Opaque silica glass article having transparent portion and process for producing same
    73.
    发明公开
    Opaque silica glass article having transparent portion and process for producing same 有权
    不透明石英玻璃制品具有透明区域和过程及其制备

    公开(公告)号:EP0909743A1

    公开(公告)日:1999-04-21

    申请号:EP98119541.5

    申请日:1998-10-15

    Abstract: An opaque silica glass article comprising a transparent portion and an opaque portion, wherein the opaque portion has an apparent density of 1.70 - 2.15 g/cm 3 and contains 5 x 10 4 - 5 x 10 6 bubbles per cm 3 , said bubbles having an average diameter of 10 - 100 µm; and the transparent portion has an apparent density of 2.19 - 2.21 g/cm 3 and the amount of bubbles having a diameter of at least 100 µm in the transparent portion is not more than 1 x 10 3 per cm 3 .
    The opaque silica glass article is made by a process wherein a mold is charged with a raw material for forming the opaque portion, which is a mixture comprising a silica powder with a small amount of a silicon nitride powder, and a raw material for forming the transparent portion so that the two raw materials are located in the positions corresponding to the opaque and the transparent portions, respectively, of the silica glass article to be produced; and the raw materials are heated in vacuo to be thereby vitrified.

    Abstract translation: 不透明石英玻璃制品,其包括和不透明部分的透明部分,worin不透明部分具有在1.70表观密度 - 2.15克/厘米<3>和含有5×10 <4> - 每平方厘米5×10 <6>气泡 <3>,。所述气泡具有在10至100微米平均直径; 和透光部分具有至2:21的2:19表观密度克/厘米<3>和具有透明部分的直径的至少100微米的气泡的量不大于1×10 <3>每厘米多个<3 >。 不透明石英玻璃制品是由worin的模具中装入的原料用于形成遮光部的方法,所有这些是包括具有氮化硅粉末的少量的二氧化硅粉末的混合物,和一个原料用于形成由 透明部分,以便做了两种原料都位于位置分别对应于不透明和透明部分,该石英玻璃制品要生产的; 和原材料是在真空中加热从而被玻璃化。

    CRISTOBALITE-CONTAINED SILICA GLASS, METHOD OF PRODUCING SAME AND SILICA GLASS JIG MADE OF SAME
    75.
    发明公开
    CRISTOBALITE-CONTAINED SILICA GLASS, METHOD OF PRODUCING SAME AND SILICA GLASS JIG MADE OF SAME 失效
    方石英含QUARZGLAS,方法ITS和由其制成的QUARZGLASS,JIG

    公开(公告)号:EP0757665A1

    公开(公告)日:1997-02-12

    申请号:EP96903002.0

    申请日:1996-02-27

    Abstract: An object of the present invention is to provide silica glass having high purity, high heat resistance, large coefficient of thermal expansion, and low light transmittance and a method of producing the same. Another object of the present invention is to provide a silica glass jig with a vapor-deposited film thereon. Therefore cristobalite-contained silica glass wherein α-cristobalite in the shape of a small sphere or a small, round-edged or sharp-edged, three-dimensional region is dispersed in the silica glass matrix, the diameter of each α-cristobalite sphere or region is in the range of 0.1 νm to 1000 νm, and a content of the α-cristobalite is at least 10 wt.%. A method of producing the cristobalite-contained silica glass by heating a mixture of two kinds or more of crystalline silicon dioxide powder the melting points of which silicon dioxide are different from each other by 20 °C or more wherein the mixture contains the silicon dioxide having the highest melting point at a content in the range of 10 wt.% to 80 wt.% and is heated at temperatures in the range of the lowest melting point of the ingredients to a temperature lower than the highest melting point. The silica glass jig is made of the cristobalite-contained silica glass and the surface of the jig is covered with a vapor-deposited thin film which has a property of being resistant to plasma etching, and which is made of a material of almost the same coefficient of thermal expansion as that of the silica glass. The silica glass jig has no chance to generate particles therefrom and thereby to contaminate a silicon wafer.

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