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公开(公告)号：EP0670192A1
公开(公告)日：1995-09-06
申请号：EP95200435.6
申请日：1995-02-23
Inventor： Simpson, Matthew A. , Hay, Robert A. , Brox, Steven J.
CPC classification number: B23B27/20 , B23C5/1081 , B23C2226/31 , B23D35/001 , Y10T407/26 , Y10T408/81
Abstract: A cutting tool of the type having a tool support with a cutting tip of CVD diamond film brazed to it has the diamond material so oriented that the general direction of grain boundaries is not normal to the general plane of the rake face.
Abstract translation: 具有具有钎焊到其上的CVD金刚石膜的切割尖端的工具支撑件的类型的切削工具具有如此取向的金刚石材料，使得晶界的总方向不与耙面的总平面垂直。
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公开(公告)号：EP0764968B1
公开(公告)日：2001-11-28
申请号：EP96112566.3
申请日：1996-08-02
Inventor： Reinhard, Donnie K. , Asmussen, Jes , Chakraborty, Rabindra N. , Goldman, Paul D.
IPC: H01J37/32
CPC classification number: H01J37/32266 , H01J37/32192 , H01J2237/3344 , Y10S438/964
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公开(公告)号：EP0764968A3
公开(公告)日：1997-10-08
申请号：EP96112566.3
申请日：1996-08-02
Inventor： Reinhard, Donnie K. , Asmussen, Jes , Chakraborty, Rabindra N. , Goldman, Paul D.
IPC: H01J37/32
CPC classification number: H01J37/32266 , H01J37/32192 , H01J2237/3344 , Y10S438/964
Abstract: A method for selective controlled etching of a material particularly by sequentially switching between two (2) or more modes of radiofrequency waves and/or by distance from a source of the microwaves. The modes and/or distance are selected depending upon the surface of the material to be etched. The etching is rapidly conducted at 0.5 mtorr to 10 torr, preferably using microwave plasma etching.
Abstract translation: 特别是通过在两种（2）或更多模式的射频波和/或与微波源的距离之间顺序切换来选择性地控制材料的蚀刻的方法。 根据待蚀刻材料的表面来选择模式和/或距离。 蚀刻在0.5毫托至10托下迅速进行，优选使用微波等离子体蚀刻。
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公开(公告)号：EP0784771A1
公开(公告)日：1997-07-23
申请号：EP95935720.0
申请日：1995-10-05
Inventor： WILLKENS, Craig, A. , BATEMAN, Linda, S.
CPC classification number: F23Q7/22 , C04B35/575 , C04B35/5755 , C04B35/581 , C04B35/645 , C04B35/6455 , C04B2235/3217 , C04B2235/3826 , C04B2235/3865 , C04B2235/3886 , C04B2235/3891 , C04B2235/5436 , C04B2235/94
Abstract: A method of heating, comprising the step of providing a line voltage of between 120 V and 230 V across a ceramic igniter having a hot zone composition comprising: (a) between 50 and 80 v/o of an electrically insulating ceramic having a resistivity of at least about 1010 ohm-cm; (b) between 10 and 45 v/o of a semiconductive material having a resistivity of between about 1 and about 108 ohm-cm; (c) between 5 and 25 v/o of a metallic conductor having a resistivity of less than about 10-2 ohm-cm; and (d) between 2.0 and 20 v/o of a resistivity-enhancing compound selected from the group consisting of metallic oxides, metallic oxynitrides, rare earth oxides, rare earth oxynitrides, and mixtures thereof.
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公开(公告)号：EP0734362B1
公开(公告)日：1997-07-23
申请号：EP95902507.3
申请日：1994-11-10
Inventor： BAUER, Ralph , COTTRINGER, Thomas, E. , BARNES, Martin, B.
IPC: C04B35/111 , C01F7/44 , C04B35/626
CPC classification number: C04B35/626 , C01F7/442 , C01P2004/61
Abstract: Fine powders of ceramic materials can be obtained by firing a precursor powder in a rotary kiln while carried on coarse carrier particles.
Abstract translation: 陶瓷材料的精细粉末可以通过在回转窑中烧制前体粉末同时载于粗载体颗粒上而获得。
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Patent Agency Ranking86.发明公开Segmented substrate for arc-jet diamond deposition 失效Segmentiertes Substratfürdie Abscheidung des Diamants mittels des Arc-Jet Verfahrens
公开(公告)号：EP0751237A1
公开(公告)日：1997-01-02
申请号：EP96201500.4
申请日：1996-05-29
Inventor： Patten, Donald O., Jr. , Guarnaccia, David G. , Fryburg, George A.
CPC classification number: C23C16/276 , C23C16/01 , C23C16/27
Abstract: A mandrel for use in a diamond deposition process for generating free standing diamond films has a segmented surface forming a plurality of surfaces for deposition of diamond. The segmented surface is formed of a plurality of mesa segments on a common supporting base surfaces for the mesas. The mesa segments are preferably removably attached to the common base by any suitable means such as by bolts through the mandrel substrate which extend into the mesa segments. The mesa segments may vary in shape, size, and number, thus permitting different shaped diamond films to be made simultaneously from the same run if desired. The provided arrangement increases yield by reducing losses due to premature lifting of the diamond film during deposition, due to violent lifting after deposition upon cooling of the mandrel, and due to cracking.
Abstract translation: 用于产生自立式金刚石膜的金刚石沉积工艺中使用的心轴具有形成用于沉积金刚石的多个表面的分段表面。 分段表面由用于台面的公共支撑基面上的多个台面段形成。 台面片段优选通过任何合适的方式可移除地附接到公共基座上，例如通过延伸到台面片段中的心轴衬底的螺栓。 台面片段可以在形状，尺寸和数量上变化，因此如果需要，允许不同形状的金刚石膜从相同的运行同时进行。 所提供的布置通过在沉积期间由于金刚石膜的过早提升而导致的损失增加了产量，这是由于在芯棒冷却之后的沉积之后的剧烈升高以及由于开裂引起的。
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87.发明公开Spinning holder for cutting tool inserts for arc-jet diamond deposition 失效Rotierender HalterfürSchneidensätzebei der Abscheidung des Diamants mittels des Arc-Jet Verfahrens
公开(公告)号：EP0747504A1
公开(公告)日：1996-12-11
申请号：EP96201499.9
申请日：1996-05-29
Inventor： Olson, James M.
CPC classification number: C23C16/276 , C23C16/4584
Abstract: A mandrel for use in an arc-jet spinning diamond deposition process for coating cutting tool inserts is disclosed. The mandrel has a plurality of cutouts or wells (308) for receiving cutting tool inserts (310). The receiving wells are machined or otherwise provided to have the same contour as the cutting tool inserts that are placed in the wells. The receiving wells may all have an identical geometry, or different geometries. In one embodiment, the mandrel comprises a single element with the receiving wells machined into the upper surface of the mandrel. In another embodiment, the mandrel comprises a separate upper plate with the receiving wells cut through the plate to form a grid, and a lower base plate which is attached to the upper plate. An intermediate layer of a low melting metal foil may be placed between the grid and base plate to aid adhesion and to provide an interface of high thermal conductivity.
Abstract translation: 公开了一种用于电弧喷射纺丝金刚石沉积工艺中用于涂覆刀具刀片的心轴。 心轴具有用于接收切削工具插入件（310）的多个切口或孔（308）。 接收井被加工或以其他方式设置成具有与放置在井中的切削工具插入件相同的轮廓。 接收井都可以具有相同的几何形状或不同的几何形状。 在一个实施例中，心轴包括单个元件，其中接收孔被加工成心轴的上表面。 在另一个实施例中，心轴包括单独的上板，其中接收井切穿板以形成格栅，以及附接到上板的下基板。 低熔点金属箔的中间层可以放置在栅格和基板之间以辅助粘附并提供高导热性的界面。
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公开(公告)号：EP0694510A3
公开(公告)日：1996-08-21
申请号：EP95202049.3
申请日：1995-07-25
Inventor： Kapoor, Rakesh R. , Nagy, Bela G. , Bigelow, Louis K.
IPC: C04B37/00
CPC classification number: C04B37/006 , C04B37/026 , C04B2235/6581 , C04B2237/123 , C04B2237/125 , C04B2237/127 , C04B2237/36 , C04B2237/363 , C04B2237/401 , C04B2237/52 , C04B2237/708 , C04B2237/72 , C04B2237/74 , C04B2237/76 , Y10T407/27 , Y10T428/30 , Y10T428/31678
Abstract: The reliability of a braze joint formed between a diamond film and a tungsten carbide body is increased by use of a vanadium containing braze. The braze joint exhibits an average shear strength greater than about 40,000 pounds per square inch, (276 MPa) and the braze exhibits a contact angle with the diamond film of less than about 15°.
Abstract translation: 通过使用含钒钎料，增加了金刚石膜和碳化钨体之间形成的钎焊接头的可靠性。 钎焊接头表现出大于约40,000磅/平方英寸（276MPa）的平均剪切强度，并且钎焊与金刚石膜呈现小于约15°的接触角。
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公开(公告)号：EP0716899A1
公开(公告)日：1996-06-19
申请号：EP95203334.8
申请日：1995-12-02
Inventor： Nagy, Bela G.
IPC: B23K26/02
CPC classification number: B23K26/0075 , B23K26/032 , G01B11/30
Abstract: A combination measuring and ablation laser apparatus is provided which generally includes an ablating laser, a profilometer laser, an automatic feedback control unit and electro-mechanical positioning apparatus. The combination measuring and ablation laser apparatus can have a single multi-mode laser having an ablating mode and a measuring mode and a positioning means for positioning the laser between ablating and measuring modes. According to the method of the invention, the profilometer laser measures the thickness of a diamond sample and compares it to the desired thickness. Where the measured thickness is too large, the feedback control unit activates the ablating laser for a predetermined time interval to smoothen any irregularities which may be contributing to the diamond sample thickness. At the end of the time interval, the portion is remeasured by the profilometer laser to determine if it conforms to the desired thickness. If the portion still fails to conform to the desired thickness, the feedback control unit repeats the steps of positioning and activating the ablation laser to further ablate the portion. This process is repeated until the thickness of the portion is equal or less than the desired thickness, after which the same procedure is used on the rest of the diamond sample until a uniform desired thickness is achieved throughout.
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公开(公告)号：EP0693573A1
公开(公告)日：1996-01-24
申请号：EP95201897.6
申请日：1995-07-11
Inventor： Simpson, Matthew
CPC classification number: C23C16/276 , C23C16/01 , C23C16/0272 , G02B1/105 , Y10T428/30
Abstract: The invention relates to a method of making synthetic diamond film.
Carbon-containing compounds, and especially silicon carbide, provide an advantageous and relatively inexpensive interlayer for CVD deposition of synthetic diamond on graphite. Control of the adherence is obtained.
Applications in the domains of window materials, free-standing domes, etc...Abstract translation: 本发明涉及制造合成金刚石薄膜的方法。 含碳化合物，特别是碳化硅，为合成金刚石在石墨上CVD沉积提供了有利且相对便宜的夹层。 得到粘附控制。 在窗口材料，独立圆顶等领域的应用...
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