公开(公告)号：JP2011171733A

公开(公告)日：2011-09-01

申请号：JP2011028425

申请日：2011-02-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KANEKO TAKESHI ,  OTTENS JOOST JEROEN ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus in which the possibility of errors in sensor reading is at least reduced. SOLUTION: A table for a lithographic apparatus comprises an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with one or more openings in the surface of the gap to extract liquid from the gap. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种至少减少了传感器读数误差的可能性的装置。 解决方案：用于光刻设备的工作台包括位于工作台上的编码器板，编码器板与工作台的顶表面之间的间隙，位于编码器板相对于工作台周边的径向内侧的间隙 以及在间隙的表面中具有一个或多个开口以从间隙提取液体的流体抽出系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010278475A

公开(公告)日：2010-12-09

申请号：JP2010196374

申请日：2010-09-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method of preventing liquid for immersion lithography from relatively deeply entering under a substrate. SOLUTION: A method of helping to prevent liquid reaching under a substrate is disclosed. The method includes steps of: introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate; and helping to keep immersion liquid that is present at the top and edge of the substrate away from the lower surface of the substrate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止浸没式光刻液体相对深入基底的方法。 公开了一种有助于防止液体到达基底的方法。 该方法包括以下步骤：在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液; 并且有助于保持存在于基板的顶部和边缘处的浸没液体远离基板的下表面。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010212720A

公开(公告)日：2010-09-24

申请号：JP2010108258

申请日：2010-05-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK R ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that is improved in thermal stability in an object during photolithography processing. SOLUTION: An object supporting member configured to support an object on which photolithography processing is performed is disclosed. The object supporting member includes a channel configuration configured to guide a thermally stabilizing medium in the object supporting member and provides thermal stability to the object. The channel configuration includes an input channel structure 9 and an output channel structure 10. The input channel structure 9 and the output channel structure 10 are arranged in a nested configuration and connected by a fine grid structure 11 provided on a surface or near the surface of an object supporting member 2. A lithography apparatus including the object supporting member 2 and a method of manufacturing a device are also disclosed. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在光刻处理期间在物体中的热稳定性得到改善的装置。 解决方案：公开了一种被配置为支撑执行光刻处理的物体的物体支撑构件。 物体支撑构件包括构造成引导物体支撑构件中的热稳定化介质并且向对象提供热稳定性的通道构造。 通道配置包括输入通道结构9和输出通道结构10.输入通道结构9和输出通道结构10被布置成嵌套结构，并通过设置在表面上或接近表面上的细格栅结构11连接 物体支撑构件2.还公开了包括物体支撑构件2的光刻设备和制造装置的方法。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010093252A

公开(公告)日：2010-04-22

申请号：JP2009225775

申请日：2009-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： COMPEN RENE THEODORUS PETRUS ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  JEUNINK ANDRE BERNARDUS ,  LOOPSTRA ERIK ROELOF ,  OTTENS JOOST JEROEN ,  SMITS PETER ,  VAN ABEELEN HENDRIKUS JOHANNES MARINUS ,  MEULENDIJKS ANTONIUS ARNOLDUS ,  HOUBEN MARTIJN ,  LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that prevents the slip occurring on a substrate table. SOLUTION: The lithographic apparatus includes an illumination system IL configured to adjust a radiation beam B; a support MT constructed to support a patterning device MA, the patterning device imparting the radiation beam B with a pattern in its cross-section to form a patterned radiation beam; a mirror block MB provided with the substrate table WT constructed to hold a substrate W; and a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate W, wherein the mirror block MB is constructed and arranged to reduce slip between the mirror block MB and the substrate table WT. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止在基板台上发生滑动的光刻设备。 解决方案：光刻设备包括被配置为调节辐射束B的照明系统IL; 构造成支撑图案形成装置MA的支撑件MT，所述图案形成装置在其横截面中赋予辐射束B以图案以形成图案化的辐射束; 设置有构造成保持衬底W的衬底台WT的镜块MB; 以及投影系统PS，其被配置为将图案化的辐射束投影到基板W的目标部分上，其中，镜块MB被构造和布置成减小镜块MB和衬底台WT之间的滑动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010080980A

公开(公告)日：2010-04-08

申请号：JP2009287219

申请日：2009-12-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  GILISSEN NOUD J ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  ZAAL KOEN JACOBUS JOHANNES MARIA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

Abstract: PROBLEM TO BE SOLVED: To improve a production yield of a lithographic apparatus and improve a method of manufacturing a device. SOLUTION: The lithographic apparatus includes an optical element, such as, immersion fluid reservoir, supported at least in part by a gas bearing etc. A surrounding structure is provided that surrounds a substrate to enable an edge of the substrate to be illuminated by the lithographic apparatus. A level parameter for substrate, such as the thickness of the substrate, is measured by a thickness sensor etc. By means of an actuator, a substrate table is positioned with respect to the surrounding structure, so that the surface of the substrate is placed at a substantially same level as that of the surface of the surrounding structure, thereby enabling the optical element to be transferred between the surface of the substrate and the surface of the surrounding structure. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提高光刻设备的生产成本并改进制造器件的方法。 解决方案：光刻设备包括至少部分地由气体轴承等支撑的诸如浸没式流体储存器的光学元件。提供围绕基底的周围结构，以使基底的边缘能够照亮 通过光刻设备。 衬底的等级参数，例如衬底的厚度，通过厚度传感器等测量。借助致动器，衬底台相对于周围结构定位，使得衬底的表面被置于 与周围结构的表面基本相同的水平，从而使得光学元件能够在基板的表面和周围结构的表面之间传递。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010045392A

公开(公告)日：2010-02-25

申请号：JP2009259763

申请日：2009-11-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： COMPEN RENE THEODORUS P ,  OTTENS JOOST JEROEN

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a cleaning system, and a cleaning method of removing a contaminant on the site from a lithographic apparatus component. SOLUTION: The lithographic apparatus is disclosed. The apparatus includes the cleaning system to clean a component inside the lithographic apparatus on site. The cleaning system is structured so as to provide a cleaning environment in the vicinity of a predetermined position on a component to be cleaned. The system is also structured so as to provide the cleaning environment virtually, irrespective of the contaminant type which is present in the predetermined position. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供从光刻设备部件去除现场污染物的光刻设备，清洁系统和清洁方法。 解决方案：公开了光刻设备。 该装置包括清洁系统，用于清洁现场光刻设备内的部件。 清洁系统被构造成在待清洁部件上的预定位置附近提供清洁环境。 该系统也被构造成能够实际地提供清洁环境，不管存在于预定位置的污染物类型如何。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009272631A

公开(公告)日：2009-11-19

申请号：JP2009111986

申请日：2009-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  SIJBEN ANKO JOZEF CORNELUS ,  MAAS WOUTERUS JOHANNES PETRUS ,  VAN ABEELEN HENDRIKUS JOHANNES ,  VERSTEIJNEN HENRICUS PETRUS ,  STEFFENS PAULA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To disclose a substrate table where heaters are arranged in consideration of a countermeasure for thermal load which may be exerted to a substrate. SOLUTION: The heaters are grouped into zones for control improvement. For each zone, a temperature sensor can be prepared. The temperature sensors can be embedded in the substrate table. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：考虑到可能施加到基板的热负荷的对策来公开加热器布置的基板台。

解决方案：将加热器分组成区域以进行控制改进。 对于每个区域，可以准备温度传感器。 温度传感器可嵌入基板台。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008300829A

公开(公告)日：2008-12-11

申请号：JP2008136199

申请日：2008-05-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG FREDERIK E ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DEN BRINK MARINUS AART ,  JACOBS JOHANNES HENRICUS WILHE ,  ANTONIUS LEENDERS MARTINUS HEN ,  LEVASIER LEON MARTIN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS J M ,  JOHANNES DROSTE RICHARD BERNAR ,  DE KLERK JOHANNES W ,  WANTEN PETER FRANCISCUS ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  DE JONG MARTEIJN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和设置有物体的基板台之间的间隙排出。 解决方案：液浸式光刻设备具有用于排出液体通过衬底的边缘和其上支撑衬底的衬底台之间的间隙的排水口。 排水管设置有将液体供给到排水管的装置，而不管衬底台的位置和/或在排水管中使气体饱和的装置。 这些意味着减少由于排水管中的液体的蒸发导致的热损失的波动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008172214A

公开(公告)日：2008-07-24

申请号：JP2007316876

申请日：2007-12-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HENNUS PIETER RENAAT MARIA ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  STEIJAART PETER PAUL ,  STEIJNS HUBERT MATTHIEU RICHAR ,  SMITS PETER

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To disclose a substrate support constituted to support a substrate for immersion lithographic processing. SOLUTION: The substrate support has a central part and a peripheral part, the peripheral part includes an extraction duct for extracting a liquid from an upper surface of the substrate support, and extraction duct is connected to an exit duct for duct the liquid away from the substrate support. The substrate support further includes a thermal decoupler for decreasing heat transmission between the central part and the peripheral part. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：公开一种用于支持浸没式光刻处理用基板的基板支撑体。 解决方案：基板支撑件具有中心部分和周边部分，周边部分包括用于从基板支撑件的上表面提取液体的提取管道，并且提取管道连接到出口管道，用于将液体 远离基板支撑。 衬底支撑件还包括用于减小中心部分和周边部分之间的热传递的热分离器。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007318120A

公开(公告)日：2007-12-06

申请号：JP2007122960

申请日：2007-05-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK R ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a photolithographic apparatus improved in thermal stabilization in articles by solving the problem that thermal stabilization is difficult because an immersion liquid may cause thermal cooling by transition to a vapor phase in immersion lithography. SOLUTION: An article support includes a channel configuration configured to guide a thermally stabilizing medium in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near the surface of the article support. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供通过解决难以进行热稳定化的问题而提高制品中热稳定性的光刻设备，因为浸没液体可能通过浸没式光刻中的气相转变而导致热冷却。 物品支撑件包括通道配置，该通道配置被配置为引导物品支撑件中的热稳定介质以向物品提供热稳定性，其中通道配置包括输入通道结构和输出通道结构，输入和输出 通道结构以嵌套构造布置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 版权所有（C）2008，JPO＆INPIT