公开(公告)号：JP2012147039A

公开(公告)日：2012-08-02

申请号：JP2012109711

申请日：2012-05-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce presence of bubbles in liquid through which radiated projection beam passes.SOLUTION: This provision may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow toward radial outside direction from an optical axis in the vicinity of an edge of the substrate.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中采取措施来防止或减少辐射投射光束通过的液体中气泡的存在。 解决方案：这种设置可以通过例如通过确保衬底和衬底台之间的间隙被浸没液体填充或者通过使得从位于其附近的光轴朝向径向外侧方向的局部流动来实现 衬底的边缘。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012044227A

公开(公告)日：2012-03-01

申请号：JP2011260597

申请日：2011-11-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  SCHULT NICHOLAS LAMBERTUS DONDERS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  MARCO COELHO STAUFEN ,  STREEFKERK BOB ,  JAN CORNELIS VAN DER HOEVEN ,  CEDRIC DEZILLE GLOVESTOLA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of a immersion lithographic apparatus.SOLUTION: In particular, cleaning fluid may be introduced into a space between a projection system and a substrate table of a lithographic apparatus by using a liquid supply system of the lithographic apparatus. Additionally or alternatively, a cleaning device may be installed on the substrate table, and an ultrasonic emitter may be provided to produce ultrasonic liquid.

Abstract translation: 要解决的问题：提供一种用于清洁浸没式光刻设备内部的方法和设备。 特别地，清洁流体可以通过使用光刻设备的液体供应系统引入到光刻设备的投影系统和基板台之间的空间中。 附加地或替代地，清洁装置可以安装在基板台上，并且可以提供超声波发射器以产生超声波液体。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012032825A

公开(公告)日：2012-02-16

申请号：JP2011208936

申请日：2011-09-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  MARTINUS HENDRIKS HENDRIKS FUCHS ,  BORCHERT KRUIZINGA ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  ERWIN JOHN VAN ZWET ,  ROLAND MICHOLAS MARIA FAHNER ,  MARCUS HEELALDUS HENDRICKS MEYELINK ,  NICHOLAS CORNELIUS JOHANNES VAN DER BURG ,  HAL VAN HIMBERGEN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for ensuring an easier use of an array of individually controllable elements in a lithographic apparatus.SOLUTION: The present invention relates to an apparatus and a method used to calibrate an array of individually controllable elements in a lithographic apparatus. A calibration unit can switch between a first state in which modulated radiation beam enters into a projection system for projecting the modulated radiation beam onto a substrate, and a second state in which a portion of the modulated radiation beam is inspected by the calibration unit. The calibration unit generates or updates calibration data, based on inspection result of the modulated radiation beam. An array controller uses the calibration data to provide control signals to elements of the array of individually controllable elements. These elements are configured to respond to the control signals.

Abstract translation: 要解决的问题：提供一种用于确保在光刻设备中更容易使用单独可控元件阵列的系统和方法。 解决方案：本发明涉及用于校准光刻设备中独立可控元件阵列的装置和方法。 校准单元可以在调制的辐射束进入用于将调制的辐射束投影到衬底上的投影系统的第一状态和第二状态之间切换，其中调制的辐射束的一部分被校准单元检查。 校准单元根据调制辐射束的检查结果生成或更新校准数据。 阵列控制器使用校准数据向各个可控元件阵列的元件提供控制信号。 这些元件被配置为响应控制信号。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011216904A

公开(公告)日：2011-10-27

申请号：JP2011152771

申请日：2011-07-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is enclosed between a final element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use can help to prevent the formation of bubbles in the immersion liquid and to reduce a residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了浸没式光刻投影装置，其中浸没液被包围在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层。 该用途可以有助于防止在浸没液中形成气泡并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2010135857A

公开(公告)日：2010-06-17

申请号：JP2010059726

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projection apparatus, space between a final element of the projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a plane of the substrate and the liquid is confined in the space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段操作期间需要加速的液体的量。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的平面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010118713A

公开(公告)日：2010-05-27

申请号：JP2010048947

申请日：2010-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus suitable for preventing or reducing production of bubbles by preventing the bubbles from escaping from one or more gaps in a substrate table to a path of a radiation beam, or extracting the bubbles that may be produced in the gaps. SOLUTION: This lithographic apparatus is configured to project an image of a desired pattern on a substrate W, which is held on a substrate table WT, through a liquid. In the lithographic apparatus, gaps 22 are formed inside a surface of the substrate table between the substrate table and an outer edge of a substrate, or between the substrate table and another component that is arranged thereon and brought into contact with the liquid in normal use. The lithographic apparatus is composed by arranging, in the gap, a bubble holding device configured to hold bubbles 24 that may be produced in the gap. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其适用于通过防止气泡从衬底台中的一个或多个间隙逸出到辐射束的路径来防止或减少气泡的产生，或提取气泡， 可能在间隙中产生。 解决方案：该光刻设备被配置为通过液体将保持在衬底台WT上的衬底W投影所需图案的图像。 在光刻设备中，间隙22形成在衬底台的表面之间，衬底台与衬底的外边缘之间，或衬底台与另一部件之间，在正常使用中与其配置并与液体接触 。 光刻设备通过在间隙中布置构造成保持可能在间隙中产生的气泡24的气泡保持装置而构成。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009302559A

公开(公告)日：2009-12-24

申请号：JP2009208849

申请日：2009-09-10

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： LIPSON MATTHEW ,  DIERICHS MARCEL MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB ,  WILKLOW RONALD ,  DE JONGE ROEL

IPC: H01L21/027 ,  G02B13/24 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which includes an immersion liquid having a refractive index higher than that of water and has no possibility of agglomeration of contained particles during operation. SOLUTION: In a projection exposure type lithographic apparatus used as a stepper or a scanner, an aqueous solution of one or more alkali metal halides such as alkali metal fluoride, alkali metal chloride, and alkali metal bromide, is used as an immersion liquid having a refractive index higher than that of water. The refractive index is 1.5 or more. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其包括折射率高于水的浸液，并且在操作期间不具有所包含的颗粒的聚集的可能性。 解决方案：在用作步进器或扫描仪的投影曝光型光刻设备中，使用一种或多种碱金属卤化物如碱金属氟化物，碱金属氯化物和碱金属溴化物的水溶液作为浸渍 液体的折射率高于水的折射率。 折射率为1.5以上。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009224806A

公开(公告)日：2009-10-01

申请号：JP2009159623

申请日：2009-07-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce distortion of an image due to temperature gradient of a substrate and an immersion liquid in a liquid immersion projection exposure apparatus.
SOLUTION: In the liquid immersion lithographic apparatus including a temperature control unit for adjusting temperatures of a member in a final stage of the projection exposure apparatus PL, a substrate, and the immersion liquid to a common target temperature T4, the temperature gradient is reduced by adjusting total temperatures of these components. By doing so, matching properties of image formation and total performance are improved. Means to be used includes control of a flow rate and temperature of the immersion liquid by a feedback circuit.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了减少由于液浸投影曝光装置中的基板和浸没液体的温度梯度引起的图像的变形。 解决方案：在液浸光刻设备中，包括用于调节投影曝光设备PL的最后阶段中的部件的温度的温度控制单元，衬底和浸入液体到达共同的目标温度T4的温度梯度 通过调节这些组件的总温度来减少。 通过这样做，改善了图像形成和总性能的匹配性质。 待使用的手段包括通过反馈电路控制浸液的流量和温度。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009163242A

公开(公告)日：2009-07-23

申请号：JP2008323792

申请日：2008-12-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  HENDRICUS HOEKS MARTINUS H ,  KRUIZINGA BORGERT ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN ZWET ERWIN JOHN ,  ROLAND NICOLAS MARIA FAHNER ,  MEIJERINK MARCUS GERHARDUS HEN ,  NICOLAS CORNELIS JOHANNES VAN ,  HAR VAN HIMBERGEN

IPC: G03F7/20 ,  G02B26/08 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for more easily using an array of individually controllable elements in a lithographic apparatus. SOLUTION: The present invention relates to an apparatus and a method used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate, and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements which are subsequently configured in response to the control signals. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在光刻设备中更容易地使用独立可控元件阵列的系统和方法。 解决方案：本发明涉及一种用于校准光刻设备内单独可控元件阵列的设备和方法。 校准单元可以在第一状态和第二状态之间进行切换，其中调制的辐射束通过投影系统以将经调制的辐射束投影到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据来向单独可控元件的阵列的元件提供控制信号，随后可以响应于控制信号而被配置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009088508A

公开(公告)日：2009-04-23

申请号：JP2008239006

申请日：2008-09-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DE GRAAF ROELOF FREDERIK ,  HUBERTUS MULKENS JOHANNES C ,  BECKERS MARCEL ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027

CPC classification number: G03F7/70916 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method of detecting contamination of a liquid containment system and/or a method of determining the time, at which the liquid containment system of an immersion lithography apparatus needs cleaning. SOLUTION: A method of operating the liquid containment system of the immersion lithography apparatus is disclosed. Performances of the liquid containment system are measured by several different methods. On the basis of a result of the performance measurement, for example, a signal showing that it is required to take aid measure is generated. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种检测液体容纳系统的污染物的方法和/或确定浸没式光刻设备的液体容纳系统需要清洁的时间的方法。 公开了一种操作浸没式光刻设备的液体容纳系统的方法。 液体容纳系统的性能通过几种不同的方法测量。 基于性能测量的结果，例如，产生表示需要进行辅助测量的信号。 版权所有（C）2009，JPO＆INPIT