLAAS ANTONIUS A ,  HEUTS FREDERIK THEODORUS E ,  GEMEN JACOBUS ,  DU CROO DE JONGH RICHARD JOHAN ,  BOONMAN MARCUS EMILE JOANNES ,  KLINKHAMER JACOB FREDRIK FRISO ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G01B9/02 ,  H01L21/027 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: PROBLEM TO BE SOLVED: To avoid the need to relate the origins of apparatuses which measure heights of substrates or masks on a plurality of stations in a lithographic projection apparatus having a plurality of substrate tables or mask tables. SOLUTION: A substrate W is mounted on a substrate table WT; then, vertical positions of a physical reference surface and vertical positions Z LS of the substrate surface are measured at a plurality of points on a measurement station (at the right of figure 8) using a level sensor 10; simultaneously, vertical positions Z IF of the substrate table are measured at the same points using a Z-interferometer Z IF ; and the substrate surface height, Z Wafer =Z LS +Z IF , is mapped. Then, the substrate table carrying the substrate is moved to an exposure station (to the left of figure 8) and vertical positions of the physical reference surface is again determined. Then, when the substrate is positioned at a right vertical position during the exposure process, the height map is referenced. This process can be applied to a mask. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了避免在具有多个基板台或掩模台的光刻投影设备中将测量基板或掩模高度的设备的起点与多个台站相关联的需要。 解决方案：将衬底W安装在衬底台WT上; 然后使用液位传感器10在测量站（图8右侧）的多个点测量基板表面的物理基准表面和垂直位置Z LS 的垂直位置; 同时，使用Z型干涉仪Z SB，在同一点测量衬底台的垂直位置Z IF ; 并且映射基板表面高度Z Wafer = Z LS + Z IF 。 然后，承载基板的基板台移动到曝光站（图8的左侧），再次确定物理基准面的垂直位置。 然后，当曝光处理期间基板位于右垂直位置时，参考高度图。 该过程可以应用于掩模。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007251165A

公开(公告)日：2007-09-27

申请号：JP2007059597

申请日：2007-03-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER SCHOOT HERMAN K ,  LOOPSTRA ERIK ROELOF ,  JACOBS FRANSICUS M ,  GODFRIED KATHARINA HUBERTUS FR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus which allows table positions to be changed without the need to drain a liquid in twin-stage immersion exposure. SOLUTION: Substrate tables WT1 and WT2 are provided with bumpers 10 surrounding the respective substrate tables and members 20 extending beyond the bumpers 10 and any other portions of the substrate tables. This structure allows the top surfaces of the substrate tables WT1 and WT2 to extend so that the top surfaces of the substrate tables sufficiently come close to each other, thereby substantially preventing a liquid from leaking from a gap 25 between the top surfaces of the substrate tables WT1 and WT2, which exists between the members 20, without the need to turn off a liquid supply system when the substrate tables WT1 and WT2 simultaneously move beneath a projection system PS. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种允许在不需要在双级浸入式曝光中排出液体的情况下改变工作台位置的装置。 解决方案：衬底台WT1和WT2设置有围绕各个衬底台的缓冲器10和延伸超过保险杠10和衬底台的任何其它部分的构件20。 这种结构允许衬底台WT1和WT2的顶表面延伸，使得衬底台的顶表面充分地彼此靠近，从而基本上防止液体从衬底台顶表面之间的间隙25泄漏 存在于构件20之间的WT1和WT2，而当基板台WT1和WT2同时在投影系统PS下方移动时，不需要关闭液体供应系统。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007235179A

公开(公告)日：2007-09-13

申请号：JP2007159104

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007129194A

公开(公告)日：2007-05-24

申请号：JP2006247183

申请日：2006-09-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTO

IPC: H01L21/027 ,  G01B21/00 ,  G01B21/22 ,  G03F7/20

CPC classification number: G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To measure the position of a substrate table at a high accuracy, using a displacement measuring system. SOLUTION: A displacement measuring system 1 includes: a first x-sensor 4 for measuring the position of a substrate table 2 in a first direction; a second y-sensor 6 for measuring the position of the substrate table 2 in a second direction; and a second x-sensor 5. The first and second x-sensors 4, 5 and the first and second y-sensors 6, 7 are constituted to measure their respective sensor positions relative to at least one lattice plate 3. The displacement measuring system 1 selectively uses the first and second x-sensors 4, 5 and the first and second y-sensors 6, 7 according to the position of the substrate table 2, thus determining the position of the substrate table 2 in the three degree of freedom. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：使用位移测量系统来高精度地测量基板台的位置。 解决方案：位移测量系统1包括：第一x传感器4，用于测量衬底台2在第一方向上的位置; 用于在第二方向上测量衬底台2的位置的第二y传感器6; 和第二x传感器5.第一和第二x传感器4,5以及第一和第二y传感器6,7构成为相对于至少一个格子板3测量其各自的传感器位置。位移测量系统 1根据衬底台2的位置选择性地使用第一和第二x传感器4,5以及第一和第二y传感器6,7，从而确定衬底台2在三自由度中的位置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007027732A

公开(公告)日：2007-02-01

申请号：JP2006191025

申请日：2006-07-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  BLEEKER ARNO JAN ,  MULDER HEINE M ,  NOORDMAN OSCAR FRANCISCUS J ,  SENGERS TIMOTHEUS FRANCISCUS ,  JORRITSMA LAURENTIUS C ,  TRENTELMAN MARK ,  STREUTKER GERRIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70466

Abstract: PROBLEM TO BE SOLVED: To provide a lithography equipment of enhanced productivity. SOLUTION: The stage equipment holds two pattern forming apparatus 42 and 43. The pattern forming apparatus are so arrayed that the distance between patterns in scanning direction agrees with the length of the pattern in the scanning direction. So, a first chip is exposed with a first pattern 44, and a second chip that adjoins the first chip is skipped. Then a second pattern 45 is used to expose a third chip that adjoins the second chip, for an improved exposure sequence. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种提高生产率的光刻设备。

解决方案：平台设备保持两个图案形成装置42和43.图案形成装置如此排列，使得扫描方向上的图案之间的距离与图案在扫描方向上的长度一致。 因此，第一芯片以第一图案44曝光，并且跳过与第一芯片相邻的第二芯片。 然后使用第二图案45来暴露与第二芯片相邻的第三芯片，以改善曝光顺序。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007005795A

公开(公告)日：2007-01-11

申请号：JP2006168236

申请日：2006-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system efficiently and effectively eliminating an energy loss in lithography equipment when a relevant component is locally cooled by the evaporation of a supplied liquid, and defocus and lens aberration are caused by transformation and alteration in immersion lithography for filling a gap between a projection system and a substrate with an immersion liquid in order to increase the number of holes. SOLUTION: A timetable 34 is prepared having information on time at which the evaporation of a supplied liquid 11 is the most likely caused, the position of a substrate W, a speed, an acceleration speed and the like. The evaporation of a local area is prevented by heating at least a portion of the substrate W by using a heater according to the timetable 34 by using a liquid evaporation control device 30 or sending humidified air. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：当通过供应液体的蒸发局部冷却相关部件时，为了提供高效且有效地消除光刻设备中的能量损失的系统，并且散焦和透镜像差是由浸渍的变换和变化引起的 用于通过浸没液体填充投影系统和基板之间的间隙以增加孔的数量的光刻。 解决方案：制备时间表34，其具有关于供应的液体11的蒸发最可能引起的时间的信息，基板W的位置，速度，加速度等。 通过使用液体蒸发控制装置30或发送加湿空气根据时间表34的加热器加热基板W的至少一部分来防止局部区域的蒸发。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005311388A

公开(公告)日：2005-11-04

申请号：JP2005146015

申请日：2005-04-15

Applicant: Asml Netherlands Bv ,  Koninkl Philips Electronics Nv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  コニンクリユケ フィリップス エレクトロニクス エヌ.ブイ.

Inventor： JOHANNES PETRUS MARTINUS BERNA ,  HENRICUS WILHELMUS ALOYSIUS JA ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K3/04 ,  H02K41/00 ,  H02K41/03

CPC classification number: H02K41/03 ,  G03F7/70758 ,  H02K3/04

Abstract: PROBLEM TO BE SOLVED: To provide a positioning device with an improved dynamic behavior, comprising a coil assembly with a lower height, smaller mass and an improved dynamic behavior, as compared with the conventional coil assemblies. SOLUTION: The coil assembly has at least two coils arranged on a common surface, and the coils are partially overlapped in a transposition section. The transposition section has a smaller height, and as a result, the total height of the coil assembly is lowered. Due to the foregoing, the coil assembly becomes more compact, thereby improving the dynamic features of the positioning device, in which the coil assembly is used. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：与传统的线圈组件相比，提供具有改进的动态特性的定位装置，其包括具有较低高度，较小质量和改善的动态特性的线圈组件。 解决方案：线圈组件具有布置在公共表面上的至少两个线圈，并且线圈在转置部分中部分重叠。 换位部具有较小的高度，结果，线圈组件的总高度降低。 由于上述原因，线圈组件变得更紧凑，从而改善了使用线圈组件的定位装置的动态特征。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004343116A

公开(公告)日：2004-12-02

申请号：JP2004142232

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOX WILHELMUS JOSEPHUS ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  FRANKEN DOMINICUS JACOBUS PETR ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  SMITS JOSEPHUS JACOBUS ,  VAN DER WIJST MARC WILHELMUS M

IPC: G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment which makes temperature stability of a projection system surer by active heat transport, while minimizing impact of mechanical vibration by the heat transport.
SOLUTION: In the lithography projection equipment, the projection system comprises one or more optical operating mirrors, and a heat shield which shields heat emission to the mirrors and/or a supporting structure of the mirrors or from the mirrors and/or the supporting structure of the mirrors. Although the heat shield is cooled compulsorily, as the mirrors and the heat shield are supported separately by a supporting frame, vibration of the mirrors by forced cooling is reduced. Preferably, the heat shield includes a heat shield which shields heat emission to the mirrors or from the mirrors, and shields heat emission to heat shields and/or supporting structures for individual mirrors or from the heat shields and/or the supporting structures.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供通过主动热输送确保投影系统的温度稳定性的光刻设备，同时最小化由热传递引起的机械振动的影响。 解决方案：在光刻投影设备中，投影系统包括一个或多个光学操作反射镜，以及屏蔽热反射镜和/或反射镜的支撑结构或从镜子和/或 镜子的支撑结构。 虽然隔热板被强制冷却，但由于反射镜和隔热罩由支撑框架单独支撑，所以通过强制冷却减轻了反射镜的振动。 优选地，隔热罩包括屏蔽向镜子或从反射镜发热的隔热罩，并且屏蔽热辐射到隔热罩和/或用于各个反射镜或隔热罩和/或支撑结构的支撑结构。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004165666A

公开(公告)日：2004-06-10

申请号：JP2003381339

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate W is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003059827A

公开(公告)日：2003-02-28

申请号：JP2002177248

申请日：2002-06-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER WERF JAN EVERT ,  LOOPSTRA ERIK ROELOF ,  MEILING HANS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: G03F1/16 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/707 ,  G03F7/70233 ,  G03F7/70258 ,  G03F7/70283 ,  G03F7/703

Abstract: PROBLEM TO BE SOLVED: To prevent or to alleviate overlay errors or the like caused by a strain, such as deformation or the like of a mark in a lithography apparatus, having a non-telecentric projection system at the article side used in a method for manufacturing a device.
SOLUTION: The method for manufacturing the device comprises a step of providing a substrate covered with a layer of a radiation-sensitive material, a step of providing a radiation projection beam by using a radiation system, a step of imparting a pattern to a section of the projection beam by using a reflective pattern forming means, and a step of forming an image on the target part of the layer of the radiation sensitive material by projecting the pattern-formed radiation beam, by using the non-telecentric projection system at the article side. The method further comprises the steps of shifting and/or inclining a nominal reflection surface of the pattern forming means, so as to separate from a flat surface of a nominal article of the projection system, and alleviating the strain and/or the overlay error of the projection image.
COPYRIGHT: (C)2003,JPO

Abstract translation: 要解决的问题：为了防止或减轻由在光刻设备中的标记的变形等的应变引起的重叠误差等，其在用于方法中的物品侧具有非远心投影系统 制造设备。 解决方案：用于制造该器件的方法包括提供覆盖有辐射敏感材料层的衬底的步骤，通过使用辐射系统提供辐射投影束的步骤，将图案赋予 通过使用反射图案形成装置的投影束，以及通过使用非远心投影系统在物品上投射图案形成的辐射束在辐射敏感材料的层的目标部分上形成图像的步骤 侧。 该方法还包括以下步骤：移动和/或倾斜图案形成装置的标称反射表面，从而与投影系统的标称物品的平坦表面分离，并减轻应变和/或重叠误差 投影图像。