表面凹凸的制作方法
    71.
    发明授权

    公开(公告)号:CN101283313B

    公开(公告)日:2011-03-16

    申请号:CN200680037154.1

    申请日:2006-09-28

    Inventor: 饵取英树

    Abstract: 提供一种使用光掩模,能够容易且高精度地形成所需的凹凸形状的表面凹凸制作方法。在由感光性树脂组合物形成的感光膜的一侧,以相对感光膜保持间隔的方式配置具备光透过部与光不透过部的掩模部件,从配置在掩模部件侧的光源照射光,通过掩模部件的光透过部,曝光感光膜,再通过显影来除去感光膜的曝光部或未曝光部,在感光膜上制作由曝光部或未曝光部的形状决定的凹凸。并且在曝光之际,控制光源与掩模部件的遮光面间的距离L,光源的大小D,掩模部件与感光膜间的光学距离T等曝光条件,由此控制曝光部或未曝光部的形状。

    表面凹凸的制作方法
    73.
    发明公开

    公开(公告)号:CN101283313A

    公开(公告)日:2008-10-08

    申请号:CN200680037154.1

    申请日:2006-09-28

    Inventor: 饵取英树

    Abstract: 提供一种使用光掩模,能够容易且高精度地形成所需的凹凸形状的表面凹凸制作方法。在由感光性树脂组合物形成的感光膜的一侧,以相对感光膜保持间隔的方式配置具备光透过部与光不透过部的掩模部件,从配置在掩模部件侧的光源照射光,通过掩模部件的光透过部,曝光感光膜,再通过显影来除去感光膜的曝光部或未曝光部,在感光膜上制作由曝光部或未曝光部的形状决定的凹凸。并且在曝光之际,控制光源与掩模部件的遮光面间的距离L,光源的大小D,掩模部件与感光膜间的光学距离T等曝光条件,由此控制曝光部或未曝光部的形状。

    图案形成方法
    77.
    发明公开

    公开(公告)号:CN1523449A

    公开(公告)日:2004-08-25

    申请号:CN200410003604.8

    申请日:2004-02-03

    CPC classification number: G03F7/201 G03F7/0382 G03F7/0392

    Abstract: 一种图案形成方法,首先形成碱溶性聚合物中由保护基保护起来的聚合物比例在50%以上的化学增幅型抗蚀材料构成的抗蚀膜(11)。然后对抗蚀膜(11)照射NA为0.92的KrF准分子激光(12)(含有对于抗蚀膜(11)以布鲁斯特角入射的光成分的曝光光),进行图案曝光之后,利用碱性显影液显影,从而形成抗蚀图14。根据本发明,尽管使用含有对抗蚀膜以布鲁斯特角入射的光成分的曝光光形成图案,也可得到表面形状良好抗蚀图。

    EXPOSURE UNIT WITH IMPROVED LIGHT INTENSITY UNIFORMNESS FOR EXPOSING A RELIEF PLATE PRECURSOR

    公开(公告)号:EP4411476A1

    公开(公告)日:2024-08-07

    申请号:EP24155747.9

    申请日:2024-02-05

    Abstract: Exposure unit (10) for exposing a relief plate precursor, said exposure unit (10) comprising: a support structure (12) with a support surface (14) configured for supporting a relief plate precursor; a plurality of UV light sources (16) arranged next to each other and configured to emit UV light to a side of the relief plate precursor, said plurality of UV light sources (16) covering a light source area (LA) parallel to the support surface (14); and a light adjustment structure (20) configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources (16) so as to render a light intensity measured in the support surface (14) more uniform as compared to a situation without the light adjustment structure (20); wherein the light adjustment structure (20) is arranged at least partially between the light source area (LA) and the support surface (14).

    LIGHT-CURING TYPE 3D PRINTING DEVICE AND IMAGE EXPOSURE SYSTEM THEREOF

    公开(公告)号:EP3101477B1

    公开(公告)日:2018-12-05

    申请号:EP14880796.9

    申请日:2014-10-16

    Inventor: HOU, Feng

    Abstract: An image exposure system of a 3D printing device comprises: a spatial light modulator (206), a light source (201), a projection lens (208), a micro-displacement driving mechanism and a controller. The spatial light modulator (206) is provided with a plurality of micromirrors (311) for adjusting the reflective direction of light illuminating the micromirrors according to a control signal, wherein each micro mirror (311) is a concave mirror for converging the light illuminating the micromirror to create a micro light spot of which the size is smaller than a pixel size corresponding to the micromirror (311); the light source (201) generates a light beam illuminating the spatial light modulator (206); the projection lens (208) is aligned with a first direction of the spatial light modulator (206) so that a micro light spot array formed through the micromirror (311) by the light source (201) is projected onto the surface of a light-sensitive material; the micro-displacement driving mechanism is connected with the spatial light modulator (206), and can drive the spatial light modulator to move in third and fourth directions that are perpendicular to each other, in order to finely adjust the position on the surface of the light-sensitive material onto which the micro light spot array is projected; and the controller is used for instructing the light source to perform multiple exposures, and also instructing the micro-displacement driving mechanism to move upon every exposure, in order to project the micro light spot arrays of the various exposures onto different positions on the surface of the light-sensitive material.

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