公开(公告)号：JP2010250075A

公开(公告)日：2010-11-04

申请号：JP2009099418

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAMOTO KEI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F12/04 ,  C08F20/04 ,  C08F20/12 ,  C08F32/08 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active-ray sensitive or radiation-sensitive resin composition which is improved in development defects and distance dependence of a pattern, and to provide a method for forming a pattern that uses the composition. SOLUTION: The active-ray sensitive or radiation-sensitive resin composition comprises (A) a resin having a specified repeating unit having a norbornane structure in a side chain, and the solubility of which with an alkali developing solution is increased by an action of an acid; (B) a compound generating an acid by irradiation with active rays or radiation; and (C) a resin containing at least either a fluorine atom or a silicon atom and having a group that is decomposed by an action of an alkali developing solution, to increase the solubility with the alkali developing solution. The method for forming a pattern is carried out by using the composition. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供改善图案的显影缺陷和距离依赖性的主动射线敏感或辐射敏感性树脂组合物，并提供形成使用该组合物的图案的方法。 解决方案：主动射线敏感或辐射敏感性树脂组合物包含（A）具有侧链中具有降冰片烷结构的特定重复单元的树脂，其与碱性显影液的溶解度增加 酸的作用 （B）通过用活性射线或辐射照射产生酸的化合物; 和（C）至少含有氟原子或硅原子的树脂，并且具有通过碱性显影液的作用分解的基团的树脂，以提高与碱性显影液的溶解性。 通过使用该组合物进行形成图案的方法。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010134106A

公开(公告)日：2010-06-17

申请号：JP2008308676

申请日：2008-12-03

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SAEGUSA HIROSHI ,  ITO TAKAYUKI ,  HARADA MASAYUKI ,  IWATO KAORU

IPC: G03F7/004 ,  C08F216/12 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resist composition for forming a resist pattern that has remedied collapse of the resist pattern, line edge roughness and generation of scum and that has little degradation in the profile and good follow-up property to an immersion liquid during immersion exposure, and to provide a pattern forming method using the photosensitive resist composition. SOLUTION: The composition is an active energy ray-sensitive or radiation-sensitive resin composition containing (A) a resin the solubility of which with an alkali developer solution is increased by an effect of an acid, (B) a compound generating an acid by irradiation with active rays or radiation, and (C) a resin having an ether bond and a fluorine atom in the main chain. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于形成抗蚀剂图案的光敏抗蚀剂组合物，该抗蚀剂图案已经补救了抗蚀剂图案的塌陷，线边缘粗糙度和浮渣的产生，并且其轮廓几乎没有劣化和良好的后续性能 在浸渍曝光期间的浸没液体，并提供使用该光敏抗蚀剂组合物的图案形成方法。 该组合物是一种活性能量射线敏感或辐射敏感性树脂组合物，其含有（A）其与碱性显影剂溶液的溶解度由于酸的作用而增加的树脂，（B）产生 通过用活性射线或辐射照射的酸，和（C）主链中具有醚键和氟原子的树脂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010079270A

公开(公告)日：2010-04-08

申请号：JP2009180210

申请日：2009-07-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIRAKAWA MICHIHIRO ,  IWATO KAORU ,  TAKAHASHI AKIRA

IPC: G03F7/40 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method of forming pattern which is used for forming a fine pattern in manufacturing a semiconductor, forms a pattern where line with roughness (LWR) is reduced, and attains a wide exposure latitude, and to provide a photosensitive composition to be used for the method. SOLUTION: The method of forming pattern includes: a process for forming a photosensitive film from the photosensitive composition; a process for irradiating the photosensitive film with an active light beam or a radiation; a heating process (a PEB process); a developing process; a rinsing process; and a post-baking process. The method of forming pattern is characterized by allowing the glass-transition temperature of at least one resin contained in the photosensitive composition to be within the range of a formula (1), and the photosensitive composition to be used for the method is provided. The formula (1) is (the heating temperature of the post-baking process plus 20°C)≥(the glass-transition temperature of the resin)>(the heating temperature of the PEB process). COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种在制造半导体时形成精细图案的图案的形成方法，形成粗糙度线（LWR）减小并获得宽曝光宽容度的图案，并且 提供用于该方法的光敏组合物。 解决方案：形成图案的方法包括：从感光组合物形成感光膜的工艺; 用活性光束或辐射照射感光膜的方法; 加热工艺（PEB工艺）; 一个发展过程; 冲洗过程; 和后烘烤过程。 形成图案的方法的特征在于允许光敏组合物中包含的至少一种树脂的玻璃化转变温度在式（1）的范围内，并且提供用于该方法的感光组合物。 式（1）为（后烘烤加工的加热温度加20℃）≥（树脂的玻璃化转变温度）>（PEB工序的加热温度）。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010061116A

公开(公告)日：2010-03-18

申请号：JP2009178796

申请日：2009-07-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  KUNIDA KAZUTO

IPC: G03F7/039 ,  C08F220/28 ,  H01L21/027

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/30

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition used for formation of minute patterns in the semiconductor production superior to the conventional products in terms of exposure latitude, LWR, and pattern collapse performance. SOLUTION: The resist composition contains two or more kinds of polymers including a first polymer and a second polymer, and a compound, which generates an acid by irradiation of an active light or a radiation. The composition ratio of at least the first polymer and the second polymer in a dried coating film formed using the resist composition has an inclined type distribution continuously changing in the depth direction from the air interface of the resist film to a supporting member, and the composition ratio of the first polymer is higher than that of the second polymer in the upper part of the resist film and the composition ratio of the second polymer is higher than that of the first polymer in the lower part of the resist film. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供在曝光宽容度，LWR和图案折叠性能方面，优于常规产品的半导体生产中用于形成微小图案的光敏组合物。 解决方案：抗蚀剂组合物包含两种或更多种包括第一聚合物和第二聚合物的聚合物，以及通过照射活性光或辐射产生酸的化合物。 使用该抗蚀剂组合物形成的干燥涂膜中的至少第一聚合物和第二聚合物的组成比，具有从抗蚀剂膜的空气界面到支撑体的深度方向上连续变化的倾斜型分布， 第一聚合物的比例高于抗蚀剂膜上部的第二聚合物的比例，并且第二聚合物的组成比高于抗蚀剂膜下部的第一聚合物的组成比。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009215365A

公开(公告)日：2009-09-24

申请号：JP2008057929

申请日：2008-03-07

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  INABE HARUKI

IPC: C08L45/00 ,  C08F38/00 ,  C08L49/00 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522

Abstract: PROBLEM TO BE SOLVED: To provide a film-forming composition (coating liquid) capable of forming an insulating film having a low permittivity and excellent mechanical strengths and having good surface properties, to provide an insulating film obtained by using the film-forming composition, and to provide an electronic device having the insulating film. SOLUTION: The film-forming composition comprises (A) a polymer that comprises a monomer unit represented by formula (1) and has a weight average of ≥1,500 mol.wt. In the formula (1), X is O, S or CH 2 ; R is alkyl, alkenyl, alkynyl, aryl, alkoxy, acyloxy, aryloxy, hydroxyl, carboxyl, alkoxycarbonyl, aryloxycarbonyl, halogen, trialkylsilyl or triarylsilyl, and R further may have a substituent and may form a ring structure by combining mutually; and n is an integer of 0-4. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 解决问题的方案为了提供能够形成具有低介电常数和优异的机械强度并且具有良好的表面性能的绝缘膜的成膜组合物（涂布液），以提供通过使用膜 - 并且提供具有绝缘膜的电子器件。 解决方案：成膜组合物包含（A）包含由式（1）表示的单体单元并且具有≥1,500mol.wt.重量平均值的聚合物。 在式（1）中，X是O，S或CH 2 ; R是烷基，烯基，炔基，芳基，烷氧基，酰氧基，芳氧基，羟基，羧基，烷氧基羰基，芳氧基羰基，卤素，三烷基甲硅烷基或三芳基甲硅烷基，R另外可以具有取代基，可以通过相互组合形成环结构; n为0-4的整数。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009206447A

公开(公告)日：2009-09-10

申请号：JP2008049995

申请日：2008-02-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KUBO YOHEI ,  INABE HARUKI ,  IWATO KAORU ,  WATANABE KATSUYUKI

IPC: H01L21/312 ,  C08F38/02 ,  H01L21/768

CPC classification number: C07C15/54 ,  C07C43/285 ,  C07C69/76 ,  C08F38/00

Abstract: PROBLEM TO BE SOLVED: To provide a film-forming composition excellent in heat resistance and mechanical strength, low-dielectric, and capable of forming a good film surface, as well as an insulating film and an electronic device using the same. SOLUTION: A film-forming composition including a compound represented by the formula (1) and/or a polymer made by using the compound represented by the formula (1) and an insulating film and an electronic device using the same, where A 1 independently represents a group selected from a single bond, -CO-, -NR-, -O-, -SO 2 -, -CH=CH-, or -C≡C-, or a group obtained by combining two or more above groups, A 2 and A 4 independently represent a monovalent organic groups whose carbon numbers are from 1 to 10, A 3 independently represents a hydrogen atom or a monovalent organic group whose carbon number is from 1 to 10 except for phenyl group and X represents a tetravalent organic group whose carbon number is from 1 to 9. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供耐热性和机械强度，低电介质，并且能够形成良好的膜表面的成膜组合物以及使用其的绝缘膜和电子器件。 解决方案：包含由式（1）表示的化合物和/或通过使用由式（1）表示的化合物制成的聚合物的绝缘膜和使用其的电子器件的成膜组合物，其中 A 1 独立地表示选自单键，-CO - ， - NR - ， - O - ， - SO 2 SBR 2 - ， - CH = CH-或 -C≡C-或通过组合两个或更多个上述基团而获得的基团，A 2 和A 4 独立地表示碳数为1〜 在图10中，A 3 独立地表示氢原子或碳数为1至10的除苯基之外的一价有机基团，X表示碳数为1至9的四价有机基团。 P>版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009079195A

公开(公告)日：2009-04-16

申请号：JP2007251407

申请日：2007-09-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU ,  HIRAOKA HIDETOSHI

IPC: C08L49/00 ,  C08F238/00 ,  H01L21/312 ,  H01L21/768

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming interlayer insulated films, which is used for electronic devices or the like, has good film characteristics such as good dielectric constant and mechanical strength, has good adhesiveness to substrates, and gives coating liquids excellent in stability.
SOLUTION: This composition for forming the interlayer insulated films comprises a polymer obtained by polymerizing raw materials containing at least compounds of general formulas (1) and (2), (wherein, R
0 is H or a 1 to 6C hydrocarbon group; Ar is an aryl group or heteroaryl group which may have one or more substituents; R
A is H or an organic group; R
c is an organic group having a cage type structure to whose bridge head position at least one R
A -C≡C- group is directly bound).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供用于电子器件等的用于形成层间绝缘膜的组合物，具有良好的介电常数和机械强度的膜特性，对基片具有良好的粘合性，并且得到涂层 液体稳定性优良。 解决方案：用于形成层间绝缘膜的组合物包括通过使至少含有通式（1）和（2）的化合物的原料聚合而得到的聚合物，其中R 0 为H 或1〜6C烃基; Ar为可具有一个或多个取代基的芳基或杂芳基; R SB为H或有机基团; R SB为C 具有笼桥型结构的有机基团，其桥头位置至少一个R a-C≡C-基团直接结合）。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009051971A

公开(公告)日：2009-03-12

申请号：JP2007221303

申请日：2007-08-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU

IPC: C09D183/07 ,  C07F7/18 ,  C08F299/08 ,  C08G77/20 ,  C08G77/442 ,  C08G81/02 ,  C09D5/25 ,  C09D143/04 ,  C09D147/00 ,  C09D149/00 ,  C09D157/00 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522

Abstract: PROBLEM TO BE SOLVED: To provide a composition for an interlayer insulating film used for electronic devices and the like that exhibits good film properties such as a dielectric constant or mechanical strengths, good adhesion to a substrate and excellent stability of a coating liquid.
SOLUTION: The composition for an interlayer insulating film comprises the following components. (A) A hydrolyzate obtained by hydrolyzing an alkoxysilane or an acyloxysilane having at least one styryl group optionally bearing one or more substituent group in the molecule. (B) A compound having at least two carbon-carbon triple bonds in the molecule. (C) A solvent.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于电子器件等的层间绝缘膜用组合物，其表现出介电常数或机械强度等良好的膜性能，对基材的良好的粘合性和优异的涂布液稳定性 。 解决方案：用于层间绝缘膜的组合物包括以下组分。 （A）通过在分子中水解具有至少一个具有一个或多个取代基的苯乙烯基的烷氧基硅烷或酰氧基硅烷获得的水解产物。 （B）分子中具有至少2个碳 - 碳三键的化合物。 （C）溶剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008231383A

公开(公告)日：2008-10-02

申请号：JP2007077398

申请日：2007-03-23

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IWATO KAORU

IPC: C08F230/08 ,  C08F2/44 ,  C08F238/00 ,  C09D5/25 ,  C09D7/12 ,  C09D147/00 ,  C09D149/00 ,  C09D183/10 ,  H01L21/312

Abstract: PROBLEM TO BE SOLVED: To provide a coating for forming an insulation film which is a composition for forming an insulation film used in electronic devices and the like and gives an insulation film being excellent in film characteristics such as in dielectric constant and mechanical strength, adhesion to substrates and further in the stability of a coating liquid.
SOLUTION: The composition for interlayer insulation films comprises the ingredients as described below: (A) an alkoxysilane or a hydrolysate of an acyloxysilane having at least one carbon-carbon double bond, (B) a compound having at least two carbon-carbon double bonds or carbon-carbon triple bonds in the molecule, (C) a ≤16C carboxylic acid and (D) a solvent.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于形成绝缘膜的涂层，其是用于形成用于电子器件等中的绝缘膜的组合物，并且提供具有优异的介电常数和机械性能的膜特性的绝缘膜 强度，对基材的粘附性，并且进一步提高涂布液的稳定性。 层间绝缘膜用组合物包含如下成分：（A）烷氧基硅烷或具有至少一个碳 - 碳双键的酰氧基硅烷的水解物，（B）具有至少两个碳 - 碳双键的化合物， 碳双键或碳 - 碳三键，（C）≤16C羧酸和（D）溶剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007279699A

公开(公告)日：2007-10-25

申请号：JP2007054428

申请日：2007-03-05

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MIZUTANI KAZUYOSHI ,  MAKINO MASAOMI ,  IWATO KAORU ,  KODAMA KUNIHIKO

IPC: G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a positive resist composition which satisfies high sensitivity, high resolution, proper pattern profile and proper density distribution dependence, at the same time, and also ensures proper dissolution contrast, and to provide a pattern forming method that uses the same. SOLUTION: The resist composition comprises (A) a resin containing a repeating unit represented by Formula (I); and (B) a compound, capable of generating an acid upon irradiation with actinic rays or radiation, wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from among a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group. The pattern forming method that uses the resist composition is also provided. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够同时满足高灵敏度，高分辨率，适当的图案分布和适当的密度分布依赖性的正性抗蚀剂组合物，并且还确保适当的溶解对比度，并提供图案形成方法 使用相同。 抗蚀剂组合物包含（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时产生酸的化合物，其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团。 还提供了使用抗蚀剂组合物的图案形成方法。 版权所有（C）2008，JPO＆INPIT