-
公开(公告)号：US07737418B2
公开(公告)日：2010-06-15
申请号：US11645808
申请日：2006-12-27
IPC: G03F7/20
CPC classification number: H05G2/003 , G03F7/70916
Abstract: A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.
Abstract translation: 提供了用于捕获来自产生锡屑的辐射源的碎片的碎片缓解系统。 碎片减轻系统包括包括多个箔片的碎片屏障，以及构造和布置成清洁箔片的清洁系统。 清洁系统包括供应单元，以向箔提供液体合金以溶解和冲洗来自箔的被捕获的碎屑。 合金包括镓，铟，锡或其任何组合。
-
公开(公告)号：US07629594B2
公开(公告)日：2009-12-08
申请号：US11544930
申请日：2006-10-10
Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Johannes Peterus Henricus De Kuster , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Bastiaan Theodoor Wolschrijn , Yurii Victorovitch Sidelnikov , Marc Hubertus Lorenz Van Der Velden , Wouter Anthon Soer , Thomas Stein , Kurt Gielissen
IPC: G21K5/00
CPC classification number: G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
Abstract translation: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。
-
Patent Agency Ranking
73.发明授权Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method 失效光刻设备，辐射系统，器件制造方法和辐射生成方法公开(公告)号：US07629593B2
公开(公告)日：2009-12-08
申请号：US11819707
申请日：2007-06-28
Applicant: Edwin Johan Buis , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
Inventor： Edwin Johan Buis , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
IPC: G21K5/04
CPC classification number: G03F7/70916
Abstract: A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.
Abstract translation: 光刻设备包括辐射系统，该辐射系统构造成从辐射源发射的辐射提供辐射束。 辐射系统包括被配置为捕获从辐射源发出的材料的污染物阱。 污染物捕集阱包括布置在辐射束的路径中的污染物接合表面，该辐射束在辐射束在辐射系统中传播期间接收从辐射源发出的材料。 辐射系统还包括液体锡冷却系统，其被构造成用液体锡冷却污染物阱。 该装置包括被配置为调节辐射束的照明系统，构造成支撑配置成在其横截面中赋予辐射束图案的图案形成装置的支撑件，被构造成保持基板的基板台和配置成 以将图案化的辐射束投射到基板的目标部分上。
-
74.发明授权Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby 失效辐射发生器件，光刻设备，器件制造方法和由此制造的器件公开(公告)号：US07615767B2
公开(公告)日：2009-11-10
申请号：US11798037
申请日：2007-05-09
IPC: H05G2/00
Abstract: A device constructed to generate radiation includes a liquid bath, and a pair of electrodes. At least a part of one of the electrodes is formed by a cable part moveable with respect to the liquid bath. The device also includes an actuator arranged to move the cable part from a liquid-adhering position to an ignition position, and an ignition source configured to trigger a discharge produced radiating plasma from the liquid adherent to the cable part, when the cable part is in the ignition position, by a discharge between the electrodes. The liquid-adhering position is a position for adhering a liquid from the bath to the part of the electrode.
Abstract translation: 构造成产生辐射的装置包括液槽和一对电极。 电极中的至少一部分由可相对于液槽移动的电缆部分形成。 该装置还包括致动器，其被布置成将电缆部分从液体粘附位置移动到点火位置，并且点火源被配置为触发从电极附着于电缆部分的液体辐射等离子体的放电，当电缆部分处于 点火位置，通过电极之间的放电。 液体粘附位置是将液体从熔池粘附到电极的一部分的位置。
-
公开(公告)号：US07541603B2
公开(公告)日：2009-06-02
申请号：US11527731
申请日：2006-09-27
Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
IPC: G21K5/00
CPC classification number: G03F7/70916 , G01N21/15 , G03F7/70558
Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
Abstract translation: 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
-
公开(公告)号：US20090027637A1
公开(公告)日：2009-01-29
申请号：US11878306
申请日：2007-07-23
Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Van Herpen
IPC: G03B27/42
CPC classification number: G03F7/70925 , B08B1/00 , B82Y10/00 , G03F7/70166 , G03F7/70916
Abstract: A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.
Abstract translation: 构建和布置防碎片系统，以防止从辐射源发出的碎屑从辐射源的辐射传播到光刻设备内或其内。 碎片防止系统包括可围绕旋转轴线旋转的第一箔捕获器和至少部分地包围第一箔捕获器的第二箔阱。 第二箔捕获器包括多个箔片，其相应于中心位置光学地打开，用于放置辐射源并且相应于垂直于旋转轴线的方向光学地闭合。
-
77.发明申请Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby 失效辐射发生器件，光刻设备，器件制造方法和由此制造的器件公开(公告)号：US20080277599A1
公开(公告)日：2008-11-13
申请号：US11798037
申请日：2007-05-09
Abstract: A device constructed to generate radiation includes a liquid bath, and a pair of electrodes. At least a part of one of the electrodes is formed by a cable part moveable with respect to the liquid bath. The device also includes an actuator arranged to move the cable part from a liquid-adhering position to an ignition position, and an ignition source configured to trigger a discharge produced radiating plasma from the liquid adherent to the cable part, when the cable part is in the ignition position, by a discharge between the electrodes. The liquid-adhering position is a position for adhering a liquid from the bath to the part of the electrode.
Abstract translation: 构造成产生辐射的装置包括液槽和一对电极。 电极中的至少一部分由可相对于液槽移动的电缆部分形成。 该装置还包括致动器，其被布置成将电缆部分从液体粘附位置移动到点火位置，并且点火源被配置为触发从电极附着于电缆部分的液体辐射等离子体的放电，当电缆部分处于 点火位置，通过电极之间的放电。 液体粘附位置是将液体从熔池粘附到电极的一部分的位置。
-
-
-
-
-
-
Search Results
77
records
(took 0.03 seconds)
