Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method for a solar cell module and the solar cell module, capable of achieving high generating efficiency by making effective use of ultraviolet light.SOLUTION: The manufacturing method for a solar cell module 100 includes: a step S1 for absorbing ultraviolet light and preparing silicon nano fine particles that emits visible light; a step S2 for containing the silicon nano fine particles in resin; and a step S3 for manufacturing a solar cell module using the resin.
Abstract:
PROBLEM TO BE SOLVED: To provide a new semiconductor electrode for utilizing as an electrode used for a solar cell, a solar cell using the semiconductor electrode, and a method for manufacturing the semiconductor electrode. SOLUTION: The solar cell 1 includes a semiconductor electrode 10, a counter electrode 20, an electrolyte 30, and a sealing material 40. The semiconductor electrode 10 includes an incident surface 11a which has a light transmission performance and from which light enters. The counter electrode 20 is arranged opposed to the semiconductor electrode 10. The electrolyte 30 is arranged in a space between the semiconductor electrode 10 and the counter electrode 20. The sealing material 40 seals the electrolyte 30 arranged in the space. The semiconductor electrode 10 includes a transparent electrode 12. The transparent electrode 12 is arranged on the opposite surface to the incident surface 11a in a substrate 11 having the incident surface 11a and having light transmission performance. The transparent electrode 12 includes a metal oxide layer 13 arranged on the opposite side of the surface to which the substrate 11 is jointed. The metal oxide layer 13 contains particulates 14 of the metal oxide and silicon particulates 15. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a light-permeable electromagnetic wave shielding member ensuring excellent conductivity without adversely affecting a transparent substrate, effectively shielding electromagnetic waves emitted from a display portion of an electronic apparatus and excellent in light-permeability, and also to provide the light-permeable electromagnetic wave shielding member manufactured by this method. SOLUTION: In the method for manufacturing a light-permeable electromagnetic wave shielding member formed on the surface of the transparent substrate, a conductive ink containing conductive particles and a resin is used for printing on the surface of the transparent substrate to form a pattern, and then, the transparent substrate having the formed pattern is immersed in a strong acid. The light-permeable electromagnetic wave shielding member manufactured by this method is also provided. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an electrochromic element capable of preventing a switching speed from lowering as much as possible even when being made large in area. SOLUTION: In the electrochromic element, a first transparent conductive film 4, an oxidation coloring layer 2, an electrolytic layer 1, a reduction coloring layer 3 and a second transparent conductive film 4 are sequentially or reverse-sequentially laminated and formed on a substrate 5, or in the electrochromic element, the electrolytic layer 1 in-between by the oxidation coloring layer 2 and the reduction coloring layer 3 is formed between the first substrate 5, on which the transparent conductive film 4 and the oxidation coloring layer 2 are sequentially laminated and formed on an internal surface side, and a second substrate 5, on which the transparent conductive film 4 and the reduction coloring layer 3 are sequentially laminated and formed on an internal surface. The electrochromic element has a metal grid electrode 6 in the at least one transparent conductive film 4. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a solar battery having an excellent productivity, an improved adhesiveness, and an improved durability, and to provide a method of manufacturing the same. SOLUTION: In the solar battery, an electrode film for a solar battery including a transparent film, a transparent electrode thin film provided on the surface, and metal electrodes prepared on the transparent electrode thin film with a space therebetween, is adhered to the surface of a silicon photoelectric converting element so that the surfaces of the metal electrode and the photoelectric converting element are opposed to each other, a void between the metal electrodes is filled with a cured object of a thermosetting or photo-curing transparent adhesive or a thermosetting or photo-curing transparent adhesive containing a conductive fine particle, and a curing contraction of the thermosetting or photo-curing transparent adhesive from the adhesive to the cured object is large. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a solar cell which is superior in productivity and improved in power generation efficiency, and a manufacturing method thereof. SOLUTION: The solar cell is characterized in that a transparent electrode film having metal electrodes formed on a surface while leaving a gap is bonded to a surface of a silicon-based photoelectric converting element with the metal electrodes and the surface of the photoelectric converting element opposed to each other and the gap between metal electrodes is filled with a cured body of a thermosetting or photosetting transparent adhesive or a thermosetting or photosetting transparent adhesive containing conductive particulates. The manufacturing method thereof is also provided. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a photocatalyst thin film of titanium oxide excellent in photocatalytic activity and to provide its production method. SOLUTION: The photocatalyst thin film of titanium oxide consists of a nanocrystalline structure. A nanocrystal is preferably orientated in the C axis. The photocatalyst thin film of titanium oxide shows the good photocatalytic activity. The photocatalyst thin film of titanium oxide is preferably produced by film forming of a gas-flow sputtering. Therefore, the photocatalyst thin film of titanium oxide showing the good photocatalytic activity can be quickly and inexpensively produced. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an electrochromic element having high coloring efficiency at a low cost by a film-deposition technique by which high speed film-deposition is made possible and control of a film-deposition condition for forming a gap can be easily performed. SOLUTION: In the electrochromic element having a layered film wherein a first conductive film, an oxidation coloring layer, an electrolyte layer, a reduction coloring layer and a second conductive film are layered in this order or in the reverse order on a substrate, any one, or two or more layers of the oxidation coloring layer, the electrolyte layer and the reduction coloring layer are film-deposited by a dual magnetron sputtering method in an atmosphere containing hydrogen. An oxygen concentration in the sputtering atmosphere is controlled by plasma emission control to perform film-deposition. Protons caused by hydrogen are introduced into these layers and proton conductivity is imparted and thus responsiveness of an electrochromic phenomenon is enhanced. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a high functional antireflection film provided with hydrophilicity. SOLUTION: The antireflection film has a low refractive index transparent film on the outermost surface and a high refractive index transparent film provided to the lower layer of the low refractive index transparent film. The high refractive index transparent film is the antireflection film of a titanium oxide film deposited by a gas flow sputtering method. The titanium oxide film deposited by the gas flow sputtering method shows high photocatalytic activity in an as-deposition state where a substrate is not heated and even when the low refractive index transparent film is deposited on the titanium oxide film, the hydrophilicity due to the titanium oxide film present on the lower layer of the low refractive index transparent film is attained and in addition, excellent antireflection performance due to the lamination of the titanium oxide film and the low refractive index transparent film is exhibited. Furthermore, the hydrophilicity due to the titanium oxide film of the lower layer is further improved by making the low refractive index transparent film on the titanium oxide film be a low density film deposited by high speed deposition by the gas flow sputtering method. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for forming a crystalline thin film on a low-temperature or unheated substrate. SOLUTION: When using a single-cathode pulse sputtering method, the method for forming the thin film includes controlling the duty ratio of an electric power applied to a target electrode to 60% or less. When using a dual-cathode pulse sputtering method, the method for forming the thin film includes controlling the duty ratio of an electric power applied to each of the two target electrodes to 40% or less. When using the single-cathode pulse sputtering method or the dual-cathode pulse sputtering method, the film-forming method can form the crystalline thin film on the low-temperature or unheated substrate. COPYRIGHT: (C)2008,JPO&INPIT