公开(公告)号：JP2012058725A

公开(公告)日：2012-03-22

申请号：JP2011146634

申请日：2011-06-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHI NOBUHIRO ,  KODAMA SEIICHIRO ,  INOMATA KATSUMI

IPC: G03F7/004 ,  C08F2/48 ,  C08F220/04 ,  C08F220/08 ,  C08G59/50 ,  G02B5/20 ,  G03F7/031 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition achieving both of storage stability and low-temperature baking in a short time and having sufficient sensitivity and developability, and to provide a cured film having excellent compression characteristics, heat resistance, a dielectric constant, solvent resistance, hardness and a voltage retention rate, and to provide a method for forming the cured film, and a color filter excellent in heat resistance, solvent resistance, a voltage retention rate and the like.SOLUTION: The radiation-sensitive resin composition contains: [A] an alkali-soluble resin prepared by copolymerizing (A1) at least one compound selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride and (A2) an epoxy group-containing unsaturated compound; [B] a polymerizable compound; [C] a radiation-sensitive polymerization initiator; [D] a compound expressed by formula (1); and [E] an organic acid or an inorganic acid compound.

Abstract translation: 要解决的问题：提供一种在短时间内具有保存稳定性和低温烘烤两者的具有足够的灵敏度和显影性的辐射敏感性树脂组合物，并提供具有优异的压缩特性，耐热性的固化膜 介电常数，耐溶剂性，硬度和电压保持率，并且提供一种形成固化膜的方法，以及耐热性，耐溶剂性，电压保持率等优异的滤色器。 解决方案：辐射敏感性树脂组合物包含：[A]通过共聚合（A1）至少一种选自不饱和羧酸和不饱和羧酸酐的化合物和（A2）环氧基团制备的碱溶性树脂 的不饱和化合物; [B]可聚合化合物; [C]辐射敏感聚合引发剂; [D]由式（1）表示的化合物; 和[E]有机酸或无机酸化合物。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011257537A

公开(公告)日：2011-12-22

申请号：JP2010131059

申请日：2010-06-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHI NOBUHIRO ,  KODAMA SEIICHIRO ,  INOMATA KATSUMI

IPC: G03F7/004 ,  C08F2/50 ,  C08G59/32 ,  G03F7/032 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which achieves both storage stability and low temperature calcination and has sufficient resolution and radiation sensitivity, to provide a cured film which is superior in heat resistance, light resistance, chemical resistance, transmittance, flatness, and voltage holding ratio or the like which are required properties for this cured film, to provide a method for forming this cured film, and to provide a display element equipped with this cured film.SOLUTION: The radiation-sensitive resin composition contains: [A] a compound having an epoxy group; [B] a polymerizable compound having an ethylenically unsaturated bond; [C] a radiation-sensitive polymerization initiator; and [D] a specific structure compound having an amino group and an electron-attracting group.

Abstract translation: 要解决的问题：提供一种具有保存稳定性和低温煅烧两者并且具有足够的分辨率和辐射敏感性的辐射敏感性树脂组合物，以提供耐热性，耐光性，耐化学性优异的固化膜 ，透光率，平坦度和电压保持率等，以提供形成该固化膜的方法，并提供配备有该固化膜的显示元件。 解决方案：辐射敏感性树脂组合物含有：[A]具有环氧基的化合物; [B]具有烯属不饱和键的聚合性化合物; [C]辐射敏感聚合引发剂; 和[D]具有氨基和吸电子基团的具体结构化合物。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011252133A

公开(公告)日：2011-12-15

申请号：JP2010128934

申请日：2010-06-04

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NARUSE SHINGO

IPC: C09B19/02 ,  C07D498/04

Abstract: PROBLEM TO BE SOLVED: To provide a dioxadine pigment which is excellent in solubility to organic solvent.SOLUTION: The compound is represented by formula (I), wherein R-Reach independently represent hydrogen atom or 1-20C substituted or non-substituted alkyl (at least one of R-Ris 1-20C substituted or non-substituted alkyl.), Rand Reach independently represent hydrogen atom, halogen atom, alkyl, alkoxy, trifluoromethyl or nitro, and Z independently represents hydrogen atom, halogen atom, alkyl, alkoxy or phenoxy.

Abstract translation: 待解决的问题：提供对有机溶剂的溶解性优异的二氧杂环丁烷颜料。 解决方案：该化合物由式（I）表示，其中R 1 = SP 3 = 4，各自独立地表示氢原子 或1-20C取代或未取代的烷基（R 1 -R 4 中的至少一个为1-20C取代或 非取代烷基），R 6和R 6各自独立地表示氢原子，卤素原子，烷基，烷氧基，三氟甲基 或硝基，Z独立地表示氢原子，卤素原子，烷基，烷氧基或苯氧基。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011190241A

公开(公告)日：2011-09-29

申请号：JP2011021233

申请日：2011-02-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： DOI TAKASHI ,  YONEDA EIJI ,  ABE SHIGERU ,  TAKASE HIDEAKI ,  ENDO TAKESHI

IPC: C07C271/24 ,  C07D213/75 ,  G03F7/004 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a compound having high radiation-sensitivity when used as a photopolymerization initiator, and to provide a radiation-sensitive composition which gives a cured film having high radiation-sensitivity and excellent solvent resistance. SOLUTION: The composition is represented by formula (1), wherein R 1 , R 2 , R 3 , and R 4 each independently represent a hydrogen atom, a halogen atom, a cyano group or a nitro group. R 5 represents a cyano group or a phenyl group in which some or all of hydrogen atoms are substituted with 1-12C alkoxy groups. R 6 and R 7 each independently represent a hydrogen atom, a 1-6C alkyl group, a cyclopentyl group, a cyclohexyl group or a nitrogen-containing heterocyclic group. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供当用作光聚合引发剂时具有高辐射敏感性的化合物，并提供具有高辐射敏感性和优异耐溶剂性的固化膜的辐射敏感性组合物。 解决方案：组合物由式（1）表示，其中R 1，R 2，R 2，R 3，SP 3和/或SP > 4 各自独立地表示氢原子，卤素原子，氰基或硝基。 R 5表示其中部分或全部氢原子被1-12个C 1烷氧基取代的氰基或苯基。 R 6和R 7各自独立地表示氢原子，1-6C烷基，环戊基，环己基或含氮杂环基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007101762A

公开(公告)日：2007-04-19

申请号：JP2005289471

申请日：2005-10-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  HAMADA KENICHI ,  SHIHO KOUJI

IPC: G03F7/023 ,  C08F220/26 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having no safety problem, superior in sensitivity, resolution and storage stability as a solution, and having such a proper development margin that a proper pattern profile can be formed, even after the lapse of the optimum developing time in a developing step, and to provide an interlayer insulation film and microlenses formed from the composition. SOLUTION: The radiation-sensitive resin composition contains [A] a copolymer of (a1) at least one selected from among unsaturated carboxylic acid and unsaturated carboxylic acid anhydride, (a2) a specific oxetanyl group-containing unsaturated compound and (a3) a specific unsaturated compound, and [B] a 1,2-quinonediazido compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供不具有安全性问题的辐射敏感性树脂组合物，作为溶液的灵敏度，分辨率和储存稳定性优异，并且具有能够形成适当图案轮廓的适当的显影余量，甚至 在显影步骤中经过最佳显影时间之后，并提供由该组合物形成的层间绝缘膜和微透镜。 解决方案：辐射敏感性树脂组合物含有[a1]（a1）至少一种选自不饱和羧酸和不饱和羧酸酐的共聚物，（a2）特定的含有氧杂环丁烷基的不饱和化合物和（a3 ）特定的不饱和化合物，和[B] 1,2-醌二叠氮化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007004072A

公开(公告)日：2007-01-11

申请号：JP2005187178

申请日：2005-06-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  HARA HIROMICHI

IPC: G03F7/039 ,  C08F20/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which ensures few development defects.
SOLUTION: In the radiation-sensitive resin composition, an acid dissociation group-containing resin which is hardly alkali-soluble or alkali-insoluble but becomes readily alkali-soluble by the action of an acid contains a repeating unit represented by formula (1), wherein R
1 represents H, methyl, ethyl, a 1-4C hydroxyalkyl or a 1-4C perfluoroalkyl; A represents a single bond or a divalent organic group; and R
2 s each independently represent H, a 1-20C substituted or unsubstituted alkyl or a 3-20C monovalent alicyclic hydrocarbon group or R
2 s may bond to each other to represent a cyclic group comprising 4-20 atoms including the atom to which each R
2 bonds or a derivative of the cyclic group.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供确保少量显影缺陷的辐射敏感性树脂组合物。 解决方案：在辐射敏感性树脂组合物中，通过酸的作用几乎不溶于碱或碱不溶性而变得容易碱溶的含酸解离基的树脂包含由式（ 1），其中R 1表示H，甲基，乙基，1-4C羟烷基或1-4C全氟烷基; A表示单键或二价有机基团; 和R 2 SP 2各自独立地表示H，1-20C取代或未取代的烷基或3-20C一价脂环族烃基或R 2 SP 2可以彼此键合至 表示包括4-20个原子的环状基团，包括每个R 2 SP 2键的原子或环状基团的衍生物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006330325A

公开(公告)日：2006-12-07

申请号：JP2005153417

申请日：2005-05-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  SHIMIZU MAKOTO

IPC: G03F7/039 ,  C08F8/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in sensitivity, resolution, pattern shape, etc., and ensuring small line edge roughness. SOLUTION: The radiation sensitive resin composition contains (A) a radiation sensitive acid generator represented by formula (1) and (B) a polymer which has a cyano group in at least one of the ends of a polymer molecular chain and becomes readily alkali-soluble by the action of an acid. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供灵敏度，分辨率，图案形状等优异的辐射敏感性树脂组合物，并确保小的边缘粗糙度。 解决方案：辐射敏感性树脂组合物含有（A）由式（1）和（B）表示的辐射敏感酸产生剂，聚合物在聚合物分子链的至少一个末端具有氰基并成为 通过酸的作用容易碱溶。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006290797A

公开(公告)日：2006-10-26

申请号：JP2005113725

申请日：2005-04-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI

IPC: C07C381/12 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a resist material giving high resolution responding to the recent tendency of demanding increased fineness of resist pattern. SOLUTION: The onium salt is expressed by general formula (1) (A is sulfur atom or iodine atom; Ar 1 is an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; Ar 2 is an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; B is a single bond, a bivalent functional group or a bivalent atom; Y - is a non-nucleophilic counter ion; when A is sulfur atom, then m is an integer of 1-3, n is an integer of 0-2 (m+n=3) and x is an integer of ≥1, and when A is iodine atom, then m is 1 or 2, n is 0 or 1 (m+n=2) and x is an integer of ≥1). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供响应于最近要求提高抗蚀剂图案的细度的趋势而提供高分辨率的抗蚀剂材料。 解决方案：鎓盐由通式（1）表示（A是硫原子或碘原子; Ar 1是芳族烃基或杂环烃基; Ar

公开(公告)号：JP2006045387A

公开(公告)日：2006-02-16

申请号：JP2004229750

申请日：2004-08-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  O ISAMU

IPC: C08F2/38 ,  C07D231/14 ,  C08F220/16 ,  C08F220/28 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiosensitive resin composition useful as a chemically amplifying resist for use in microprocessing and an acid dissociative group-containing polymer, and to provide a pyrazole derivative useful as a chain transfer agent for preparation of the copolymer. SOLUTION: The pyrazole derivative represented by formula (1) ( wherein each R, R 3 is a substituted or an unsubstituted alkyl, alicyclic, alkenyl, aryl or heteroaryl group, n is an integer of 0-3, each R 1 , R 2 is a hydrogen atom, or a substituted or an unsubstituted alkyl or alicyclic group, and R 1 , R 2 may bond each other to form one or more rings), the acid dissociative group-containing polymer obtained by polymerization using the pyrazole derivative as the chain transfer agent, and the radiosensitive resin composition containing the derivative are provided. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 待解决的问题：提供可用作微加工用的化学增幅抗蚀剂的放射敏感树脂组合物和含酸解离基的聚合物，并提供可用作制备共聚物的链转移剂的吡唑衍生物 。 解决方案：由式（1）表示的吡唑衍生物（其中每个R，R 3 SP 3是取代或未取代的烷基，脂环，烯基，芳基或杂芳基，n是 0-3，每个R 1 ，R 2 是氢原子或取代或未取代的烷基或脂环族基团， ，R 2可以彼此键合形成一个或多个环），通过使用吡唑衍生物作为链转移剂进行聚合得到的含酸解离基团的聚合物和含有衍生物的放射敏感性树脂组合物 被提供。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005156725A

公开(公告)日：2005-06-16

申请号：JP2003392513

申请日：2003-11-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NAKAMURA ATSUSHI ,  O ISAMU

IPC: G03F7/039 ,  C08F2/38 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition adaptable to a short-wavelength radiation typified by far UV capable of meeting progress of scale down in an integrated circuit device, having high transparency to radiations and excellent in basic properties as a resist, such as sensitivity, resolution, pattern profile and line edge roughness of a pattern. SOLUTION: The radiation-sensitive resin composition contains an acid-dissociable group-containing polymer containing at least two repeating units having mutually different acid-dissociable groups and a radiation-sensitive acid generator, wherein the polymer is obtained by chain transfer type radical polymerization using a chain transfer agent represented by formula (X-1) wherein R a represents a substituted or unsubstituted hydrocarbon group and Z represents a substituted or unsubstituted hetero atom-containing group. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种适用于以远紫外线为代表的能够在集成电路装置中达到缩小进度的短波长辐射的辐射敏感性树脂组合物，具有高的辐射透明性和优异的基本性能 作为抗蚀剂，例如图案的灵敏度，分辨率，图案轮廓和线边缘粗糙度。 解决方案：辐射敏感性树脂组合物含有含有至少两个具有相互不同的酸解离基团的重复单元的含酸解离基团的聚合物和辐射敏感性酸产生剂，其中该聚合物通过链转移型 使用由式（X-1）表示的链转移剂进行自由基聚合，其中R a 表示取代或未取代的烃基，Z表示取代或未取代的含杂原子的基团。 版权所有（C）2005，JPO＆NCIPI